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    • 2. 发明专利
    • Silica material for heat-treatment of semiconductor
    • 二氧化硅材料用于半导体热处理
    • JPS6123315A
    • 1986-01-31
    • JP14245684
    • 1984-07-11
    • Toshiba Ceramics Co Ltd
    • WATABE HIROYUKIKUMAKURA MAKOTOUESHIMA NOBUYUKI
    • H01L21/22H01L21/02
    • PURPOSE: To obtain a high performance semiconductor element with high yield rate by trapping alkali in a heat-treatment furnace by specifying the amount of impurity of alkali metal elements such as Na, K. Li and Al contained in silica glass.
      CONSTITUTION: As a silica material used in the process of heat-treatment of a semiconductor element, the material with Al more than 5ppm, with total amount of alkali metals Na, K and Li less than 2ppm, and {Li(ppm)/A
      1 +Na(ppm)/A
      2 +K (ppm)/A
      3 }/{Al(ppm)/A
      4 }≤0.5 (but A
      1 , A
      2 , A
      3 and A
      4 are atomic weights of Li, Na, K and Al respectively) is used. If the amount of Al becomes less than 5ppm and the above ratio becomes more than 0.5, the amount of Al in an activated state is decreased and can not trap alkali issued from a furnace wall and a soaking tube. If the amount of the alkali metals Na, K and Li are contained more than 2ppm, these metals move and emit from the surface of the silica glass during operation at high temperature and give affect adversely on the semiconductor element.
      COPYRIGHT: (C)1986,JPO&Japio
    • 目的:通过规定在二氧化硅玻璃中含有的碱金属元素如Na,K.Li和Al的杂质的量,在热处理炉中捕获碱来获得高产率的高性能半导体元件。 构成:作为半导体元件的热处理用二氧化硅材料,Al超过5ppm,碱金属Na,K和Li的总量小于2ppm,{Li(ppm)/ A1 + Na(ppm)/ A2 + K(ppm)/ A3} / {Al(ppm)/ A4} <= 0.5(但A1,A2,A3和A4分别为Li,Na,K和Al的原子量) 用过的。 如果Al的量变得小于5ppm且上述比例大于0.5,则活化状态的Al的量减少,并且不能捕获从炉壁和均热管发出的碱。 如果碱金属Na,K和Li的含量超过2ppm,则这些金属在高温运行时从石英玻璃的表面移动并发射,并对半导体元件产生不利影响。
    • 3. 发明专利
    • ELECTROLYZING DEVICE
    • JPS6418927A
    • 1989-01-23
    • JP17399987
    • 1987-07-14
    • TOSHIBA CERAMICS CO
    • UESHIMA NOBUYUKISASAKI YASUMIABE SHIGERU
    • C03B20/00C03B32/00C03C23/00
    • PURPOSE:To efficiently transfer and remove impurities in a molded article and to obtain the molded article of high-purity quartz glass free from devitrification, by heating the molded article of quartz glass held between a positive and a negative electrodes in a furnace under control, impressing a DC electric source to the electrode in an inert gas atmosphere and electrolyzing. CONSTITUTION:A positive electrode 8 having an electrode plate 10 held by a supporting pipe 12 equipped with an inert gas introducing pipe 13 in a furnace 1 which is provided with heating elements 2 and 3, measures temperature by a temperature measuring means 5 equipped with a thermocouple 6 in a protecting pipe 7 and can control the temperature by a temperature regulating means 4 is opposingly set to a negative electrode 9 having an electrode plate 11 at a facing position thereof and a molded article (e.g. core pipe or crucible for pulling up single crystal) 16 of quartz glass is held between the electrodes. Then an inert gas is introduced through a feeding means 14 and a flow velocity setting means 14a from an introducing pipe 13 to the furnace 1, the molded article 16 is heated while controlling at >=1,000 deg.C, an electric current 15 is sent through a DC current source between both the electrodes 8 and 9, the molded article 16 is electrolyzed, impurities are efficiently transferred and removed to give the high-purity molded article 16.
    • 5. 发明专利
    • Fuel cell
    • 燃料电池
    • JPS61131369A
    • 1986-06-19
    • JP25304984
    • 1984-11-30
    • Toshiba Ceramics Co LtdToshiba Chem CorpToshiba Corp
    • SEKI TOSHIAKITSUSHIMA MASAMITSUKOJIMA SUSUMUOKAWA MASAYUKIUESHIMA NOBUYUKINAGATA TSUTOMUITO MITSUO
    • H01M4/96
    • H01M4/96
    • PURPOSE:To prevent the increase of contact resistance and the lowering of conductivity to maintain the stable performance through a long time without causing the lowering of strength and the buckling by using carbon fibers which are made high purity by the processing of chlorine gas at high temperatures as the material of electrodes with ribs. CONSTITUTION:A unit cell is constituted by laminating a matrix 1 impregnating electrolyte, electrodes 2, 3 with ribs which have flow passages 4, 5 for fluid fuel and fluid oxidizing agent and to which catalyst is added and a separator 6. Carbon fibers which are made high purity are used as the material of electrodes 2, 3 with ribs. Carbon fibers which is reduced in impurity content are obtained by raising the temperature of the carbon fibers by the use of a graphitization furnace, and blowing chlorine gas at the temperature of 1,500 deg.C, and raising the temperature of it to 2,300 deg.C to scatter and eliminate impurities as chloride. A carbon porous plate of the electrode with ribs is obtained by carrying out the hot press forming of the mixture of the obtained carbon fibers and phenol series resin, and carrying out the processing of hardening, and carrying out the processing of carbonization for the resin, and carrying out the processing of graphitization.
    • 目的:为了防止接触电阻的增加和导电性的降低,长时间保持稳定的性能,而不会通过使用通过在高温下处理氯气而制成高纯度的碳纤维而导致强度降低和翘曲 作为具有肋的电极的材料。 构成:单元电池通过将基体1浸渍电解质,电极2,3与具有用于流体燃料和流体氧化剂的流动通道4,5和添加有催化剂的隔离物6和隔离物6层压而构成。碳纤维 使用高纯度作为具有肋的电极2,3的材料。 杂质含量降低的碳纤维是通过使用石墨化炉升高碳纤维的温度,在1500℃的温度下吹入氯气,将其升温至2300℃而获得的。 以氯化物分散和消除杂质。 通过进行所得到的碳纤维和酚系树脂的混合物的热压成形,进行硬化处理,进行树脂的碳化处理,得到具有肋的电极的碳多孔板, 并进行石墨化处理。
    • 6. 发明专利
    • Furnace core tube made by silica glass
    • 二氧化硅玻璃制成的FORENACE芯管
    • JPS6123314A
    • 1986-01-31
    • JP14245584
    • 1984-07-11
    • Toshiba Ceramics Co Ltd
    • AOKI MASARUKUMAKURA MAKOTOUESHIMA NOBUYUKI
    • H01L21/22
    • PURPOSE: To obtain a furnace core tube for semiconductor heat-treatment enabled to produce a high performance semiconductor element with high yield rate by specifying the amount of impurity of alkali metal elements such as Na, K and Li which are easy to move inside the silica glass especially in high temperature.
      CONSTITUTION: As a furnace core tube made by silica glass to be used for heat- treatment of semiconductor substance, a material with total amount of less than 2ppm of alkali metal impurity Na, K and Li, and with viscosity of more than 10
      12 poise at 1,200°C is used. By using this material, the alkali metal elements are prevented from moving out of the silica glass and the alkali metals issued from a soaking tube or a furnace wall can be trapped inside the silica glass, thus the production yield rate of semiconductor elements can be increased.
      COPYRIGHT: (C)1986,JPO&Japio
    • 目的:获得半导体热处理炉芯管,能够通过规定容易在二氧化硅内移动的Na,K和Li等碱金属元素的杂质量,以高产率制造高性能半导体元件 玻璃特别是在高温下。 构成:作为用于半导体物质的热处理的石英玻璃制成的炉芯管,总量小于2ppm的碱金属杂质Na,K和Li,粘度大于10 <12的材料 >使用1,200度的poise。 通过使用这种材料,可以防止碱金属元素从石英玻璃中移出,并且可以将由均热管或炉壁产生的碱金属捕获在石英玻璃内部,从而可以提高半导体元件的生产率 。
    • 8. 发明专利
    • QUARTZ GLASS CRUCIBLE AND ITS PRODUCTION
    • JPH0616494A
    • 1994-01-25
    • JP1781791
    • 1991-02-08
    • TOSHIBA CERAMICS CO
    • WATABE HIROYUKIABE SHIGERUUESHIMA NOBUYUKI
    • C03C3/06C03B19/09C03B20/00C04B41/91C30B15/10
    • PURPOSE:To provide the crucible for production of a high-quality silicon single crystal by consisting the crucible of a quartz glass with a natural rock crystal as the raw material, confirming the contents of Na, NLi and Cu to prescribed values or below and specifying the viscosity and electric resistance thereof to prescribed values or above. CONSTITUTION:The natural rock crystal is pulverized and adjusted to 50 to 80# and is refined by a flotation method. The refined powder is molded by arc rotational melting to form the quartz crucible. An electrolysis is then effected >=5 minutes by impressing a high voltage of about 10KV above this crucuble to migrate the alkaline metals and copper in a furnace at about 1300 deg.C, by which the contents of the alkaline metals Na, k and Li are reduced respectively to =10 poises and the electric resistance at 1200 deg.C to >=1.4X10 OMEGAm. The convection of molten silicon is controllable of the electric resistance is high in such a case and, therefore, the erosion quantity on the inside surface of the crucible decreases and the quantity of the oxygen to be dissolved in the crucible is decreased. The alkaline metals are not migrated and the contents thereof are decreased.