专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2006026508A Photocatalyst unit 审中-公开
标题翻译：光电单元
公开(公告)号：JP2006026508A
公开(公告)日：2006-02-02
申请号：JP2004208000
申请日：2004-07-15
申请人： Toshiba Ceramics Co Ltd , 東芝セラミックス株式会社
发明人： ZHOU ZHONGHUA , TOKUTAKE FUMIO , ISHII TATSUYA , YO HIEN , SUZUKI TAKASHI
IPC分类号： B01J19/12 , A61L9/00 , A61L9/01 , A61L9/20 , B01D53/86 , B01J35/02 , B01J35/10
摘要： PROBLEM TO BE SOLVED: To provide a photocatalytic unit in which a ceramic filter having photocatalysis and consequently excellent deodorizing performance is used and which exhibits a maximum photocatalytic result efficiently. SOLUTION: The photocatalytic effect of this photocatalytic unit is improved by arranging a photocatalyst-deposited ceramic porous body, which is obtained by forming a titanium oxide film of ≤1 μm film thickness on the surface layer of a ceramic skeleton and has ≥5 m 2 /cm 3 surface area, and an ultraviolet lamp so that the distance between the photocatalyst-deposited ceramic porous body and the ultraviolet lamp is ≤3 mm. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种光催化单元，其中使用具有光催化作用并因此具有优异除臭性能的陶瓷过滤器，并且其有效地表现出最大的光催化效果。解决方案：通过在陶瓷骨架的表面层上形成膜厚≤1μm的氧化钛膜而形成的光催化剂沉积陶瓷多孔体，改善了该光催化单元的光催化效果， 5μm×SP 2 / SP 3 / SP 3表面积，紫外线灯使得光催化剂沉积陶瓷多孔体与紫外线灯之间的距离≤3mm。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2005047787A Titanium dioxide microparticle and method for producing the same 有权
标题翻译：二氧化钛微球及其制造方法
公开(公告)号：JP2005047787A
公开(公告)日：2005-02-24
申请号：JP2003301138
申请日：2003-08-26
申请人： Toshiba Ceramics Co Ltd , 東芝セラミックス株式会社
发明人： ZHOU ZHONGHUA , TOKUTAKE FUMIO , SHIMAI SHUNZO , KONDO HIROYUKI , ITO YUGO
IPC分类号： C01G23/07 , B01J27/24 , B01J35/02
摘要： PROBLEM TO BE SOLVED: To provide titanium dioxide microparticles which exhibit higher photocatalysis than the conventional upon being irradiated with visible rays and develop photocatalysis excellent in stability and persistence and to provide a method for producing the same.
SOLUTION: The titanium microparticles are obtained by heat-treating titanium dioxide microparticles as a raw material at 500 to 620°C in a reducing gas atmosphere containing a nitrogen-containing gas and are microparticles having a titanium dioxide component content of at least 80 wt.%, and doped with at least two types of anions containing at least 50 ppm of each of at least nitrogen and carbon, and exhibiting isopropanol oxidation activity upon being irradiated with visible rays at a wavelength of 400 to 600 nm.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决的问题：为了提供在照射可见光线时比常规光催化更高的二氧化钛微粒，并且开发稳定性和持久性优异的光催化剂，并提供其制备方法。解决方案：钛微粒通过在含有含氮气体的还原气体气氛中在500-620℃下热处理二氧化钛微粒作为原料而获得，并且是二氧化钛组分含量至少为 80重量％，并且掺杂有至少两种至少含有至少50ppm至少氮和碳的阴离子的阴离子，并且在以400-600nm波长的可见光照射下显示异丙醇氧化活性。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2004121927A Chemical filter 审中-公开
公开(公告)号：JP2004121927A
公开(公告)日：2004-04-22
申请号：JP2002287010
申请日：2002-09-30
申请人： Toshiba Ceramics Co Ltd , 東芝セラミックス株式会社
发明人： SHIN TAIRA , TOKUTAKE FUMIO , SHIMAI SHUNZO
IPC分类号： B01D53/50 , B01D53/34 , B01D53/56 , B01D53/68 , B01D53/81
摘要： PROBLEM TO BE SOLVED: To provide an inexpensive chemical filter having the large surface coating ratio of a chemical adsorbent and high filter efficiency. SOLUTION: The chemical filter comprises a substrate 1 which is composed of ceramic fibers, glass fibers or a mixture of them. The surface 2 of this substrate 1 is coated with the chemical adsorbent 3 comprising potassium permanganate, calcium hydroxide, phosphoric acid, manganese dioxide or either one of an alkali carbonate and an alkaline earth carbonate. COPYRIGHT: (C)2004,JPO

4. 发明专利

JP2001053124A ANALYSIS SAMPLE GATHERING UNIT FOR SEMICONDUCTOR VAPOR GENERATOR AND ANALYSIS PROCESSING METHOD USING THE SAME 失效
公开(公告)号：JP2001053124A
公开(公告)日：2001-02-23
申请号：JP22364999
申请日：1999-08-06
申请人： TOSHIBA CERAMICS CO
发明人： NAGAMINE YOSHINOBU , TOKUTAKE FUMIO
IPC分类号： G01N1/22 , G01N1/36 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an analysis sample gathering unit for semiconductor vapor generator, capable of capturing high-temperature vapor as a condensation agent in composition as is, without using trapping agents such as pure water, etc., and provide an analysis processing method using the same. SOLUTION: This analysis sample gathering unit for a semiconductor vapor generator for analyzing a trace amount of impurity included in vapor generated by the device is connected to an external burning vapor generator for a semiconductor manufacture process. The analysis sample gathering unit comprises a receiver 1 for condensing and storing gathering vapor, a lid body 2 to which a vapor introduction pipe 4 is attached for detachably engaging with the receiver 1, and a coolant bath 3 for cooling the receiver 1 mounting the lid body 2 from the outside, and the vapor introduction pipe 4 extends downwardly of the interior of the receiver when mounting the lid body, and the end part is stationed in proximity to the bottom face of the receiver.

5. 发明专利

JPH1143321A PRODUCTION OF QUARTZ RAW MATERIAL POWDER 失效
公开(公告)号：JPH1143321A
公开(公告)日：1999-02-16
申请号：JP21393997
申请日：1997-07-25
申请人： TOSHIBA CERAMICS CO
发明人： FUJIWARA MARIKO , TOKUTAKE FUMIO
IPC分类号： C03B20/00 , C01B33/18 , C03B19/10 , C03C3/06
摘要： PROBLEM TO BE SOLVED: To produce a highly pure raw material powder having an iron content not larger than a specific value by calcining a quartz raw material powder and carrying out a purifying treatment of the calcined quartz raw material powder with a mixed liquid of hydrofluoric acid with sulfuric acid. SOLUTION: A quartz raw powder is calcined and thereafter subjected to a purifying treatment with a mixed liquid of 2-5% hydrofluoric acid with 5-20% sulfuric acid to provide the objective quartz raw material powder with =40 deg.C, more preferably >=60 deg.C. The purifying treatment is preferably carried out while stirring the mixture. Although the purifying treatment time is not indiscriminately defined because of dependence on the concentration of the mixed liquid, and the treatment temperature, but when using the condition of 2% hydrofluoric acid, 10% sulfonic acid and 80 deg.C treatment temperature, 1-2 hr is exemplified. For example, a silica rock is used as the raw material, and pulverized by a conventional method. The pulverized raw material silica rock is floated and thereafter calcined. The calcined powder is subjected to the purifying treatment with the mixed liquid of the hydrofluoric acid with the sulfuric acid in the before concentration. Thereafter, the treated powder is washed with water and dried to provide the highly pure quartz raw material powder.

6. 发明专利

JP2007160273A Photocatalyst water purification apparatus 审中-公开
标题翻译：光催化水净化装置
公开(公告)号：JP2007160273A
公开(公告)日：2007-06-28
申请号：JP2005363330
申请日：2005-12-16
申请人： Toshiba Ceramics Co Ltd , 東芝セラミックス株式会社
发明人： ISHII TATSUYA , TOKUTAKE FUMIO , SHU CHUKA
IPC分类号： C02F1/32 , B01J35/02 , C02F1/72
摘要： PROBLEM TO BE SOLVED: To provide an inexpensive photocatalyst water purification apparatus having a large water purification capacity, which can be maintained for a long time.
SOLUTION: The photocatalyst water purification apparatus comprises a photocatalyst-carrying ceramic foam so provided that water to be purified permeates therethrough and an ultraviolet lamp directly irradiating the ceramic foam with ultraviolet rays. The photocatalyst-carrying ceramic foam is preferably in the shape of a flat plate horizontally disposed in a purification tank which the water to be purified is charged into and discharged from. The surface of the ceramic foam irradiated with the ultraviolet rays is as high as, or higher than, that of the water to be treated in the purification tank.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种可以长时间保持的具有大的净水能力的便宜的光催化剂水净化装置。解决方案：光催化剂水净化装置包括携带光催化剂的陶瓷泡沫，使得待净化的水渗入其中，并且紫外线灯直接用紫外线照射陶瓷泡沫。携带有光催化剂的陶瓷泡沫体优选为水平设置在净化槽中的平板形状，待净化的水被充入和排出。用紫外线照射的陶瓷泡沫的表面与净化槽中待处理的水的高度一样高。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2003171188A CHEMICAL ETCHING METHOD FOR ALULMINA CERAMICS 审中-公开
公开(公告)号：JP2003171188A
公开(公告)日：2003-06-17
申请号：JP2001369945
申请日：2001-12-04
申请人： TOSHIBA CERAMICS CO
发明人： SUZUKI TAKASHI , SHIMAI SHUNZO , TOKUTAKE FUMIO , TAKAHASHI MASATO
IPC分类号： C04B41/91
摘要： PROBLEM TO BE SOLVED: To provide a chemical etching method for alumina ceramics by which etching can effectively be performed. SOLUTION: Alumina ceramics is dipped into a sulfuric acid aqueous solution having a concentration of 18 to 50%. COPYRIGHT: (C)2003,JPO

8. 发明专利

JP2002241187A CERAMIC MEMBER HAVING FINE PROJECTION FORMED ON SURFACE OF THE SAME MEMBER, AND PRODUCTION PROCESS OF THE SAME MEMBER 失效
公开(公告)号：JP2002241187A
公开(公告)日：2002-08-28
申请号：JP2001033102
申请日：2001-02-09
申请人： TOSHIBA CERAMICS CO
发明人： KAWAI KAZUHIDE , SHIMAI SHUNZO , TAKAHASHI MASATO , SHIDARA HIROAKI , TOKUTAKE FUMIO
IPC分类号： C04B41/91 , C04B35/00
摘要： PROBLEM TO BE SOLVED: To provide a ceramic member which has fine projections formed on the surface of the member and exhibits an excellent anchoring effect on a different kind of substance that is deposited and built up on the surface of the member, while inhibiting or preventing gas-releasing properties of the member from being exhibited, and when used in a thin-film formation device, peeling-off of particles of such a different kind of substance from the member is hardly caused, and also to provide a production process of the ceramic member. SOLUTION: In the ceramic member, a plurality of fine projections are formed on the surface of each of most of the constituent crystal grains of the surface or its vicinity of a dense ceramic base material having a >=95% purity and each of the plurality of fine projections has a smaller size than the crystal grain size. The production process of such a ceramic member comprises subjecting a dense ceramic base material which has a >=95% purity and a density exceeding 90% of the theoretical density, to etching treatment with an acidic etching liquid, to form the plurality of projections on the surface of each of most of the crystal grains existing in the surface or in the vicinity of the surface of the base material.

9. 发明专利

JP2000266650A METHOD FOR ANALYZING SURFACE-LAYER IMPURITY OF POLYSILICON, AND SAMPLE-TREATING CONTAINER FOR ETCHING POLYSILICON 失效
公开(公告)号：JP2000266650A
公开(公告)日：2000-09-29
申请号：JP7026499
申请日：1999-03-16
申请人： TOSHIBA CERAMICS CO , TOKUYAMA CORP
发明人： TANAKA MASAFUMI , TOKUTAKE FUMIO , MUROTA HITOSHI
IPC分类号： G01N27/62 , G01N1/10 , G01N1/28 , G01N31/00 , G01N33/00 , H01L21/306 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To prevent the contamination of a sample in analysis for making a high- sensitivity analysis performable by housing a polysilicon sample and an etching liquid in a sample treatment container, then moving the treatment container for bringing the etching liquid into contact with the surface of the polysilicon sample, and collecting the etching liquid. SOLUTION: The sample treatment container 1 is provided with a container body 2 made of a fluororesin having an opening 2a of polysilicon sample inlet/outlet, a lid body 3 made of a fluororesin being provided at the opening 2a of the body 2 detachably and the body 2, and an etching liquid inlet/outlet 5 at the lid body 3. The container 1 is also provided with knurls 4 and 6 at the both end that can rotate the body 2 in one direction while being in contact with a rotary roller. In this configuration, the sample treatment container 1 accommodating the polysilicon sample and the etching liquid is mounted between a rotary-driving roller and a follower roller of a roller shaker for rotating via the knurls 4 and 6. After the etching is completed, the etching liquid is transferred to a washed evaporation condensation tool from the etching liquid inlet/outlet 5 of the lid body 3.

10. 发明专利

JP2000007370A QUARTZ GLASS FOR OPTICS 失效
公开(公告)号：JP2000007370A
公开(公告)日：2000-01-11
申请号：JP16890098
申请日：1998-06-16
申请人： TOSHIBA CERAMICS CO
发明人： TANIIKE SEIJI , SHINPO MASARU , TANAKA MASAFUMI , TOKUTAKE FUMIO
IPC分类号： C03C3/06
摘要： PROBLEM TO BE SOLVED: To obtain an optical quartz glass that suppresses the emission of fluorescence, even when a laser beam of short wavelength is used, and can draw sharp patterns, for example, on wafers by setting the concentration of Ni on the basis of the positive correlation with the intensity of the fluorescence. SOLUTION: A positive correlation between the concentration of Ni and the intensity of its fluorescence can be noticed clearly, when the correlation between the impurity elements in quartz glass and the fluorescent intensity is examined individually. When the concentration of Ni is in the range of from 0.1 ppb to 1.0 ppb, the emission of the fluorescence can be substantially inhibited, regardless of the existence of other elements and their concentrations. If it is in this range, the emission of fluorescence can be inhibited, even when the excimer laser is employed. This merit can be revealed at maximum, when these elements constituted with this optical quartz glass are applied to the optical lithography.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式