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1. 发明授权

US08481244B2 Epoxy-containing polymer, photo-curable resin composition, patterning process, and electric/electronic part protective film 有权
标题翻译：含环氧聚合物，光固化树脂组合物，图案化工艺和电/电子部件保护膜
公开(公告)号：US08481244B2
公开(公告)日：2013-07-09
申请号：US12889730
申请日：2010-09-24
申请人： Takanobu Takeda , Hideto Kato
发明人： Takanobu Takeda , Hideto Kato
IPC分类号： G03F7/038 , G03F7/40 , G03F7/075 , C08L83/06 , C08L83/14 , H01L21/312 , C09D183/06
CPC分类号： C08L83/06 , C08G77/14 , C08G77/80 , C08L83/14 , C09D183/06 , C09D183/14 , G03F7/0045 , G03F7/0757 , H01L21/02118 , H01L21/312 , Y10T428/24802 , C08L2666/14
摘要： A photo-curable resin composition comprising an epoxy-containing silphenylene or silicone polymer with a Mw of 3,000-500,000 forms a coating which is useful as a protective film for electric/electronic parts.
摘要翻译：包含Mw为3,000〜500,000的含环氧基的硅亚烷基或有机硅聚合物的光固化树脂组合物形成可用作电气/电子部件的保护膜的涂层。

2. 发明授权

US08476379B2 Silphenylene skeleton-containing silicone type polymer and method for manufacturing the same 有权
标题翻译：含硅亚苯基骨架的硅氧烷型聚合物及其制造方法
公开(公告)号：US08476379B2
公开(公告)日：2013-07-02
申请号：US13095237
申请日：2011-04-27
申请人： Hiroyuki Yasuda , Takato Sakurai , Takanobu Takeda , Hideto Kato
发明人： Hiroyuki Yasuda , Takato Sakurai , Takanobu Takeda , Hideto Kato
IPC分类号： C08F283/12 , C08G67/02
CPC分类号： C08G77/52 , C08K5/1515 , C08K5/18 , C09D183/14
摘要： There is disclosed a silphenylene skeleton-containing silicone type polymer comprising a repeating unit represented by the following general formula (1) and having a weight average molecular weight of 5,000 to 40,000. There can be a novel silphenylene skeleton-containing silicone type polymer which enables to satisfy both chemical resistance and adhesiveness to a substrate and can be used as a material for a thermosetting resin for forming coatings for protecting substrates, circuits, and interconnections; and a method for manufacturing the same.
摘要翻译：公开了包含由以下通式（1）表示的重均单元，重均分子量为5,000〜40,000的含硅亚
苯基骨架的硅氧烷型聚合物。可以存在能够满足对基板的耐化学性和粘合性的新型含硅亚苯基骨架的硅氧烷型聚合物，并且可以用作形成用于保护基板，电路和互连的涂层的热固性树脂的材料; 及其制造方法。

3. 发明授权

US08729148B2 Photocurable dry film, method for preparing same, patterning method and film for protecting electric and electronic parts 有权
标题翻译：可光固化干膜，其制备方法，图案化方法和保护电气和电子部件的膜
公开(公告)号：US08729148B2
公开(公告)日：2014-05-20
申请号：US12967163
申请日：2010-12-14
申请人： Satoshi Asai , Takanobu Takeda , Hideto Kato
发明人： Satoshi Asai , Takanobu Takeda , Hideto Kato
IPC分类号： C08J3/28 , C08F2/50 , G03F7/00 , G03F7/004 , G03C1/73 , C09D183/14 , H01L23/29
CPC分类号： C08L83/10 , C08G77/52 , C08J7/04 , C08J2323/06 , C08J2479/02 , C09D183/14 , H01L23/293 , H01L2924/0002 , Y10T428/24355 , Y10T428/31663 , H01L2924/00
摘要： Disclosed herein is a photocurable dry film including a structure having a photocurable resin layer sandwiched between a support film and a protective film, the photocurable resin layer being formed of a photocurable resin composition including ingredients (A) to (D):(A) a silicone skeleton-containing polymer compound having the repeating units represented by the following general formula (1) wherein X and Y, respectively, a divalent organic group represented by the following general formula (2) or (3) (B) a crosslinking agent selected from formalin-modified or formalin-alcohol-modified amino condensates and phenolic compound having on average two or more methylol groups or alkoxymethylol groups in one molecule; (C) a photoacid generator capable of generating an acid by decomposition with light having a wavelength of 190 to 500 nm; and (D) a solvent.
摘要翻译：本发明公开了一种可光固化的干膜，其具有夹在支撑膜和保护膜之间的光固化树脂层的结构，该光固化性树脂层由含有成分（A）〜（D）的光固化性树脂组合物形成：（A）含有下述通式（1）表示的重复单元的含硅氧烷骨架的高分子化合物，其中X和Y分别为由以下通式（2）或（3）（B）表示的二价有机基团选择的交联剂由福尔马林改性或福尔马林醇修饰的氨基缩合物和在一个分子中平均有两个或多个羟甲基或烷氧基羟甲基的酚类化合物; （C）能够通过用波长为190〜500nm的光分解而产生酸的光酸产生剂; 和（D）溶剂。

4. 发明授权

US08697333B2 Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective film 有权
标题翻译：可光固化树脂组合物，其干膜，图案形成方法和电气/电子部件保护膜
公开(公告)号：US08697333B2
公开(公告)日：2014-04-15
申请号：US13271858
申请日：2011-10-12
申请人： Kyoko Soga , Takanobu Takeda , Hideto Kato
发明人： Kyoko Soga , Takanobu Takeda , Hideto Kato
IPC分类号： G03C1/00 , G03F7/00
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0757 , G03F7/38 , G03F7/40
摘要： A photocurable composition includes: (A) an epoxy group-containing polymer compound having repeating units represented by the following formula (1), where R1 to R4 are each a hydrocarbon group, m is an integer of 1 to 100, a, b, c and d are each 0 or a positive number, such that 0
摘要翻译：光固化性组合物包括：（A）具有下式（1）表示的重复单元的含环氧基的高分子化合物，其中，R1〜R4各自为烃基，m为1〜100的整数，a，b， c和d各自为0或正数，使得0 <（c + d）/（a + b + c + d）＆nlE; 1.0，X和Y各自为式（2）或（3）条件是存在至少一个式（3）的基团，（B）由式（8）表示的光致酸产生剂和（C）溶剂。

5. 发明申请

US20120094222A1 PHOTOCURABLE RESIN COMPOSITION, DRY FILM THEREOF, PATTERN FORMING METHOD, AND ELECTRICAL/ELECTRONIC PART PROTECTIVE FILM 有权
标题翻译：光电树脂组合物，其干膜，图案形成方法和电子/电子部件保护膜
公开(公告)号：US20120094222A1
公开(公告)日：2012-04-19
申请号：US13271858
申请日：2011-10-12
申请人： Kyoko SOGA , Takanobu Takeda , Hideto Kato
发明人： Kyoko SOGA , Takanobu Takeda , Hideto Kato
IPC分类号： G03F7/20 , G03F7/075
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0757 , G03F7/38 , G03F7/40
摘要： A photocurable composition includes: (A) an epoxy group-containing polymer compound having repeating units represented by the following formula (1), where R1 to R4 are each a hydrocarbon group, m is an integer of 1 to 100, a, b, c and d are each 0 or a positive number, such that 0
摘要翻译：光固化性组合物包括：（A）具有下式（1）表示的重复单元的含环氧基的高分子化合物，其中，R1〜R4各自为烃基，m为1〜100的整数，a，b， c和d各自为0或正数，使得0 <（c + d）/（a + b + c + d）＆nlE; 1.0，X和Y各自为式（2）或（3）条件是存在至少一个式（3）的基团，（B）由式（8）表示的光致酸产生剂和（C）溶剂。

6. 发明申请

US20100233619A1 NOVEL POLYIMIDE SILICONE, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE NOVEL POLYIMIDE SILICONE, AND METHOD FOR PATTERN FORMATION 有权
标题翻译：新型聚酰亚胺硅氧烷，含有新型聚酰亚胺硅氧烷的感光性树脂组合物，以及形成图案的方法
公开(公告)号：US20100233619A1
公开(公告)日：2010-09-16
申请号：US12722068
申请日：2010-03-11
申请人： Shohei TAGAMI , Takanobu Takeda , Michihiro Sugo , Hideto Kato
发明人： Shohei TAGAMI , Takanobu Takeda , Michihiro Sugo , Hideto Kato
IPC分类号： G03F7/004 , C08G77/04 , G03F7/20
CPC分类号： C08G77/455 , C08G73/106 , C08K5/34922 , C08L63/00 , C08L79/08 , C08L83/10 , G03F7/0382 , G03F7/0387
摘要： A polyimide silicone having in the molecule a phenolic hydroxy group in which a part or all of hydrogen atoms are substituted with an acid labile group is provided. The polyimide silicone comprises the unit represented by the formula (1): wherein X is a tetravalent group at least a part of which is a tetravalent organic group represented by the formula (2): wherein R1 is a monovalent hydrocarbon group, R2 is a trivalent group, and n is an integer of 1 to 120 on average; and Y is a divalent organic group at least a part of which is a divalent organic group having a phenolic hydroxy group in which a part or all of hydrogen atoms are substituted with an acid labile group represented by the formula (3): wherein R3 and R4 are a hydrogen atom or an alkyl group, and R5 is an alkyl group, an aryl group, or an aralkyl group. R3 and R4, R3 and R5, or R4 and R5 may be bonded to each other to form a ring together with the carbon atom or the carbon atom and the oxygen atom to which they are bonded with the proviso that the R3, R4, and R5 are independently an alkylene group.
摘要翻译：提供了在分子中具有一部分或全部氢原子被酸不稳定基团取代的酚羟基的聚酰亚胺硅氧烷。聚酰亚胺硅氧烷包括由式（1）表示的单元：其中X是四价基团，其中至少一部分是由式（2）表示的四价有机基团：其中R 1是单价烃基，R 2是三价基，平均为n为1〜120的整数。 Y为二价有机基团，其中至少一部分为具有酚羟基的二价有机基团，其中部分或全部氢原子被式（3）表示的酸不稳定基团取代：其中R3和 R4是氢原子或烷基，R5是烷基，芳基或芳烷基。 R 3和R 4，R 3和R 5或R 4和R 5可以彼此键合以与碳原子或碳原子和它们所键合的氧原子一起形成环，条件是R3，R4和 R5独立地是亚烷基。

7. 发明授权

US08263308B2 Polyimide silicone, photosensitive resin composition containing the novel polyimide silicone, and method for pattern formation 有权
标题翻译：聚酰亚胺硅酮，含有新型聚酰亚胺硅酮的感光性树脂组合物，以及图案形成方法
公开(公告)号：US08263308B2
公开(公告)日：2012-09-11
申请号：US12722068
申请日：2010-03-11
申请人： Shohei Tagami , Takanobu Takeda , Michihiro Sugo , Hideto Kato
发明人： Shohei Tagami , Takanobu Takeda , Michihiro Sugo , Hideto Kato
IPC分类号： G03F7/004 , G03F7/30 , C08G69/26 , C08G77/00
CPC分类号： C08G77/455 , C08G73/106 , C08K5/34922 , C08L63/00 , C08L79/08 , C08L83/10 , G03F7/0382 , G03F7/0387
摘要： A polyimide silicone having in the molecule a phenolic hydroxy group in which a part or all of hydrogen atoms are substituted with an acid labile group is provided. The polyimide silicone comprises the unit represented by the formula (1): wherein X is a tetravalent group at least a part of which is a tetravalent organic group represented by the formula (2): wherein R1 is a monovalent hydrocarbon group, R2 is a trivalent group, and n is an integer of 1 to 120 on average; and Y is a divalent organic group at least a part of which is a divalent organic group having a phenolic hydroxy group in which a part or all of hydrogen atoms are substituted with an acid labile group represented by the formula (3): wherein R3 and R4 are a hydrogen atom or an alkyl group, and R5 is an alkyl group, an aryl group, or an aralkyl group. R3 and R4, R3 and R5, or R4 and R5 may be bonded to each other to form a ring together with the carbon atom or the carbon atom and the oxygen atom to which they are bonded with the proviso that the R3, R4, and R5 are independently an alkylene group.
摘要翻译：提供了在分子中具有一部分或全部氢原子被酸不稳定基团取代的酚羟基的聚酰亚胺硅氧烷。聚酰亚胺硅氧烷包括由式（1）表示的单元：其中X是四价基团，其中至少一部分是由式（2）表示的四价有机基团：其中R 1是一价烃基，R 2是三价基，平均为n为1〜120的整数。 Y为二价有机基团，其中至少一部分为具有酚羟基的二价有机基团，其中部分或全部氢原子被式（3）表示的酸不稳定基团取代：其中R3和 R4是氢原子或烷基，R5是烷基，芳基或芳烷基。 R 3和R 4，R 3和R 5或R 4和R 5可以彼此键合以与碳原子或碳原子和它们所键合的氧原子一起形成环，条件是R3，R4和 R5独立地是亚烷基。

8. 发明申请

US20110076465A1 EPOXY-CONTAINING POLYMER, PHOTO-CURABLE RESIN COMPOSITION, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTIVE FILM 有权
标题翻译：含环氧聚合物，光固化树脂组合物，图案处理和电子/电子部件保护膜
公开(公告)号：US20110076465A1
公开(公告)日：2011-03-31
申请号：US12889730
申请日：2010-09-24
申请人： Takanobu Takeda , Hideto Kato
发明人： Takanobu Takeda , Hideto Kato
IPC分类号： C08G77/14 , G03F7/004 , G03F7/20 , B32B3/10
CPC分类号： C08L83/06 , C08G77/14 , C08G77/80 , C08L83/14 , C09D183/06 , C09D183/14 , G03F7/0045 , G03F7/0757 , H01L21/02118 , H01L21/312 , Y10T428/24802 , C08L2666/14
摘要： A photo-curable resin composition comprising an epoxy-containing silphenylene or silicone polymer with a Mw of 3,000-500,000 forms a coating which is useful as a protective film for electric/electronic parts.
摘要翻译：包含Mw为3,000〜500,000的含环氧基的硅亚烷基或有机硅聚合物的光固化树脂组合物形成可用作电气/电子部件的保护膜的涂层。

9. 发明授权

US08378148B2 Alcoholic hydroxyl-containing compounds and making method 有权
标题翻译：含醇羟基的化合物及其制备方法
公开(公告)号：US08378148B2
公开(公告)日：2013-02-19
申请号：US12898136
申请日：2010-10-05
申请人： Takato Sakurai , Michihiro Sugo , Takanobu Takeda , Hideto Kato
发明人： Takato Sakurai , Michihiro Sugo , Takanobu Takeda , Hideto Kato
IPC分类号： C07C43/23 , C07C41/26
CPC分类号： C07C43/23 , C07C41/26 , C08K5/06 , C08K5/1515
摘要： Bisphenol derivatives having both alcoholic hydroxyl and allyl groups are novel and useful as reagents for modifying organic resins and silicone resins.
摘要翻译：具有醇羟基和烯丙基两者的双酚衍生物是新型的，可用作改性有机树脂和有机硅树脂的试剂。

10. 发明申请

US20110143092A1 PHOTOCURABLE DRY FILM, METHOD FOR PREPARING SAME, PATTERNING METHOD AND FILM FOR PROTECTING ELECTRIC AND ELECTRONIC PARTS 有权
标题翻译：光电干燥膜，其制备方法，保护电气和电子部件的图案方法和薄膜
公开(公告)号：US20110143092A1
公开(公告)日：2011-06-16
申请号：US12967163
申请日：2010-12-14
申请人： Satoshi ASAI , Takanobu Takeda , Hideto Kato
发明人： Satoshi ASAI , Takanobu Takeda , Hideto Kato
IPC分类号： G03F7/26 , G03F7/004 , G03F7/20 , B32B3/30
CPC分类号： C08L83/10 , C08G77/52 , C08J7/04 , C08J2323/06 , C08J2479/02 , C09D183/14 , H01L23/293 , H01L2924/0002 , Y10T428/24355 , Y10T428/31663 , H01L2924/00
摘要： Disclosed herein is a photocurable dry film including a structure having a photocurable resin layer sandwiched between a support film and a protective film, the photocurable resin layer being formed of a photocurable resin composition including ingredients (A) to (D):(A) a silicone skeleton-containing polymer compound having the repeating units represented by the following general formula (1) wherein X and Y, respectively, a divalent organic group represented by the following general formula (2) or (3) (B) a crosslinking agent selected from formalin-modified or formalin-alcohol-modified amino condensates and phenolic compound having on average two or more methylol groups or alkoxymethylol groups in one molecule; (C) a photoacid generator capable of generating an acid by decomposition with light having a wavelength of 190 to 500 nm; and (D) a solvent.
摘要翻译：本发明公开了一种可光固化的干膜，其具有夹在支撑膜和保护膜之间的光固化树脂层的结构，该光固化性树脂层由含有成分（A）〜（D）的光固化性树脂组合物形成：（A）含有下述通式（1）表示的重复单元的含硅氧烷骨架的高分子化合物，其中X和Y分别为由以下通式（2）或（3）（B）表示的二价有机基团选择的交联剂由福尔马林改性或福尔马林醇修饰的氨基缩合物和在一个分子中平均有两个或多个羟甲基或烷氧基羟甲基的酚类化合物; （C）能够通过用波长为190〜500nm的光分解而产生酸的光酸产生剂; 和（D）溶剂。

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