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1. 发明授权

US09244351B2 Composition for hardmask, method of forming patterns using the same, and semiconductor integrated circuit device including the patterns 有权
标题翻译：用于硬掩模的组合物，使用其形成图案的方法，以及包括图案的半导体集成电路器件
公开(公告)号：US09244351B2
公开(公告)日：2016-01-26
申请号：US14368858
申请日：2012-11-23
申请人： Sung-Jae Lee , Joon-Young Moon , Youn-Jin Cho , Young-Min Kim , Yong-Woon Yoon
发明人： Sung-Jae Lee , Joon-Young Moon , Youn-Jin Cho , Young-Min Kim , Yong-Woon Yoon
IPC分类号： G03F7/40 , G03F7/11 , G03F7/09 , H01L21/027 , G03F7/075 , H01L21/033
CPC分类号： G03F7/094 , G03F7/0752 , G03F7/09 , G03F7/091 , G03F7/40 , H01L21/0276 , H01L21/0332
摘要： A composition for a hardmask including copolymer including repeating units represented by Chemical Formulae 1 and 2 and a solvent, a method of forming a pattern using the same, and a semiconductor integrated circuit device including a pattern formed using the method are provided.
摘要翻译：提供包括由化学式1和2表示的重复单元的共聚物的硬掩模组合物和溶剂，使用其的形成图案的方法，以及包括使用该方法形成的图案的半导体集成电路器件。

2. 发明申请

US20140335447A1 COMPOSITION FOR HARDMASK, METHOD OF FORMING PATTERNS USING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS 有权
标题翻译： HARDMASK的组合物，使用其的形成图案的方法和包括图案的半导体集成电路装置
公开(公告)号：US20140335447A1
公开(公告)日：2014-11-13
申请号：US14368858
申请日：2012-11-23
申请人： Sung-Jae Lee , Joon-Young Moon , Youn-Jin Cho , Young-Min Kim , Yong-Woon Yoon
发明人： Sung-Jae Lee , Joon-Young Moon , Youn-Jin Cho , Young-Min Kim , Yong-Woon Yoon
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F7/094 , G03F7/0752 , G03F7/09 , G03F7/091 , G03F7/40 , H01L21/0276 , H01L21/0332
摘要： A composition for a hardmask including copolymer including repeating units represented by Chemical Formulae 1 and 2 and a solvent, a method of forming a pattern using the same, and a semiconductor integrated circuit device including a pattern formed using the method are provided.
摘要翻译：提供包括由化学式1和2表示的重复单元的共聚物的硬掩模组合物和溶剂，使用其的形成图案的方法，以及包括使用该方法形成的图案的半导体集成电路器件。

3. 发明授权

US08900997B2 Method for forming a dual damascene structure of a semiconductor device, and a semiconductor device therewith 有权
标题翻译：用于形成半导体器件的双镶嵌结构的方法及其半导体器件
公开(公告)号：US08900997B2
公开(公告)日：2014-12-02
申请号：US14072881
申请日：2013-11-06
申请人： Joon-Young Moon , Youn-Jin Cho , Sung-Jae Lee , You-Jung Park , Yong-Woon Yoon , Chul-Ho Lee , Chung-Heon Lee
发明人： Joon-Young Moon , Youn-Jin Cho , Sung-Jae Lee , You-Jung Park , Yong-Woon Yoon , Chul-Ho Lee , Chung-Heon Lee
IPC分类号： H01L21/44 , H01L23/522 , H01L23/532 , H01L21/768
CPC分类号： H01L21/76804 , H01L21/76808 , H01L23/5226 , H01L23/53295 , H01L2924/0002 , H01L2924/00
摘要： Forming a dual damascene structure includes forming a first insulation layer and a second insulation layer, forming a resist mask, forming a via hole down to a lower end of the first insulation layer, forming a hardmask layer in the via hole and on the second insulation layer using a spin-coating method, forming a resist mask, forming a first trench hole down to a lower end of the second insulation layer, respectively removing a part of the hardmask layer in the via hole and a part of the hardmask layer on the second insulation layer, forming a second trench hole by removing a part of the first insulation layer between a top corner of the hardmask layer remaining in the via hole and a bottom corner of the first trench hole, removing the hardmask layer, and filling the via hole and the second trench hole with a conductive material.
摘要翻译：形成双镶嵌结构包括形成第一绝缘层和第二绝缘层，形成抗蚀剂掩模，在第一绝缘层的下端形成通孔，在通孔中和第二绝缘层上形成硬掩模层层，形成抗蚀剂掩模，在第二绝缘层的下端形成第一沟槽，分别去除通孔中的硬掩模层的一部分和硬掩模层的一部分，第二绝缘层，通过去除残留在通孔中的硬掩模层的顶角之间的第一绝缘层的一部分和第一沟槽的底角，形成第二沟槽，去除硬掩模层，并且填充通孔孔和具有导电材料的第二沟槽孔。

4. 发明授权

US09284245B2 Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition 有权
标题翻译：用于硬掩模组合物和硬掩模组合物的单体，包括使用硬掩模组合物形成图案的单体和方法
公开(公告)号：US09284245B2
公开(公告)日：2016-03-15
申请号：US14083598
申请日：2013-11-19
申请人： Sung-Jae Lee , Hwan-Sung Cheon , Youn-Jin Cho , Chul-Ho Lee , Chung-Heon Lee
发明人： Sung-Jae Lee , Hwan-Sung Cheon , Youn-Jin Cho , Chul-Ho Lee , Chung-Heon Lee
IPC分类号： C07C43/23 , G03F7/09 , G03F7/20 , C07C33/26 , G03F7/075 , G03F7/40
CPC分类号： C07C33/26 , C07C43/23 , G03F7/0752 , G03F7/09 , G03F7/40
摘要： A monomer for a hardmask composition represented by the following Chemical Formula 1,
摘要翻译：用于由以下化学式1表示的硬掩模组合物的单体，

5. 发明申请

US20110123925A1 POLYMER FOR PROTECTIVE LAYER OF RESIST, AND POLYMER COMPOSITION INCLUDING THE SAME 审中-公开
标题翻译：用于保护层的聚合物和包括其的聚合物组合物
公开(公告)号：US20110123925A1
公开(公告)日：2011-05-26
申请号：US12950369
申请日：2010-11-19
申请人： Sang-Geun YUN , Sang-Jun Choi , Seung-Jib Choi , Sung-Jae Lee
发明人： Sang-Geun YUN , Sang-Jun Choi , Seung-Jib Choi , Sung-Jae Lee
IPC分类号： G03F7/004 , G03F7/20 , C08F220/28 , C09D127/12
CPC分类号： C08F220/28 , C08F220/18 , C08F220/22 , C08F220/38 , G03F7/0752 , G03F7/11 , G03F7/2041
摘要： A polymer includes a first repeating unit represented by the following Chemical Formula 1, and a second repeating unit including at least one repeating unit represented by the following Chemical Formulae 2 to 6.
摘要翻译：聚合物包括由以下化学式1表示的第一重复单元和包含由以下化学式2至6表示的至少一个重复单元的第二重复单元。

6. 发明申请

US20110045405A1 (Meth)acrylate compound, photosensitive polymer, and resist composition 审中-公开
标题翻译：（甲基）丙烯酸酯化合物，光敏聚合物和抗蚀剂组合物
公开(公告)号：US20110045405A1
公开(公告)日：2011-02-24
申请号：US12805726
申请日：2010-08-17
申请人： Sung-Jae Lee , Tae-Ho Kim , Jun-Suk Kim , Jin-Young Lee , Kang Ryu , Sang-Jun Choi
发明人： Sung-Jae Lee , Tae-Ho Kim , Jun-Suk Kim , Jin-Young Lee , Kang Ryu , Sang-Jun Choi
IPC分类号： G03F7/004 , C07D307/93 , C07D495/04 , C08F24/00 , C08F28/06
CPC分类号： C07D307/93 , C07D493/08 , C07D495/08 , C08F220/18 , C08F220/28 , G03F7/0397
摘要： Disclosed are a (meth)acrylate compound, a photosensitive polymer, and a resist composition, and the (meth)acrylate compound includes a lactone-group-containing (meth)acrylate compound represented by the following Chemical Formula 1.
摘要翻译：公开了（甲基）丙烯酸酯化合物，光敏聚合物和抗蚀剂组合物，（甲基）丙烯酸酯化合物包含由以下化学式1表示的含内酯基的（甲基）丙烯酸酯化合物。

7. 发明授权

US06339876B1 Method for assembling an inner core/cylinder block assembly for linear compressor 失效
标题翻译：用于组装线性压缩机的内芯/气缸体组件的方法
公开(公告)号：US06339876B1
公开(公告)日：2002-01-22
申请号：US09627394
申请日：2000-07-27
申请人： Sung-Jae Lee
发明人： Sung-Jae Lee
IPC分类号： B23P1500
CPC分类号： F04B35/045 , Y10T29/49236
摘要： A method for manufacturing a linear compressor which has a cylinder block with a compressing chamber and an inner core which has a plurality of electric steel plates disposed around the cylinder block. The method includes punching each of the electric steel plates, radially stacking such plates and welding them to the inner core. The inner core is inserted into a cast mold for casting the cylinder block. Molten metal is then poured into the cast mold and pressure is applied to the cast mold so that the molten material fills the spaces between the electric steel plates, thus making the inner core integral with the cylinder block.
摘要翻译：一种线性压缩机的制造方法，该线性压缩机具有具有压缩室的气缸体和具有设置在气缸体周围的多个电动钢板的内芯。该方法包括冲压每个电钢板，径向堆叠这些板并将其焊接到内芯上。将内芯插入用于铸造气缸体的铸模中。然后将熔融金属倒入铸模中，并将压力施加到铸模上，使得熔融材料填充电钢板之间的空间，从而使内芯与气缸体一体。

8. 发明授权

US6077054A Stator of linear compressor 有权
标题翻译：线性压缩机定子
公开(公告)号：US6077054A
公开(公告)日：2000-06-20
申请号：US206963
申请日：1998-12-08
申请人： Sung-Jae Lee , Phil-Soo Jang
发明人： Sung-Jae Lee , Phil-Soo Jang
IPC分类号： H02K1/12 , F04B35/04 , H02K3/32 , H02K3/46 , H02K33/16 , F04B17/04
CPC分类号： F04B35/045 , H02K3/325 , H02K33/16
摘要： There is disclosed a stator of a linear compressor which comprises a bobbin of a cylindrical shape having a recess for winding coils at the outer circumference thereof, coils wound in the coil winding recess, and a plurality of cores inserted into the bobbin. A plurality of guide rails extending to the axial direction of the bobbin are arranged radially at regular intervals on the inner circumference of the bobbin and the cores are mounted between the respective guide rails. Further, a plurality of guide projections extending outward from the outer circumferences of the upper and lower ends of the bobbin are arranged at regular intervals. In addition, there are further provided a plurality of supporting jaws extending toward the inside of the bobbin between the respective guide rails.
摘要翻译：公开了一种线性压缩机的定子，其包括圆筒形的线轴，其具有用于在其外周缠绕线圈的线圈，缠绕在线圈绕组凹部中的线圈和插入到线轴中的多个芯。沿着筒管的轴向延伸的多个导轨以规则的间隔排列在线轴的内周上，并且芯安装在相应的导轨之间。此外，以规则的间隔布置从筒管的上端和下端的外周向外延伸的多个引导突起。此外，还在各导轨之间设置有向筒管内侧延伸的多个支撑爪。

9. 发明申请

US20100167200A1 (Meth)acrylate compound, photosensitive polymer, and resist composition including the same 审中-公开
标题翻译：（甲基）丙烯酸酯化合物，感光性聚合物和含有它们的抗蚀剂组合物
公开(公告)号：US20100167200A1
公开(公告)日：2010-07-01
申请号：US12654740
申请日：2009-12-30
申请人： Sang-Jun Choi , Sung-Jae Lee , Seung-Jib Choi
发明人： Sang-Jun Choi , Sung-Jae Lee , Seung-Jib Choi
IPC分类号： G03F7/004 , C07D307/12 , C07C69/608 , C08F24/00 , C08F32/08
CPC分类号： C07C69/67 , C07C2603/74 , C07D307/33 , C08F232/04 , C08F232/08 , G03F7/0397
摘要： A (meth)acrylate compound having an acid-labile ester group, a photosensitive polymer, and a resist composition including the same, the (meth)acrylate compound being represented by the following Chemical Formula 1 wherein, R1 is hydrogen or methyl, R2 and R3 are each independently a substituted or unsubstituted linear alkyl, a substituted or unsubstituted cyclic alkyl, or linked each other to form a monocyclic ring or a fused-ring, and R4 is a linear ester or cyclic ester group.
摘要翻译：具有酸不稳定酯基的（甲基）丙烯酸酯化合物，感光性聚合物和包含它们的抗蚀剂组合物，（甲基）丙烯酸酯化合物由以下化学式1表示，其中R 1是氢或甲基，R 2和 R 3各自独立地为取代或未取代的直链烷基，取代或未取代的环烷基，或彼此连接形成单环或稠环，并且R 4为直链酯或环酯基。

10. 发明申请

US20050028840A1 Method of and apparatus for eluting impurities 失效
标题翻译：洗脱杂质的方法和装置
公开(公告)号：US20050028840A1
公开(公告)日：2005-02-10
申请号：US10893233
申请日：2004-07-19
申请人： Sung-Jae Lee , Bok-Soon Ko
发明人： Sung-Jae Lee , Bok-Soon Ko
IPC分类号： H01L21/304 , B08B3/04 , H01L21/00 , B08B3/00
CPC分类号： H01L21/67051 , B08B3/048 , Y10S134/902
摘要： Impurities can be eluted simultaneously from a plurality of local areas of a surface layer of a semiconductor substrate. A supporting unit supports the substrate, and a sample plate is disposed on the surface of the substrate. The sample plate has a plurality of holes that expose the local areas of the surface of the substrate. Eluant is provided onto the local areas of the surface layer of the substrate through the holes in the sample plate. The impurities are thus dissolved by the eluant to produce a sample. A nozzle transfers the sample from the local areas of the surface of the substrate to a plurality of sample cups. Therefore, samples from the surface layer of the substrate may be produced in a short amount of time.
摘要翻译：杂质可以从半导体衬底的表面层的多个局部区域同时洗脱。支撑单元支撑基板，并且样品板设置在基板的表面上。样品板具有暴露基板表面的局部区域的多个孔。通过样品板中的孔将洗脱液提供到基底的表面层的局部区域上。因此，杂质被洗脱剂溶解以产生样品。喷嘴将样品从基材表面的局部区域转移到多个样品杯。因此，可以在短时间内制造来自基板的表面层的样品。

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