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1. 发明申请

WO2013074523A1 ION IMPLANT APPARATUS AND A METHOD OF IMPLANTING IONS 审中-公开
标题翻译：离子植入装置和离子注入方法
公开(公告)号：WO2013074523A1
公开(公告)日：2013-05-23
申请号：PCT/US2012/064829
申请日：2012-11-13
申请人： GTAT, CORPORATION , SMICK, Theodore , RYDING, Geoffrey , GLAVISH, Hilton , SAKASE, Takao , PARK, William , EIDE, Paul , ARNOLD, Drew , HORNER, Ronald , GILLESPIE, Joseph
发明人： SMICK, Theodore , RYDING, Geoffrey , GLAVISH, Hilton , SAKASE, Takao , PARK, William , EIDE, Paul , ARNOLD, Drew , HORNER, Ronald , GILLESPIE, Joseph
IPC分类号： H01J37/317 , H01L21/265 , H01L31/18
CPC分类号： C23C14/48 , H01J37/1475 , H01J37/20 , H01J37/3171 , H01J2237/1523 , H01J2237/20214
摘要： Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H + , is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.
摘要翻译：使用鼓式扫描轮的离子注入装置保持总锥角小于60°的晶片。准直的扫描的离子束，例如H +，沿着与扫描轮的旋转轴线成至少45°的角度的最终光束路径被引导。在扫描或质量分析之前，从源中提取离子并沿线性加速路径加速至高注入能量（大于500keV）。质量分析器可以位于旋转轴附近，并且不需要的离子被引导到可以安装在扫描轮上的环形光焦点。

2. 发明申请

WO2012092026A3 A METHOD AND APPARATUS FOR FORMING A THIN LAMINA 审中-公开
标题翻译：一种形成薄板的方法和设备
公开(公告)号：WO2012092026A3
公开(公告)日：2012-10-11
申请号：PCT/US2011066195
申请日：2011-12-20
申请人： TWIN CREEKS TECHNOLOGIES INC , KELL ADAM , CLARK-PHELPS ROBERT , GILLESPIE JOSEPH D , PRABHU GOPAL , SAKASE TAKAO , SMICK THEODORE H , ZUNIGA STEVE , BABABYAN STEVE
发明人： KELL ADAM , CLARK-PHELPS ROBERT , GILLESPIE JOSEPH D , PRABHU GOPAL , SAKASE TAKAO , SMICK THEODORE H , ZUNIGA STEVE , BABABYAN STEVE
IPC分类号： H01L31/18 , H01L21/265 , H01L21/67 , H01L31/042
CPC分类号： H01L21/6838 , H01L21/67092 , H01L21/67132 , H01L21/76254 , H01L31/022466 , H01L31/056 , H01L31/1804 , Y02E10/52 , Y02E10/547 , Y02P70/521
摘要： A method for producing a lamina from a donor body includes implanting the donor body with an ion dosage and heating the donor body to an implant temperature during implanting. The donor body is separably contacted with a susceptor assembly, where the donor body and the susceptor assembly are in direct contact. A lamina is exfoliated from the donor body by applying a thermal profile to the donor body. Implantation and exfoliation conditions may be adjusted in order to maximize the defect-free area of the lamina.
摘要翻译：用于由施主体产生薄层的方法包括用离子剂量植入施主体并在植入期间将施主体加热至植入温度。施主体与感受器组件分离地接触，其中施主体和感受器组件直接接触。通过对供体施加热分布来将层压体从供体中剥离。可以调整植入和剥离条件以最大化椎板的无缺陷区域。

3. 发明申请

WO2010008458A1 POST-DECEL MAGNETIC ENERGY FILTER FOR ION IMPLANTATION SYSTEMS 审中-公开
标题翻译：用于离子植入系统的后胶磁能过滤器
公开(公告)号：WO2010008458A1
公开(公告)日：2010-01-21
申请号：PCT/US2009/003722
申请日：2009-06-23
申请人： AXCELIS TECHNOLOGIES, INC. , RYDING, Geoffrey , FARLEY, Marvin , VANDERBERG, Bo , SMICK, Theodore , SAKASE, Takao
发明人： RYDING, Geoffrey , FARLEY, Marvin , VANDERBERG, Bo , SMICK, Theodore , SAKASE, Takao
IPC分类号： H01J37/05 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/05 , H01J2237/0492 , H01J2237/103 , H01J2237/1405 , H01J2237/1501 , H01J2237/1523 , H01J2237/153 , H01J2237/21 , H01J2237/24528 , H01J2237/31705
摘要： A system (200) and method for magnetically filtering an ion beam (210) during an ion implantation into a workpiece (228) is provided, wherein ions are emitted from an ion source (212) and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer (214), wherein ions are selected. The ion beam is then decelerated via a decelerator (242) once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered downstream of the deceleration. The magnetic filtering is provided by a quadrapole (quadrupole) magnetic energy filter (250), wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals (264).
摘要翻译：提供了一种用于在离子注入工件（228）期间对离子束（210）进行磁过滤的系统（200）和方法，其中离子从离子源（212）发射并将离子从离子源加速到形成离子束。通过质量分析器（214）对离子束进行质量分析，其中选择离子。一旦离子束被质量分析，离子束然后通过减速器（242）减速，并且离子束在减速度的下游进一步磁过滤。磁过滤由四极（四极）磁能过滤器（250）提供，其中形成磁场用于截取离开减速器的离子束中的离子，以选择性地过滤不期望的离子和快速中和（264）。

4. 发明申请

WO2010008455A3 LOW- INERTIA MULTI -AXIS MULTI -DIRECTIONAL MECHANICALLY SCANNED ION IMPLANTATION SYSTEM 审中-公开
公开(公告)号：WO2010008455A3
公开(公告)日：2010-01-21
申请号：PCT/US2009/003718
申请日：2009-06-23
申请人： AXCELIS TECHNOLOGIES, INC. , SMICK, Theodore , EIDE, Paul , RYDING, Geoffrey , FARLEY, Marvin , HORNER, Ronald , OTA, Kan
发明人： SMICK, Theodore , EIDE, Paul , RYDING, Geoffrey , FARLEY, Marvin , HORNER, Ronald , OTA, Kan
IPC分类号： H01J37/20 , H01J37/317 , F16M11/18
摘要： An ion implantation system (100) configured to produce an ion beam (210) is provided, wherein an end station (216) has a robotic architecture (250) having at least four degrees of freedom. An end effector (229) operatively coupled to the robotic architecture selectively grips and translates a workpiece (228) through the ion beam. The robotic architecture has a plurality of motors (254) operatively coupled to the end station, each having a rotational shaft (256). At least a portion of each rotational shaft generally resides within the end station, and each of the plurality of motors has a linkage assembly (252) respectively associated therewith, wherein each linkage assembly respectively has a crank arm (258) and a strut (260). The crank arm of each linkage assembly is fixedly coupled to the respective rotational shaft, and the strut of each linkage assembly is pivotally coupled to the respective crank arm at a first joint (262), and pivotally coupled to the end effector at a second joint (264).

5. 发明申请

WO2008053138A1 ION BEAM DIAGNOSTICS 审中-公开
标题翻译：离子束诊断
公开(公告)号：WO2008053138A1
公开(公告)日：2008-05-08
申请号：PCT/GB2007/003657
申请日：2007-09-25
申请人： APPLIED MATERIALS, INC. , RYDING, Geoffrey , SMICK, Theodore H. , SAKASE, Takao , FARLEY, Marvin
发明人： RYDING, Geoffrey , SMICK, Theodore H. , SAKASE, Takao , FARLEY, Marvin
IPC分类号： H01J37/244 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/244 , H01J2237/24405 , H01J2237/2446 , H01J2237/24507 , H01J2237/24542 , H01J2237/24578
摘要： This invention relates to a method of measuring a property of an ion beam, for example an ion beam (34) current profile or the emittance of an ion beam (34). A Faraday array (54) comprising an array of ion beam current sensors (58) is employed. The array can provide an ion beam current profile at the plane of the array. The Faraday array is also used in conjunction with an occluding element (56) that may be moved through the ion beam upstream of the Faraday array, there obscuring varying portions of the ion beam from the Faraday array. Suitable manipulation of the signals from the Faraday allows the ion beam current profile to be determined for the plane of the occluding element, and also for the emittance of the ion beam at the plane of the occluding element to be determined.
摘要翻译：本发明涉及一种测量离子束的性质的方法，例如离子束（34）的电流分布或离子束（34）的发射率。采用包括离子束电流传感器（58）阵列的法拉第阵列（54）。该阵列可以在阵列的平面处提供离子束电流分布。法拉第阵列还与可以移动通过法拉第阵列上游的离子束的阻塞元件（56）结合使用，这掩盖了来自法拉第阵列的离子束的变化部分。适当地操纵来自法拉第的信号允许针对封闭元件的平面确定离子束电流轮廓，并且还确定待确定的阻塞元件平面处的离子束的发射率。

6. 发明申请

WO0113410A9 WAFER HOLDER ASSEMBLY 审中-公开
标题翻译：晶片夹持器组件
公开(公告)号：WO0113410A9
公开(公告)日：2001-08-16
申请号：PCT/US0022677
申请日：2000-08-17
申请人： IBIS TECHNOLOGY INC , BLAKE JULIAN G , SMICK THEODORE H , ANDREWS ROBERT S , CORDTS BERNHARD F III , RYDING GEOFFREY
发明人： BLAKE JULIAN G , SMICK THEODORE H , ANDREWS ROBERT S , CORDTS BERNHARD F III , RYDING GEOFFREY
IPC分类号： H01J37/317 , H01L21/265 , H01L21/683 , H01L21/687 , H01L21/00
CPC分类号： H01L21/687
摘要： A wafer holder assembly for use in an ion implantation system includes at least one base structural member attachable to an end-station within the implantation system. At least a wafer-holding member, formed of an electrically conductive refractive material, is coupled to the base member and is adapted to hold a wafer in the path of an ion beam within the ion implantation system. The wafer holder assembly can include first and second main structural members from which first and second wafer-holding arms extend. The first arm is secured to the main structural members by a graphite retaining member. The second arm is pivotally biased to a wafer-hold position by a graphite bias member. This arrangement provides a conductive path from the wafer to the assembly for inhibiting electrical discharges form the wafer during the ion implantation process. The wafer-contacting pins at the distal end of the arms can be formed form silicon or graphite. The pins can be coated, for example, with titanium nitride to enhance electrical contact with the wafer and to provide an abrasion resistant surface. The pins can have a limited profile to minimize the amount of pin material proximate the wafer for reducing the likelihood of electrical arcing from the wafer to the pin.
摘要翻译：用于离子注入系统的晶片保持器组件包括至少一个可连接到植入系统内的终端站的基座结构构件。由导电折射材料形成的至少一个晶片保持构件联接到基座构件并且适于将晶片保持在离子注入系统内的离子束的路径中。晶片保持器组件可以包括第一和第二主要结构部件，第一和第二晶片保持臂从该主要结构部件延伸。第一臂通过石墨保持构件固定到主要结构构件。第二臂通过石墨偏置构件枢转地偏置到晶片保持位置。该布置提供从晶片到组件的导电路径，用于在离子注入过程期间抑制从晶片的放电。臂的远端处的晶片接触销可以由硅或石墨形成。例如，可以用氮化钛涂覆引脚以增强与晶片的电接触并提供耐磨表面。这些引脚可以具有有限的轮廓以最小化邻近晶片的引脚材料的量，以降低从晶片到引脚的电弧的可能性。

7. 发明申请

WO2011017203A1 MIRROR-IMAGE VOLTAGE SUPPLY 审中-公开
标题翻译：镜像电压供应
公开(公告)号：WO2011017203A1
公开(公告)日：2011-02-10
申请号：PCT/US2010/043793
申请日：2010-07-29
申请人： TWIN CREEKS TECHNOLOGIES, INC. , RICHARDS, Steven , RYDING, Geoffrey , SMICK, Theodore
发明人： RICHARDS, Steven , RYDING, Geoffrey , SMICK, Theodore
IPC分类号： H02M7/10
CPC分类号： H02M7/103 , H02M2001/0077
摘要： A voltage supply incorporates two voltage supplies connected in a mirror-image series arrangement to generate a DC voltage between the respective common terminals of the voltage supplies.
摘要翻译：电压源包括以镜像串联装置连接的两个电压源，以在电压源的相应公共端之间产生直流电压。

8. 发明申请

WO2010008455A2 LOW- INERTIA MULTI -AXIS MULTI -DIRECTIONAL MECHANICALLY SCANNED ION IMPLANTATION SYSTEM 审中-公开
标题翻译：低精度多相多机器人机械扫描离子植入系统
公开(公告)号：WO2010008455A2
公开(公告)日：2010-01-21
申请号：PCT/US2009003718
申请日：2009-06-23
申请人： AXCELIS TECH INC , SMICK THEODORE , EIDE PAUL , RYDING GEOFFREY , FARLEY MARVIN , HORNER RONALD , OTA KAN
发明人： SMICK THEODORE , EIDE PAUL , RYDING GEOFFREY , FARLEY MARVIN , HORNER RONALD , OTA KAN
IPC分类号： H01J37/20 , F16M11/18 , H01J37/317
CPC分类号： H01J37/3171 , F16M11/123 , F16M11/18 , H01J37/20 , H01J2237/20 , H01J2237/2007 , H01J2237/202 , H01J2237/20278
摘要： An ion implantation system configured to produce an ion beam is provided, wherein an end station has a robotic architecture having at least four degrees of freedom. An end effector operatively coupled to the robotic architecture selectively grips and translates a workpiece through the ion beam. The robotic architecture has a plurality of motors operatively coupled to the end station, each having a rotational shaft. At least a portion of each rotational shaft generally resides within the end station, and each of the plurality of motors has a linkage assembly respectively associated therewith, wherein each linkage assembly respectively has a crank arm and a strut. The crank arm of each linkage assembly is fixedly coupled to the respective rotational shaft, and the strut of each linkage assembly is pivotally coupled to the respective crank arm at a first joint, and pivotally coupled to the end effector at a second joint.
摘要翻译：提供了一种配置成产生离子束的离子注入系统，其中端站具有至少四个自由度的机器人结构。可操作地耦合到机器人架构的末端执行器选择性地夹持和平移工件通过离子束。机器人结构具有可操作地联接到终端站的多个电动机，每个电动机具有旋转轴。每个旋转轴的至少一部分通常位于终端站内，并且多个电动机中的每一个具有分别与其相关联的联动组件，其中每个连杆组件分别具有曲柄臂和支柱。每个连杆组件的曲柄臂固定地联接到相应的旋转轴，并且每个连杆组件的支柱在第一关节处枢转地联接到相应的曲柄臂，并且在第二关节处可枢转地联接到末端执行器。

9. 发明申请

WO2008053137A1 SUBSTRATE SCANNER APPARATUS 审中-公开
标题翻译：基板扫描仪
公开(公告)号：WO2008053137A1
公开(公告)日：2008-05-08
申请号：PCT/GB2007/003655
申请日：2007-09-26
申请人： APPLIED MATERIALS, INC. , SMICK, Theodore , HORNER, Ronald
发明人： SMICK, Theodore , HORNER, Ronald
IPC分类号： H01J37/20 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/20 , H01J2237/20228 , H01J2237/20285 , Y10T74/18072
摘要： This invention relates to an apparatus for scanning substrates through an ion beam in the process chamber of an ion implanter. The apparatus comprises a substrate carriage and reaction mass carriage movably mounted to a fixed base. The substrate carriage is adapted to support a substrate holder. Movement of the substrate carriage results in movement of the substrate holder, and substrate mounted therein, through the ion beam. The reaction mass carriage moves in the opposite direction to the substrate carriage to counter any reaction forces exerted on the fixed base as a result of acceleration of the substrate carriage.
摘要翻译：本发明涉及一种用于通过离子注入机的处理室中的离子束扫描基板的装置。该装置包括可移动地安装到固定基座的基底托架和反作用物质托架。衬底托架适于支撑衬底保持器。衬底托架的移动导致衬底保持器和其中安装的衬底通过离子束的移动。反作用物质托架在与基板托架相反的方向上移动，以抵抗由于基板托架的加速而施加在固定基座上的任何反作用力。

10. 发明申请

WO2006132878A2 ROTATING SUBSTRATE SUPPORT AND METHODS OF USE 审中-公开
标题翻译：旋转基板支持和使用方法
公开(公告)号：WO2006132878A2
公开(公告)日：2006-12-14
申请号：PCT/US2006/021077
申请日：2006-05-31
申请人： APPLIED MATERIALS, INC. , SMITH, Jacob , TAM, Alexander , IYER, R, Suryanarayanan , SEUTTER, Sean , TRAN, Binh , MERRY, Nir , BRAILOVE, Adam , SHYDO JR., Robert , ANDREWS, Robert , ROBERTS, Frank , SMICK, Theodore , RYDING, Geoffrey
发明人： SMITH, Jacob , TAM, Alexander , IYER, R, Suryanarayanan , SEUTTER, Sean , TRAN, Binh , MERRY, Nir , BRAILOVE, Adam , SHYDO JR., Robert , ANDREWS, Robert , ROBERTS, Frank , SMICK, Theodore , RYDING, Geoffrey
IPC分类号： C23C16/458
CPC分类号： H01L21/68792 , C23C16/4584 , H01L21/67126 , H01L21/68742
摘要： A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.
摘要翻译：本文公开了一种利用旋转衬底支撑件来处理衬底的方法和装置。在一个实施例中，用于处理衬底的装置包括具有设置在腔室内的衬底支撑组件的室。衬底支撑组件包括具有支撑表面的衬底支撑件和设置在支撑表面下方的加热器。轴连接到基板支撑件，并且电机通过转子联接到轴，以向基板支撑件提供旋转运动。密封块设置在转子周围并与其形成密封。密封块具有至少一个密封件和沿密封块和轴之间的界面设置的至少一个通道。端口连接到每个通道以连接到泵。升降机构联接到轴上以升高和降低基板支撑。

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