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1. 发明授权

US06650678B1 Laser oscillating apparatus 有权
标题翻译：激光振荡装置
公开(公告)号：US06650678B1
公开(公告)日：2003-11-18
申请号：US09512075
申请日：2000-02-24
申请人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
发明人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
IPC分类号： A01S3097
CPC分类号： H01S3/0315 , G03F7/70383 , H01S3/0385 , H01S3/0975 , H01S3/225
摘要： A plasma is excited uniformly as a whole over the length of each slot. A laser oscillating apparatus is designed to excite a laser gas in a laser tube (2) by introducing electromagnetic waves into the laser tube through a plurality of slots (10) formed in a waveguide wall and generate a laser beam by resonating the light generated from the laser gas. A least one electrode (13) is placed near the slot (10). By giving a predetermined current density to the electrode (13), the intensity distribution of light generated from the laser gas above the slot (10) is controlled.
摘要翻译：等离子体在每个槽的长度上作为整体被均匀地激发。激光振荡装置被设计成通过在波导壁中形成的多个槽（10）将电磁波引入到激光管中来激发激光管（2）中的激光气体，并通过使从激光气体。至少一个电极（13）放置在槽（10）附近。通过向电极（13）施加预定的电流密度，控制从狭槽（10）上方的激光气体产生的光的强度分布。

2. 发明授权

US06829279B1 Laser oscillating apparatus, exposure apparatus using the same and device fabrication method 有权
标题翻译：激光振荡装置，使用其的曝光装置和装置制造方法
公开(公告)号：US06829279B1
公开(公告)日：2004-12-07
申请号：US09494945
申请日：2000-02-01
申请人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
发明人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
IPC分类号： H01S500
CPC分类号： G03F7/70025 , H01S3/0315 , H01S3/0385 , H01S3/225
摘要： In a laser oscillating apparatus for exciting a laser gas in a laser tube by introducing an electromagnetic wave from a waveguide into the laser tube through a plurality of slots formed in a waveguide wall, and generating a laser beam by resonating light emitted from the laser gas, the slots are formed in a line such that their longitudinal direction is consistent with the longitudinal direction of the waveguide, and a metal wall is so formed as to surround these slots. This metal wall forms a gap as a microwave passage from the slots to a window in the laser tube wall, thereby spacing the laser tube wall apart from the slots by a predetermined distance.
摘要翻译：在激光振荡装置中，通过将形成在波导壁上的多个槽引入来自波导的电磁波向激光管激励激光器中的激光气体，通过使从激光气体发出的光共振而产生激光束槽形成为一条直线，使得它们的纵向与波导的纵向方向一致，并且金属壁形成为围绕这些槽。该金属壁形成从激光管壁中的狭缝到窗口的微波通道的间隙，从而将激光管壁与狭缝分开预定距离。

3. 发明授权

US06801554B1 Laser oscillating apparatus, exposure apparatus, and device fabrication method 有权
标题翻译：激光振荡装置，曝光装置和装置制造方法
公开(公告)号：US06801554B1
公开(公告)日：2004-10-05
申请号：US09531958
申请日：2000-03-21
申请人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
发明人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
IPC分类号： H01S300
CPC分类号： H01S3/225 , H01S3/0975
摘要： An excimer laser gas in a laser tube 2 is excited by a microwave introduced from awaveguide 1, and electric field concentration occurs in a slit-shaped gap 3 provided in a plate member 11c, causing plasma discharge. Then the phase of plasma light is regulated and the light is resonated, to cause excimer laser light. This construction realizes plasma excitation entirely uniform along a lengthwise direction of laser light emission, and enables uniform laser light emission with minimum energy loss.
摘要翻译：激光管2中的准分子激光气体被从波导管1引入的微波激发，并且在设置在板构件11c中的狭缝状间隙3中发生电场浓度，引起等离子体放电。然后等离子体光的相位被调节并且光被共振，以引起准分子激光。这种结构实现了沿着激光发射的长度方向的等离子体激发完全均匀，并且以最小的能量损失实现均匀的激光发射。

4. 发明授权

US06744802B1 Laser oscillating apparatus with slotted waveguide 有权
标题翻译：具有开槽波导的激光振荡装置
公开(公告)号：US06744802B1
公开(公告)日：2004-06-01
申请号：US09512074
申请日：2000-02-24
申请人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
发明人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
IPC分类号： H01S3097
CPC分类号： G03F7/70025 , H01S3/0315 , H01S3/0975 , H01S3/225
摘要： In a slot array structure, electromagnetic wave emission which is uniform as a whole over the length of a laser tube is realized to allow uniform laser emission with minimum energy loss. Slots (10) are formed at a predetermined pitch in a long end face (H plane) of each waveguide (1) along a central line (m) in the longitudinal direction of the H plane to be alternately located on the left and right sides of the central line (m) and spaced apart from the central line (m) by a distance (d).
摘要翻译：在时隙阵列结构中，实现了在激光管的长度上整体上均匀的电磁波发射，以允许具有最小能量损失的均匀的激光发射。在每个波导（1）的长边（H平面）上沿着H平面的纵向方向上的中心线（m）以预定间距形成狭槽（10），以交替地位于左侧和右侧的中心线（m）并与中心线（m）间隔开距离（d）。

5. 发明授权

US06847672B2 Laser gas supply path structure in an exposure apparatus 有权
标题翻译：曝光装置中的激光气体供给路径结构
公开(公告)号：US06847672B2
公开(公告)日：2005-01-25
申请号：US09985707
申请日：2001-11-06
申请人： Tadahiro Ohmi , Hiroshi Osawa , Nobuyoshi Tanaka , Kazuhide Ino , Toshikuni Shinohara , Yasuyuki Shirai , Masaki Hirayama
发明人： Tadahiro Ohmi , Hiroshi Osawa , Nobuyoshi Tanaka , Kazuhide Ino , Toshikuni Shinohara , Yasuyuki Shirai , Masaki Hirayama
IPC分类号： H01S5/30 , H01S3/036 , H01S3/22 , G03B27/42 , G03B27/54 , H01S3/03 , H01S3/223
CPC分类号： H01S3/036
摘要： A gas supply path structure forms a fluid path for allowing a laser gas to flow into or out of a pair of fluid inlet and outlet 11a and a laser gas is controlled to a predetermined subsonic speed at a throat portion. Gas supplies for controlling the speed of the gas are connected each to the fluid inlet and to the fluid outlet of the gas supply path structure and, together with a cooling device, compose a circulation system for controlling the speed and pressure of the laser gas at the fluid inlet and/or at the fluid outlet.
摘要翻译：气体供给路径结构形成用于允许激光气体流入或流出一对流体入口和出口11a的流体路径，并且在喉部处将激光气体控制到预定的亚音速。用于控制气体速度的气体供应装置连接到流体入口和气体供给路径结构的流体出口，并且与冷却装置一起构成用于控制激光气体的速度和压力的循环系统流体入口和/或在流体出口处。

6. 发明授权

US06804285B2 Gas supply path structure for a gas laser 有权
标题翻译：气体激光器的供气路径结构
公开(公告)号：US06804285B2
公开(公告)日：2004-10-12
申请号：US09425015
申请日：1999-10-25
申请人： Tadahiro Ohmi , Hiroshi Osawa , Nobuyoshi Tanaka , Kazuhide Ino , Toshikuni Shinohara , Yasuyuki Shirai , Masaki Hirayama
发明人： Tadahiro Ohmi , Hiroshi Osawa , Nobuyoshi Tanaka , Kazuhide Ino , Toshikuni Shinohara , Yasuyuki Shirai , Masaki Hirayama
IPC分类号： H01S322
CPC分类号： H01S3/036
摘要： A gas supply path structure forms a fluid path for allowing a laser gas to flow into or out of a pair of fluid inlet and outlet 11a and a laser gas is controlled to a predetermined subsonic speed at a throat portion. Gas supplies for controlling the speed of the gas are connected each to the fluid inlet and to the fluid outlet of the gas supply path structure and, together with a cooling device, compose a circulation system for controlling the speed and pressure of the laser gas at the fluid inlet and/or at the fluid outlet.
摘要翻译：气体供给路径结构形成用于允许激光气体流入或流出一对流体入口和出口11a的流体路径，并且在喉部处将激光气体控制到预定的亚音速。用于控制气体速度的气体供应装置连接到流体入口和气体供给路径结构的流体出口，并且与冷却装置一起构成用于控制激光气体的速度和压力的循环系统流体入口和/或在流体出口处。

7. 发明授权

US06258244B1 Treating method and apparatus utilizing chemical reaction 失效
标题翻译：利用化学反应的处理方法和装置
公开(公告)号：US06258244B1
公开(公告)日：2001-07-10
申请号：US09076834
申请日：1998-05-13
申请人： Tadahiro Ohmi , Nobuyoshi Tanaka , Takeo Ushiki , Toshikuni Shinohara , Takahisa Nitta
发明人： Tadahiro Ohmi , Nobuyoshi Tanaka , Takeo Ushiki , Toshikuni Shinohara , Takahisa Nitta
IPC分类号： C25D900
CPC分类号： H01L21/3063 , C25D11/005 , C25D11/32 , H01L21/76256
摘要： In order to effectively remove gas molecules of a by-product in a chemical reaction in a solution so as to achieve high efficiency, high rate, and uniformity of the chemical reaction in the solution and in order to realize formation of a semiconductor substrate applicable to production of SOI structure and realize formation of a semiconductor substrate in which a light-emitting element or a gas sensor can be formed, on the basis of an inexpensive silicon substrate, the chemical reaction is performed while the concentration of a gas dissolved in a reaction solution in a reaction vessel is always controlled to be not more than the solubility thereof during the reaction.
摘要翻译：为了有效地除去溶液中的化学反应中副产物的气体分子，以达到溶液中化学反应的高效率，高速率和均匀性，并且为了实现适用于制造SOI结构，并且在廉价的硅衬底的基础上实现可以形成发光元件或气体传感器的半导体衬底的形成，同时在溶解在反应中的气体的浓度进行化学反应反应容器中的溶液总是控制在不大于其在反应期间的溶解度。

8. 发明授权

US06255731B1 SOI bonding structure 失效
标题翻译： SOI结合结构
公开(公告)号：US06255731B1
公开(公告)日：2001-07-03
申请号：US09123364
申请日：1998-07-28
申请人： Tadahiro Ohmi , Nobuyoshi Tanaka , Takeo Ushiki , Toshikuni Shinohara , Takahisa Nitta
发明人： Tadahiro Ohmi , Nobuyoshi Tanaka , Takeo Ushiki , Toshikuni Shinohara , Takahisa Nitta
IPC分类号： H01L2348
CPC分类号： H01L21/76251 , H01L21/2007 , H01L23/4825 , H01L2924/0002 , H01L2924/09701 , H01L2924/00
摘要： A semiconductor substrate adapted to giga-scale integration (GSI) comprises a support, at least the surface of which is made of semiconductor, an electroconductive material layer, an insulating layer and a semiconductor layer arranged sequentially in the above order. The electroconductive material layer has at least in part thereof an electroconductive reacted layer obtained by causing two metals, a metal and a semiconductor, a metal and a metal-semiconductor compound, a semiconductor and a metal-semiconductor compound, or two metal-semiconductor compounds to react each other. An electroconductive reaction terminating layer that is made of a material that does not react with the reacted layer is arranged between the reacted layer and the insulating layer or the support.
摘要翻译：适用于千兆级集成（GSI）的半导体衬底包括至少其表面由半导体制成的支撑体，导电材料层，绝缘层和按上述顺序排列的半导体层。导电材料层至少部分地具有通过使两种金属，金属和半导体，金属和金属 - 半导体化合物，半导体和金属 - 半导体化合物或两种金属 - 半导体化合物形成的导电反应层互相反应。在反应层和绝缘层或载体之间设置由不与反应层反应的材料制成的导电反应终止层。

9. 发明授权

US06929830B2 Plasma treatment method and method of manufacturing optical parts using the same 失效
标题翻译：使用其制造光学部件的等离子体处理方法和方法
公开(公告)号：US06929830B2
公开(公告)日：2005-08-16
申请号：US10449106
申请日：2003-06-02
申请人： Goushu Tei , Nobuyoshi Tanaka , Tadahiro Ohmi , Masaki Hirayama
发明人： Goushu Tei , Nobuyoshi Tanaka , Tadahiro Ohmi , Masaki Hirayama
IPC分类号： C23C16/44 , C23C16/455 , C23C16/511 , H01J37/32 , B05D5/06 , C03C17/245 , H05H1/46
CPC分类号： C23C16/45565 , C23C16/511 , H01J37/32192
摘要： A method for treating a non-planar surface of an object by employing a plasma treatment apparatus in which a microwave dielectric has a non-planar surface corresponding to the surface of the object. A method for forming an optical part is also provided.
摘要翻译：一种通过采用等离子体处理装置处理物体的非平面表面的方法，其中微波介电体具有对应于物体表面的非平面表面。还提供了一种用于形成光学部件的方法。

10. 发明授权

US06690702B1 Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube 有权
标题翻译：准分子激光振荡装置和方法，准分子激光曝光装置和激光管
公开(公告)号：US06690702B1
公开(公告)日：2004-02-10
申请号：US09528183
申请日：2000-03-17
申请人： Tadahiro Ohmi , Nobuyoshi Tanaka , Masaki Hirayama
发明人： Tadahiro Ohmi , Nobuyoshi Tanaka , Masaki Hirayama
IPC分类号： H01S304
CPC分类号： H01S3/225 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/0973
摘要： In an excimer laser oscillation apparatus including a laser chamber (20) constituted by a laser tube (2) for storing a laser gas containing a gas mixture of at least one inert gas selected from the group consisting of Kr, Ar, and Ne, He and F2 gas, and an optical resonator consisting of a pair of reflection mirrors (5, 6) arranged to sandwich the laser chamber (20) therebetween, the inner surface of the laser chamber (20) for storing the laser gas has a reflection-free surface with respect to light of a desired wavelength of 248 nm, 193 nm, or 157 nm, and the uppermost surface of the inner surface consists of a fluoride, and a means (waveguide 1) for introducing a microwave for exciting the laser gas in the laser chamber (20) is prepared. With this arrangement, an excimer laser oscillation apparatus, an oscillation method, and an exposure apparatus can be provided, which can reduce the load on the lens material and its surface, can simplify the mirror or laser scanning control system, and are satisfactorily used in mass production since the service life of an excimer laser can be sufficiently prolonged.
摘要翻译：在包括由激光管（2）构成的激光室（20）的准分子激光振荡装置中，所述激光管（2）用于存储含有选自Kr，Ar和Ne的至少一种惰性气体的气体混合物的激光气体，He 和F2气体，以及由设置成将激光室（20）夹在其间的一对反射镜（5,6）构成的光谐振器，用于存储激光气体的激光室（20）的内表面具有反射 - 相对于248nm，193nm或157nm的所需波长的光的自由表面，并且内表面的最上表面由氟化物组成，并且用于引入微波激励激光气体的装置（波导1）在激光室（20）中。通过这种布置，可以提供准分子激光振荡装置，振荡方法和曝光装置，其可以减少透镜材料及其表面上的负载，可以简化镜子或激光扫描控制系统，并且令人满意地使用由于准分子激光器的使用寿命可以充分延长，因此大量生产。

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