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1. 发明授权

US09714410B2 Cell culture method and utilization of the same 有权
公开(公告)号：US09714410B2
公开(公告)日：2017-07-25
申请号：US11793784
申请日：2005-12-26
申请人： Susumu Goto , Shohei Kishishita , Shinya Takuma , Chikashi Hirashima
发明人： Susumu Goto , Shohei Kishishita , Shinya Takuma , Chikashi Hirashima
IPC分类号： C12N5/00 , C12N5/18
CPC分类号： C12N5/0037 , C12N2500/80 , C12N2510/02
摘要： It is an object of the present invention to allow a cell to produce a protein at a high level using a medium containing an enzymatic degradation product of fish meat or a fish meat extract. A method of culturing a cell comprising starting culturing in an initial medium and feeding at least once a feed medium to the initial medium during culturing, wherein at least one of the initial medium or the feed medium contains an enzymatic degradation product of fish meat or a fish meat extract added thereto. A method of producing a protein of interest using the above culture method.

2. 发明申请

US20080124761A1 Cell Culture Method and Utilization of the Same 有权
标题翻译：细胞培养方法及其利用
公开(公告)号：US20080124761A1
公开(公告)日：2008-05-29
申请号：US11793784
申请日：2005-12-26
申请人： Susumu Goto , Shohei Kishishita , Shinya Takuma , Chikashi Hirashima
发明人： Susumu Goto , Shohei Kishishita , Shinya Takuma , Chikashi Hirashima
IPC分类号： C12P21/04 , C12N5/06
CPC分类号： C12N5/0037 , C12N2500/80 , C12N2510/02
摘要： It is an object of the present invention to allow a cell to produce a protein at a high level using a medium containing an enzymatic degradation product of fish meat or a fish meat extract. A method of culturing a cell comprising starting culturing in an initial medium and feeding at least once a feed medium to the initial medium during culturing, wherein at least one of the initial medium or the feed medium contains an enzymatic degradation product of fish meat or a fish meat extract added thereto. A method of producing a protein of interest using the above culture method.
摘要翻译：本发明的目的是允许细胞使用含有鱼肉或鱼肉提取物的酶降解产物的培养基来产生高水平的蛋白质。一种培养细胞的方法，包括在初始培养基中开始培养，并且在培养期间至少将进料培养基喂入初始培养基，其中初始培养基或饲料培养基中的至少一种含有鱼肉的酶降解产物或加入鱼肉提取物。使用上述培养方法制备感兴趣的蛋白质的方法。

3. 植物专利

USPP23055P2 Petunia plant named ‘Hoobenihime’ 有权
标题翻译：矮牵牛植物命名为Hoobenihime
公开(公告)号：USPP23055P2
公开(公告)日：2012-09-18
申请号：US13199130
申请日：2011-08-19
申请人： Koji Goto , Fusako Goto , Susumu Goto
发明人： Koji Goto , Fusako Goto , Susumu Goto
IPC分类号： A01H5/00
CPC分类号： A01H5/02
摘要： A Petunia variety named ‘Hoobenihime’ particularly distinguished by having red-purple flowers with a dark purple edge and small flower size is disclosed.
摘要翻译：披露了一种名叫“Hoobenihime”的矮牵牛品种，其特征在于具有深紫色边缘和小花朵尺寸的红紫色花朵。

4. 发明授权

US08228547B2 Image source apparatus and method of acquiring information from printer 有权
标题翻译：从打印机获取信息的图像源设备和方法
公开(公告)号：US08228547B2
公开(公告)日：2012-07-24
申请号：US11710178
申请日：2007-02-23
申请人： Akihito Tanimoto , Nagomi Mine , Susumu Goto
发明人： Akihito Tanimoto , Nagomi Mine , Susumu Goto
IPC分类号： G06F3/12 , G06K15/00 , H04N5/225
CPC分类号： H04N1/00278 , H04N2201/0015 , H04N2201/0084 , H04N2201/33321 , H04N2201/33328 , H04N2201/33335
摘要： An image source apparatus includes: a driver, operable to send the image data to the printer and to cause the printer to execute the printing based on the image data, in accordance with a prescribed standard; an application processor; and a storage. When the driver receives an initialization request from the application processor, the driver, after notifying the application processor of an acknowledgement of the initialization request, carries out an initialization process in accordance with the received initialization request, and the driver, after finishing the initialization process, acquires information on a plurality of items related to a specification of the printer from the printer in accordance with the prescribed standard and stores the information in the storage. When the driver receives an acquisition command for acquiring any of the plurality of items from the application processor, the driver returns information on the item related to the acquisition command to the application processor with reference to the storage.
摘要翻译：图像源装置包括：驱动器，用于根据规定的标准将图像数据发送到打印机并使打印机基于图像数据执行打印; 应用处理器; 和一个存储。当驾驶员从应用程序处理器接收到初始化请求时，驱动程序在通知应用程序处理程序之后确认初始化请求，在完成初始化过程之后根据接收到的初始化请求和驱动程序执行一个初始化过程根据规定的标准从打印机获取与打印机的规格有关的多个项目的信息，并将该信息存储在存储器中。当驾驶员从应用处理器接收到用于获取多个项目中的任何一个的获取命令时，驱动程序将关于获取命令的项目的信息返回给应用处理器。

5. 发明授权

US07960703B2 Charged-particle beam lithography apparatus and device manufacturing method 有权
标题翻译：带电粒子光刻设备及器件制造方法
公开(公告)号：US07960703B2
公开(公告)日：2011-06-14
申请号：US12184586
申请日：2008-08-01
申请人： Susumu Goto
发明人： Susumu Goto
IPC分类号： H01J37/12
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J37/145 , H01J37/3174 , H01J2237/047 , H01J2237/04926 , H01J2237/1538
摘要： A charged-particle beam lithography apparatus includes a projection system that projects a charged-particle beam, and images a pattern on a substrate with the projected charged-particle beam. The projection system has a symmetrical magnetic doublet lens configured to generate a magnetic field, and an electro-static lens configured to generate an electrical field superimposed on the magnetic field. The electro-static lens includes an electrode configured to apply, on at least the pupil plane of the symmetrical magnetic doublet lens, a potential to accelerate a charged-particle beam that has entered the symmetrical magnetic double lens.
摘要翻译：带电粒子束光刻设备包括投射带电粒子束的投影系统，并且通过投影的带电粒子束将图案图像化在基板上。投影系统具有被配置为产生磁场的对称磁双透镜，以及被配置为产生叠加在磁场上的电场的静电透镜。静电透镜包括配置成在至少对称磁性双透镜透镜的光瞳面上施加加速已经进入对称磁性双透镜的带电粒子束的电位的电极。

6. 植物专利

USPP16588P2 Petunia plant named ‘Temari’ 有权
标题翻译：矮牵牛植物名为“Temari”
公开(公告)号：USPP16588P2
公开(公告)日：2006-05-30
申请号：US10990883
申请日：2004-11-17
申请人： Koji Goto , Fusako Goto , Susumu Goto
发明人： Koji Goto , Fusako Goto , Susumu Goto
IPC分类号： A01H5/00
CPC分类号： A01H5/02
摘要： A Petunia cultivar particularly distinguished by a purple flower with a dark purple edge, decumbent growth habit and small flower diameter.
摘要翻译：一个矮牵牛品种特别是紫紫色的紫色边缘，长大的生长习惯和小花直径。

7. 发明申请

US20090057571A1 CHARGED-PARTICLE BEAM LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：充电光束光刻设备和器件制造方法
公开(公告)号：US20090057571A1
公开(公告)日：2009-03-05
申请号：US12184586
申请日：2008-08-01
申请人： Susumu Goto
发明人： Susumu Goto
IPC分类号： A61N5/00
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J37/145 , H01J37/3174 , H01J2237/047 , H01J2237/04926 , H01J2237/1538
摘要： This invention discloses a charged-particle beam lithography apparatus which comprises a projection system which projects a charged-particle beam, and images a pattern on a substrate with the projected charged-particle beam. The projection system comprises a symmetrical magnetic doublet lens configured to generate a magnetic field, and an electro-static lens configured to generate an electric field superimposed on the magnetic field. The electro-static lens includes an electrode configured to apply, on at least the pupil plane of the symmetrical magnetic doublet lens, a potential to accelerate the charged-particle beam which has entered the symmetrical magnetic doublet lens.
摘要翻译：本发明公开了一种带电粒子束光刻设备，其包括投射带电粒子束的投影系统，并用投射的带电粒子束在基片上成像图案。投影系统包括被配置为产生磁场的对称磁双透镜，以及被配置为产生叠加在磁场上的电场的静电透镜。静电透镜包括配置成在至少对称磁性双透镜透镜的光瞳面上施加加速已经进入对称磁性双透镜的带电粒子束的电位的电极。

8. 发明授权

US06246065B1 Electron beam projection exposure apparatus 有权
标题翻译：电子束投影曝光装置
公开(公告)号：US06246065B1
公开(公告)日：2001-06-12
申请号：US09145647
申请日：1998-09-02
申请人： Susumu Goto
发明人： Susumu Goto
IPC分类号： H01J37302
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3174 , H01J2237/063
摘要： This invention provides an electron beam projection exposure apparatus which can obtain a large irradiation width while maintaining an electron beam intensity required for exposure. An electron beam emitted by an electron gun (1) is transmitted through a condenser lens (2) and field lens (3), and illuminates a mask (4). The electron beam transmitted through the mask (4) is imaged and irradiated onto a wafer (7) via reduction projection lenses (5, 6), thus forming a pattern on the mask (4) on the wafer (7) by exposure. The electron gun (1) has an electron source, an electron emission surface of which has a circularly recessed central portion, and a ring-shaped electron beam emitted by the peripheral portion of the electron emission surface is used in exposure.
摘要翻译：本发明提供一种能够在保持曝光所需的电子束强度的同时获得大的照射宽度的电子束投影曝光装置。由电子枪（1）发射的电子束通过聚光透镜（2）和场透镜（3）透射，照射掩模（4）。通过掩模（4）透射的电子束被成像并经由还原投影透镜（5,6）照射到晶片（7）上，从而通过曝光在晶片（7）上的掩模（4）上形成图案。电子枪（1）具有电子源，其电子发射表面具有圆形凹入的中心部分，并且在曝光期间使用由电子发射表面的周边部分发射的环形电子束。

9. 发明授权

US4812662A Alignment system using an electron beam 失效
标题翻译：使用电子束的对准系统
公开(公告)号：US4812662A
公开(公告)日：1989-03-14
申请号：US9872
申请日：1987-02-02
申请人： Susumu Goto , Yuichi Kumabe , Masahiko Okunuki
发明人： Susumu Goto , Yuichi Kumabe , Masahiko Okunuki
IPC分类号： G03F9/00 , H01J37/304 , H01L21/027 , H01L21/67 , H01L21/68 , G01B15/00 , H01L21/66
CPC分类号： G03F9/70 , H01J37/3045
摘要： An alignment system for aligning a mask and a wafer each having an alignment mark, includes an irradiation system for irradiating the alignment marks of the mask and the wafer with an electron beam, a detecting system for detecting the amount of electron beam absorbed by the alignment marks, and an adjusting system for adjusting a relative position of the mask and the wafer, in accordance with the detection, so as to bring the mask and the wafer into a predetermined positional relation.
摘要翻译：用于对准具有对准标记的掩模和晶片的对准系统包括用电子束照射掩模和晶片的对准标记的照射系统，用于检测由对准物吸收的电子束的量的检测系统标记，以及用于根据检测调整掩模和晶片的相对位置的调整系统，以使掩模和晶片成为预定的位置关系。

10. 发明授权

US4086295A Polyamide composition 失效
标题翻译：聚酰胺组合物
公开(公告)号：US4086295A
公开(公告)日：1978-04-25
申请号：US751925
申请日：1976-12-16
申请人： Taketoshi Mori , Susumu Goto , Asaichi Katsuragi , Mutsuo Matsuki
发明人： Taketoshi Mori , Susumu Goto , Asaichi Katsuragi , Mutsuo Matsuki
IPC分类号： C08L77/00
CPC分类号： C08L77/00
摘要： A polyamide composition comprised of a mixture of 65-95% by weight of polyamide and 35-5% by weight of a copolymer of ethylene series containing unsaturated carboxylic acid components, the mixture having incorporated thereto 0.1-5% by weight of a carbonate compound such as ethylene carbonate or an epoxy compound such as butyl glycidyl ether. This composition is excellent in impact-strength and is thus suitable for use in interior or exterior parts of automobiles and housing materials.
摘要翻译：一种聚酰胺组合物，其由65-95重量％的聚酰胺和35-5重量％的含有不饱和羧酸组分的乙烯系共聚物的混合物组成，所述混合物中加入了0.1-5重量％的碳酸酯化合物例如碳酸亚乙酯或丁基缩水甘油醚等环氧化合物。该组合物的冲击强度优异，因此适用于汽车和外壳材料的内部或外部部件。

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