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    • 1. 发明授权
    • Multi-wavelength laser diode
    • 多波长激光二极管
    • US07317745B2
    • 2008-01-08
    • US10998921
    • 2004-11-30
    • Tae Sung JangHee Seok ChoiSang Deog ChoDong Min Jeon
    • Tae Sung JangHee Seok ChoiSang Deog ChoDong Min Jeon
    • H01S5/00H01S3/08
    • H01S5/10H01S3/08086H01S5/028H01S5/20
    • The present invention relates to a multi-wavelength laser diode, in which an oscillating structure includes a semiconductor substrate, and a lower cladding layer, an active layer and a ridge formed in their order on the semiconductor substrate. A first metal layer is formed on a first face of the oscillating structure including one end of the ridge, and made of a metal having a high reflectivity in a first wavelength range of at least a predetermined wavelength. A second metal layer is formed on the first metal layer, the second metal layer being made of a metal having a high reflectivity in a second wavelength range under the predetermined wavelength. The multi-wavelength laser diode can improve-the reflective layer structure to achieve a high reflectivity in the entire visible light range.
    • 本发明涉及一种多波长激光二极管,其中振荡结构包括半导体衬底,以及在半导体衬底上依次形成的下包层,有源层和脊。 第一金属层形成在包括脊的一端的振荡结构的第一面上,并且由在至少预定波长的第一波长范围内具有高反射率的金属制成。 第二金属层形成在第一金属层上,第二金属层由在预定波长的第二波长范围内具有高反射率的金属制成。 多波长激光二极管可以改善反射层结构,以在整个可见光范围内实现高反射率。
    • 4. 发明授权
    • Nitride semiconductor light emitting diode
    • 氮化物半导体发光二极管
    • US08203170B2
    • 2012-06-19
    • US11905434
    • 2007-10-01
    • Hyun Wook ShimJoong Seo KangDong Min Jeon
    • Hyun Wook ShimJoong Seo KangDong Min Jeon
    • H01L33/00
    • H01L33/42H01L33/14H01L33/32
    • Provided is a nitride semiconductor light emitting diode (LED) including a substrate; an n-type nitride semiconductor layer formed on the substrate; an active layer formed on a portion of the n-type nitride semiconductor layer; a p-type nitride semiconductor layer formed on the active layer; a p-type contact layer formed on the p-type nitride semiconductor layer and doped with more than 1×1020/cm3 of p-type impurities; a transparent oxide electrode formed on the p-type contact layer; a p-electrode formed on the transparent oxide electrode; and an n-electrode formed on the n-type nitride semiconductor layer where the active layer is not formed.
    • 提供了包括基板的氮化物半导体发光二极管(LED) 在该基板上形成的n型氮化物半导体层; 形成在所述n型氮化物半导体层的一部分上的有源层; 形成在有源层上的p型氮化物半导体层; p型接触层,形成在p型氮化物半导体层上,掺杂有大于1×1020 / cm3的p型杂质; 形成在p型接触层上的透明氧化物电极; 形成在透明氧化物电极上的p电极; 以及在没有形成有源层的n型氮化物半导体层上形成的n电极。