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1. 发明授权

US5663205A Pharmaceutical composition for use in glaucoma treatment 失效
标题翻译：用于青光眼治疗的药物组合物
公开(公告)号：US5663205A
公开(公告)日：1997-09-02
申请号：US338592
申请日：1994-11-15
申请人： Takahiro Ogawa , Takaaki Deguchi , Yoshifumi Ikejiri , Katsuhiro Inada
发明人： Takahiro Ogawa , Takaaki Deguchi , Yoshifumi Ikejiri , Katsuhiro Inada
IPC分类号： A61K9/06 , A61K9/08 , A61K31/18 , A61P27/06
CPC分类号： A61K31/18 , Y10S514/913
摘要： A pharmaceutical composition for use in glaucoma treatment which contains as an active ingredient 5-[1-hydroxy-2-[2-(2-methoxyphenoxyl)ethylamino]ethyl]-2-methylbenzenesulfonamide of the formula: ##STR1## or its acid salt. This agent is free from side effects and stable and has an excellent intraocular pressure reducing activity at its low concentrations, thus being useful as a pharmaceutical composition for use in glaucoma treatment.
摘要翻译： PCT No.PCT / JP93 / 00654 Sec。 371日期：1994年11月15日 102（e）1994年11月15日日期PCT提交1993年5月19日PCT公布。公开号WO93 / 24121 日本1993年12月9日一种用于青光眼治疗的药物组合物，其含有作为活性成分的5- [1-羟基-2- [2-（2-甲氧基苯氧基）乙基氨基]乙基] -2-甲基苯磺酰胺，由下式效果稳定，并且在其低浓度下具有优异的眼内压降低活性，因此可用作用于青光眼治疗的药物组合物。

2. 发明授权

US5419898A Antiallergic composition for ophthalmic or nasal use 失效
标题翻译：用于眼科或鼻用的抗过敏组合物
公开(公告)号：US5419898A
公开(公告)日：1995-05-30
申请号：US169706
申请日：1993-12-20
申请人： Yoshifumi Ikejiri , Takahiro Ogawa , Fuminori Tokumochi , Shogo Sameshima , Motoko Kimura
发明人： Yoshifumi Ikejiri , Takahiro Ogawa , Fuminori Tokumochi , Shogo Sameshima , Motoko Kimura
IPC分类号： A61K9/08 , A61K9/00 , A61K31/495 , A61K47/40 , A61P11/02 , A61P27/02 , A61P27/14 , A61P37/08 , C07D295/08
CPC分类号： A61K31/495 , A61K9/0043 , A61K9/0048 , Y10S514/912 , Y10S514/914
摘要： There is disclosed an antiallergic composition for ophthalmic or nasal use, comprising cetirizine or a salt thereof as an active ingredient. The antiallergic composition may further contain a cyclodextrin compound, as well as a surfactant and/or a water soluble polymer.
摘要翻译：公开了一种用于眼用或鼻用的抗过敏组合物，其包含西替立嗪或其盐作为活性成分。抗过敏组合物还可以含有环糊精化合物，以及表面活性剂和/或水溶性聚合物。

3. 发明授权

US5652272A Ophthalmic preparations for reducing intraocular pressure 失效
标题翻译：用于降低眼内压的眼用制剂
公开(公告)号：US5652272A
公开(公告)日：1997-07-29
申请号：US404315
申请日：1995-03-15
申请人： Takahiro Ogawa , Takaaki Deguchi
发明人： Takahiro Ogawa , Takaaki Deguchi
IPC分类号： A61K31/22 , A61K31/225 , A67K31/14
CPC分类号： A61K31/225 , A61K31/22 , Y10S514/913
摘要： The present invention provides an ophthalmic preparation for reducing intraocular pressure comprising 2-[3-dimethyl-amino-2-(2-carboxyethoxy)propionyloxy]-2'-methoxybibenzyl or a salt thereof, which preparation exhibits intraocular pressure reducing activity, without exerting effects on the central nervous system, and can advantageously be used as a prophylactic and therapeutic agent for ocular hypertension and glaucoma bringing about elevated intraocular pressure.
摘要翻译：本发明提供了一种用于降低眼内压的眼用制剂，其包含2- [3-二甲基 - 氨基-2-（2-羧基乙氧基）丙酰氧基] -2'-甲氧基联苄基或其盐，该制剂具有降低眼压的作用，而不发挥作用对中枢神经系统的作用，并且可以有利地用作眼压高和眼压升高的青光眼的预防和治疗剂。

4. 发明授权

US5639773A Ocular hypotensive agent 失效
标题翻译：眼降血压药
公开(公告)号：US5639773A
公开(公告)日：1997-06-17
申请号：US269675
申请日：1994-07-01
申请人： Keiji Kubo , Takahiro Ogawa , Takaaki Deguchi
发明人： Keiji Kubo , Takahiro Ogawa , Takaaki Deguchi
IPC分类号： A61K31/41 , A61K31/415 , A61K31/695
CPC分类号： A61K31/415
摘要： This invention relates to an ocular hypotensive agent which comprises a compound represented by the formula: ##STR1## wherein R.sup.1 represents hydrogen or an optionally substituted hydrocarbon residue that may be bound via a hetero atom; R.sup.2 represents hydrogen or a hydrocarbon residue that may have a substituent; R.sup.3 represents a group capable of forming an anion or a group capable of changing thereto; X is a covalent bond between the 2 benzene rings or a spacer having a chain length of 1 to 2 atoms as the linear moiety between the adjoining phenylene group and phenyl group; n represents 1 or 2; ring A is a benzene ring having 1 or 2 optional substituents in addition to the group represented by COOR.sup.2, or a pharmaceutically acceptable salt thereof.
摘要翻译：本发明涉及一种眼降血压药，其包含由下式表示的化合物：其中R 1表示氢或可经由杂原子结合的任选取代的烃残基; R 2表示氢或可以具有取代基的烃残基; R3表示能够形成阴离子或能够改变的基团的基团; X是相邻的亚苯基和苯基之间的线性部分的2个苯环或链长为1〜2个原子的间隔基之间的共价键; n表示1或2; 除了由COOR2表示的基团之外，环A是具有1或2个任选取代基的苯环或其药学上可接受的盐。

5. 发明授权

US5538974A Ophthalmic composition for lowering intraocular pressure 失效
标题翻译：用于降低眼内压的眼用组合物
公开(公告)号：US5538974A
公开(公告)日：1996-07-23
申请号：US378244
申请日：1995-01-24
申请人： Takahiro Ogawa , Takaaki Deguchi
发明人： Takahiro Ogawa , Takaaki Deguchi
IPC分类号： A61K31/55 , A61K31/495 , A61K31/39
CPC分类号： A61K31/55
摘要： An ophthalmic composition comprising a compound of the formula ##STR1## wherein R.sup.1 and R.sup.2 are each a hydrogen, a halogen, a hydroxyl, a lower alkyl or a lower alkoxy, R.sup.3 and R.sup.4 are each a hydrogen, an optionally substituted lower alkyl, an optionally substituted cycloalkyl or an optionally substituted aralkyl, or form, together with the adjacent nitrogen atom, an optionally substituted ring, X is a hydrogen, an optionally substituted lower alkyl, an optionally substituted aryl or an optionally esterified or amidized carboxyl, Y is >C.dbd.O or >CH--OR.sup.5 wherein R.sup.5 is a hydrogen, an acyl or an optionally substituted carbamoyl, m is an integer of from 0 to 2, and n is an integer of from 1 to 6, or a salt thereof, and a method for the treatment of glaucoma, comprising administering said compound or a salt thereof.
摘要翻译：一种眼用组合物，其包含式IMA的化合物，其中R 1和R 2各自为氢，卤素，羟基，低级烷基或低级烷氧基，R 3和R 4各自为氢，任选取代的低级烷基，任选取代的环烷基或任选取代的芳烷基，或与相邻氮原子一起形成任选取代的环，X为氢，任选取代的低级烷基，任选取代的芳基或任选酯化或酰胺化的羧基，Y为> C = O或> CH-OR 5，其中R5是氢，酰基或任选取代的氨基甲酰基，m是0-2的整数，n是1至6的整数，或其盐，和治疗青光眼的方法，包括给予所述化合物或其盐。

6. 发明授权

US08795032B2 Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method 有权
标题翻译：基板处理装置，基板处理方法，基板保持机构和基板保持方法
公开(公告)号：US08795032B2
公开(公告)日：2014-08-05
申请号：US12457175
申请日：2009-06-03
申请人： Mitsuru Miyazaki , Seiji Katsuoka , Naoki Matsuda , Junji Kunisawa , Kenichi Kobayashi , Hiroshi Sotozaki , Hiroyuki Shinozaki , Osamu Nabeya , Shinya Morisawa , Takahiro Ogawa , Natsuki Makino
发明人： Mitsuru Miyazaki , Seiji Katsuoka , Naoki Matsuda , Junji Kunisawa , Kenichi Kobayashi , Hiroshi Sotozaki , Hiroyuki Shinozaki , Osamu Nabeya , Shinya Morisawa , Takahiro Ogawa , Natsuki Makino
IPC分类号： B24B51/00
CPC分类号： B24B37/345 , H01L21/30625 , H01L21/67219 , H01L21/67739 , H01L21/67742 , H01L21/67754 , Y10T137/0318 , Y10T137/8593
摘要： An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.
摘要翻译：公开了一种用于处理衬底的设备。该装置包括：抛光部，其被配置为对基板进行抛光;移动机构，被配置为传送基板;以及清洁部，其构造成清洁和干燥被研磨的基板。清洗部具有多个用于清洗多个基板的清洗线。多个清洁线具有多个清洁模块和用于传送基板的多个传送机器人。

7. 发明授权

US08777198B2 Substrate holding apparatus, substrate holding method, and substrate processing apparatus 有权
标题翻译：基板保持装置，基板保持方法和基板处理装置
公开(公告)号：US08777198B2
公开(公告)日：2014-07-15
申请号：US13398216
申请日：2012-02-16
申请人： Masahiko Sekimoto , Seiji Katsuoka , Naoki Dai , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Suzuki , Kenichi Kobayashi , Yasuyuki Motoshima , Ryo Kato
发明人： Masahiko Sekimoto , Seiji Katsuoka , Naoki Dai , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Suzuki , Kenichi Kobayashi , Yasuyuki Motoshima , Ryo Kato
IPC分类号： B23Q1/00
CPC分类号： H01L21/67086 , H01L21/67051 , H01L21/687
摘要： A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section.
摘要翻译：基板保持装置可以满足对较小尺寸的小型装置的要求，同时确保基板在处理液体中的足够的浸入深度。基板保持装置包括：基板保持件，用于通过使基板（W）的表面的周边部分与第一密封构件接触来支撑基板（W）; 以及基板按压部，其相对于基板保持件下降，以将由基板保持件保持的基板（W）向下压，从而使第一密封部件与基板（W）压力接触。基板按压部设置有与基板保持件的环状保持部的上表面压力接触的第二环状密封部件，从而密封基板按压部的周边区域。

8. 发明授权

US08487284B2 Prohealing endovascular devices 有权
标题翻译：预处理血管内装置
公开(公告)号：US08487284B2
公开(公告)日：2013-07-16
申请号：US13356563
申请日：2012-01-23
申请人： Satoshi Tateshima , Takahiro Ogawa , Fernando Vinuela
发明人： Satoshi Tateshima , Takahiro Ogawa , Fernando Vinuela
IPC分类号： A61F2/82 , A61F2/90
CPC分类号： B29C59/165 , A61L27/04 , A61L27/50 , A61L29/02 , A61L29/14 , A61L31/022 , A61L31/14 , A61L2400/18 , B29C2035/0827 , B29L2031/753 , B29L2031/7534 , B29L2031/7542
摘要： The present invention provides endovascular devices and the methods of making and using the same. The endovascular device is a prohealing endovascular device that comprises a super hydrophilic surface. The super hydrophilic surface is generated by a method comprising a step of irradiating a surface of the endovascular device with a high energy radiation for a period of time to cause the surface to become super hydrophilic.
摘要翻译：本发明提供血管内装置及其制造和使用方法。血管内装置是包括超亲水表面的预热血管内装置。超级亲水性表面通过包括以高能量辐射照射血管内装置的表面一段时间以使表面变得超亲水的步骤的方法产生。

9. 发明授权

US07796873B2 Anti-shake apparatus 有权
标题翻译：防抖装置
公开(公告)号：US07796873B2
公开(公告)日：2010-09-14
申请号：US12044102
申请日：2008-03-07
申请人： Yukio Uenaka , Takahiro Ogawa
发明人： Yukio Uenaka , Takahiro Ogawa
IPC分类号： G03B17/00
CPC分类号： H04N5/23248 , H04N5/23287
摘要： An anti-shake apparatus (an image-stabilization apparatus) of a photographing device comprises a movable unit and a controller. The movable unit has an imaging device and is movable and rotatable for an anti-shake operation. The controller controls the movable unit for the anti-shake operation. The controller calculates a hand-shake angle caused by roll. The controller controls whether the anti-shake operation is performed for correcting hand-shake caused by roll, on the basis of the hand-shake angle caused by roll.
摘要翻译：拍摄装置的防抖装置（图像稳定装置）包括可移动单元和控制器。可移动单元具有成像装置，并且可移动并且可旋转以进行防抖操作。控制器控制可动单元进行防抖操作。控制器计算由滚动导致的手抖动角度。控制器根据由滚动导致的手抖动角度来控制是否执行用于校正由滚动导致的手抖动的防抖操作。

10. 发明申请

US20090067959A1 Substrate processing apparatus, substrate transfer apparatus, substrate clamp apparatus, and chemical liquid treatment apparatus 审中-公开
标题翻译：基板处理装置，基板输送装置，基板夹紧装置和药液处理装置
公开(公告)号：US20090067959A1
公开(公告)日：2009-03-12
申请号：US11665963
申请日：2007-02-21
申请人： Nobuyuki Takahashi , Hiroaki Nishida , Hiroomi Torii , Soichi Isobe , Tadakazu Sone , Ryuichi Kosuge , Hiroyuki Kaneko , Hiroshi Sotozaki , Takao Mitsukura , Takahiro Ogawa , Kenichi Sugita
发明人： Nobuyuki Takahashi , Hiroaki Nishida , Hiroomi Torii , Soichi Isobe , Tadakazu Sone , Ryuichi Kosuge , Hiroyuki Kaneko , Hiroshi Sotozaki , Takao Mitsukura , Takahiro Ogawa , Kenichi Sugita
IPC分类号： H01L21/67
CPC分类号： H01L21/67219 , B24B37/345 , H01L21/6719 , H01L21/67742 , H01L21/67745 , H01L21/67748 , H01L21/67751 , H01L21/67766 , H01L21/68707
摘要： The present invention relates to a substrate processing apparatus which can improve a tact time of substrate processing. A polishing apparatus as the substrate processing apparatus includes plural polishing sections (3a, 3b) each for polishing a semiconductor wafer (W), and a swing transporter (7) for transferring the wafer (W). The swing transporter (7) includes a wafer clamp mechanism (112) adapted to clamp the wafer (W), a vertically moving mechanism (104, 106) for vertically moving the wafer clamp mechanism (112) along a frame (102) of a casing of the polishing section (3a), and a swing mechanism (108, 110) for swinging the wafer clamp mechanism (112) about a shaft adjacent to the frame (102).
摘要翻译：本发明涉及能够提高基板处理的节拍时间的基板处理装置。作为基板处理装置的研磨装置包括：用于研磨半导体晶片（W）的多个研磨部（3a，3b）和用于转印晶片（W）的摆动传送装置（7）。摆动传送器（7）包括适于夹紧晶片（W）的晶片夹紧机构（112），用于沿着晶片夹持机构（102）的框架（102）垂直移动的垂直移动机构（104,106）抛光部分（3a）的外壳和用于使晶片夹紧机构（112）围绕与框架（102）相邻的轴摆动的摆动机构（108,110）。

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