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    • 3. 发明专利
    • Method for manufacturing silica glass
    • 制造二氧化硅玻璃的方法
    • JP2005255495A
    • 2005-09-22
    • JP2004071549
    • 2004-03-12
    • Toshiba Ceramics Co Ltd東芝セラミックス株式会社
    • TAKAHASHI KENJIIWASAKI TAKESHIUENO HIROKO
    • C03B8/02
    • PROBLEM TO BE SOLVED: To provide a method for manufacturing silica glass by which bubble-free silica glass is easily manufactured at high yield.
      SOLUTION: In the method for manufacturing the silica glass, transparent silica glass is manufactured by mixing silica sol with silica powder having 1-10 μm particle diameter in a ratio of 1:2-2.3 by pts.wt., pouring the mixture into a forming die and gelating the mixture to form a silica formed body, drying the silica formed body and primarily firing the dried silica formed body at 1,000-1,400°C under the atmosphere to form a silica porous body and firing the silica porous body at a reduced pressure under an inert gas atmosphere in a vacuum pressurizing firing furnace.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种以高产率容易地制造无气泡二氧化硅玻璃的石英玻璃的制造方法。 解决方案:在石英玻璃的制造方法中,透明石英玻璃通过将二氧化硅溶胶与具有1-10μm粒径的二氧化硅粉末以1:2.3.3比例重量比混合制成, 混合物成型成型模并将混合物凝胶化以形成二氧化硅形成体,干燥二氧化硅形成体并在1000-1400℃下在大气下一次焙烧干燥的二氧化硅形成体以形成二氧化硅多孔体,并烧制二氧化硅多孔体 在真空加压烧制炉中在惰性气体气氛下减压。 版权所有(C)2005,JPO&NCIPI