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1. 发明专利

JPS642322A PLASMA ETCHING DEVICE 失效
公开(公告)号：JPS642322A
公开(公告)日：1989-01-06
申请号：JP15865587
申请日：1987-06-25
申请人： TOSHIBA CORP
发明人： NAKANO MASANOBU , HAMASHIMA KOTARO , FUJIWARA NAOYOSHI , HORI ITSUKO
IPC分类号： H01L21/302 , H01L21/3065
摘要： PURPOSE:To make it possible to conduct high-speed etching by a method wherein the etching is conducted by confining the plasma produced by microwave excitation in the vicinity of a placing stand using a magnetic field applying means. CONSTITUTION:Etching gas is introduced into the quartz tube 2 of a vacuum container 1. A magnetic field is generated by applying a current on coils 6A and 6B, and at the same time, microwaves are generated by a magnetron 10, and plasma is generated by allowing the magnetic field and a high frequency electric field to work on the etching gas. The generated plasma is confined in the etching chamber located in the vicinity of a placing stand 4 by the magnetic field Mmirror and MCUSP for confinement applied by the coils 6A and 6B, high density plasma is formed in the vicinity of a placing stand 4, and the surface of a wafer 5 is etched.

2. 发明专利

JPS63239803A MAGNETIC-FIELD CORRECTING COIL 失效
公开(公告)号：JPS63239803A
公开(公告)日：1988-10-05
申请号：JP28342086
申请日：1986-11-28
申请人： TOSHIBA CORP
发明人： HAMASHIMA KOTARO
IPC分类号： G01R33/3875 , A61B5/055 , A61B10/00 , H01F7/20
摘要： PURPOSE:To obtain high uniform magnetic-field distribution by symmetrically arranging first and second coil groups, holding a plane in space, mounting first-fourth saddle-shaped coils to each coil group and forming these coils under specific conditions. CONSTITUTION:First and second coil groups 1, 2 having the same constitution are disposed symmetrically into space organized of X, Y and Z axes, holding XY planes. The coil group 1 has first-fourth saddle-shaped coils 11-14. The saddle-shaped coils 11, 13 and 12, 14 are constructed and disposed symmetrically, holding a Z axis respectively, the length of the arcuate sections of separate saddle-shaped coil is brought to length where angles facing both ends of these arcuate sections from the Z axis are at 90 deg., and angles where straight lines facing the arcuate sections of each saddle-shaped coil from an origin forms with the Z axis are set at one of the angles of aperture to the Z axis from the origin represented by Z/r satisfying respective formula shown by the values of cylindrical coordinates (r, phi, Z). The same applies to the coil group 2. Accord ingly, a magnetic field proportional to (X -Y ), an error of which is reduced extremely, is generated selectively, thus acquiring uniform magnetic field distribu tion.

3. 发明专利

JPS63136505A MAGNETIC FIELD CORRECTING COIL 失效
公开(公告)号：JPS63136505A
公开(公告)日：1988-06-08
申请号：JP28264786
申请日：1986-11-27
申请人： TOSHIBA CORP
发明人： HAMASHIMA KOTARO
IPC分类号： G01R33/3875 , A61B5/055 , A61B10/00 , H01F7/20
摘要： PURPOSE:To obtain a uniform high magnetic field distribution by setting angles of first to fourth saddle-shaped coils from an origin with respect to the circular arc parts of the coils to specific angles. CONSTITUTION:First to fourth saddle-shaped coils having circular-arc parts bent around Z-axis of X-, Y-and Z-axes crossing perpendicularly to each other are provided. The first, second and the third, fourth coils are disposed symmetrically through an X-Y plane, and the first, third and the second, fourth coils are disposed symmetrically through the Z-axis. When the lengths of the circular- arcs of the first to fourth coils are set to the lengths that the angles of the coils from the Z-axis to the both ends of the circular-arc parts are 120 deg. and the angle of the linear line from the origin to the circular-arc parts of the first to fourth coils with respect to the Z-axis is represented by the value of cylindrical coordinates (r, phi, z) for indicating the circular-arc part, it is set to one of the opening angles from the origin represented by Z/r for satisfying the equations with respect to the Z-axis. Thus, a magnetic field proportional to the specific sole function can be accurately generated to obtain a uniform high magnetic field distribution.

4. 发明专利

JPS61229306A SUPERCONDUCTING COIL 失效
公开(公告)号：JPS61229306A
公开(公告)日：1986-10-13
申请号：JP6991585
申请日：1985-04-04
申请人： TOSHIBA CORP
发明人： HAMASHIMA KOTARO
IPC分类号： H01F6/04 , H01F6/06 , H01F5/08
摘要： PURPOSE:To make the temperature in a coil uniform as well as to cool a large type coil in a short period by a method wherein a heat equalizing plate is arranged in the coil. CONSTITUTION:A conductor 1 with which a forced cooling operation is performed is wound in a pancake form, and a rectangular heat equalizing plate 2 is arranged between the pancakes. Between conductors 1 and between the conductors 1 and heat-equalizing plates 2 are insulated by an insulating material 3. Said heat equalizing plate 2 is connected to a cooling pipe 4 by welding and the like. The materials such as Al, Cu and the like having a high coefficient of heat conductivity are used as the heat equalizing plate 2. As a result, the temperature inside a coil can be made uniform, and the coil can also be cooled in a short period.

5. 发明专利

JP2001256841A SUPERCONDUCTIVE CABLE AND MAGNET USING THE SAME 失效
公开(公告)号：JP2001256841A
公开(公告)日：2001-09-21
申请号：JP2000070640
申请日：2000-03-14
申请人： TOSHIBA CORP
发明人： HAMASHIMA KOTARO , ONO MICHITAKA , TAKANO HIROHISA
IPC分类号： H01F6/00 , H01B12/08 , H01F6/04
摘要： PROBLEM TO BE SOLVED: To provide a superconductive cable for a large current, with sufficient cable functions with smaller loss but highly stable, and a magnet using the cable. SOLUTION: The superconductive cable has a core 1 such as a pipe, rod, or coil or the like disposed at the center. Superconductive element wires 2, 3, 4, 5, 6 are disposed at the periphery of the core 1 as two or more coaxial layers. The superconductive element wires 2 to 6 are conducted to be twisted together for each layer. The superconductive element wires 2 to 6 are twisted at shorter pitches for all the layers except the innermost layer than those of the innermost layer.

6. 发明专利

JPH06132117A LAMINATED MAGNETIC MATERIAL BODY 失效
公开(公告)号：JPH06132117A
公开(公告)日：1994-05-13
申请号：JP27907492
申请日：1992-10-19
申请人： TOSHIBA CORP
发明人： YAGISAWA TAKESHI , HAMASHIMA KOTARO
IPC分类号： H01F7/20
摘要： PURPOSE:To obtain a laminated magnetic material body which can effectively realize magnetic shield of a metallic body which is moving in a magnetic field. CONSTITUTION:A laminated magnetic material body is formed by laminating thin magnetic plates 3. Magnetic flux distribution entering a metallic body 1 can be corrected by attaching thin magnetic plates 3 on the surface of the metallic body 1 moving in ununiform magnetic field in such a manner that the longitudinal direction of the plates almost matches the moving direction and the width direction thereof becomes perpendicular to the surface of metallic body.

7. 发明专利

JPH04370609A SUPERCONDUCTIVE CONDUCTOR 失效
公开(公告)号：JPH04370609A
公开(公告)日：1992-12-24
申请号：JP14644191
申请日：1991-06-19
申请人： TOSHIBA CORP
发明人： HAMASHIMA KOTARO
IPC分类号： H01B12/12 , H01F6/06
摘要： PURPOSE:To prevent quenching by forming a superconductive coil by winding many superconductive wires on the outside circumference of a circular or elliptic hollow pipe and by inhibiting frictional heating between the superconductive wires and the pipe, and between the superconductive wires. CONSTITUTION:A superconductive conductor 3 is formed by winding superconductive wires 2, in moderate numbers, formed by twisting many superconductive strands on the outside circumference of a hollow pipe 1. The pipe 1 is formed in circular or elliptic shape by using stainless steel. an aluminium alloy, a copper alloy, ceramics etc. Therefore, the conductive wires 2 are pressed to the surface of the pipe 1 and will not float from the surface, and has no acute end portion. Thus, no gap is generated between tire conductive wires 2. This prevents quenching without generating heating caused by sliding the conductive wires 2 over the surface of the pipe even if the conductor 3 is excited, or without generating frictional heating between the conductive wires 2.

8. 发明专利

JPH02126519A SUPERCONDUCTING CONDUCTOR 失效
公开(公告)号：JPH02126519A
公开(公告)日：1990-05-15
申请号：JP27931088
申请日：1988-11-07
申请人： TOSHIBA CORP
发明人： HAMASHIMA KOTARO
IPC分类号： C22C27/02 , H01B12/10 , H01F6/06
摘要： PURPOSE:To reduce AC loss by winding a metal tape or a fine line with pictures around the external circumference of a superconducting wire and bundling and twisting a large number of wound wires to constitute a cable and putting this cable in a tube of stainless steel, etc., and then, heat-treating the tube to form an intermetallic compound superconductor. CONSTITUTION:A fine line 2 or a tape 21 is wound with appropriate pitches lp around the external circumference of a superconducting wire 1 made up of a material constituting Nb3Sn. The superconducting wires around which a fine line or a tape is wound are bundled in an appropriate number and twisted together. The cable is put in a tube made of stainless steel, etc., and then, molded in a prescribed dimension, and then, made into a cable-in-conduit type superconducting conductor through heat-treatment for formation of Nb3Sn, etc. The section between wires is electrically connected through the fine line or the tape by winding it with appropriate pitches around the external circumference of the superconducting wire as above. Thereby, the resistance between the wires increases with the result that AC loss due to a fluctuating magnetic field can be reduced, too.

9. 发明专利

JPS64284A PLASMA ACCELERATOR 失效
公开(公告)号：JPS64284A
公开(公告)日：1989-01-05
申请号：JP14647587
申请日：1987-06-12
申请人： TOSHIBA CORP
发明人： FUJIWARA NAOYOSHI , HAMASHIMA KOTARO , NINOMIYA MASAHARU , YOSHIDA MASAO
IPC分类号： C23F4/00
摘要： PURPOSE:To widen the control range of a plasma speed by adopting the control by Lorentz force and the control by ion energy using high frequencies to accelerate the plasma. CONSTITUTION:A DC voltage is impressed between a pair of accelerating electrodes 1a and 1b by an accelerating power supply 2. A high-frequency power supply 7 is connected to a wafer base 5 which supports a wafer to serve as a target and a high-frequency voltage is impressed between the wafer base 5 and the electrodes 1a, 1b. The plasma 8 flows between the electrodes 1a and 1b and is accelerated toward the wafer base 5. Current (j) flows between the electrodes 1a and 1b and the magnetic field generated by a magnetic field generating means is generated at a specific angle to the current (j) as shown by an arrow B. The Lorentz force F, therefore, acts toward the wafer base 5. The size thereof is determined by jXB. The acceleration of the plasma 8 is executed by controlling the voltage of the accelerating power supply 2.

10. 发明专利

JPS63310979A TRANSPORT DEVICE OF PLASMA 失效
公开(公告)号：JPS63310979A
公开(公告)日：1988-12-19
申请号：JP14647487
申请日：1987-06-12
申请人： TOSHIBA CORP
发明人： HAMASHIMA KOTARO , FUJIWARA NAOYOSHI , OKUYAMA TOSHIHISA , YOSHIDA MASAO
IPC分类号： C23F4/00
摘要： PURPOSE:To efficiently transport plasma to the prescribed direction by overlapping a pulasting magnetic field furthermore on the stationary magnetic field formed on the transport path of plasma in a processing equipment for utilizing plasma. CONSTITUTION:A semiconductor wafer is put on a base 8 for the wafer in a vacuum vessel 6 and microwaves generated in a magnetron 3 are introduced into a quartz pipe 5 via a waveguide 4. A plurality of solenoid coils 1-1-1-n provided to the outside of the quartz 5 are connected with the respective electric sources 2-1-2-n and the respective electric sources are connected with a controlling device 9. The electric sources 2-1-2-n are capable of feeding both stationary current consisting of DC component and pulsating current consisting of AC component, and current overlapped with both components is allowed to flow and the respective electric sources are controlled with the controlling device 9 and thereby the magnetic fields formed by the coils 1-1-1-n can be controlled. The reactive gas supplied through a pipe 7 is made to plasma by resonance of an electric cyclotron based on the microwaves and the magnetic fields caused with the coils, and the semiconductor wafer is subjected to etching processing. The above-mentioned magnetic fields allow plasma to be efficiently transported to the necessary parts on the semiconductor wafer by means of the magnetic gradient due to the pulsating parts of current.

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