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1. 发明申请

WO2006107010A3 POSITIVE PHOTORESIST COMPOSITION, THICK FILM PHOTORESIST LAMINATE, METHOD FOR PRODUCING THICK FILM RESIST PATTERN, AND METHOD FOR PRODUCING CONNECTING TERMINAL 审中-公开
标题翻译：积极光电组合物，厚膜光电陶瓷层压板，生产厚膜电阻图案的方法和生产连接端子的方法
公开(公告)号：WO2006107010A3
公开(公告)日：2007-12-27
申请号：PCT/JP2006307021
申请日：2006-03-28
申请人： TOKYO OHKA KOGYO CO LTD , MISUMI KOICHI , WASHIO YASUSHI , SENZAKI TAKAHIRO , SAITO KOJI
发明人： MISUMI KOICHI , WASHIO YASUSHI , SENZAKI TAKAHIRO , SAITO KOJI
IPC分类号： G03F7/004 , G03F7/039 , H01L21/60
CPC分类号： G03F7/0045 , G03F7/0397 , H01L24/11 , H01L24/13 , H01L2224/1146 , H01L2224/1147 , H01L2224/131 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/81192 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01019 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01057 , H01L2924/01073 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/014 , H01L2924/15747 , H01L2924/15788 , H01L2924/3025 , H05K3/0076 , H05K3/0079 , H05K3/3452 , H01L2924/00014 , H01L2924/00
摘要： This positive photoresist composition is a positive photoresist composition for exposing to light having one or more wavelengths selected from g-rays, h-rays and i-rays, comprising: (A) a compound which generates an acid under irradiation with active rays or radiation, and (B) a resin whose solubility in an alkali is enhanced by an action of an acid, wherein the component (A) contains an onium salt (A1) having a naphthalene ring in the cation moiety.
摘要翻译：该正性光致抗蚀剂组合物是用于暴露于选自g射线，h射线和i射线的一种或多种波长的光的正性光致抗蚀剂组合物，其包含：（A）在用活性射线或辐射照射下产生酸的化合物（B）通过酸的作用使在碱中的溶解度增强的树脂，其中，成分（A）在阳离子部分含有具有萘环的鎓盐（A1）。

2. 发明公开

EP3133145A4 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING CELL CULTURE SUBSTRATE 审中-公开
公开(公告)号：EP3133145A4
公开(公告)日：2018-03-14
申请号：EP15779517
申请日：2015-04-10
申请人： TOKYO OHKA KOGYO CO LTD
发明人： SENZAKI TAKAHIRO
IPC分类号： C12M1/00 , B29C41/12 , C08F2/46 , C08J7/00
CPC分类号： C12M23/20 , B29C35/002 , B29C35/0805 , B29C41/003 , B29C41/12 , B29C41/42 , B29C71/0009 , B29C71/04 , B29C2035/0827 , B29C2071/0045 , B29D7/00 , B29K2033/04 , B29K2067/06 , B29K2071/00 , B29L2007/00 , C08F2/46 , C08J7/00
摘要： Provided are: a photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, that has low cytotoxicity, and that can form a cell culture substrate with which cells can be cultured well; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. In the photosensitive resin composition, which includes a photopolymerizable monomer (A) and a photopolymerization initiator (B), the photopolymerizable monomer (A) used contains a defined amount of a polyfunctional monomer (A1) that is at least trifunctional, and the content of the photopolymerization initiator (B) is within a prescribed range.

3. 发明专利

JP2013225026A Pattern reduction method and composition 有权
标题翻译：图案缩小方法与组合
公开(公告)号：JP2013225026A
公开(公告)日：2013-10-31
申请号：JP2012096997
申请日：2012-04-20
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SENZAKI TAKAHIRO , MIYAGI MASARU , MIYASHITA KENICHIRO
IPC分类号： G03F7/40 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method of reducing a pattern formed in a thin film on a substrate, by utilizing a phase separation structure of a block polymer.SOLUTION: The pattern reduction method includes: a step of forming, on a substrate which has a thin film having a pattern formed therein on a surface, a layer including a block copolymer using a composition so as to cover a bottom surface of a concave portion of the pattern; a step of separating phases of the layer including the block copolymer; and a step of selectively removing phases other than a phase comprising a Pblock in the layer including the block copolymer. The composition comprises (A) a block copolymer where the Pblock and a block being incompatible with the Pblock and having an etching selection ratio of one or more relative to the Pblock, (B) a random copolymer or a homopolymer compatible with blocks other than the Pblock. (C) a random copolymer or a homopolymer compatible with the Pblock, and (D) an organic solvent.
摘要翻译：要解决的问题：提供一种通过利用嵌段聚合物的相分离结构来降低在基板上形成的薄膜中的图案的方法。解决方案：图案缩小方法包括：在基板上形成具有在表面上形成有图案的薄膜，包含使用组合物覆盖图案的凹部的底面的嵌段共聚物的层; 分离包含嵌段共聚物的层的相的步骤; 以及在包括嵌段共聚物的层中选择性除去除了包含Pblock的相以外的相的步骤。组合物包含（A）嵌段共聚物，其中Pblock和块与Pblock不相容并且具有相对于Pblock的蚀刻选择比为一个或多个，（B）无规共聚物或与除 Pblock。（C）与Pblock相容的无规共聚物或均聚物，和（D）有机溶剂。

4. 发明专利

JP2013190693A Solvent-developable negative resist composition and method for forming resist pattern 有权
标题翻译：可溶性发展负极性组合物和形成耐药性图案的方法
公开(公告)号：JP2013190693A
公开(公告)日：2013-09-26
申请号：JP2012057959
申请日：2012-03-14
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： KUROSAWA TSUYOSHI , ENDO KOTARO , IWASAWA YUTA , SENZAKI TAKAHIRO
IPC分类号： G03F7/039 , G03F7/004 , G03F7/038 , G03F7/32 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a solvent-developable negative resist composition and a method for forming a resist pattern.SOLUTION: There is provided a solvent-developable negative resist composition which is a resist composition used for a method for forming a resist pattern which includes: a step of forming a resist film on a support using a resist composition containing a base material component (A) whose solubility in an organic solvent decreases by the action of an acid, an acid generator component (B) capable of generating an acid upon exposure and a basic compound component (D); a step of exposing the resist film; and a step of forming a resist pattern by patterning the resist film by negative development using a developer containing the organic solvent, wherein the base material component (A) contains a resin component (A1) containing a structural unit (a0) including a 3 to 7-membered ether-containing cyclic group and a structural unit (a1) including an acid decomposable group whose polarity increases by the action of an acid, and the basic compound component (D) contains a basic compound component (D1) having a fluorine atom.
摘要翻译：要解决的问题：提供可溶性可显影的负性抗蚀剂组合物和形成抗蚀剂图案的方法。溶液：提供了一种溶剂可显影的负性抗蚀剂组合物，其是用于形成抗蚀剂图案的方法的抗蚀剂组合物，包括：使用含有在有机溶剂中的溶解度降低的基材成分（A）的抗蚀剂组合物在载体上形成抗蚀剂膜的工序，通过酸的作用降低酸产生剂成分（B），能够产生酸暴露后和碱性化合物组分（D）; 暴露抗蚀剂膜的步骤; 以及通过使用包含有机溶剂的显影剂通过负显影对抗蚀剂膜进行图案化而形成抗蚀剂图案的步骤，其中，所述基材成分（A）含有含有包含3〜3的结构单元（a0）的树脂成分（A1）含有7元醚的环状基团和包含通过酸作用而极性增加的酸分解基团的结构单元（a1），碱性化合物成分（D）含有具有氟原子的碱性化合物成分（D1）。

5. 发明专利

JP2013189571A Undercoat agent, and method for forming pattern of layer comprising block copolymer 有权
标题翻译： UNDERCOAT试剂和形成包含嵌段共聚物层的图案的方法
公开(公告)号：JP2013189571A
公开(公告)日：2013-09-26
申请号：JP2012057815
申请日：2012-03-14
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SENZAKI TAKAHIRO , MIYAGI MASARU , MIYASHITA KENICHIRO
IPC分类号： C08F220/26 , B05D3/10 , B05D7/24 , C08F216/16 , C08F293/00
CPC分类号： C09D133/14 , C09J133/26
摘要： PROBLEM TO BE SOLVED: To provide an undercoat agent, and a method for forming patterns of a layer comprising a block copolymer using the undercoat agent.SOLUTION: An undercoat agent is used for performing phase separation of a layer formed on a substrate, and containing a block copolymer having a plurality of blocks bonded, wherein the undercoat agent contains a resin component, the resin component comprises a structural unit having an aromatic ring and a structural unit not having an aromatic ring, and the resin component has a group that can interact with the substrate, and also has a 3- to 7-membered, ether-containing cyclic group. The method for forming patterns of a layer comprising the block copolymer includes: a step (1) of applying the undercoat agent on the substrate to form a layer comprising the undercoat agent; a step (2) of forming a layer, comprising a block copolymer having a plurality of blocks bonded thereto, on the surface of the layer comprising the undercoat agent, and then performing phase separation of the layer comprising the block copolymer; and a step (3) of selectively removing a phase comprising at least one block among the plurality of blocks constituting the block copolymer.
摘要翻译：要解决的问题：提供底涂剂，以及使用该底涂剂形成包含嵌段共聚物的层的图案的方法。溶液：使用底涂剂进行在基材上形成的层的相分离，并含有具有多个嵌段的嵌段共聚物，其中所述底涂剂含有树脂组分，所述树脂组分包含具有芳环的结构单元和不具有芳环的结构单元，并且所述树脂组分具有可以相互作用的基团与底物，并且还具有3至7元的含醚的环状基团。形成包含嵌段共聚物的层的图案的方法包括：将底涂层涂布在基材上以形成包含底涂层的层的步骤（1）在包含所述底涂层的层的表面上形成层的步骤（2），其包含与其结合的多个嵌段的嵌段共聚物，然后进行包含嵌段共聚物的层的相分离; 以及选择性地除去构成嵌段共聚物的多个嵌段中包含至少一个嵌段的相的步骤（3）。

6. 发明专利

JP2012116967A Substrate equipped with polymer nanostructure on surface thereof, and method for producing the same 有权
标题翻译：在其表面上配备聚合物纳米结构的基板及其制造方法
公开(公告)号：JP2012116967A
公开(公告)日：2012-06-21
申请号：JP2010268532
申请日：2010-12-01
申请人： Institute Of Physical & Chemical Research , Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社 , 独立行政法人理化学研究所
发明人： FUJIKAWA SHIGENORI , KOIZUMI MARI , SENZAKI TAKAHIRO , DAZAI NAOHIRO , MIYAGI MASARU
IPC分类号： C08L53/00 , B32B27/28 , B82B1/00 , B82B3/00 , C01B31/02 , C08K3/04
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a substrate having a polymer nanostructure by controlling formation of a phase separation structure of a block copolymer quickly and simply.SOLUTION: The method for forming the phase separation structure of the block copolymer includes mixing a block copolymer, which contains plural kinds of polymers combined, with a carbon nanotube. The method for producing the substrate having the polymer nanostructure on its surface includes: a step of preparing a mixed solution by mixing the carbon nanotube with a solution of the block copolymer, which contains the plural kinds of polymers combined; a step of forming a layer having the phase separation structure of the block copolymer by coating the prepared, mixed solution on a surface of the substrate; and, a step of, among the layer, selectively removing a layer composed of at least one kind of polymer from among the plural kinds of polymers organizing the block copolymer. The substrate having the polymer nanostructure, produced using the method, on its surface is also disclosed.
摘要翻译：解决的问题：提供一种通过控制嵌段共聚物的相分离结构快速而简单地形成来制造具有聚合物纳米结构的基材的方法。解决方案：用于形成嵌段共聚物的相分离结构的方法包括将包含多种聚合物的嵌段共聚物与碳纳米管混合。制备其表面上具有聚合物纳米结构的基材的方法包括：通过将碳纳米管与包含多种聚合物组合的嵌段共聚物溶液混合来制备混合溶液的步骤; 通过将所制备的混合溶液涂布在基材的表面上形成具有嵌段共聚物的相分离结构的层的步骤; 并且在所述层中，从组织所述嵌段共聚物的多种聚合物中选择性地除去由至少一种聚合物构成的层。还公开了在其表面上使用该方法制备的具有聚合物纳米结构的基材。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JP2010197568A Photosensitive resin composition, dry film, and method for forming pattern 有权
标题翻译：感光树脂组合物，干膜和形成图案的方法
公开(公告)号：JP2010197568A
公开(公告)日：2010-09-09
申请号：JP2009040601
申请日：2009-02-24
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SENZAKI TAKAHIRO , KATO TETSUYA
IPC分类号： G03F7/004 , C08G59/68 , G03F7/027 , G03F7/038 , G03F7/40 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition, which is to be used for a permanent film and does not use a photosensitive agent containing a halogen, and to provide a dry film and a method for forming a pattern using the dry film.
SOLUTION: The photosensitive resin composition contains (A) a polymer having an alicyclic epoxy group, (B) a monomer having a radical polymerizable group, (C) a radical polymerization initiator and (D) a photosensitive agent generating sulfonic acid by irradiation with light. As the photosensitive resin composition does not corrode a material to be used for microcomponents even when the composition is used for a permanent film, the composition can be suitably used as a photosensitive resin composition for a permanent film.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于永久性膜并且不使用含有卤素的感光剂的感光性树脂组合物，并提供干膜，以及使用该膜形成图案的方法干膜。解决方案：感光性树脂组合物含有（A）具有脂环族环氧基的聚合物，（B）具有自由基聚合性基团的单体，（C）自由基聚合引发剂，（D）通过用光照射由于感光性树脂组合物即使在组合物用于永久性膜时也不会腐蚀微量元件所使用的材料，所以组合物可以适合用作永久性膜的感光性树脂组合物。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2013212569A Method for patterning layer including block copolymer, and primer agent 有权
标题翻译：包含嵌段共聚物的层的方法，以及引发剂
公开(公告)号：JP2013212569A
公开(公告)日：2013-10-17
申请号：JP2012164039
申请日：2012-07-24
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SENZAKI TAKAHIRO , MIYAGI MASARU
IPC分类号： B82B3/00 , B82Y40/00 , C08F297/00 , C09D5/00 , C09D201/00 , C09D201/02 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method for patterning a layer including a block copolymer, by which a substrate having a nanostructure with more flexibly designed locations and orientation on a substrate surface can be produced by using phase separation of the block copolymer.SOLUTION: A method for patterning a layer including a block copolymer includes: step (1) of applying a primer agent comprising a resin component and a basic compound component in an amount of 1 to 50 parts by mass with respect to 100 parts by mass of the resin component on a substrate 1 to form a layer 2 of the primer agent; step (2) of forming a layer 3 including a block copolymer in which a plurality of types of blocks are bonded, on a surface of the layer formed of the primary agent 2, and then subjecting the layer 3 containing the block copolymer to phase separation; and step (3) of selectively removing a phase 3a comprising at least one type of block in the plurality of types of blocks constituting the block copolymer, in the layer 3 including the block copolymer.
摘要翻译：要解决的问题：提供一种图案化包含嵌段共聚物的层的方法，通过该方法可以通过使用嵌段共聚物的相分离来制备具有更灵活设计的位置和取向在基材表面上的纳米结构的基材。溶液：图案化包含嵌段共聚物的层的方法包括：相对于100质量份的树脂，施加1〜50质量份的包含树脂成分和碱性化合物成分的底漆的工序（1）在底物1上形成层2，在由主剂2形成的层的表面上形成包含多个嵌段的嵌段共聚物的层3的工序（2），然后使含有嵌段共聚物的层3相分离 ; 以及在包含嵌段共聚物的层3中选择性除去构成嵌段共聚物的多种类型的嵌段中至少一种类型的嵌段的相3a的步骤（3）。

9. 发明专利

JP2013084010A Photosensitive resin composition, photosensitive resin laminate, and pattern forming method 有权
标题翻译：感光树脂组合物，感光树脂层压板和图案形成方法
公开(公告)号：JP2013084010A
公开(公告)日：2013-05-09
申请号：JP2013007400
申请日：2013-01-18
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SENZAKI TAKAHIRO , KATO TETSUYA
IPC分类号： G03F7/033 , C08F2/48 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which can be cured with an acid-generating agent weaker than an antimony-based acid generator or a phosphorus-based acid generator.SOLUTION: A photosensitive resin composition contains: an epoxy resin; an acrylic monomer having one or more crosslink forming moieties; a terminal vinyl-based silane coupling agent; a photopolymerization initiator; and a photo-acid-generating agent. For example, the epoxy resin has an alkoxy group (Si-OR) giving a silanol group (Si-OH) upon hydrolysis. The acrylic monomer is a molecule having one to six terminal vinyl groups. The terminal vinyl-based silane coupling agent has the alkoxy group (Si-OR) giving the silanol group (Si-OH) upon the hydrolysis at one end of the molecule and has the vinyl group as an organic functional group at the other end. The photopolymerization initiator is an oxime-based radical polymerization initiator having a carbazole skeleton.
摘要翻译：解决的问题：提供一种可用比锑酸产生剂或磷酸发生剂弱的酸产生剂固化的感光性树脂组合物。光敏树脂组合物含有：环氧树脂; 具有一个或多个交联形成部分的丙烯酸类单体; 末端乙烯基类硅烷偶联剂; 光聚合引发剂; 和光酸生成剂。例如，环氧树脂在水解时具有硅烷醇基（Si-OH）的烷氧基（Si-OR）。丙烯酸类单体是具有1〜6个末端乙烯基的分子。末端乙烯基类硅烷偶联剂在分子一端水解时具有硅烷醇基（Si-OH）的烷氧基（Si-OR），另一端具有乙烯基作为有机官能团。光聚合引发剂是具有咔唑骨架的肟基自由基聚合引发剂。版权所有（C）2013，JPO＆INPIT

10. 发明专利

JP2008310089A Photosensitive resin composition, photosensitive resin laminate, and pattern forming method 有权
标题翻译：感光树脂组合物，感光树脂层压板和图案形成方法
公开(公告)号：JP2008310089A
公开(公告)日：2008-12-25
申请号：JP2007158320
申请日：2007-06-15
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SENZAKI TAKAHIRO , MISUMI KOICHI , SAITO KOJI
IPC分类号： G03F7/029 , C08G59/68 , G03F7/004 , G03F7/038 , G03F7/11 , H05K3/00
CPC分类号： C08F2/50 , G03F7/0045 , G03F7/038 , G03F7/161 , Y10S430/122 , Y10S430/126 , Y10S430/127
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of achieving higher hardness while using an epoxy group-containing acrylic resin, a photosensitive resin laminate and a pattern forming method. SOLUTION: The photosensitive resin composition comprises (A) the epoxy group-containing acrylic resin, (B) a photopolymerization initiator and (C) a sensitizer, wherein an onium salt of a specific structure is used as the component (B) and at least one selected from 1,5-dihydroxynaphthalene, 2,3-dihydroxynaphthalene and 2,6-dihydroxynaphthalene is used as the component (C). COPYRIGHT: (C)2009,JPO&INPIT

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