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1. 发明授权

US08016585B2 Nanoimprint resin stamper 有权
标题翻译：纳米压印树脂压模
公开(公告)号：US08016585B2
公开(公告)日：2011-09-13
申请号：US12270376
申请日：2008-11-13
申请人： Susumu Komoriya , Kyoichi Mori , Noritake Shizawa , Takanori Yamasaki , Tetsuhiro Hatogai , Koji Tsushima
发明人： Susumu Komoriya , Kyoichi Mori , Noritake Shizawa , Takanori Yamasaki , Tetsuhiro Hatogai , Koji Tsushima
IPC分类号： B29C59/00 , B29B13/08
CPC分类号： B29C35/0888 , B29C33/424 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A resin stamper is provided that is intended for use in an optical transfer-based nanostructure transfer apparatus and which is capable of automatic transport and alignment. The resin stamper includes a support member made of a light transmitting material and having mechanical strength, an intermediate layer also made of a light transmitting material, and a patterned resin layer which is also made of a light transmitting material. The support member is larger in size than the intermediate layer and the patterned resin layer. The intermediate layer is more flexible than the patterned resin layer. Also, the patterned resin layer has a pattern of high and low areas formed in a surface thereof that is the obverse of the pattern of high and low areas in a mold.
摘要翻译：提供了一种用于基于光学转印的纳米结构转印装置并且能够自动输送和对准的树脂压模。树脂压模包括由透光材料制成并具有机械强度的支撑构件，也由透光材料制成的中间层以及也由透光材料制成的图案化树脂层。支撑构件的尺寸大于中间层和图案化树脂层。中间层比图案化树脂层更柔软。此外，图案化树脂层具有形成在模具中的高低区域图案的表面的高低区域的图案。

2. 发明申请

US20090123590A1 NANOIMPRINT RESIN STAMPER 有权
标题翻译： NANOIMPRINT树脂印章
公开(公告)号：US20090123590A1
公开(公告)日：2009-05-14
申请号：US12270376
申请日：2008-11-13
申请人： Susumu Komoriya , Kyoichi Mori , Noritake Shizawa , Takanori Yamasaki , Tetsuhiro Hatogai , Koji Tsushima
发明人： Susumu Komoriya , Kyoichi Mori , Noritake Shizawa , Takanori Yamasaki , Tetsuhiro Hatogai , Koji Tsushima
IPC分类号： B29C35/08
CPC分类号： B29C35/0888 , B29C33/424 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A resin stamper is provided that is intended for use in an optical transfer-based nanostructure transfer apparatus and which is capable of automatic transport and alignment. The resin stamper comprises a support member made of a light transmitting material and having mechanical strength, an intermediate layer also made of a light transmitting material, and a patterned resin layer which is also made of a light transmitting material, the support member being larger in size than the intermediate layer and the patterned resin layer, the intermediate layer being more flexible than the patterned resin layer, and the patterned resin layer having a pattern of high and low areas formed in a surface thereof that is the obverse of the pattern of high and low areas in a mold.
摘要翻译：提供了一种用于基于光学转印的纳米结构转印装置并且能够自动输送和对准的树脂压模。树脂压模包括由透光材料制成并具有机械强度的支撑构件，也由透光材料制成的中间层，以及也由透光材料制成的图案化树脂层，支撑构件尺寸比中间层和图案化树脂层，中间层比图案化树脂层更具柔性，并且图案化树脂层具有形成在其表面上的高和低区域的图案，其是高图案的图案和模具中的低面积。

3. 发明授权

US08096802B2 Nanoimprint stamper and a fine-structure transfer apparatus using the stamper 有权
标题翻译：纳米压印模和使用压模的精细结构转印装置
公开(公告)号：US08096802B2
公开(公告)日：2012-01-17
申请号：US12534232
申请日：2009-08-03
申请人： Kyoichi Mori , Noritake Shizawa , Susumu Komoriya , Akihiro Miyauchi , Takashi Ando , Tetsuhiro Hatogai
发明人： Kyoichi Mori , Noritake Shizawa , Susumu Komoriya , Akihiro Miyauchi , Takashi Ando , Tetsuhiro Hatogai
IPC分类号： B29C59/00 , B29B13/08
CPC分类号： B29C35/0888 , B29C33/0088 , B29C33/20 , B29C33/30 , B29C33/305 , B29C43/003 , B29C43/021 , B29C43/10 , B29C43/36 , B29C2035/0827 , B29C2043/025 , B29C2043/3634 , B29C2043/3652 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A nanoimprint stamper can simultaneously conform to two types of anomaly in the shape of a transfer substrate, for example warpage and surface protrusions (including foreign objects) that differ greatly in the wavelength of variation. The nanoimprint stamper is capable of performing transfer with a smaller number of defects and in a uniform way. The nanoimprint stamper includes a light-transmitting rigid substrate, a light-transmitting resilient plate, a light-trarsmitting and flexible rigid stamper base, a light-transmitting stamper buffer layer, and a light-transmitting patterned stamp layer. The stamper buffer layer has a lower Young's modulus than the patterned stamp layer.
摘要翻译：纳米压印模具可以同时符合转印基板形状的两种异常，例如在变化波长上差别很大的翘曲和表面突起（包括异物）。纳米压印压模能够以较少数量的缺陷和均匀的方式进行转印。纳米压印压模包括透光刚性基板，透光弹性板，光束和柔性刚性压模基座，透光压模缓冲层和透光图案印刷层。压模缓冲层具有比图案化的印模层更低的杨氏模量。

4. 发明申请

US20130224322A1 Method For Cleaning Fine Pattern Surface Of Mold, And Imprinting Device Using Same 审中-公开
标题翻译：用于清洁模具的精细图案表面的方法和使用其的印刷装置
公开(公告)号：US20130224322A1
公开(公告)日：2013-08-29
申请号：US13883844
申请日：2011-11-11
申请人： Noritake Shizawa , Naoaki Yamashita , Masashi Aoki , Tetsuhiro Hatogai
发明人： Noritake Shizawa , Naoaki Yamashita , Masashi Aoki , Tetsuhiro Hatogai
IPC分类号： B29C59/16 , B29C33/72
CPC分类号： B29C59/16 , B29C33/72 , B81C1/00857 , B81C99/009 , G03F7/0002
摘要： A method for removing foreign matters attaching on a surface of a fine pattern of a mold, having the fine pattern being convexo-concave, at least on one surface thereof, thereby cleaning the fine pattern surface of the mold, and an imprinting device applying that method therein, without removing, comprises the following steps of: applying a photo-curable resin on a surface of a body to be transcribed, onto which the mold is suppressed, and thereby forming a photo-curable resin layer; suppressing the mold on the photo-curable resin, which is applied on the surface of the body to be transcribed; separating the photo-curable resin cured from the mold, after curing the photo-curable resin, and whereby taking the foreign matters attaching on the surface of the fine pattern into the photo-curable resin cured to remove them, wherein the photo-curable resin to be formed on the surface of the body to be transcribed is formed with such thickness that it can remove the foreign matters attaching on the fine pattern, and also the mold is suppressed onto the photo-curable resin, which is formed on the surface of the body to be transcribed, under such pressure that it can remove the foreign matters attaching on the fine pattern.
摘要翻译：至少在其一个表面上除去附着在具有凹凸的微细图案的模具的精细图案的表面上的异物从而清洁模具的精细图案表面的方法以及应用该模具的压印装置的方法的方法，包括以下步骤：将光固化树脂施加到待转印体上的表面上，模具被抑制，从而形成光固化树脂层; 抑制施加在待转印体的表面上的光固化树脂上的模具; 分离固化光固化树脂后的光固化树脂，固化光固化树脂后，将附着在精细图案表面上的异物固化成光固化树脂以除去它们，其中光固化树脂形成在被转印体的表面上的厚度形成为能够除去附着在细图案上的异物的厚度，并且还将模具抑制在形成在表面上的光固化树脂上身体被转录，在这样的压力下，它可以消除附着在精细图案上的异物。

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