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1. 发明申请

WO2003005406A1 PLASMA PUMP WITH INTER-STAGE PLASMA SOURCE 审中-公开
标题翻译：等离子体泵与等离子体等离子体源
公开(公告)号：WO2003005406A1
公开(公告)日：2003-01-16
申请号：PCT/US2002/020868
申请日：2002-07-02
申请人： TOKYO ELECTRON LIMITED , QUON, Bill, H. , JOHNSON, Wayne, L.
发明人： QUON, Bill, H. , JOHNSON, Wayne, L.
IPC分类号： H01J37/02
CPC分类号： H01J37/32834 , H01J37/32082
摘要： A high efficiency plasma pump for use in a plasma processing system that includes a plasma processing device having a first plasma density proximate a processing region and a second plasma density proximate an exit region is disclosed. The plasma pump includes an inter-stage plasma (ISP) source fluidly coupled to the plasma processing device proximate the exit region, the ISP source comprising an inter-stage plasma region having a third plasma density; and a plasma pump fluidly coupled to the ISP, the plasma pump having a fourth plasma density, wherein pumping speed is dependent upon the third plasma density and the fourth plasma density. The ISP source increasing the third plasma density to increase the pumping efficiency.
摘要翻译：公开了一种用于等离子体处理系统的高效率等离子体泵，其包括具有靠近处理区域的第一等离子体密度和靠近出口区域的第二等离子体密度的等离子体处理装置。等离子体泵包括在出口区域处流体耦合到等离子体处理装置的级间等离子体（ISP）源，ISP源包括具有第三等离子体密度的级间等离子体区域; 以及流体耦合到ISP的等离子体泵，等离子体泵具有第四等离子体密度，其中泵送速度取决于第三等离子体密度和第四等离子体密度。 ISP源增加第三种等离子体密度以提高泵送效率。

2. 发明申请

WO2002097855A1 PLASMA PROCESSING APPARATUS AND METHOD 审中-公开
标题翻译：等离子体加工设备和方法
公开(公告)号：WO2002097855A1
公开(公告)日：2002-12-05
申请号：PCT/US2002/013782
申请日：2002-05-02
申请人： TOKYO ELECTRON LIMITED , QUON, Bill, H.
发明人： QUON, Bill, H.
IPC分类号： H01J37/32
CPC分类号： H01J37/32935
摘要： A method for determining the potential of a plasma in a processing chamber includes determining voltages of respective plasma engaging surfaces of at least two plasma generating electrodes (18,20) disposed within the processing chamber and determining the plasma potential by comparing the determined voltages and equating the highest determined voltage to the plasma potential.
摘要翻译：用于确定处理室中的等离子体的电位的方法包括确定设置在处理室内的至少两个等离子体产生电极（18,20）的各个等离子体接合表面的电压，并通过将所确定的电压进行比较来确定等离子体电位对等离子体电位的最高确定电压。

3. 发明申请

WO2002103745A1 ION MOMENTUM TRANSFER PLASMA PUMP 审中-公开
标题翻译：离子转移等离子泵
公开(公告)号：WO2002103745A1
公开(公告)日：2002-12-27
申请号：PCT/US2002/015943
申请日：2002-05-21
申请人： TOKYO ELECTRON LIMITED , QUON, Bill, H.
发明人： QUON, Bill, H.
IPC分类号： H01J37/32
CPC分类号： H01J37/32834 , H01J37/3266 , H05H1/54
摘要： A plasma pump to pump particles from a first region containing a plasma to a second region containing a lower density plasma is provided. The pump includes a conduit having an inlet end, a radially directed outlet, and a longitudinal axis extending from the inlet end towards a distal end. A magnet array generates a magnetic field having field lines generally parallel to the longitudinal axis. A high voltage, radio frequency electrode is disposed at the distal end of the conduit. The electrode produces a high voltage, radio frequency electric field within the conduit such that charged particles within the conduit are accelerated radially through ion cyclotron resonance so as to pass through the conduit outlet. A method is also provided. The method includes providing the magnetic field, having field lines generally parallel to the longitudinal axis and providing the high voltage, radio frequency electric field within the conduit radially inward of the conduit outlet.
摘要翻译：提供了一种将粒子从含有等离子体的第一区域泵送到含有较低密度等离子体的第二区域的等离子体泵。泵包括具有入口端，径向指示的出口和从入口端朝向远端延伸的纵向轴线的导管。磁体阵列产生具有大致平行于纵向轴线的场线的磁场。高压射频电极设置在导管的远端。电极在导管内产生高电压射频电场，使得导管内的带电粒子通过离子回旋共振径向加速，从而通过导管出口。还提供了一种方法。该方法包括提供磁场，其具有大致平行于纵向轴线的场线，并且在导管的径向向内的导管出口内提供高压的射频电场。

4. 发明申请

WO2002097937A1 INDUCTIVELY COUPLED HIGH-DENSITY PLASMA SOURCE 审中-公开
标题翻译：感应耦合高密度等离子体源
公开(公告)号：WO2002097937A1
公开(公告)日：2002-12-05
申请号：PCT/US2002/022080
申请日：2002-03-25
申请人： TOKYO ELECTRON LIMITED , QUON, Bill, H. , JEVTIC, Jovan , ANTLEY, Sam , STRANG, Eric, J.
发明人： QUON, Bill, H. , JEVTIC, Jovan , ANTLEY, Sam , STRANG, Eric, J.
IPC分类号： H01T23/00
CPC分类号： H01J37/321 , H01J37/32357 , H01J37/3266
摘要： A high-density plasma source (100) is disclosed. The source includes an annular insulating body (300) with an annular cavity (316) formed within. An inductor coil (340) serving as an antenna is arranged within the annular cavity and is operable to generate a first magnetic field within a plasma duct (60) interior region (72) and inductively couple to the plasma when the annular body is arranged to surround a portion of the plasma duct. A grounded conductive housing (400) surrounds the annular insulating body. An electrostatic shield (360) is arranged adjacent the inner surface of the insulating body and is grounded to the conductive housing. Upper and lower magnet rings (422 and 424) are preferably arranged adjacent the upper and lower surfaces of the annular insulating body outside of the conductive housing. A T-match network is in electrical communication with said inductor coil and is adapted to provide for efficient transfer of RF power from an RF power source to the plasma. At least one plasma source can be used to form a high-density plasma suitable for plasma processing of a workpiece residing in a plasma chamber in communication with the at least one source.
摘要翻译：公开了一种高密度等离子体源（100）。源包括环形绝缘体（300），其内部形成有环形空腔（316）。用作天线的电感线圈（340）布置在环形空腔内，并且可操作以在等离子体管道（60）内部区域（72）内产生第一磁场，并且当环形体布置成围绕等离子体管道的一部分。接地导电壳体（400）围绕环形绝缘体。静电屏蔽（360）被布置成邻近绝缘体的内表面并且被接地到导电壳体。上，下磁环（422和424）优选地布置成邻近导电外壳外的环形绝缘体的上表面和下表面。 T匹配网络与所述电感器线圈电连通，并且适于提供从RF功率源到等离子体的RF功率的有效传输。可以使用至少一个等离子体源来形成适于等离子体处理等离子体处理的等离子体处理，所述等离子体处理驻留在与所述至少一个源连通的等离子体室中。

5. 发明申请

WO2002075332A1 IMPEDANCE MONITORING SYSTEM AND METHOD 审中-公开
标题翻译：阻抗监测系统和方法
公开(公告)号：WO2002075332A1
公开(公告)日：2002-09-26
申请号：PCT/US2002/005112
申请日：2002-03-14
申请人： TOKYO ELECTRON LIMITED , QUON, Bill, H.
发明人： QUON, Bill, H.
IPC分类号： G01R27/26
CPC分类号： H01J37/321 , G01R19/0061 , G01R27/2641 , H01J37/32082 , H01J37/32183 , H01J37/32935
摘要： An apparatus (14) for and method of measuring impedance in a capacitively coupled plasma reactor system (10). The apparatus includes a high-frequency RF source (150) in electrical communication with an upper electrode (50). A first high-pass filter (130) is arranged between the upper electrode and the high-frequency RF source, to block low-frequency, high-voltage signals from the electrode RF power source (66) from passing through to the impedance measuring circuit. A current-voltage probe (140) is arranged between the high-frequency source and the high-pass filter, and is used to measure the current and voltage of the probe signal with and without the plasma present. An amplifier (250) is electrically connected to the current-voltage probe, and a data acquisition unit (260) is electrically connected to the amplifier. A second high-pass filter (276) is electrically connected to a lower electrode (56) and to ground, so as to complete the isolation of the high-frequency circuit of the impedance measurement apparatus from the low-frequency, high-voltage circuit of the capacitively coupled plasma reactor system. A method of measuring the plasma impedance using the apparatus of the present invention is also disclosed.
摘要翻译：一种用于测量电容耦合等离子体反应器系统（10）中的阻抗的装置（14）。该装置包括与上电极（50）电连通的高频RF源（150）。第一高通滤波器（130）布置在上电极和高频RF源之间，以阻止来自电极RF电源（66）的低频高电压信号通过阻抗测量电路。电流电压探头（140）设置在高频源和高通滤波器之间，用于测量具有和不具有等离子体的探针信号的电流和电压。放大器（250）电连接到电流 - 电压探针，并且数据获取单元（260）电连接到放大器。第二高通滤波器（276）电连接到下电极（56）并接地，从而将阻抗测量装置的高频电路与低频，高压电路的电容耦合等离子体反应器系统。还公开了使用本发明的装置测量等离子体阻抗的方法。

6. 发明申请

WO2002104085A3 A CLOSED-DRIFT HALL EFFECT PLASMA VACUUM PUMP FOR PROCESS REACTORS 审中-公开
公开(公告)号：WO2002104085A3
公开(公告)日：2002-12-27
申请号：PCT/US2002/015944
申请日：2002-05-21
申请人： TOKY0 ELECTRON LIMITED , QUON, Bill, H. , ANTLEY, Samuel , MITROVIC, Andrej
发明人： QUON, Bill, H. , ANTLEY, Samuel , MITROVIC, Andrej
IPC分类号： H01J37/32 , H01J41/12 , H05H1/54
摘要： A closed-drift Hall effect plasma vacuum pump includes one or more pumping conduits which are linked with a radial magnetic field. The magnetic field separates a plasma from a plasma at a higher pressure which is formed by cross-field plasma transport from a plasma processing region.

7. 发明申请

WO2002104085A2 A CLOSED-DRIFT HALL EFFECT PLASMA VACUUM PUMP FOR PROCESS REACTORS 审中-公开
标题翻译：用于过程反应器的封闭式霍尔效应等离子体真空泵
公开(公告)号：WO2002104085A2
公开(公告)日：2002-12-27
申请号：PCT/US2002/015944
申请日：2002-05-21
申请人： TOKY0 ELECTRON LIMITED , QUON, Bill, H. , ANTLEY, Samuel , MITROVIC, Andrej
发明人： QUON, Bill, H. , ANTLEY, Samuel , MITROVIC, Andrej
IPC分类号： H05H
CPC分类号： H01J27/143 , H01J37/3266 , H01J37/32834 , H05H1/54
摘要： A closed-drift Hall effect plasma vacuum pump includes one or more pumping conduits which are linked with a radial magnetic field. The magnetic field separates a plasma from a plasma at a higher pressure which is formed by cross-field plasma transport from a plasma processing region.
摘要翻译：闭合漂移霍尔效应等离子体真空泵包括一个或多个与径向磁场相连的泵送管道。磁场将等离子体从等离子体处理区域的交叉场等离子体传输形成的较高压力下分离出来。

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