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1. 发明授权

US4551424A Silver halide photographic light-sensitive material 失效
标题翻译：卤化银照相感光材料
公开(公告)号：US4551424A
公开(公告)日：1985-11-05
申请号：US681757
申请日：1984-12-14
申请人： Tadashi Ikeda , Kenichi Kuwabara , Kiyohiko Yamamuro , Tadayoshi Kokubo
发明人： Tadashi Ikeda , Kenichi Kuwabara , Kiyohiko Yamamuro , Tadayoshi Kokubo
IPC分类号： G03C1/06 , G03C1/18 , G03C1/28 , G03C1/29 , G03C1/38 , G03C1/02
CPC分类号： G03C1/29 , G03C1/18 , G03C1/38
摘要： A silver halide photographic light-sensitive material is described, comprising a support and at least one silver halide emulsion layer on the support, wherein the silver halide emulsion layer contains at least one specific type of sensitizing dye, at least one of the silver halide emulsion layer and other hydrophilic colloid layers contains at least one compound of four specific types of compounds and the silver halide grains contained in the silver halide emulsion are substantially tetradecahedral grains in which the proportion of (100) faces is at least 50%; this material is superior in both sensitivity and stain resistance.
摘要翻译：描述了一种卤化银照相感光材料，其包含载体和载体上的至少一种卤化银乳剂层，其中卤化银乳剂层含有至少一种特定类型的增感染料，至少一种卤化银乳剂层和其它亲水胶体层包含至少一种四种特定类型化合物的化合物，并且卤化银乳剂中所含的卤化银颗粒基本上为十四面体颗粒，其中（100）面的比例为至少50％; 这种材料在灵敏度和耐污染性方面都是优越的。

2. 发明授权

US4592991A Silver halide photographic printing paper 失效
标题翻译：卤化银照相印刷纸
公开(公告)号：US4592991A
公开(公告)日：1986-06-03
申请号：US684402
申请日：1984-12-20
申请人： Tetsuo Yoshida , Tadayoshi Kokubo , Keiichi Adachi , Tadashi Ikeda , Hidetoshi Kobayashi
发明人： Tetsuo Yoshida , Tadayoshi Kokubo , Keiichi Adachi , Tadashi Ikeda , Hidetoshi Kobayashi
IPC分类号： G03C1/42 , G03C1/06 , G03C1/815 , G03C5/16 , G03C1/02 , G03C7/26
CPC分类号： G03C1/815 , Y10S430/134
摘要： A silver halide photographic printing paper is described, comprising a support and a photographic layer containing a silver halide developing agent, wherein a dispersion of an oil-soluble brightening agent in a high boiling point organic solvent having a specific inductive capacity of 7.5 or less is contained in the photographic layer. This printing paper yields a background of high whiteness even when processed under rapid processing conditions.
摘要翻译：描述了一种卤化银照相印刷纸，其包括载体和含有卤化银显影剂的照相层，其中油溶性增亮剂在具有7.5或更小的介电常数的高沸点有机溶剂中的分散体是包含在照相层中。即使在快速加工条件下加工，该印刷纸也产生高白度的背景。

3. 发明授权

US4657846A Silver halide photographic printing paper 失效
标题翻译：卤化银照相印刷纸
公开(公告)号：US4657846A
公开(公告)日：1987-04-14
申请号：US684318
申请日：1984-12-20
申请人： Tadayoshi Kokubo , Tadashi Ikeda , Keiichi Adachi , Masaki Okazaki , Tetsuo Yoshida
发明人： Tadayoshi Kokubo , Tadashi Ikeda , Keiichi Adachi , Masaki Okazaki , Tetsuo Yoshida
IPC分类号： G03C1/06 , G03C1/12 , G03C1/18 , G03C1/775 , G03C1/815 , G03C1/19
CPC分类号： G03C1/8155 , G03C1/18 , Y10S430/134
摘要： A silver halide photographic light-sensitive materials are described. In silver halide photographic printing paper comprising at least one silver halide photographic emulsion layer applied to a water impermeable reflective base, the printing paper of the present invention is in the improvement wherein said silver halide emulsion layer is spectrally sensitized with at least one cyanine dye represented by general formulae I and II, and an emulsified dispersion or latex dispersion of a water insoluble fluorescent whitening agent contained in a hydrophilic vehicle of at least one layer applied to the base on the same side as said silver halide emulsion layer: ##STR1## wherein Y.sub.1 and Y.sub.2 each represents an O atom, --N--R.sub.7 or a S atom, wherein R.sub.7 represents a lower alkyl group, A represents H or a lower alkyl group having 4 or less carbon atoms, R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each represents --H, --CH.sub.3, --OCH.sub.3, --C.sub.2 H.sub.5, --OC.sub.2 H.sub.5, --CN, --Cl, --F, --CF.sub.3, --COOH, --COOCH.sub.3 or --COOC.sub.2 H.sub.5, R.sub.5 and R.sub.6 each represents substituted or non-substituted lower alkyl group, but at least one of R.sub.5 and R.sub.6 is substituted by a sulfo group, and X represents an anionic residue.
摘要翻译：描述了卤化银照相感光材料。在包含施加到不透水的反射基底上的至少一个卤化银照相乳剂层的卤化银照相印刷纸中，本发明的印刷纸的改进在于其中所述卤化银乳剂层用至少一种花青染料代表光谱增感通过通式I和II，以及在与所述卤化银乳剂层相同的一侧施加到基底上的至少一层的亲水载体中包含的水不溶性荧光增白剂的乳化分散体或胶乳分散体：其中Y1和Y2各自表示O原子，-N-R7或S原子，其中R7表示低级烷基，A表示H或碳原子数4以下的低级烷基，R1，R2， R 3和R 4各自表示-H，-CH 3，-OCH 3，-C 2 H 5，-OC 2 H 5，-CN，-Cl，-F，-CF 3，-COOH，-COOCH 3或-COOC 2 H 5，取代的低级烷基，但是至少一个 R5和R6被磺基取代，X表示阴离子残基。

4. 发明授权

US5576139A Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst 失效
标题翻译：正型光致抗蚀剂组合物，其包含用二氧化硅 - 氧化镁固体催化剂制备的酚醛清漆树脂
公开(公告)号：US5576139A
公开(公告)日：1996-11-19
申请号：US783346
申请日：1991-10-28
申请人： Kazuya Uenishi , Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
发明人： Kazuya Uenishi , Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
IPC分类号： C08G8/08 , C08L61/04 , C08L61/06 , G03F7/022 , G03F7/023 , H01L21/027
CPC分类号： C08G8/08 , G03F7/022 , G03F7/0236
摘要： A novel positive type photoresist composition is provided, comprising an alkali-soluble novolak resin obtained by the condensation of substituted or unsubstituted phenols and aldehydes in the presence of a silica-magnesia solid catalyst and a light-sensitive material containing 1,2-naphthoquinone-diazido-5-(and/or -4-) sulfonate as main component.
摘要翻译：提供了一种新型的正型光致抗蚀剂组合物，其包含通过在二氧化硅 - 氧化镁固体催化剂和含有1,2-萘醌的固体催化剂存在下缩合取代或未取代的酚和醛而获得的碱溶性酚醛清漆树脂，重氮基-5-（和/或-4-）磺酸盐为主要成分。

5. 发明授权

US5340688A Positive type photoresist composition 失效
标题翻译：正型光致抗蚀剂组合物
公开(公告)号：US5340688A
公开(公告)日：1994-08-23
申请号：US15578
申请日：1993-02-10
申请人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo
发明人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo
IPC分类号： G03F7/022 , H01L21/027 , G03F7/021 , G03F7/30
CPC分类号： G03F7/022
摘要： Disclosed is a novel positive type photoresist composition comprising a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic ester of a member selected from the group consisting of the polyhydroxy compounds represented by the following formula (I), (II) or (III) and an alkali-soluble resin: ##STR1## wherein the variables of Formula I are defined in the specification; ##STR2## wherein the variables of Formula II are defined in the specification; ##STR3## wherein the variables of Formula III are defined in the specification.
摘要翻译：公开了一种新型的正型光致抗蚀剂组合物，其包含选自由下式（I）表示的多羟基化合物，（I），（I）表示的多羟基化合物的组分的1,2-萘醌二叠氮基-5-（和/或-4-）磺酸酯， II）或（III）和碱溶性树脂：其中式I的变量在说明书中定义; （II）其中式II的变量在说明书中定义; （III）其中式III的变量在本说明书中定义。

6. 发明授权

US5340686A Positive-type photoresist composition 失效
标题翻译：正型光致抗蚀剂组合物
公开(公告)号：US5340686A
公开(公告)日：1994-08-23
申请号：US173924
申请日：1993-12-28
申请人： Shinji Sakaguchi , Shiro Tan , Tadayoshi Kokubo
发明人： Shinji Sakaguchi , Shiro Tan , Tadayoshi Kokubo
IPC分类号： G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30 , G03F7/30
CPC分类号： G03F7/0226 , G03F7/0236
摘要： A positive-type photoresist composition is described as including:(1) an alkali-soluble phenol novolak having a degree of dispersion of from 1.5 to 4.0;(2) a 1,2-quinone diazide compound; and(3) from 2 to 30% by weight, based on the above-mentioned novolak, of a low molecular weight compound having a total of from 12 to 50 carbon atoms per molecule and 2 to 8 phenolic hydroxyl groups per molecule. The degree of dispersion is determined from a weight-average molecular weight of the novolak and a number-average molecular weight of the novolak, both the weight-average and number-average molecular weights being obtained by gel penetration chromatography (GPC) defined by using standard polystyrene as a reference, such that the degree of dispersion is a ratio of the weight-average molecular weight to the number average molecular weight.The positive-type photoresist composition of the present invention is excellent in development latitude and has a high sensitivity and a high resolving power. Thus, it is suitable for use in, for example, the production of semiconductors such as integrated circuits, the production of circuit substrates for thermal heads, and photofabrication processes.
摘要翻译：正型光致抗蚀剂组合物包括：（1）分散度为1.5〜4.0的碱溶性酚醛清漆; （2）1,2-醌二叠氮化合物; 和（3）基于上述酚醛清漆的2至30重量％的每分子具有总共12至50个碳原子的低分子量化合物和每分子2至8个酚羟基。分散度由酚醛清漆的重均分子量和酚醛清漆的数均分子量确定，通过使用通过凝胶渗透色谱法（GPC）得到的重均分子量和数均分子量均为标准聚苯乙烯作为参考，使得分散度是重均分子量与数均分子量的比率。本发明的正型光致抗蚀剂组合物的显影宽度优良，灵敏度高，分辨率高。因此，适用于例如集成电路等半导体的制造，热敏头的电路基板的制造以及光制造工序。

7. 发明授权

US4639416A Internal latent image-type silver halide emulsion 失效
标题翻译：内部潜像型卤化银乳剂
公开(公告)号：US4639416A
公开(公告)日：1987-01-27
申请号：US609176
申请日：1984-05-11
申请人： Tetsuo Yoshida , Tadayoshi Kokubo
发明人： Tetsuo Yoshida , Tadayoshi Kokubo
IPC分类号： G03C1/035 , G03C1/485 , G03C1/28
CPC分类号： G03C1/485 , G03C1/035 , G03C2001/03535 , Y10S430/141
摘要： An internal latent image-type silver halide emulsion containing core/shell type silver halide grains with a mean grain size of about 0.4 .mu.m or less, the grains comprising a core of chemically sensitized silver halide and a shell of silver halide covering at least the light-sensitive sites of the core and the surface of the grains being chemically sensitized wherein the core is chemically sensitized to such an extent that the difference between fog density F.sub.1 and fog density F.sub.2 as defined herein (i.e., internal fog density) is at least 0.10. This emulsion permits the formation of good reversal images in which D.sub.max is high and D.sub.min is low and, furthermore, has a superior storage stability.
摘要翻译：含有平均粒径约0.4μm或更小的核/壳型卤化银颗粒的内部潜影型卤化银乳剂，包含化学增感卤化银核心的颗粒和至少覆盖至少核心的光敏部位和晶粒的表面被化学敏化，其中核心被化学增感，使得如本文所定义的雾浓度F1和雾浓度F2之间的差异（即，内雾浓度）至少为 0.10。这种乳液允许形成其中Dmax高和Dmin低的良好的反转图像，此外具有优异的储存稳定性。

8. 发明授权

US4452885A Heat-developable photographic material 失效
标题翻译：热显影照相材料
公开(公告)号：US4452885A
公开(公告)日：1984-06-05
申请号：US428519
申请日：1982-09-29
申请人： Yasushi Nozawa , Tadayoshi Kokubo , Isamu Itoh , Hiroshi Kitaguchi
发明人： Yasushi Nozawa , Tadayoshi Kokubo , Isamu Itoh , Hiroshi Kitaguchi
IPC分类号： G03C1/498 , G03C1/34 , G03C1/02
CPC分类号： G03C1/49845
摘要： A heat-developable photographic material is disclosed. The material is comprised of (a) an organic silver salt, (b) a photocatalyst, (c) a reducing agent, (d) a binder, and (e) at least one compound selected from the group consisting of 2-trihalogenomethyl-3,4-oxadiazoles and the derivatives thereof as an antifogging agent. The use of component (e) does not present environmental pollution problems and successfully reduces fog density.
摘要翻译：公开了一种可热显影的照相材料。该材料包括（a）有机银盐，（b）光催化剂，（c）还原剂，（d）粘合剂，和（e）至少一种选自2-三卤代甲基 - 3,4-恶二唑及其衍生物作为防雾剂。组分（e）的使用不会造成环境污染问题，并能成功降低雾度。

9. 发明授权

US5707777A Light-sensitive composition 失效
标题翻译：感光组合物
公开(公告)号：US5707777A
公开(公告)日：1998-01-13
申请号：US466136
申请日：1995-06-06
申请人： Toshiaki Aoai , Tadayoshi Kokubo
发明人： Toshiaki Aoai , Tadayoshi Kokubo
IPC分类号： G03F7/004 , G03F7/039 , G03F7/075 , H01L21/027 , G03F7/038
CPC分类号： G03F7/0755 , G03F7/0045 , Y10S430/11 , Y10S430/111 , Y10S430/122
摘要： A positive-working light-sensitive composition which comprises: (a) 0.5 to 80% by weight of a compound which has at least one group capable of being decomposed by an acid and whose solubility in an alkaline developer is increased by an acid; (b) 0.01 to 20% by weight of a disulfone compound represented by the following formula (I); R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 (I) wherein R.sup.1 and R.sup.2 may be the same or different and represent a substituted or unsubstituted alkyl, alkenyl or aryl group; and (c) 5 to 99.49% by weight of a resin insoluble in water and soluble in an alkaline water, wherein the compound of the component (a) has a molecular weight of not more than 2,000 and a boiling point of not less than 150.degree. C. and wherein a film of the composition having a thickness of 1 .mu.m has an optical density determined at 248 nm of not more than 1.4 before exposure to light and the optical density of the composition determined at 248 nm is reduced by exposure to light of 248 nm.
摘要翻译：一种正性感光性组合物，其包含：（a）0.5〜80重量％的具有至少一个能够被酸分解并且在碱性显影剂中的溶解度由酸增加的化合物; （b）0.01〜20重量％的由下式（I）表示的二砜化合物; R1-SO2-SO2-R2（Ⅰ）其中R1和R2可以相同或不同，表示取代或未取代的烷基，烯基或芳基; 和（c）5〜99.49重量％的不溶于水且可溶于碱性水的树脂，其中组分（a）的化合物的分子量不大于2,000，沸点不小于150 并且其中具有1μm厚度的组合物的膜在暴露于光之前在248nm处确定为不大于1.4的光密度，并且通过暴露于248nm下测定的组合物的光密度降低 248nm的光。

10. 发明授权

US5248582A Positive-type photoresist composition 失效
标题翻译：正型光致抗蚀剂组合物
公开(公告)号：US5248582A
公开(公告)日：1993-09-28
申请号：US987562
申请日：1992-12-08
申请人： Kazuya Uenishi , Shinji Sakaguchi , Tadayoshi Kokubo
发明人： Kazuya Uenishi , Shinji Sakaguchi , Tadayoshi Kokubo
IPC分类号： G03F7/022
CPC分类号： G03F7/022
摘要： A positive type photoresist composition which comprises an alkali soluble novolak resin and at least one light-sensitive material represented by the following general formulae (I) to (IV) to provide a resist pattern with high resolution, high reproduction fidelity, desirable sectional shape, wide latitude of development, high heat resistance and high storage stability: ##STR1## (wherein X represents --CO--, or --SO.sub.2 --; p represents an integer from 2 to 4; R's may be the same or different, each being --H, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted acyl group, a substituted or unsubstituted acyloxy group, ##STR2## provided that R always contains at least one of ##STR3## ; R.sub.1 represents ##STR4## a substituted or unsubstituted di- to tetra-valent alkyl group, or a substituted or unsubstituted di- to tetra-valent aromatic group; and l, m and n Represent O or an integer of from 1 to 3, provided that at least one of them is not zero).
摘要翻译：一种正型光致抗蚀剂组合物，其包含碱溶性酚醛清漆树脂和由以下通式（I）至（IV）表示的至少一种感光材料，以提供具有高分辨率，高再现保真度，期望的截面形状的抗蚀剂图案，宽范围的发展，高耐热性和高储存稳定性：其中X表示-CO-或-SO 2 - ;其中X表示-CO-或-SO 2 - ; p表示2至4的整数; R可以相同或不同，各自为-H，-OH，取代或未取代的烷基，取代或未取代的烷氧基，取代或未取代的芳基，取代或未取代的芳烷基，取代或未取代的酰基，取代或未取代的酰氧基，条件是R总是包含至少一个; R 1表示取代或未取代的二价至四价的烷基，或替代或未授权抽出二价至四价芳基; 和l，m和n表示O或1至3的整数，条件是它们中的至少一个不为零）。

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