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    • 7. 发明授权
    • Method for manufacturing magnetic recording medium
    • 磁记录介质的制造方法
    • US07247343B2
    • 2007-07-24
    • US10924991
    • 2004-08-25
    • Takahiro SuwaMitsuru TakaiKazuhiro HattoriShuichi Okawa
    • Takahiro SuwaMitsuru TakaiKazuhiro HattoriShuichi Okawa
    • B05D5/12
    • G11B5/855
    • A method for manufacturing a magnetic recording medium for efficiently and certainly manufacturing a magnetic recording medium. The magnetic recording medium has a recording layer formed to have predetermined concavo-convex pattern and an adequately flat surface. According to this method, a non-magnetic material is deposited on and filled into a member to be processed 10 by adjusting sputtering conditions in such a manner as to satisfy the following Eq I: 0.1≦V/V0−0.003×(L·d/t)+1.2 Eq I where V represents a deposition rate which is the film thickness per unit of time, V0 represent a deposition rate in a case that the bias power is zero, t represents the film thickness of the deposited non-magnetic material, L represents the width of a recording element, and d represents the depth of a recessed portion between the recording elements.
    • 一种用于制造磁记录介质的方法,用于有效且肯定地制造磁记录介质。 磁记录介质具有形成为具有预定凹凸图案和足够平坦表面的记录层。 根据该方法,通过调整溅射条件,使非磁性材料沉积在待加工构件10中,并满足以下等式I:<?in-line-formula description =“In- 线公式“end =”lead“?> 0.1 <= V / V <0> -0.003x(Ld / t)+1.2 Eq I <?in-line-formula description =”In-line Formulas “end =”tail“?>其中V表示作为每单位时间的膜厚度的沉积速率,V 表示在偏置功率为零的情况下的沉积速率,t表示 沉积的非磁性材料的膜厚度L表示记录元件的宽度,d表示记录元件之间的凹部的深度。
    • 9. 发明申请
    • Method for manufacturing magnetic recording medium
    • 磁记录介质的制造方法
    • US20050048198A1
    • 2005-03-03
    • US10924991
    • 2004-08-25
    • Takahiro SuwaMitsuru TakaiKazuhiro HattoriShuichi Okawa
    • Takahiro SuwaMitsuru TakaiKazuhiro HattoriShuichi Okawa
    • G11B5/65G11B5/84G11B5/855B05D5/12
    • G11B5/855
    • A method for manufacturing a magnetic recording medium for efficiently and certainly manufacturing a magnetic recording medium. The magnetic recording medium has a recording layer formed to have predetermined concavo-convex pattern and an adequately flat surface. According to this method, a non-magnetic material is deposited on and filled into a member to be processed 10 by adjusting sputtering conditions in such a manner as to satisfy the following equation (I): 0.1≦V/V0≦−0.003×(L·d/t)+1.2  (I) where V represents a deposition rate which is the film thickness per unit of time, V0 represent a deposition rate in a case that the bias power is zero, t represents the film thickness of the deposited non-magnetic material, L represents the width of a recording element, and d represents the depth of a recessed portion between the recording elements.
    • 一种用于制造磁记录介质的方法,用于有效且肯定地制造磁记录介质。 磁记录介质具有形成为具有预定凹凸图案和足够平坦表面的记录层。 根据该方法,通过以满足下述式(I)的方式调整溅射条件,将非磁性材料沉积并填充到待加工构件10中:0.1 <= V / V0 <= 0.003 x(Ld / t)+1.2(I)其中V表示作为每单位时间的膜厚度的沉积速率,V0表示在偏置功率为零的情况下的沉积速率,t表示沉积的膜厚度 非磁性材料,L表示记录元件的宽度,d表示记录元件之间的凹部的深度。