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1. 发明授权

US07690766B2 Liquid ejection head, liquid ejection device and liquid ejection method 有权
标题翻译：液体喷射头，液体喷射装置和液体喷射方法
公开(公告)号：US07690766B2
公开(公告)日：2010-04-06
申请号：US11793083
申请日：2005-12-07
申请人： Nobuhiro Ueno , Yasuo Nishi , Atsuro Yanata
发明人： Nobuhiro Ueno , Yasuo Nishi , Atsuro Yanata
IPC分类号： B41J2/06
CPC分类号： B41J2/04576 , B41J2/04581 , B41J2/04588 , B41J2/06 , B41J2/14233 , B41J2002/14475
摘要： A liquid ejection head having: a nozzle for ejecting a liquid; a flat nozzle plate on which the nozzle is provided; a cavity to store the liquid to be ejected from an ejection hole of the nozzle; a pressure generating section which generates pressure on the liquid in the nozzle and forms a meniscus of the liquid in the ejection hole of the nozzle; an electrostatic voltage applying section which applies electrostatic voltage between a base material and the liquid in the nozzle and the cavity, and generates electrostatic suction force; and an operation control section which controls applying of the electrostatic voltage by the electrostatic voltage applying section, and controls applying of drive voltage to drive the pressure generating portion, wherein a volume resistivity of the nozzle plate is 1015 Ωm or more.
摘要翻译：一种液体喷射头，具有：用于喷射液体的喷嘴; 设有喷嘴的扁平喷嘴板; 用于存储从喷嘴的喷射孔喷出的液体的空腔; 压力产生部分，其在喷嘴中的液体上产生压力并在喷嘴的喷射孔中形成液体的弯月面; 静电电压施加部，其在基材与喷嘴中的液体和空腔之间施加静电电压，并产生静电吸引力; 以及操作控制部，其控制由所述静电电压施加部施加静电电压，并且控制施加驱动电压来驱动所述压力产生部，其中所述喷嘴板的体积电阻率为1015Ω·cm以上。

2. 发明申请

US20080150975A1 Liquid Ejection Head, Liquid Ejection Device And Liquid Ejection Method 有权
标题翻译：液体喷射头，液体喷射装置和液体喷射方法
公开(公告)号：US20080150975A1
公开(公告)日：2008-06-26
申请号：US11793083
申请日：2005-12-07
申请人： Nobuhiro Ueno , Yasuo Nishi , Atsuro Yanata
发明人： Nobuhiro Ueno , Yasuo Nishi , Atsuro Yanata
IPC分类号： B41J29/38 , B41J2/045
CPC分类号： B41J2/04576 , B41J2/04581 , B41J2/04588 , B41J2/06 , B41J2/14233 , B41J2002/14475
摘要： A liquid ejection head having: a nozzle for ejecting a liquid; a flat nozzle plate on which the nozzle is provided; a cavity to store the liquid to be ejected from an ejection hole of the nozzle; a pressure generating section which generates pressure on the liquid in the nozzle and forms a meniscus of the liquid in the ejection hole of the nozzle; an electrostatic voltage applying section which applies electrostatic voltage between a base material and the liquid in the nozzle and the cavity, and generates electrostatic suction force; and an operation control section which controls applying of the electrostatic voltage by the electrostatic voltage applying section, and controls applying of drive voltage to drive the pressure generating portion, wherein a volume resistivity of the nozzle plate is 1015 Ωm or more.
摘要翻译：一种液体喷射头，具有：用于喷射液体的喷嘴; 设有喷嘴的扁平喷嘴板; 用于存储从喷嘴的喷射孔喷出的液体的空腔; 压力产生部分，其在喷嘴中的液体上产生压力并在喷嘴的喷射孔中形成液体的弯月面; 静电电压施加部，其在基材与喷嘴中的液体和空腔之间施加静电电压，并产生静电吸引力; 以及操作控制部，其控制由所述静电电压施加部施加静电电压，并控制施加驱动电压来驱动所述压力发生部，其中，所述喷嘴板的体积电阻率为10〜 Omegam或更多。

3. 发明授权

US5403622A Method for feeding a coating solution 失效
标题翻译：喂食溶液的方法
公开(公告)号：US5403622A
公开(公告)日：1995-04-04
申请号：US86911
申请日：1993-07-06
申请人： Yasuo Nishi , Nobuhiro Ueno , Katsusuke Nagashima , Takayuki Kato , Nobuhiko Takashima , Kikuo Maeda
发明人： Yasuo Nishi , Nobuhiro Ueno , Katsusuke Nagashima , Takayuki Kato , Nobuhiko Takashima , Kikuo Maeda
IPC分类号： B05C5/00 , B05C9/06 , G03C1/74 , B05D1/26
CPC分类号： B05C9/06 , B05C5/007 , G03C1/74
摘要： A method of coating an object by shifting from a first coating solution to a second coating solution. After a coating of the object with the first coating solution is finished, a washing solution is used to clean a coating pipe-line and a coater. Deaerated water is supplied to fill up the pipe-line and the coater by control of a multi-way valve which is located at an end of the coating pipe-line which is connected to one of a coater or an outlet for drainage. The multi-way valve is capable of shifting a fluid flow therethrough to one of the coater and to the outlet. With the multi-way valve in the outlet position the deaerated water is replaced in the pipe-line and the coater with the second coating solution. A slit inside the coater is dried, and the second coating solution is then conducted to the coater by shifting the multi-way valve to a coater position therefor.
摘要翻译：通过从第一涂布溶液转移到第二涂布溶液来涂覆物体的方法。用第一涂布溶液涂覆物体后，使用洗涤液清洗涂布管线和涂布机。通过控制位于涂布管线末端的多通阀，连接到涂布机或排水口之一，供给脱气水以填充管线和涂布机。多通阀能够将流体流动通过其移动到涂布机和出口之一。在出口位置的多通阀中，在管线和涂布机中用第二涂层溶液代替脱气的水。将涂布机内的狭缝干燥，然后通过将多路阀移动到涂布机位置将第二涂布溶液导入涂布机。

4. 发明授权

US6106590A Method of ultrasonic waves degassing and device using the same 失效
标题翻译：超声波脱气方法及其使用方法
公开(公告)号：US6106590A
公开(公告)日：2000-08-22
申请号：US98148
申请日：1998-06-16
申请人： Nobuhiro Ueno , Yasuo Nishi , Takeshi Sakurai
发明人： Nobuhiro Ueno , Yasuo Nishi , Takeshi Sakurai
IPC分类号： B01D19/00 , B01D19/02 , G03C1/025
CPC分类号： B01D19/02 , B01D19/0078 , G03C1/025 , G03C2001/7437 , G03C2001/744
摘要： In an apparatus for defoaming liquid with ultrasonic wave in order to eliminate foam or bubble from the liquid, provided with an ultrasonic wave liquid tank, a defoaming tank, and an ultrasonic oscillator for irradiating ultrasonic wave through the ultrasonic wave transmitting liquid to the defoaming tank; at least a part of the defoaming tank is immersed in the ultrasonic wave transmitting liquid in the ultrasonic wave liquid tank, and a degree of unsaturation of dissolved air in the ultrasonic wave transmitting liquid under defoaming operation is not lower than 10%.
摘要翻译：在用超声波消泡液体的设备中，为了从液体中除去泡沫或气泡，设置有超声波液罐，消泡槽和超声波振荡器，用于将超声波通过超声波透过液体照射到消泡罐 ; 将消泡槽的至少一部分浸渍在超声波液罐中的超声波透过液中，在消泡作用下超声波透过液中的溶解空气的不饱和度为10％以上。

5. 发明授权

US07665829B2 Liquid solution ejecting apparatus 失效
标题翻译：液体溶液喷射装置
公开(公告)号：US07665829B2
公开(公告)日：2010-02-23
申请号：US11632408
申请日：2005-07-20
申请人： Nobuhiro Ueno , Isao Doi , Yasuo Nishi , Nobuhisa Ishida
发明人： Nobuhiro Ueno , Isao Doi , Yasuo Nishi , Nobuhisa Ishida
IPC分类号： B41J2/045
CPC分类号： B05B5/0255 , B41J2/04576 , B41J2/04581 , B41J2/04588 , B41J2/06 , B41J2/14233 , B41J2/1433 , B41J2002/14475
摘要： Liquid ejecting apparatus 20 for ejecting electrically charged droplets of the liquid solution onto base member K, which includes liquid ejecting head 26 to eject the droplets from top end 21a of nozzle 21, with the inner diameter equal to or less than 100 μm, liquid solution supplying section 29 to supply the liquid solution into nozzle 21, and ejection voltage applying section 25 to apply the ejection voltage onto the liquid solution in nozzle 21. In liquid ejecting apparatus 20, nozzle 21 projects toward the droplet ejecting direction from nozzle plane 26e on nozzle plate 26c facing base member K, whereby the projecting length of nozzle 21 is equal to or less than 30 μm.
摘要翻译：液体喷射装置20，用于将液体溶液的带电液滴喷射到基材K上，该基材K包括液体喷头26，以使内径等于或小于100μm的喷嘴21的顶端21a喷出液滴;液体溶液供给部分29将液体溶液供应到喷嘴21中，以及喷射电压施加部分25，以将喷射电压施加到喷嘴21中的液体溶液上。在液体喷射装置20中，喷嘴21从喷嘴平面26e向液滴喷射方向突出喷嘴板26c面对基部构件K，由此喷嘴21的突出长度等于或小于30μm。

6. 发明申请

US20070200898A1 Liquid Solution Ejecting Apparatus 失效
标题翻译：液体溶液喷射装置
公开(公告)号：US20070200898A1
公开(公告)日：2007-08-30
申请号：US11632408
申请日：2005-07-20
申请人： Nobuhiro Ueno , Isao Doi , Yasuo Nishi , Nobuhisa Ishida
发明人： Nobuhiro Ueno , Isao Doi , Yasuo Nishi , Nobuhisa Ishida
IPC分类号： B41J2/06
CPC分类号： B05B5/0255 , B41J2/04576 , B41J2/04581 , B41J2/04588 , B41J2/06 , B41J2/14233 , B41J2/1433 , B41J2002/14475
摘要： Liquid ejecting apparatus 20 for ejecting electrically charged droplets of the liquid solution onto base member K, which includes liquid ejecting head 26 to eject the droplets from top end 21a of nozzle 21, with the inner diameter equal to or less than 100 μm, liquid solution supplying section 29 to supply the liquid solution into nozzle 21, and ejection voltage applying section 25 to apply the ejection voltage onto the liquid solution in nozzle 21. In liquid ejecting apparatus 20, nozzle 21 projects toward the droplet ejecting direction from nozzle plane 26e on nozzle plate 26c facing base member K, whereby the projecting length of nozzle 21 is equal to or less than 30 μm.
摘要翻译：液体喷射装置20，用于将液体溶液的带电液滴喷射到基体部件K上，基底部件K包括液体喷射头26，以使内径等于或小于100um的喷嘴21的顶端21a喷出液滴，液体溶液供给部分29将液体溶液供应到喷嘴21中，以及喷射电压施加部分25，以将喷射电压施加到喷嘴21中的液体溶液上。在液体喷射装置20中，喷嘴21从喷嘴平面26向液滴喷射方向突出 e在喷嘴板26c上面对着基件K，由此喷嘴21的突出长度等于或小于30μm。

7. 发明授权

US06194034B1 Method of coating a substrate wherein the flow rate of the coating solution is changed 失效
标题翻译：涂布溶液的流速变化的基材的涂布方法
公开(公告)号：US06194034B1
公开(公告)日：2001-02-27
申请号：US09108074
申请日：1998-06-30
申请人： Yasuo Nishi , Tomohiko Sakai , Nobuhiro Ueno , Nobuyuki Kimura , Fumio Kimura
发明人： Yasuo Nishi , Tomohiko Sakai , Nobuhiro Ueno , Nobuyuki Kimura , Fumio Kimura
IPC分类号： B05D134
CPC分类号： B05D1/26 , G03C1/74 , Y10S118/04
摘要： A method of coating a coating solution onto a base member by a coater while conveying the base member, wherein the base member has a coating starting point from which the coating solution is coated onto the base member, comprise steps of feeding the coating solution to the coater at a flow rate lower than a regular coating flow rate; and increasing the lower flow rate to the regular coating flow rate in accordance with the conveyed position of the coating starting point of the base member when the coating starting point of the base member is conveyed to the coater.
摘要翻译：一种在输送基材的同时通过涂布机将涂布液涂布在基材上的方法，其中，所述基材具有将涂布液从其涂布到基材上的涂层起始点，包括将涂布溶液供给到涂布机的流速低于规定的涂布流速; 并且当基材的涂层起点被输送到涂布机时，根据基材的涂布起点的输送位置，将较低的流速增加到规定的涂布流量。

8. 发明授权

US08366861B2 Anode bonding method and producing method of liquid droplet discharging head 有权
标题翻译：阳极接合方法及液滴喷头的制造方法
公开(公告)号：US08366861B2
公开(公告)日：2013-02-05
申请号：US12733364
申请日：2008-08-29
申请人： Nobuhiro Ueno
发明人： Nobuhiro Ueno
IPC分类号： B32B37/00
CPC分类号： B41J2/161 , B41J2/1623 , B41J2002/14491 , C03C27/00
摘要： Provided is an anode bonding method by which a silicon substrate and a glass substrate are well anodically bonded without generating positional shift, even when an electrode cannot be arranged on a surface on the opposite side to a bonding surface of a glass substrate and the bonding surface is large. The method for anodically bonding the glass substrate and the silicon substrate is provided with a step of placing on the glass substrate the silicon substrate whereupon a through hole is arranged; a step of bringing the anode electrode into contact with the surface of the overlapped silicon substrate opposite to the surface facing the glass substrate, and bringing an cathode electrode into contact with the glass substrate through the through hole arranged on the silicon substrate; and a step of applying a direct current voltage to the anode electrode and the cathode electrode in a state where the glass substrate and the silicon substrate are heated.
摘要翻译：提供了一种阳极接合方法，其中硅衬底和玻璃衬底良好地阳极结合而不产生位置偏移，即使当电极不能布置在与玻璃衬底的接合表面相对的表面上时，接合表面很大玻璃基板和硅基板的阳极接合方法具有在玻璃基板上放置硅基板，然后配置通孔的工序; 将阳极电极与与玻璃基板相对的面重叠的硅基板的表面接触的步骤，通过布置在硅基板上的贯通孔使阴极与玻璃基板接触; 以及在加热玻璃基板和硅基板的状态下，向阳极电极和阴极施加直流电压的工序。

9. 发明申请

US20090143319A1 Transcription factor decoy 审中-公开
标题翻译：转录因子诱饵
公开(公告)号：US20090143319A1
公开(公告)日：2009-06-04
申请号：US11921581
申请日：2006-06-06
申请人： Takefumi Gemba , Nobuhiro Ueno
发明人： Takefumi Gemba , Nobuhiro Ueno
IPC分类号： A61K31/713 , C07H21/04 , A61P1/04 , A61P9/00 , A61P9/10 , A61P11/00 , A61P11/06 , A61P13/02 , A61P13/12 , A61P17/00 , A61P17/02 , A61P17/06 , A61P19/02 , A61P29/00 , A61P35/00 , A61P35/04 , A61P37/00 , A61P37/08 , A61P41/00
CPC分类号： C12N15/113 , C12N2310/13 , C12N2310/315 , C12N2310/321 , C12N2310/3231 , C12N2310/3521
摘要： Double-stranded oligonucleotides useful as decoy oligonucleotides having a high binding ability to a transcription factor and having a reduced cytotoxicity are disclosed. Each of the double-stranded oligonucleotides is formed by hybridization of a sense strand oligonucleotide of the following Formula A: 5′-N(m)-G-Consensus Sequence-C—N(n)-3′ (Formula A) (wherein N(m) is a flanking sequence at the 5′-end, and represents that “N” (s) in the number of m is(are) ligated; N(n) is a flanking sequence at the 3′-end, and represents that “N” (s) in the number of m is(are) ligated; all “N” (s) each independently represent(s) nucleotide A, G, T, C or U; m and n represent each independently an integer of 0 to 20; and Consensus Sequence represents a consensus sequence to which a transcription factor binds) and an antisense strand oligonucleotide complementary to said sense strand oligonucleotide.
摘要翻译：公开了用作具有对转录因子的高结合能力并具有降低的细胞毒性的诱饵寡核苷酸的双链寡核苷酸。通过下列式A的有义链寡核苷酸的杂交形成每个双链寡核苷酸：<？in-line-formula description =“In-line Formulas”end =“lead”→> 5'-N（m ）-G-共有序列-CN（n）-3'（式A）<？在线公式描述=“在线公式”end =“tail”？>（其中N（m）是侧翼序列并且表示m个数量的“N”（s）被连接; N（n）是3'端的侧翼序列，并且表示“N”（s））m全为连接;全部“N”（s）各自独立地表示（S）核苷酸A，G，T，C或U; m和n各自独立地表示0〜20的整数，共有序列表示转录因子结合的共有序列）和与所述有义链寡核苷酸互补的反义链寡核苷酸。

10. 发明申请

US20100206475A1 ANODE BONDING METHOD AND PRODUCING METHOD OD LIQUID DROPLET DISCHARGING HEAD 有权
标题翻译： ANODE BONDING METHOD AND PRODUCTION METHOD OD LIQUID DROPLET DISCHARGING HEAD
公开(公告)号：US20100206475A1
公开(公告)日：2010-08-19
申请号：US12733364
申请日：2008-08-29
申请人： Nobuhiro Ueno
发明人： Nobuhiro Ueno
IPC分类号： B32B37/00 , B32B38/00
CPC分类号： B41J2/161 , B41J2/1623 , B41J2002/14491 , C03C27/00
摘要： Provided is an anode bonding method by which a silicon substrate and a glass substrate are well anodically bonded without generating positional shift, even when an electrode cannot be arranged on a surface on the opposite side to a bonding surface of a glass substrate and the bonding surface is large. The method for anodically bonding the glass substrate and the silicon substrate is provided with a step of placing on the glass substrate the silicon substrate whereupon a through hole is arranged; a step of bringing the anode electrode into contact with the surface of the overlapped silicon substrate opposite to the surface facing the glass substrate, and bringing an cathode electrode into contact with the glass substrate through the through hole arranged on the silicon substrate; and a step of applying a direct current voltage to the anode electrode and the cathode electrode in a state where the glass substrate and the silicon substrate are heated.
摘要翻译：提供了一种阳极接合方法，其中硅衬底和玻璃衬底良好地阳极结合而不产生位置偏移，即使当电极不能布置在与玻璃衬底的接合表面相对的表面上时，接合表面很大玻璃基板和硅基板的阳极接合方法具有在玻璃基板上放置硅基板，然后配置通孔的工序; 将阳极电极与与玻璃基板相对的面重叠的硅基板的表面接触的步骤，通过布置在硅基板上的贯通孔使阴极与玻璃基板接触; 以及在加热玻璃基板和硅基板的状态下，向阳极电极和阴极施加直流电压的工序。

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