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1. 发明授权

US07935175B2 Apparatus for trapping carbon nanotube and system and method for producing the carbon nanotube 有权
标题翻译：用于捕获碳纳米管的装置及其制造方法和碳纳米管的制造方法
公开(公告)号：US07935175B2
公开(公告)日：2011-05-03
申请号：US11889230
申请日：2007-08-10
申请人： Suk-Won Jang , Young-Chul Joung
发明人： Suk-Won Jang , Young-Chul Joung
IPC分类号： B03C1/32
CPC分类号： B03C1/286 , B03C1/288 , B82Y30/00 , B82Y40/00 , C01B32/162 , C01B32/17
摘要： This invention relates to a carbon nanotube producing system. A carbon nanotube producing system includes a reaction tube in which a metal catalyst and a carbon-containing gas are supplied and carbon nanotube grows on the metal catalyst by pyrolysis; an exhaust line along which a gas including the carbon nanotube grown on the metal catalyst is exhausted from the reaction tube; and a carbon nanotube trapping apparatus installed on the exhaust line and configured to trap the carbon nanotube grown on the metal catalyst by using a magnetic force.
摘要翻译：本发明涉及碳纳米管制造系统。碳纳米管制造系统包括供给金属催化剂和含碳气体的反应管，碳纳米管通过热解在金属催化剂上生长; 将从金属催化剂生长的碳纳米管的气体从反应管排出的排气管，以及碳纳米管捕集装置，其安装在所述排气管上并且被构造成通过使用磁力捕获在所述金属催化剂上生长的所述碳纳米管。

2. 发明申请

US20080233041A1 Apparatus for trapping carbon nanotube and system and method for producing the carbon nanotube 有权
标题翻译：用于捕获碳纳米管的装置及其制造方法和碳纳米管的制造方法
公开(公告)号：US20080233041A1
公开(公告)日：2008-09-25
申请号：US11889230
申请日：2007-08-10
申请人： Suk-Won Jang , Young-Chul Joung
发明人： Suk-Won Jang , Young-Chul Joung
IPC分类号： C01B31/02 , B01J19/00 , B03C1/00
CPC分类号： B03C1/286 , B03C1/288 , B82Y30/00 , B82Y40/00 , C01B32/162 , C01B32/17
摘要： This invention relates to a carbon nanotube producing system. A carbon nanotube producing system includes a reaction tube in which a metal catalyst and a carbon-containing gas are supplied and carbon nanotube grows on the metal catalyst by pyrolysis; an exhaust line along which a gas including the carbon nanotube grown on the metal catalyst is exhausted from the reaction tube; and a carbon nanotube trapping apparatus installed on the exhaust line and configured to trap the carbon nanotube grown on the metal catalyst by using a magnetic force.
摘要翻译：本发明涉及碳纳米管制造系统。碳纳米管制造系统包括供给金属催化剂和含碳气体的反应管，碳纳米管通过热解在金属催化剂上生长; 将从金属催化剂生长的碳纳米管的气体从反应管排出的排气管，以及碳纳米管捕集装置，其安装在所述排气管上并且被构造成通过使用磁力捕获在所述金属催化剂上生长的所述碳纳米管。

3. 发明申请

US20090269492A1 Apparatus and Method for Deposition Organic Compounds, and Substrate Treating Facility With the Apparatus 审中-公开
标题翻译：用于沉积有机化合物的装置和方法，以及用该装置的基板处理设备
公开(公告)号：US20090269492A1
公开(公告)日：2009-10-29
申请号：US12084624
申请日：2006-11-02
申请人： Il-Ho No , Suk--Min Choi , Young-Chul Joung
发明人： Il-Ho No , Suk--Min Choi , Young-Chul Joung
IPC分类号： C23C16/44 , C23C16/54
CPC分类号： C23C14/12 , C23C14/042 , C23C14/243
摘要： An apparatus for depositing organic compounds is provided to deposit predetermined organic films on a substrate. The apparatus includes a deposition chamber, a support member provided inside the deposition chamber and supporting the substrate to make a deposition surface of the substrate face downwardly, a vaporizer installing portion in which an organic vaporizer is installed to vaporize organic compounds to the deposition surface of the substrate, and a vaporizer replacing portion disposed adjacent to the vaporizer installing portion to replace the organic vaporizer. According to the apparatus, organic vaporizers for vaporizing organic compounds are replaced automatically.
摘要翻译：提供了一种用于沉积有机化合物的装置以在基板上沉积预定的有机膜。该装置包括沉积室，设置在沉积室内部并支撑基板以使基板的沉积表面朝下的支撑构件，蒸发器安装部分，其中安装有机蒸发器以将有机化合物蒸发到沉积表面基板和邻近蒸发器安装部分设置的蒸发器更换部分以替换有机蒸发器。根据该装置，用于汽化有机化合物的有机蒸发器被自动替换。

4. 发明授权

US07918940B2 Apparatus for processing substrate 有权
标题翻译：基板处理装置
公开(公告)号：US07918940B2
公开(公告)日：2011-04-05
申请号：US11342610
申请日：2006-01-31
申请人： Ki-Choul An , Young-Chul Joung , Tae-Young Ha , Jung-Won Chang , Il-Ho Noh , Seung-Bae Lee
发明人： Ki-Choul An , Young-Chul Joung , Tae-Young Ha , Jung-Won Chang , Il-Ho Noh , Seung-Bae Lee
IPC分类号： C23C16/00
CPC分类号： H01L21/67236 , H01L21/67173 , H01L21/67748
摘要： In a substrate processing apparatus for forming thin layers on a substrate used for an organic light emitting diode, the apparatus includes a mask attaching chamber, a deposition chamber and a mask detaching chamber. The mask attaching chamber, the deposition chamber and the mask detaching chamber are provided with a transferring guide installed thereinside, and a substrate supporter for supporting the substrate moves along the transferring guide in or between the chambers. Thus, a time for processing the substrate and an area for the apparatus may be reduced. Also, the chambers are grouped in one or more, and a gate valve is installed between the grouped chambers for opening and closing a path between the grouped chambers. Accordingly, the chambers may be continuously maintained in a vacuum state when any one of the chambers is repaired.
摘要翻译：在用于有机发光二极管的基板上形成薄层的基板处理装置中，该装置包括掩模附着室，沉积室和掩模分离室。掩模附着室，沉积室和掩模拆卸室设置有安装在其上的传送导向器，用于支撑基板的基板支撑件沿着传送导向件在室内或室之间移动。因此，可以减少处理基板和设备的区域的时间。而且，这些室分组成一个或多个，并且闸门安装在分组室之间，用于打开和关闭分组室之间的路径。因此，当任何一个腔室被修复时，腔室可以被连续地保持在真空状态。

5. 发明申请

US20100233061A1 METHOD OF FABRICATING SUPERHYDROPHOBIC SILICA CHAIN POWDERS 审中-公开
标题翻译：制造超级二氧化硅粉末粉末的方法
公开(公告)号：US20100233061A1
公开(公告)日：2010-09-16
申请号：US12749266
申请日：2010-03-29
申请人： Ho Sung Park , Sharad D. Bhagat , Jong-Hyun Lim , Young-Chul Joung , Seung-Yong Jee , Jong-Chul Park , In-Soon Jung
发明人： Ho Sung Park , Sharad D. Bhagat , Jong-Hyun Lim , Young-Chul Joung , Seung-Yong Jee , Jong-Chul Park , In-Soon Jung
IPC分类号： C01B33/152
CPC分类号： C01B33/166
摘要： Disclosed herein is a method of fabricating superhydrophobic silica-based powder, comprising: forming a hydrogel by adding an organosilane compound having alkaline pH and an inorganic acid to a non-ion-exchanged water glass solution, which is a precursor, to form a mixed solution and then surface-modifying and gelating the mixed solution; dipping the hydrogel into a nonpolar solvent to solvent-exchange the hydrogel and remove sodium ions (Na+) therefrom; and drying the solvent-exchanged hydrogel through a fluidized bed drying method under normal pressure or reduced pressure to fabricate aerogel powder. According to the method of fabricating a superhydrophobic silica-based powder of the present invention, the process thereof is very simple and economical. Therefore, the present invention is expected to be industrially important.
摘要翻译：本文公开了一种制造超疏水性二氧化硅基粉末的方法，其包括：通过向作为前体的非离子交换水玻璃溶液中加入具有碱性pH和无机酸的有机硅烷化合物形成水凝胶，以形成混合溶液，然后对混合溶液进行表面改性和凝胶化; 将水凝胶浸入非极性溶剂中以溶剂交换水凝胶并从其中除去钠离子（Na +）; 并在常压或减压下通过流化床干燥方法干燥溶剂交换的水凝胶以制备气凝胶粉末。根据本发明的超疏水性二氧化硅系粉末的制造方法，其工艺非常简单且经济。因此，本发明预期在工业上是重要的。

6. 发明申请

US20060174829A1 Apparatus for processing substrate 有权
标题翻译：基板处理装置
公开(公告)号：US20060174829A1
公开(公告)日：2006-08-10
申请号：US11342610
申请日：2006-01-31
申请人： Ki-Choul An , Young-Chul Joung , Tae-Young Ha , Jung-Won Chang , Il-Ho Noh , Seung-Bae Lee
发明人： Ki-Choul An , Young-Chul Joung , Tae-Young Ha , Jung-Won Chang , Il-Ho Noh , Seung-Bae Lee
IPC分类号： B05C11/02 , B05C11/11 , B05C11/00
CPC分类号： H01L21/67236 , H01L21/67173 , H01L21/67748
摘要： In a substrate processing apparatus for forming thin layers on a substrate used for an organic light emitting diode, the apparatus includes a mask attaching chamber, a deposition chamber and a mask detaching chamber. The mask attaching chamber, the deposition chamber and the mask detaching chamber are provided with a transferring guide installed thereinside, and a substrate supporter for supporting the substrate moves along the transferring guide in or between the chambers. Thus, a time for processing the substrate and an area for the apparatus may be reduced. Also, the chambers are grouped in one or more, and a gate valve is installed between the grouped chambers for opening and closing a path between the grouped chambers. Accordingly, the chambers may be continuously maintained in a vacuum state when any one of the chambers is repaired.
摘要翻译：在用于有机发光二极管的基板上形成薄层的基板处理装置中，该装置包括掩模附着室，沉积室和掩模分离室。掩模附着室，沉积室和掩模拆卸室设置有安装在其上的传送导向器，用于支撑基板的基板支撑件沿着传送导向件在室内或室之间移动。因此，可以减少处理基板和设备的区域的时间。而且，这些室分组成一个或多个，并且闸门安装在分组室之间，用于打开和关闭分组室之间的路径。因此，当任何一个腔室被修复时，腔室可以被连续地保持在真空状态。

7. 发明申请

US20100172815A1 Method of Manufacturing Superhydrophobic Silica-Based Powder 审中-公开
标题翻译：制造超疏水硅石粉的方法
公开(公告)号：US20100172815A1
公开(公告)日：2010-07-08
申请号：US12601523
申请日：2007-12-04
申请人： Ho Sung Park , Sharad D. Bhagat , Jong-Hyun Lim , Young-Chul Joung , Jong-Chul Park , Seung-Yong Jee
发明人： Ho Sung Park , Sharad D. Bhagat , Jong-Hyun Lim , Young-Chul Joung , Jong-Chul Park , Seung-Yong Jee
IPC分类号： C01B33/141
CPC分类号： C01B33/1585 , C01B33/143
摘要： Disclosed is a method of manufacturing superhydrophobic silica-based powder, including adding a water glass solution, which is not subjected to ion exchange, serving as a precursor, with an organosilane compound having an alkaline pH and an inorganic acid to thus subject the water glass solution to surface modification and gelation, thereby producing hydrogel, immersing the hydrogel in a nonpolar solvent to thus subject the hydrogel to solvent exchange and Na+ removal, and drying the hydrogel, subjected to solvent exchange, at ambient pressure, thereby manufacturing aerogel powder. This invention is very important from an industrial point of view because it involves a very simple process and realizes economic benefits.
摘要翻译：公开了一种制造超疏水性二氧化硅基粉末的方法，包括将不进行离子交换的水玻璃溶液与具有碱性pH和无机酸的有机硅烷化合物一起添加作为前体，从而使水玻璃溶液进行表面改性和凝胶化，由此制备水凝胶，将水凝胶浸入非极性溶剂中，从而使水凝胶进行溶剂交换和Na +去除，并在环境压力下干燥进行溶剂交换的水凝胶，从而制备气凝胶粉末。本发明从工业角度来看是非常重要的，因为它涉及到非常简单的过程并实现经济效益。

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