专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2012078421A2 A D.C. CHARGED PARTICLE ACCELERATOR, A METHOD OF ACCELERATING CHARGED PARTICLES USING D.C. VOLTAGES AND A HIGH VOLTAGE POWER SUPPLY APPARATUS FOR USE THEREWITH 审中-公开
标题翻译：直流充电颗粒加速器，使用直流电压加速充电颗粒的方法及其使用的高压电源装置
公开(公告)号：WO2012078421A2
公开(公告)日：2012-06-14
申请号：PCT/US2011/062531
申请日：2011-11-30
申请人： TWIN CREEKS TECHNOLOGIES, INC. , SMICK, Theodore H. , RYDING, Geoffrey , PARK, William H. , HORNER, Ronald
发明人： SMICK, Theodore H. , RYDING, Geoffrey , PARK, William H. , HORNER, Ronald
IPC分类号： H05H13/04 , H05H7/00
CPC分类号： H05H5/04 , H02K11/0094 , H02K16/00 , H02K21/14 , H02M7/106
摘要： A d. c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In embodiments, the individually regulated gap voltages are generated by electrically isolated alternators mounted on a common rotor shaft driven by an electric motor. Alternating power outputs from the alternators provide inputs to individual regulated d. c. power supplies to generate the gap voltages. The power supplies are electrically isolated and have outputs connected in series across successive pairs of accelerator electrodes. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.
摘要翻译：广告。 C。带电粒子加速器包括通过绝缘垫片间隔开的加速器电极，其限定相邻电极对之间的加速间单独调节的间隙电压施加在每个相邻的加速器电极对之间。在实施例中，单独调节的间隙电压由安装在由电动机驱动的公共转子轴上的电隔离交流发电机产生。交流发电机的交流电源输出为单独调节的d提供输入。 C。电源产生间隙电压。电源是电隔离的，并且具有串联连接成对的加速器电极的输出。所描述的实施例使得能够将离子束加速到高能量和高束流，具有良好的加速器稳定性。

2. 发明申请

WO2011008413A1 ION IMPLANTATION APPARATUS AND METHOD 审中-公开
标题翻译：离子植入装置和方法
公开(公告)号：WO2011008413A1
公开(公告)日：2011-01-20
申请号：PCT/US2010/039191
申请日：2010-06-18
申请人： TWIN CREEKS TECHNOLOGIES, INC. , RYDING, Geoffrey , SMICK, Theodore, H. , PURSER, Kenneth , GILLESPIE, Joseph, D. , GLAVISH, Hilton
发明人： RYDING, Geoffrey , SMICK, Theodore, H. , PURSER, Kenneth , GILLESPIE, Joseph, D. , GLAVISH, Hilton
IPC分类号： H01J37/05 , H01J37/08 , H01J37/20 , H01J37/317 , F16J15/00 , H01J37/02
CPC分类号： H01J37/3171 , H01J37/05 , H01J37/08 , H01J37/20 , H01J2237/057 , H01J2237/061 , H01J2237/082 , H01J2237/166 , H01J2237/2001 , H01J2237/2006 , H01J2237/201 , H01J2237/202
摘要： A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel (14) carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and a ribbon beam (101) of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel. The beam is generated by an ion source (16) providing an extracted ribbon beam having at least 100mm major cross-sectional diameter. The ion source may use core-less saddle type coils (112, 112a-c) to provide a uniform field confining the plasma in the ion source. The ribbon beam may be passed through a 90 bending magnet (17) which bends the beam in the plane of the ribbon.
摘要翻译：用于从硅晶片剥离硅的氢离子注入机使用大的扫描轮（14），围绕其周边承载50多个晶片并围绕轴线旋转。在一个实施例中，车轮的旋转轴线是固定的，并且氢离子的带状束（101）被定向在车轮的周边边缘上。带状束在轮上的晶片的整个径向宽度上延伸。光束由离子源（16）产生，提供具有至少100mm主横截面直径的抽出的带状束。离子源可以使用无芯鞍型线圈（112,112a-c）来提供限制等离子体在离子源中的均匀场。带状光束可以穿过弯曲磁体（17），弯曲磁体将光束弯曲在色带的平面内。

3. 发明申请

WO2017196659A1 ION BEAM FILTER FOR A NEUTRON GENERATOR 审中-公开
标题翻译：用于中子发生器的离子束滤波器
公开(公告)号：WO2017196659A1
公开(公告)日：2017-11-16
申请号：PCT/US2017/031262
申请日：2017-05-05
申请人： NEUTRON THERAPEUTICS, INC. , RYDING, Geoffrey , SAKASE, Takao , PARK, William, H. , SMICK, Theodore, H.
发明人： RYDING, Geoffrey , SAKASE, Takao , PARK, William, H. , SMICK, Theodore, H.
IPC分类号： H05H3/06 , G01N23/222 , A61N5/10 , G01N23/207 , G21G4/02
摘要： The present disclosures relates to an ion beam assembly where a relatively small deflection angle (approximately 15° from the center of the beam line) is used in conjunction with two beam dumps located on either side of the beam. In some embodiments, the combination of the two beam dumps and the magnet assembly can provide an ion beam filter. In some embodiments, the resulting system provides a smaller, safer and more reliable ion beam. In some embodiments, the ion beam can be a proton beam.
摘要翻译：本公开涉及一种离子束组件，其中与离子束任一侧上的两个离子束堆积物结合使用相对较小的偏转角（距离束线中心大约15°）。在一些实施例中，两个束流泵和磁体组件的组合可以提供离子束过滤器。在一些实施例中，所得系统提供更小，更安全且更可靠的离子束。在一些实施例中，离子束可以是质子束。

4. 发明申请

WO2011017203A1 MIRROR-IMAGE VOLTAGE SUPPLY 审中-公开
标题翻译：镜像电压供应
公开(公告)号：WO2011017203A1
公开(公告)日：2011-02-10
申请号：PCT/US2010/043793
申请日：2010-07-29
申请人： TWIN CREEKS TECHNOLOGIES, INC. , RICHARDS, Steven , RYDING, Geoffrey , SMICK, Theodore
发明人： RICHARDS, Steven , RYDING, Geoffrey , SMICK, Theodore
IPC分类号： H02M7/10
CPC分类号： H02M7/103 , H02M2001/0077
摘要： A voltage supply incorporates two voltage supplies connected in a mirror-image series arrangement to generate a DC voltage between the respective common terminals of the voltage supplies.
摘要翻译：电压源包括以镜像串联装置连接的两个电压源，以在电压源的相应公共端之间产生直流电压。

5. 发明申请

WO2008053138A1 ION BEAM DIAGNOSTICS 审中-公开
标题翻译：离子束诊断
公开(公告)号：WO2008053138A1
公开(公告)日：2008-05-08
申请号：PCT/GB2007/003657
申请日：2007-09-25
申请人： APPLIED MATERIALS, INC. , RYDING, Geoffrey , SMICK, Theodore H. , SAKASE, Takao , FARLEY, Marvin
发明人： RYDING, Geoffrey , SMICK, Theodore H. , SAKASE, Takao , FARLEY, Marvin
IPC分类号： H01J37/244 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/244 , H01J2237/24405 , H01J2237/2446 , H01J2237/24507 , H01J2237/24542 , H01J2237/24578
摘要： This invention relates to a method of measuring a property of an ion beam, for example an ion beam (34) current profile or the emittance of an ion beam (34). A Faraday array (54) comprising an array of ion beam current sensors (58) is employed. The array can provide an ion beam current profile at the plane of the array. The Faraday array is also used in conjunction with an occluding element (56) that may be moved through the ion beam upstream of the Faraday array, there obscuring varying portions of the ion beam from the Faraday array. Suitable manipulation of the signals from the Faraday allows the ion beam current profile to be determined for the plane of the occluding element, and also for the emittance of the ion beam at the plane of the occluding element to be determined.
摘要翻译：本发明涉及一种测量离子束的性质的方法，例如离子束（34）的电流分布或离子束（34）的发射率。采用包括离子束电流传感器（58）阵列的法拉第阵列（54）。该阵列可以在阵列的平面处提供离子束电流分布。法拉第阵列还与可以移动通过法拉第阵列上游的离子束的阻塞元件（56）结合使用，这掩盖了来自法拉第阵列的离子束的变化部分。适当地操纵来自法拉第的信号允许针对封闭元件的平面确定离子束电流轮廓，并且还确定待确定的阻塞元件平面处的离子束的发射率。

6. 发明申请

WO2010008455A3 LOW- INERTIA MULTI -AXIS MULTI -DIRECTIONAL MECHANICALLY SCANNED ION IMPLANTATION SYSTEM 审中-公开
公开(公告)号：WO2010008455A3
公开(公告)日：2010-01-21
申请号：PCT/US2009/003718
申请日：2009-06-23
申请人： AXCELIS TECHNOLOGIES, INC. , SMICK, Theodore , EIDE, Paul , RYDING, Geoffrey , FARLEY, Marvin , HORNER, Ronald , OTA, Kan
发明人： SMICK, Theodore , EIDE, Paul , RYDING, Geoffrey , FARLEY, Marvin , HORNER, Ronald , OTA, Kan
IPC分类号： H01J37/20 , H01J37/317 , F16M11/18
摘要： An ion implantation system (100) configured to produce an ion beam (210) is provided, wherein an end station (216) has a robotic architecture (250) having at least four degrees of freedom. An end effector (229) operatively coupled to the robotic architecture selectively grips and translates a workpiece (228) through the ion beam. The robotic architecture has a plurality of motors (254) operatively coupled to the end station, each having a rotational shaft (256). At least a portion of each rotational shaft generally resides within the end station, and each of the plurality of motors has a linkage assembly (252) respectively associated therewith, wherein each linkage assembly respectively has a crank arm (258) and a strut (260). The crank arm of each linkage assembly is fixedly coupled to the respective rotational shaft, and the strut of each linkage assembly is pivotally coupled to the respective crank arm at a first joint (262), and pivotally coupled to the end effector at a second joint (264).

7. 发明申请

WO2013074523A1 ION IMPLANT APPARATUS AND A METHOD OF IMPLANTING IONS 审中-公开
标题翻译：离子植入装置和离子注入方法
公开(公告)号：WO2013074523A1
公开(公告)日：2013-05-23
申请号：PCT/US2012/064829
申请日：2012-11-13
申请人： GTAT, CORPORATION , SMICK, Theodore , RYDING, Geoffrey , GLAVISH, Hilton , SAKASE, Takao , PARK, William , EIDE, Paul , ARNOLD, Drew , HORNER, Ronald , GILLESPIE, Joseph
发明人： SMICK, Theodore , RYDING, Geoffrey , GLAVISH, Hilton , SAKASE, Takao , PARK, William , EIDE, Paul , ARNOLD, Drew , HORNER, Ronald , GILLESPIE, Joseph
IPC分类号： H01J37/317 , H01L21/265 , H01L31/18
CPC分类号： C23C14/48 , H01J37/1475 , H01J37/20 , H01J37/3171 , H01J2237/1523 , H01J2237/20214
摘要： Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H + , is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.
摘要翻译：使用鼓式扫描轮的离子注入装置保持总锥角小于60°的晶片。准直的扫描的离子束，例如H +，沿着与扫描轮的旋转轴线成至少45°的角度的最终光束路径被引导。在扫描或质量分析之前，从源中提取离子并沿线性加速路径加速至高注入能量（大于500keV）。质量分析器可以位于旋转轴附近，并且不需要的离子被引导到可以安装在扫描轮上的环形光焦点。

8. 发明申请

WO2010085351A1 ION BEAM ANGLE CALIBRATION AND EMITTANCE MEASUREMENT SYSTEM FOR RIBBON BEAMS 审中-公开
标题翻译：离子束角度校准和辐射测量系统
公开(公告)号：WO2010085351A1
公开(公告)日：2010-07-29
申请号：PCT/US2010/000169
申请日：2010-01-22
申请人： AXCELIS TECHNOLOGIES, INC. , FARLEY, Marvin , POLNER, Donald , RYDING, Geoffrey , SMICK, Theodore , SAKASE, Takao , HORNER, Ronald , EISNER, Edward , EIDE, Paul , FREER, Brian , LAMBERT, Mark , BECKEL, Donovan
发明人： FARLEY, Marvin , POLNER, Donald , RYDING, Geoffrey , SMICK, Theodore , SAKASE, Takao , HORNER, Ronald , EISNER, Edward , EIDE, Paul , FREER, Brian , LAMBERT, Mark , BECKEL, Donovan
IPC分类号： H01J37/244 , H01J37/317
CPC分类号： H01J37/244 , H01J37/3171 , H01J2237/024 , H01J2237/24507 , H01J2237/24528 , H01J2237/24535 , H01J2237/24542
摘要： An ion beam angle calibration and emittance measurement system (200), comprising a plate comprising an elongated slit (204) therein, wherein the elongated slit positioned at a rotation center of the plate and configured to allow a first beam portion (213) to pass therethrough. A beam current detector (202) located downstream of the plate, wherein the beam current detector comprises a slit (208) therein configured to permit a second beam portion (215) of the first beam portion to pass therethrough, wherein the beam current detector is configured to measure a first beam current associated with the first beam portion. A beam angle detector (206) is located downstream of the beam current detector and configured to detect a second beam current associated with the second beam portion. The plate, the current beam detector and the beam angle detector are configured to collectively rotate about the rotation center of the plate.
摘要翻译：一种离子束角度校准和发射测量系统（200），包括其中包括细长狭缝（204）的板，其中所述细长狭缝位于所述板的旋转中心并且被配置为允许第一梁部分（213）通过穿过。一种位于所述板下游的光束电流检测器（202），其中所述光束电流检测器包括其中构造成允许所述第一光束部分的第二光束部分（215）穿过其中的狭缝（208），其中所述光束电流检测器被配置为测量与所述第一光束部分相关联的第一光束电流。光束角度检测器（206）位于束电流检测器的下游，并被配置为检测与第二光束部分相关联的第二光束电流。板，当前的束检测器和束角检测器构造成围绕板的旋转中心共同旋转。

9. 发明申请

WO2010008458A1 POST-DECEL MAGNETIC ENERGY FILTER FOR ION IMPLANTATION SYSTEMS 审中-公开
标题翻译：用于离子植入系统的后胶磁能过滤器
公开(公告)号：WO2010008458A1
公开(公告)日：2010-01-21
申请号：PCT/US2009/003722
申请日：2009-06-23
申请人： AXCELIS TECHNOLOGIES, INC. , RYDING, Geoffrey , FARLEY, Marvin , VANDERBERG, Bo , SMICK, Theodore , SAKASE, Takao
发明人： RYDING, Geoffrey , FARLEY, Marvin , VANDERBERG, Bo , SMICK, Theodore , SAKASE, Takao
IPC分类号： H01J37/05 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/05 , H01J2237/0492 , H01J2237/103 , H01J2237/1405 , H01J2237/1501 , H01J2237/1523 , H01J2237/153 , H01J2237/21 , H01J2237/24528 , H01J2237/31705
摘要： A system (200) and method for magnetically filtering an ion beam (210) during an ion implantation into a workpiece (228) is provided, wherein ions are emitted from an ion source (212) and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer (214), wherein ions are selected. The ion beam is then decelerated via a decelerator (242) once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered downstream of the deceleration. The magnetic filtering is provided by a quadrapole (quadrupole) magnetic energy filter (250), wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals (264).
摘要翻译：提供了一种用于在离子注入工件（228）期间对离子束（210）进行磁过滤的系统（200）和方法，其中离子从离子源（212）发射并将离子从离子源加速到形成离子束。通过质量分析器（214）对离子束进行质量分析，其中选择离子。一旦离子束被质量分析，离子束然后通过减速器（242）减速，并且离子束在减速度的下游进一步磁过滤。磁过滤由四极（四极）磁能过滤器（250）提供，其中形成磁场用于截取离开减速器的离子束中的离子，以选择性地过滤不期望的离子和快速中和（264）。

10. 发明申请

WO2008053139A2 SHAPED APERTURES IN AN ION IMPLANTER 审中-公开
标题翻译：在离子植入物中形成的形状
公开(公告)号：WO2008053139A2
公开(公告)日：2008-05-08
申请号：PCT/GB2007/003672
申请日：2007-09-26
申请人： APPLIED MATERIALS, INC. , RYDING, Geoffrey , SAKASE, Takao , FARLEY, Marvin , HAYS, Stephen
发明人： RYDING, Geoffrey , SAKASE, Takao , FARLEY, Marvin , HAYS, Stephen
IPC分类号： H01J37/09 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/09 , H01J2237/0451
摘要： This invention relates to shaped apertures in an ion implanter that may act to clip an ion beam and so adversely affect uniformity of an implant. In particular, the present invention finds application in ion implanters that employ scanning of a substrate to be implanted relative to the ion beam such that the ion beam traces a raster pattern over the substrate. An ion implanter is provided comprising: a substrate scanner arranged to scan a substrate repeatedly through an ion beam in a scanning direction substantially transverse to the ion beam path, thereby forming a series of scan lines across the substrate; and an aperture plate having provided therein an aperture positioned on the ion beam path upstream of the substrate scanner, and wherein the aperture is defined in part by an inwardly-facing projection.
摘要翻译：本发明涉及离子注入机中的成形孔，其可以用于夹住离子束并且对输入物的均匀性产生不利影响。特别地，本发明应用于使用相对于离子束进行植入的衬底的扫描的离子注入器，使得离子束在衬底上追踪光栅图案。提供了一种离子注入机，包括：衬底扫描器，其布置成在基本上横向于离子束路径的扫描方向上反复扫描基板通过离子束，从而在衬底上形成一系列扫描线; 以及孔板，其中设置有位于所述基板扫描器上游的离子束路径上的孔，并且其中所述孔部分地由向内的突起限定。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式