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    • 3. 发明专利
    • Method for producing coated member
    • 生产涂层成员的方法
    • JP2006257466A
    • 2006-09-28
    • JP2005074129
    • 2005-03-15
    • Jtekt CorpToyota Central Res & Dev Lab Inc株式会社ジェイテクト株式会社豊田中央研究所
    • ANDO JUNJIKUWABARA HIROBUMIFURUHASHI TADATAKEMORI HIROYUKINAKANISHI KAZUYUKITACHIKAWA HIDEO
    • C23C8/36C23C16/02C23C28/04
    • PROBLEM TO BE SOLVED: To provide a method for producing a coated member where a coated member having excellent adhesion between a base material and a coating film can be obtained.
      SOLUTION: The method for producing a coated member comprises: a nitride intermediate layer forming stage where a nitride intermediate layer 10 composed of nitride is formed on the surface part of a base material 1; and a coating film forming stage where a coating film 2 is formed on the nitride intermediate layer 10. In the nitride intermediate layer forming stage, the nitride intermediate layer 10 is formed ≥1 μm in thickness, and the surface of the nitride intermediate layer 10 is made into a rugged face 11 having projecting parts in which the average height is 10 to 100 nm and the average width is 10 to 500 nm. In the nitride intermediate layer forming stage, by forming the nitride intermediate layer ≥1 μm in thickness, the surface of the base material is nitrided, and further, the rugged face sufficient for holding high adhesion with the coating film can be formed.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种涂覆部件的制造方法,其中可以获得在基材和涂膜之间具有优异粘附性的涂布部件。 解决方案:涂覆部件的制造方法包括:氮化物中间层形成阶段,其中在基材1的表面部分上形成由氮化物构成的氮化物中间层10; 以及在氮化物中间层10上形成涂膜2的涂膜形成阶段。在氮化物中间层形成阶段,氮化物中间层10的厚度形成为≥1μm以上,氮化物中间层10的表面 制成具有平均高度为10〜100nm,平均宽度为10〜500nm的突出部的粗糙面11。 在氮化物中间层形成阶段,通过形成厚度为1μm以上的氮化物中间层,使基材的表面氮化,并且可以形成足以与涂膜保持高粘合性的粗糙面。 版权所有(C)2006,JPO&NCIPI
    • 5. 发明专利
    • Amorphous-carbon coated member
    • 非晶碳涂层成员
    • JP2006291355A
    • 2006-10-26
    • JP2006071701
    • 2006-03-15
    • Jtekt CorpToyota Central Res & Dev Lab Inc株式会社ジェイテクト株式会社豊田中央研究所
    • SAITO TOSHIYUKIANDO JUNJINAKANISHI KAZUYUKIMORI HIROYUKITACHIKAWA HIDEO
    • C23C16/26
    • PROBLEM TO BE SOLVED: To provide an amorphous-carbon coated member exhibiting not only good wear resistance but also low aggressiveness against mating member simultaneously.
      SOLUTION: The amorphous-carbon coated member according to the present invention comprises a conductive substrate, and an amorphous carbon film fixed onto a part of a surface of the substrate at least. Moreover, the amorphous carbon film comprises a compositionally gradient film. The compositionally gradient film is composed of carbon as a major component, silicon whose concentration inclines continuously so that the silicon concentration is the highest on the substrate side, and hydrogen whose concentration inclines continuously so that the hydrogen concentration is the lowest on the substrate side. Since the amorphous carbon film comprises the compositionally gradient film in which the silicon concentration inclines gradually so that the silicon concentration is the highest on the substrate side, the amorphous carbon film exhibits the highest hardness on the substrate side so that the substrate side can secure the strength of the amorphous carbon film. Additionally, since the amorphous carbon film comprises the compositionally gradient film in which the hydrogen concentration inclines continuously so that the hydrogen concentration is the lowest on the substrate side, the amorphous carbon film exhibits the lowest hardness on the outer side so that the aggressiveness against mating member is reduced.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供不仅具有良好的耐磨性,而且对配合构件同时具有低侵蚀性的非晶碳涂层构件。 解决方案:根据本发明的无定形碳涂覆部件至少包括固定到基板的一部分表面上的导电基板和无定形碳膜。 此外,无定形碳膜包括组成梯度膜。 组成梯度膜由碳作为主要成分,其浓度连续倾斜,硅浓度在基板侧最高,其浓度连续倾斜,使得氢浓度在基板侧最低。 由于无定形碳膜包含其中硅浓度逐渐倾斜的组成梯度膜,使得硅衬底侧的硅浓度最高,所以无定形碳膜在衬底侧表现出最高的硬度,使得衬底侧可以固定 无定形碳膜的强度。 此外,由于无定形碳膜包含其中氢浓度连续倾斜以使得在基板侧上的氢浓度最低的组成梯度膜,所以非晶碳膜在外侧表现出最低的硬度,使得对配合的侵蚀性 会员减少 版权所有(C)2007,JPO&INPIT
    • 7. 发明专利
    • Low friction sliding member
    • 低摩擦滑动构件
    • JP2007023356A
    • 2007-02-01
    • JP2005209114
    • 2005-07-19
    • Toyota Central Res & Dev Lab Inc株式会社豊田中央研究所
    • MORI HIROYUKISHIMIZU FUMIOIGARASHI SHINTAROTACHIKAWA HIDEOMATSUI MUNEHISAOSHIMA TADASHIIZEKI TAKASHINAKANISHI KAZUYUKI
    • C23C16/27C10M103/02C10M103/06C10N20/00C10N30/06C10N40/02C10N40/25C10N50/08C23C30/00
    • PROBLEM TO BE SOLVED: To provide a low friction sliding member with which the friction between a counterpart member and itself can be lowered even if the surface roughness of a sliding surface is large.
      SOLUTION: The low friction sliding member 1 is constituted of a base material 11 and a sliding layer 21 which is formed on the sliding surface side of the base material 11 and brought into contact with the counterpart member formed in a sliding state. The sliding layer 21 is formed from amorphous carbon containing carbon as a main component, >30 to 2 -hybrid orbital is contained in an amount of 40-70 atomic% in the carbon. As the low friction sliding member 1 has a soft sliding layer 21, a sliding surface 21f can be made smooth by sliding even when the surface roughness of the sliding surface 21f is large. A wear resistant layer 22 formed from amorphous carbon containing hydrogen in an amount lower than that of the hydrogen contained in the amorphous carbon of the sliding layer 21 may be provided between the base material 11 and the sliding layer 21. The wear resistant layer 22 imparts a high wear resistance to the soft, low friction sliding member 1.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了提供一种低摩擦滑动构件,即使滑动表面的表面粗糙度大,也可以降低对置构件与其本身之间的摩擦。 解决方案:低摩擦滑动构件1由基材11和滑动层21构成,滑动层21形成在基材11的滑动表面侧上并与形成为滑动状态的配对构件接触。 滑动层21由含有碳为主要成分的无定形碳形成,含有> 30至<50原子%的氢和1.5-20原子%的硅,其中含有sp 2 - 混合轨道的碳 其碳含量为40-70原子%。 由于低摩擦滑动构件1具有柔软的滑动层21,所以即使当滑动面21f的表面粗糙度大时,滑动面21f也能够滑动。 可以在基材11和滑动层21之间设置由非晶碳构成的耐磨层22,该耐磨层22的含量低于滑动层21的无定形碳中含有的氢的量的无定形碳。耐磨层22赋予 对柔软,低摩擦滑动构件1具有高耐磨性。版权所有(C)2007,JPO&INPIT
    • 8. 发明专利
    • Amorphous carbon, amorphous carbon coating film member and method of forming amorphous carbon film
    • 非晶碳,非晶碳涂层薄膜和形成非晶碳膜的方法
    • JP2005187318A
    • 2005-07-14
    • JP2004340860
    • 2004-11-25
    • Toyota Central Res & Dev Lab Inc株式会社豊田中央研究所
    • NAKANISHI KAZUYUKIOSHIMA TADASHIHASEGAWA HIDEOMORI HIROYUKIIZEKI TAKASHITACHIKAWA HIDEOMATSUI MUNEHISA
    • C01B31/02B32B9/00C23C16/26H01L21/205H05H1/24
    • C23C16/26Y10T428/30
    • PROBLEM TO BE SOLVED: To provide soft amorphous carbon having a low elastic modulus, an amorphous carbon coating film member consisting of the amorphous carbon and a method of forming the amorphous carbon film. SOLUTION: The amorphous carbon consists essentially of carbon, contains >30 at% and ≤60 at% hydrogen and has 40 to 150 GPa elastic modulus. The amorphous carbon coating film member consists of a conductive base material 22, and a coating film fixed at least at part of the surface of the base material 22 and consisting of the amorphous carbon. The method of forming the amorphous carbon film comprises forming the amorphous carbon film on the surface of the conductive base material 22 by the plasma CVD method. A plurality of the base materials 22 are arranged so as to face each other on a base material holding tool 21 which is disposed in a film forming furnace 11 and connected to a negative pole. The pressure of treating gas and a plasm power source are operated so that the negative glows 24 of two adjacent base materials 22 overlap each other. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供具有低弹性模量的软无定形碳,由无定形碳组成的无定形碳涂层膜和形成无定形碳膜的方法。 解决方案:无定形碳基本上由碳组成,含有> 30原子%和≤60原子%的氢,并具有40至150GPa的弹性模量。 无定形碳涂膜构件由导电基材22和固定在基材22表面的至少一部分上并由无定形碳构成的涂膜构成。 形成无定形碳膜的方法包括通过等离子体CVD法在导电性基材22的表面上形成无定形碳膜。 多个基材22被布置成在设置在成膜炉11中并连接到负极的基材保持工具21上彼此面对。 操作处理气体和等离子体电源的压力被操作,使得两个相邻基底材料22的负发光体24彼此重叠。 版权所有(C)2005,JPO&NCIPI