会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明申请
    • Thermal Printer with Energy Save Features
    • 具有节能功能的热敏打印机
    • US20120320138A1
    • 2012-12-20
    • US13160499
    • 2011-06-14
    • Tadashi Yamamoto
    • Tadashi Yamamoto
    • B41J2/315
    • B41J2/33535B41J2/3351B41J2/33525B41J2/3354B41J2/3357B41J2/3358B41J2/33585
    • A thermal printer having a thermal printhead with energy save features which is capable of high speed and high quality printing is provided. The thermal printer has an energy storage device and a thermal printhead including a substrate, a resistor layer formed on one surface of the substrate, and a thermoelectric element disposed on the other surface of the substrate opposite to where the resistor layer is formed, wherein the thermoelectric element converts heat generated by the resistor layer to electrical energy when a temperature difference between the resistor layer and an opposite side of the thermoelectric element where the resistor layer is disposed nearby becomes large enough for the thermoelectric element to convert heat into electric energy, and the electrical energy is stored in the energy storage device.
    • 提供一种具有能够高速和高质量打印的节能特征的热打印头的热敏打印机。 热敏打印机具有能量存储装置和热打印头,该打印头包括基板,形成在基板的一个表面上的电阻层,以及布置在与形成电阻层相反的基板的另一个表面上的热电元件,其中, 当电阻层和邻近设置电阻层的热电元件的相对侧之间的温度差变得足够大以使热电元件将热量转换为电能时,热电元件将由电阻层产生的热量转换为电能,以及 电能存储在能量存储装置中。
    • 10. 发明申请
    • MAGNETIC DEVICE MANUFACTURING METHOD
    • 磁性装置制造方法
    • US20100308012A1
    • 2010-12-09
    • US12865034
    • 2009-01-23
    • Tadashi Yamamoto
    • Tadashi Yamamoto
    • G11B5/84
    • G11B5/855B82Y10/00G11B5/743G11B5/746G11B5/82H01F10/12H01F41/34H01L27/22H01L27/222H01L43/12
    • A method for manufacturing a magnetic device that obtains sufficient processing accuracy without increasing mask removal steps. A first mask layer is formed above a magnetic layer using one selected from the group consisting of Ti, Ta, W, and an oxide or a nitride thereof. A second mask layer is formed on the first mask layer using Ru or Cr. A resist pattern is formed on the second mask layer. A second mask pattern is formed by performing reactive ion etching with reactive gas containing oxygen on the second mask layer using the resist pattern. A first mask pattern is formed by performing reactive ion etching with reactive gas containing halogen gas on the first mask layer using the second mask pattern. A magnetic pattern is formed by performing reactive ion etching with reactive gas containing oxygen on the magnetic layer using the first mask pattern.
    • 一种在不增加掩模去除步骤的情况下获得足够的加工精度的磁性装置的制造方法。 使用选自Ti,Ta,W及其氧化物或氮化物的一种,在磁性层的上方形成第一掩模层。 使用Ru或Cr在第一掩模层上形成第二掩模层。 在第二掩模层上形成抗蚀剂图案。 通过使用抗蚀剂图案在第二掩模层上对含有氧的反应性气体进行反应离子蚀刻来形成第二掩模图案。 通过使用第二掩模图案在第一掩模层上对含有卤素气体的反应性气体进行反应离子蚀刻来形成第一掩模图案。 通过使用第一掩模图案在磁性层上对含有氧的反应性气体进行反应离子蚀刻来形成磁性图案。