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1. 发明授权

US6007970A Lithographic developer containing surfactant 失效
标题翻译：含有表面活性剂的平版印刷版
公开(公告)号：US6007970A
公开(公告)日：1999-12-28
申请号：US395182
申请日：1995-02-27
申请人： Tadahiro Ohmi , Hisayuki Shimada , Shigeki Shimomura
发明人： Tadahiro Ohmi , Hisayuki Shimada , Shigeki Shimomura
IPC分类号： G03F7/32 , G03C5/00
CPC分类号： G03F7/322
摘要： Provided is a lithographic developer used to develop a resist pattern having regions with different sizes and shapes, by dissolving and removing a resist region of a resist layer formed in the resist pattern, wherein the developer comprises a surfactant capable of increasing the dissolution of a resist in the resist region to be dissolved and removed, having a smaller dissolving-and-removing area on the surface of the resist layer.
摘要翻译：提供了通过溶解和除去形成在抗蚀剂图案中的抗蚀剂层的抗蚀剂区域来开发具有不同尺寸和形状的区域的抗蚀剂图案的平版印刷显影剂，其中显影剂包括能够增加抗蚀剂溶解度的表面活性剂在要溶解和去除的抗蚀剂区域中，在抗蚀剂层的表面上具有较小的溶解和去除区域。

2. 发明授权

US6107007A Lithography process 失效
标题翻译：平版印刷工艺
公开(公告)号：US6107007A
公开(公告)日：2000-08-22
申请号：US15437
申请日：1993-02-09
申请人： Tadahiro Ohmi , Hisayuki Shimada , Shigeki Shimomura , Akiyoshi Suzuki , Mamoru Miyawaki , Miyoko Noguchi
发明人： Tadahiro Ohmi , Hisayuki Shimada , Shigeki Shimomura , Akiyoshi Suzuki , Mamoru Miyawaki , Miyoko Noguchi
IPC分类号： G03F7/20 , G03F7/32 , G03C5/00
CPC分类号： G03F7/701 , G03F7/322
摘要： A lithography process for forming a pattern having different sizes or different shapes of pattern components, comprises steps of exposing a resist to a predetermined light pattern by modified illumination, and removing, at least one step of forming the resist pattern, a region of the resist by employing a lithography-developing solution containing a surfactant, the surfactant being capable of promoting dissolution of a smaller pattern component to be removed of the resist.The surfactant is represented by the general formula below:HO(CH.sub.2 CH.sub.2 O).sub.a (CH(CH.sub.3)CH.sub.2 O).sub.b (CH.sub.2 CH.sub.2 O).sub.c Hwhere a, b, and c are respectively an integer.The surfactant satisfies the relation:(A+C)/(A+B+C).ltoreq.0.3where A represents the molecular weight of HO(CH.sub.2 CH.sub.2 O).sub.a, B represents the molecular weight of (CH(CH.sub.3)CH.sub.2 O).sub.b, and C represents the molecular weight of (CH.sub.2 CH.sub.2 O).sub.c H.
摘要翻译：用于形成具有不同尺寸或不同形状的图案部件的图案的光刻工艺包括以下步骤：通过改进的照明将抗蚀剂暴露于预定的光图案，以及去除形成抗蚀剂图案的至少一个步骤，通过使用含有表面活性剂的光刻显影液，表面活性剂能够促进较小的图案成分的溶解，以除去抗蚀剂。表面活性剂由以下通式表示：HO（CH 2 CH 2 O）a（CH（CH 3）CH 2 O）b（CH 2 CH 2 O）c H其中a，b和c分别为整数。表面活性剂满足下列关系：（A + C）/（A + B + C）≤0.3其中A表示HO（CH 2 CH 2 O）a的分子量，B表示（CH（CH 3）CH 2 O）b的分子量，C表示（CH 2 CH 2 O）c H的分子量。

3. 发明授权

US07126861B2 Programmable control of leakage current 有权
标题翻译：可编程控制漏电流
公开(公告)号：US07126861B2
公开(公告)日：2006-10-24
申请号：US10749287
申请日：2003-12-30
申请人： Richard K. Hose, Jr. , Shigeki Shimomura
发明人： Richard K. Hose, Jr. , Shigeki Shimomura
IPC分类号： G11C16/04 , G11C11/00
CPC分类号： G11C5/147 , G11C7/1045 , G11C2207/2227
摘要： An apparatus having a memory cell, a ground control circuitry coupled to the memory cell to programmably control a voltage at a first ground, a first circuitry coupled to the memory cell to provide a first voltage to the memory cell during a first period, and a second circuitry coupled to the memory cell to provide a second voltage to memory cell during a second period, is described. In various embodiments, the first voltage is reference to the first ground; and the second voltage is referenced to a second ground which is different from the first ground.
摘要翻译：一种具有存储单元的装置，耦合到存储单元的可编程地控制第一地电压的接地控制电路，耦合到存储单元的第一电路，以便在第一时段期间向存储单元提供第一电压;以及描述了耦合到存储器单元以在第二时段期间向存储器单元提供第二电压的第二电路。在各种实施例中，第一电压参考第一地面; 并且第二电压参考与第一地不同的第二地。

4. 发明申请

US20050146948A1 Programmable control of leakage current 有权
标题翻译：可编程控制漏电流
公开(公告)号：US20050146948A1
公开(公告)日：2005-07-07
申请号：US10749287
申请日：2003-12-30
申请人： Richard Hose , Shigeki Shimomura
发明人： Richard Hose , Shigeki Shimomura
IPC分类号： G11C5/14 , G11C7/10 , G11C16/04
CPC分类号： G11C5/147 , G11C7/1045 , G11C2207/2227
摘要： An apparatus comprises a memory cell and ground control circuitry coupled to the memory cell to programmably control a voltage at a first ground. The apparatus further comprises first circuitry coupled to the memory cell to provide a first voltage to the memory cell during a first period. The first voltage referenced to the first ground. The apparatus additionally comprises second circuitry coupled to the memory cell to provide a second voltage to memory cell during a second period. The second voltage referenced to a second ground different from the first ground.
摘要翻译：一种装置包括耦合到存储器单元的可编程地控制第一地的电压的存储单元和地控制电路。该装置还包括耦合到存储器单元的第一电路，以在第一周期期间向存储器单元提供第一电压。第一个电压参考第一个地面。该装置还包括耦合到存储器单元的第二电路，以在第二周期期间向存储器单元提供第二电压。第二电压参考与第一地不同的第二地。

5. 发明授权

US5138302A Photoelectric, scattered light smoke detector 失效
标题翻译：光电式，散光式烟雾探测器
公开(公告)号：US5138302A
公开(公告)日：1992-08-11
申请号：US578598
申请日：1990-09-07
申请人： Akira Nagaoka , Shigeki Shimomura , Masao Arakawa , Tomizo Terasawa , Hironori Kami , Masanobu Ogawa
发明人： Akira Nagaoka , Shigeki Shimomura , Masao Arakawa , Tomizo Terasawa , Hironori Kami , Masanobu Ogawa
IPC分类号： G08B17/107
CPC分类号： G08B17/107 , G08B17/113
摘要： A photoelectric smoke detector has a circuit substrate coupled to an optical-system base as disposed in a circuit accommodating zone defined within a detector housing by the base together with a smoke supervisory zone, a light projecting element and an integrated circuit incorporating therein a light receiving element and smoke detecting means are mounted to the circuit substrate, and the optical-system base holds therein a light receiving lens which is capable of condensing scattered light from smoke particles onto the light receiving element in the integrated circuit on the circuit substrate. Effective reduction in the number of constituent parts is thereby attained, to promote reduction in manufacturing costs, and to effectively realize dimensional minimization.
摘要翻译：光电式烟雾探测器具有电路基板，该电路基板与光学系统基座连接，该光电系统基座设置在电路容纳区域内，该电路容纳区域由检测器壳体内的基座与烟雾监控区域，光投射元件和集成电路结合在一起，元件和烟雾检测装置安装到电路基板上，并且光学系统基座保持有光接收透镜，该光接收透镜能够将来自烟粒子的散射光聚集到电路基板上的集成电路中的光接收元件上。由此，能够有效地减少构成部件的数量，促进制造成本的降低，有效地实现尺寸最小化。

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