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    • 4. 发明授权
    • Pressure-type flow rate control apparatus
    • 压力式流量控制装置
    • US06152168A
    • 2000-11-28
    • US284352
    • 1999-05-24
    • Tadahiro OhmiTetu KagazumeKazuhiko SugiyamaRyousuke DohiTomio UnoKouji NishinoHiroyuki FukudaNobukazu IkedaMichio Yamaji
    • Tadahiro OhmiTetu KagazumeKazuhiko SugiyamaRyousuke DohiTomio UnoKouji NishinoHiroyuki FukudaNobukazu IkedaMichio Yamaji
    • F16K17/22G05D7/06
    • G05D7/0647Y10T137/7759Y10T137/7761
    • A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate control range as well as size reduction of the pressure-type flow control apparatus, and offers other advantages including improved gas replaceability, prevention of dust formation, and reduced manufacturing costs of the flow control system. The apparatus comprises an orifice, a control valve provided on the upstream side of the orifice, a pressure detector provided between the control valve and the orifice, and a control unit to calculate a fluid flow rate Q on the basis of a pressure P1 detected by the pressure detector with the equation Q=KP1 (K=constant) and to output in a drive for the control valve the difference between the set flow rate signal Qs and the calculated flow rate signal Q as control signal Qy, wherein the pressure P1 on the upstream side of the orifice is regulated by actuating the control valve for controlling the flow rate of the fluid downstream of the orifice with the ratio P2/P1 between the pressure P1 on the upstream side of the orifice and the downstream pressure P2 maintained at not higher than the ratio of the critical pressure of the controlled fluid, characterized in that a direct touch type metal diaphragm valve unit functions as the orifice and that the ring-shaped gap between the valve seat and the diaphragm serves a variable orifice wherein the gap is adjusted by the orifice drive.
    • PCT No.PCT / JP98 / 03620 Sec。 371日期1999年5月24日 102(e)日期1999年5月24日PCT提交1998年8月13日PCT公布。 公开号WO99 /​​ 09463 日期1999年2月25日一种特别用于半导体制造设备中的气体供给系统的压力式流量控制装置。 流量控制装置设置有可变孔口,其允许容易地切换流体流量控制范围以及压力型流量控制装置的尺寸减小,并且提供其它优点,包括改进的气体替换性,防止灰尘 形成和降低流量控制系统的制造成本。 该装置包括孔口,设置在孔口的上游侧的控制阀,设置在控制阀和孔口之间的压力检测器,以及控制单元,用于根据检测到的压力P1计算流体流量Q 压力检测器具有等式Q = KP1(K =常数),并且在控制阀的驱动器中输出设定流量信号Qs和计算流量信号Q之间的差作为控制信号Qy,其中压力P1 on 孔口的上游侧通过致动用于控制孔口下游流体的流速的控制阀来调节,孔口上游侧的压力P1与保持在不同的孔口的下游压力P2之间的比率P2 / P1 高于受控流体的临界压力的比例,其特征在于,直接触摸式金属隔膜阀单元用作孔口,并且阀海之间的环形间隙 并且隔膜用于可变孔口,其中间隙由孔口驱动器调节。
    • 6. 发明授权
    • Pressure type flow rate control apparatus
    • 压力式流量控制装置
    • US5816285A
    • 1998-10-06
    • US907951
    • 1997-08-11
    • Tadahiro OhmiKoji NishinoNobukazu IkedaAkihiro MorimotoYukio MinamiKoji KawadaRyosuke DohiHiroyuki Fukuda
    • Tadahiro OhmiKoji NishinoNobukazu IkedaAkihiro MorimotoYukio MinamiKoji KawadaRyosuke DohiHiroyuki Fukuda
    • G05D7/06G05D16/20F16K31/12
    • G05D7/0635Y10T137/7759Y10T137/7761
    • A pressure type flow rate control apparatus (1) controls flow rate of a fluid in an environment where a ratio of P2/P1 between an absolute pressure P1 at an upstream side of an orifice and an absolute pressure P2 at a downstream side of the orifice is maintained at a value less than about 0.7. The apparatus comprises: a plate for forming the orifice (5); a control valve (2) positioned upstream of the orifice; an orifice corresponding valve (9) positioned downstream of the orifice (5); a primary pressure detector (3) positioned between the control valve (2) and the orifice (5); a secondary pressure detector (11) positioned downstream of the orifice (5); a calculation control device (6) for calculating flow rate Qc on the basis of the measured pressure P1 of the primary pressure detector (3) by a formula Qc=KP1 (K being a constant) and for outputting as a control signal Qy a difference between a flow rate command signal Qs and the calculated flow rate signal Qc to a drive unit (14) of the control valve 2; and a pressure comparing, calculating apparatus (10) for calculating the ratio of P2/P1 between the detected pressure P1 of the primary pressure detector (3) and the detected pressure P2 of the secondary pressure detector (11). The pressure P1 upstream of the orifice is adjusted by opening and closing the control valve by the control signal Qy, thereby controlling the flow rate downstream of the orifice.
    • 压力式流量控制装置(1)控制在孔口上游侧的绝对压力P1和孔口下游侧的绝对压力P2之间的P2 / P1的比例的环境中的流体流量 保持在小于约0.7的值。 该装置包括:用于形成孔口(5)的板; 位于孔口上游的控制阀(2); 位于孔口(5)下游的孔对应阀(9); 位于控制阀(2)和孔(5)之间的主要压力检测器(3); 位于孔口(5)下游的二次压力检测器(11); 计算控制装置(6),用于通过公式Qc = KP1(K为常数)计算基于所测量的主压力检测器(3)的压力P1的流量Qc,并且作为控制信号Qy输出差 在流量指令信号Qs和计算出的流量信号Qc之间,与控制阀2的驱动单元(14)之间; 以及压力比较计算装置(10),用于计算一次压力检测器(3)的检测压力P1与二次压力检测器(11)的检测压力P2之间的P2 / P1的比。 通过控制信号Qy打开和关闭控制阀来调节孔口上游的压力P1,从而控制孔口下游的流速。