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    • 8. 发明授权
    • Aqueous polyurethane dispersions containing secondary amide groups and their use in one-component thermoset compositions
    • 含有仲酰胺基团的水性聚氨酯分散体及其在单组分热固性组合物中的用途
    • US06455632B1
    • 2002-09-24
    • US09730079
    • 2000-12-05
    • Lyubov K. GindinKaren M. HendersonSze-Ming LeeBrian Long
    • Lyubov K. GindinKaren M. HendersonSze-Ming LeeBrian Long
    • C08J300
    • C09D175/04C08G18/0823C08G18/0866C08G18/12C08G18/283C08G18/3825C08G18/4238Y10T428/31551C08G18/3231
    • The present invention relates to aqueous polyurethane dispersions containing secondary amide groups in the backbone of the polyurethane, wherein the secondary amide groups (calculated as NH—CO—, MW 43) are present in an amount of 1 to 14% by weight, based on the weight of the polyurethanes, and correspond to the formula —X1—R1—NH—C(O)—R2—X2—  (I) wherein X1, and X2 are the same or different and represent the groups obtained by removing a hydrogen atom from a hydroxy group or a primary or secondary amino group and R1and R2 are the same or different and represent linear or branched hydrocarbon groups that are optionally substituted by groups that do not contain isocyanate-reactive hydrogen atoms. The present invention also relates to aqueous, one-component, thermoset compositions containing the polyurethanes with amide groups in the backbone and a cross-linking component that is reactive with amide groups. Finally, the present invention relates to coatings, sealants and adhesives prepared from these aqueous, one-component, thermoset compositions.
    • 本发明涉及在聚氨酯主链中含有仲酰胺基团的含水聚氨酯分散体,其中仲酰胺基团(以NH-CO-,MW 43计算)的存在量为1至14重量%,基于 聚氨酯的重量,对应于X 1和X 2的化学式相同或不同,表示通过从羟基或伯或仲氨基除去氢原子而获得的基团,R 1和R 2相同或不同,表示直链 或任选被不含有异氰酸酯反应性氢原子的基团取代的支链烃基。本发明还涉及包含在主链中具有酰胺基团的聚氨酯的含水单组分热固性组合物和交联组分, 与酰胺基反应。 最后,本发明涉及由这些水性单组分热固性组合物制备的涂料,密封剂和粘合剂。
    • 9. 发明授权
    • Positive-tone photoresist containing novel diester dissolution inhibitors
    • 含有新型二酯溶解抑制剂的正色光致抗蚀剂
    • US5585223A
    • 1996-12-17
    • US633637
    • 1996-04-17
    • Jean M. J. Fr echetSze-Ming Lee
    • Jean M. J. Fr echetSze-Ming Lee
    • G03F7/004G03F7/36G03F7/38
    • G03F7/0045Y10S430/143Y10S430/168
    • A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor. The dissolution inhibitor comprises a compound of Formula I: ##STR1## wherein R.sub.1 is a C.sub.1 -C.sub.20 alkyl, cyclo alkyl, benzyl, phenyl, alkyl substituted cyclo alkyl, alkoxy substituted cyclo alkyl, alkyl substituted phenyl, alkoxy substituted phenyl, acetoxy substituted phenyl, hydroxy substituted phenyl, t-butyloxycarbonyloxy substituted phenyl, diphenyl alkyl, alkyl substituted diphenyl, alkoxy substituted diphenyl, alkyl substituted diphenyl alkyl, or alkoxy substituted diphenyl alkyl; and R.sub.2 is a C.sub.1 -C.sub.20 alkyl, cyclo alkyl, benzyl, phenyl, alkyl substituted cyclo alkyl, alkoxy substituted cyclo alkyl, alkyl substituted phenyl, alkoxy substituted phenyl, hydroxy substituted phenyl, acetoxy substituted phenyl, or t-butyloxycarbonyloxy substituted phenyl.The present invention also provides a method of making microelectronic structures.
    • 提供正色光致抗蚀剂。 光致抗蚀剂包括聚合物,光活性剂和溶解抑制剂。 溶解抑制剂包括式I化合物:其中R 1是C 1 -C 20烷基,环烷基,苄基,苯基,烷基取代的环烷基,烷氧基取代的环烷基,烷基取代的苯基,烷氧基取代的苯基, 乙酰氧基取代的苯基,羟基取代的苯基,叔丁氧基羰氧基取代的苯基,二苯基烷基,烷基取代的二苯基,烷氧基取代的二苯基,烷基取代的二苯基烷基或烷氧基取代的二苯基烷基; 烷基取代的苯基,烷氧基取代的苯基,羟基取代的苯基,乙酰氧基取代的苯基或叔丁氧羰基氧基取代的苯基。 本发明还提供了一种制造微电子结构的方法。