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    • 2. 发明专利
    • FLOW RATE REGULATING METHOD
    • JPS6414621A
    • 1989-01-18
    • JP17176587
    • 1987-07-08
    • TAKENAKA KOMUTEN COSHINKO KOGYO KK
    • USUDA MASASHIKAKIZAKI JIROISHIMOTO SHINJINISHIMUTA SUMIICHI
    • G05D7/00
    • PURPOSE:To realize the regulating with fine accuracy by executing simultaneously in parallel a rough adjustment control by an opening adjusting operation of a large valve, and a fine adjustment control by an opening adjusting operation of a small valve. CONSTITUTION:A flow rate of a fluid flowing in a fluid carrying system becomes a regulated variable, a valve opening adjusting operation is executed so that this flow rate follows up a fluctuated object value, and a flow rate variation portion is regulated by distributing it into a rough adjustment control by an opening adjusting operation of a large valve 3 and a fine adjustment control by an opening adjusting operation of a small wave 4. As for its distributing method, in case of a repeated control flow, the distribution is executed in a state that an opening adjusting manipulated variable of a small valve in the control flow of each time is allowed to have a margin, and when its margin does not exist in the small valve 4, the distribution is executed so as to compensate a portion for generating its margin by an opening adjusting manipulated variable of the large valve 3. Accordingly, the range of the flow rate which can be controlled extends over a wide range from '0' to the sum of each maximum flow rate of the large valve and the small valve, and also, as for the control accuracy which follows up the flow rate target value in its range, the accuracy being equal to the control accuracy of the small valve is secured.
    • 5. 发明专利
    • Clean room structure
    • 清洁室结构
    • JP2007212015A
    • 2007-08-23
    • JP2006030354
    • 2006-02-07
    • Takenaka Komuten Co Ltd株式会社竹中工務店
    • TANIGUCHI KAZUTOKAKIZAKI JIRO
    • F24F7/06E04H5/02
    • PROBLEM TO BE SOLVED: To provide a clean room structure wherein an opening for maintenance is formed in a clean room for shortening an evacuation route and securing bi-directional evacuation routes without causing the disturbed distribution of an air flow in a room or the agitation of the air flow in a clean room space. SOLUTION: A walking area 5 for workers is provided on the lower side of a floor 2 of the clean room in such a manner that an air flow passing through the floor flows down in the walking area. A stairway 30 or a lifting means is provided for the workers to move up and down between the clean room space 1 and the walking area, and the stairway or the lifting means is partitioned form the walking area with partitioning means 35, 36, 37 having ventilation characteristics. The ventilation characteristics of the partitioning means are set so that the air flow toward the walking area via the opening 33 of the stairway or the lifting means is subjected to air resistance corresponding to the ventilating resistance of the floor. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种洁净室结构,其中在洁净室中形成用于维护的开口,用于缩短撤离路线并确保双向撤离路线,而不会造成室内空气流动的不均匀分布,或 空气流动在洁净室空间的搅动。 解决方案:在洁净室的地板2的下侧设置有用于工人的步行区域5,使得穿过地板的空气流在步行区域中向下流动。 提供了一个楼梯30或提升装置,用于工人在洁净室空间1和行走区域之间上下移动,并且楼梯或提升装置由行走区域分隔开,分隔装置35,36,37具有 通风特性。 分隔装置的通风特性被设定为使得经由楼梯的开口33或提升装置的朝向步行区域的空气流受到与地板的通风阻力相对应的空气阻力。 版权所有(C)2007,JPO&INPIT
    • 7. 发明专利
    • SEMICONDUCTOR PLANT
    • JP2000303709A
    • 2000-10-31
    • JP11676499
    • 1999-04-23
    • TAKENAKA KOMUTEN CO
    • KAKIZAKI JIROWATANABE FUJIO
    • E04H5/02F24F7/06H01L21/02
    • PROBLEM TO BE SOLVED: To provide a semiconductor plant capable of securing a duct lower space in a utility space without causing curvature, etc., of a floor material, etc., at the time of depositing enlarged and weight increased manufacturing apparatuses. SOLUTION: This plant is constituted of a main manufacturing area and a core part 40 erected on both sides or one side of this main manufacturing area, the main manufacturing area is furnished with a clean room 20, a chamber formed on the ceiling side of this clean room, a floor material 24 laid on the floor side of the clean room 20, a utility space 25 formed on the lower side of this floor material 24 and a shaft for clean air circulation to communicate this utility space 25 and the chamber to each other. In this semiconductor plant, the clean room 20 has a passage 21 constituted of a member having a more load withstanding property than the floor material 24 along a boundary with the core part 40.
    • 10. 发明专利
    • JPH05296198A
    • 1993-11-09
    • JP11998492
    • 1992-04-13
    • TAKENAKA KOMUTEN CO
    • KAKIZAKI JIROMOTOI HIROMASASOEDA FUMIO
    • B01D46/00F04D29/66F24F7/06
    • PURPOSE:To reduce noise and uniform air blasting by providing a fan connecting case, having a blow-off hole and a blow-in hole at appropriate places, with either one or both of a muffling means and an air flow distribution improving means. CONSTITUTION:Instead of fitting a fan 10 directly to the window hole 8 of a parttion panel 7 in a clean room, a fan connecting case 17 is provided to connect the fan 10, and removably fitted to the window hole 8. The fan connecting case 17 is provided with a casing 18 formed of sound absorbing material. In the casing 18, a blow-off hole 19 corresponding to the window hole 8 is provided at the lower face, and a blow-in hole 20 for connecting the fan 10 is provided at the back face. A baffle 21 formed of sound absorbing material is disposed in the casing 18, in correspondence with the blow-off hole 19, and the fan 10 is connected to the blow-in hole 20. The fan 10 is covered with an outer case 22 formed of sound absorbing material, and the outer case 22 is provided with a suction port 23 having a slide damper 24 on the upper face. In this case, the sound absorbing material and the baffle 21 serve as a muffling means and an air flow distribution improving means, so that the blow- off of clean air can be performed silently and uniformly.