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1. 发明申请

US20050005853A1 Device for the coating of objects 有权
标题翻译：物体涂层装置
公开(公告)号：US20050005853A1
公开(公告)日：2005-01-13
申请号：US10486140
申请日：2002-08-07
申请人： Stephan Behle , Lars Bewig , Thomas Kupper , Wolfram Maring , Christoph Molle , Marten Walther
发明人： Stephan Behle , Lars Bewig , Thomas Kupper , Wolfram Maring , Christoph Molle , Marten Walther
IPC分类号： H05H1/46 , C23C16/511 , H01J37/32 , H01P5/12 , C23C16/00
CPC分类号： H01J37/32229 , C23C16/511 , H01J37/32192
摘要： An apparatus for coating objects having a single microwave source, two or more coating chambers, and an impedance structure or a waveguide structure. The coating chambers are connected to the single microwave source. The impedance structure or waveguide structure divides the microwave energy in order to generate plasmas in the coating chambers.
摘要翻译：一种用于涂覆具有单个微波源，两个或更多个涂层室以及阻抗结构或波导结构的物体的设备。涂层室连接到单个微波源。阻抗结构或波导结构划分微波能量，以便在涂层室中产生等离子体。

2. 发明授权

US07434537B2 Device for the coating of objects 有权
标题翻译：物体涂层装置
公开(公告)号：US07434537B2
公开(公告)日：2008-10-14
申请号：US10486140
申请日：2002-08-07
申请人： Stephan Behle , Lars Bewig , Thomas Küpper , Wolfram Maring , Christoph Mölle , Marten Walther
发明人： Stephan Behle , Lars Bewig , Thomas Küpper , Wolfram Maring , Christoph Mölle , Marten Walther
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32229 , C23C16/511 , H01J37/32192
摘要： An apparatus for coating objects having a single microwave source, two or more coating chambers, and an impedance structure or a waveguide structure. The coating chambers are connected to the single microwave source. The impedance structure or waveguide structure divides the microwave energy in order to generate plasmas in the coating chambers.
摘要翻译：一种用于涂覆具有单个微波源，两个或更多个涂层室以及阻抗结构或波导结构的物体的设备。涂层室连接到单个微波源。阻抗结构或波导结构划分微波能量，以便在涂层室中产生等离子体。

3. 发明授权

US07306830B2 Method for coating the quartz burner of an HID lamp 失效
标题翻译：用于涂覆HID灯的石英燃烧器的方法
公开(公告)号：US07306830B2
公开(公告)日：2007-12-11
申请号：US10502408
申请日：2003-01-28
申请人： Wolfgang Moehl , Lars Bewig , Thomas Kuepper , Wolfram Maring , Christopher Moelle
发明人： Wolfgang Moehl , Lars Bewig , Thomas Kuepper , Wolfram Maring , Christopher Moelle
IPC分类号： H05H1/24 , H01J61/40
CPC分类号： C03C17/3417 , H01J61/35
摘要： In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOy and SiOx by means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.
摘要翻译：为了提高HID灯的能量平衡，石英燃烧器，优选其内部，通过交替地施加至少由氧化钛和氧化硅制成的非晶薄层，涂覆有一般的化学计量的TiO 通过等离子体脉冲化学气相沉积（PICVD）方法在高功率密度和100°至400°C范围内提高的衬底温度下，使用范围从1nm /秒到100nm / sec的小增长率，以便形成厚度小于1200nm的干涉层系统和0.1至1％范围内的最小化UV有源缺陷点率。

4. 发明授权

US06629763B2 Object which has optical layers 有权
标题翻译：具有光学层的物体
公开(公告)号：US06629763B2
公开(公告)日：2003-10-07
申请号：US09872049
申请日：2001-06-01
申请人： Christoph Moelle , Thomas Küpper , Lars Bewig , Wolfram Maring , Jochen Heinz
发明人： Christoph Moelle , Thomas Küpper , Lars Bewig , Wolfram Maring , Jochen Heinz
IPC分类号： G02B7182
CPC分类号： C23C16/029 , B05D1/62 , B05D7/56 , B05D2201/02 , C08J7/04 , C08J2323/02 , C23C16/515 , G02B1/10
摘要： A process for producing an object which has optical layers comprising the steps of applying optical layers to a substrate of plastic material wherein the optical layers are applied by means of a chemical plasma-impulse vaporization process (PICVD).
摘要翻译：一种用于制造具有光学层的物体的方法，包括以下步骤：将光学层施加到塑料材料的基底上，其中通过化学等离子体脉冲蒸发处理（PICVD）施加光学层。

5. 发明申请

US20060246321A1 Layer system comprising a titanium-aluminium-oxide layer 有权
标题翻译：层系统包括钛 - 氧化铝层
公开(公告)号：US20060246321A1
公开(公告)日：2006-11-02
申请号：US10527494
申请日：2003-09-13
申请人： Christoph Molle , Lars Bewig , Frank Koppe , Thomas Kuepper , Stefan Geisler , Stefan Bauer , Jurgen Dzick , Christian Henn
发明人： Christoph Molle , Lars Bewig , Frank Koppe , Thomas Kuepper , Stefan Geisler , Stefan Bauer , Jurgen Dzick , Christian Henn
IPC分类号： B32B17/06 , B32B9/00 , B32B19/00
CPC分类号： G02B5/285 , C03C17/3417 , C03C2217/734 , C03C2218/156 , C03C2218/322 , C23C14/0078 , C23C14/022 , C23C14/34 , C23C14/56 , C23C28/042 , C23C28/42 , G02B1/105 , G02B1/14 , Y10T428/12576 , Y10T428/12611
摘要： The invention relates to layer systems having at least one layer comprising titanium aluminum oxide. The layer comprising titanium aluminum oxide may be either a functional layer—with or without interruption by an intermediate layer which is optically inactive—or a functional layer formed from a metal oxide which is interrupted by an intermediate layer comprising titanium aluminum oxide. The layer systems are structurally and thermally stable at operating temperatures of over 600° C. The layer systems may either comprise only one functional layer or may be a multilayer system, preferably an alternating layer system composed of functional layers with high and low refractive indices.
摘要翻译：本发明涉及具有至少一层包含钛铝氧化物的层系统。包含钛氧化铝的层可以是功能层 - 具有或不具有光学无活性的中间层或由金属氧化物形成的功能层中断，该金属氧化物由包含钛铝氧化物的中间层中断。层系统在超过600℃的操作温度下在结构和热稳定性。层系统可以仅包括一个功能层，或者可以是多层系统，优选地由具有高和低折射率的功能层组成的交替层系统。

6. 发明申请

US20050163939A1 Method for coating the quartz burner of an hid lamp 失效
标题翻译：用于涂覆隐藏灯的石英燃烧器的方法
公开(公告)号：US20050163939A1
公开(公告)日：2005-07-28
申请号：US10502408
申请日：2003-01-28
申请人： Wolfgang Moehl , Lars Bewig , Thomas Kuepper , Wolfram Maring , Christoph Moelle
发明人： Wolfgang Moehl , Lars Bewig , Thomas Kuepper , Wolfram Maring , Christoph Moelle
IPC分类号： C03C17/34 , C23C16/30 , H01J61/35 , H05H1/24
CPC分类号： C03C17/3417 , H01J61/35
摘要： In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOy and SiOx by means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.
摘要翻译：为了提高HID灯的能量平衡，石英燃烧器，优选其内部，通过交替地施加至少由氧化钛和氧化硅制成的非晶薄层，涂覆有一般的化学计量的TiO 通过等离子体脉冲化学气相沉积（PICVD）方法在高功率密度和100°至400°C范围内提高的衬底温度下，使用范围从1nm /秒到100nm / sec的小增长率，以便形成厚度小于1200nm的干涉层系统和0.1至1％范围内的最小化UV有源缺陷点率。

7. 发明授权

US06918676B2 Object which has optical layers 失效
标题翻译：具有光学层的物体
公开(公告)号：US06918676B2
公开(公告)日：2005-07-19
申请号：US10637203
申请日：2003-08-08
申请人： Christopher Moelle , Thomas Küpper , Lars Bewig , Wolfram Maring , Jochen Heinz
发明人： Christopher Moelle , Thomas Küpper , Lars Bewig , Wolfram Maring , Jochen Heinz
IPC分类号： G02B5/08 , B05D5/06 , B05D7/00 , B05D7/04 , B05D7/24 , B32B7/02 , B32B27/30 , B32B27/32 , C08J7/00 , C23C16/02 , C23C16/50 , C23C16/515 , F21S8/10 , F21V7/00 , F21V7/22 , F21V17/00 , F21W101/10 , G02B1/10 , G02B1/11 , G02B1/12 , G02B5/10 , G02B7/182
CPC分类号： C23C16/029 , B05D1/62 , B05D7/56 , B05D2201/02 , C08J7/04 , C08J2323/02 , C23C16/515 , G02B1/10
摘要： The invention relates to a process for producing an object which has optical layers. According to the invention such a process comprises the following process steps: To a substrate of plastic material several optical layers are applied; the optical layers are applied by means of a chemical plasma-impulse vaporization (PICVC).
摘要翻译：本发明涉及一种具有光学层的物体的制造方法。根据本发明，这种方法包括以下工艺步骤：向塑料材料的基底施加几个光学层; 通过化学等离子体脉冲蒸发（PICVC）来施加光学层。

8. 发明授权

US06177148B1 Plasma CVD system with an array of microwave plasma electrodes and plasma CVD process 有权
标题翻译：具有阵列微波等离子体电极和等离子体CVD工艺的等离子体CVD系统
公开(公告)号：US06177148B1
公开(公告)日：2001-01-23
申请号：US09254061
申请日：1999-05-10
申请人： Marten Walther , Wolfgang Möhl , Burkhard Danielzik , Markus Kuhr , Roland Hochhaus , Hartmut Bauch , Martin Heming , Thomas K{umlaut over (u)}pper , Lars Bewig
发明人： Marten Walther , Wolfgang Möhl , Burkhard Danielzik , Markus Kuhr , Roland Hochhaus , Hartmut Bauch , Martin Heming , Thomas K{umlaut over (u)}pper , Lars Bewig
IPC分类号： H05H146
CPC分类号： H01J37/32192 , C23C16/402 , C23C16/511 , C23C16/545
摘要： The invention concerns a plasma CVD system (in particular a plasma pulse CVD system) with an array of microwave antennas. According to the invention, in order to improve the homogeneity of the layer, interference is prevented by controlling adjacent antennas in a chronologically offset manner. To that end, microcapsules are provided within the macrocapsules of the plasma pulse CVD process. Additionally, the uniformity of the layer deposition at the interfaces between adjacent modules can be optimized by radio-frequency excitation by means of suitable electrodes, magnetic fields or the configuration of the gas inlets. The surface coated in an operating cycle can thus be scaled as required.
摘要翻译：本发明涉及具有微波天线阵列的等离子体CVD系统（特别是等离子体脉冲CVD系统）。根据本发明，为了提高层的均匀性，通过按时间顺序偏移的方式控制相邻的天线来防止干扰。为此，在等离子体脉冲CVD工艺的大囊中提供微胶囊。另外，可以通过适当的电极，磁场或气体入口的配置通过射频激发来优化相邻模块之间的界面处的层沉积的均匀性。因此可以根据需要调整在操作循环中涂覆的表面。

9. 发明申请

US20060127699A1 Protective layer and process and arrangement for producing protective layers 审中-公开
标题翻译：保护层和生产保护层的工艺和布置
公开(公告)号：US20060127699A1
公开(公告)日：2006-06-15
申请号：US10527520
申请日：2003-09-13
申请人： Christoph Moelle , Lars Bewig , Frank Koppe , Thomas Kupper , Stefan Geisler , Stefan Bauer , Juergen Dzick , Lutz Klippe , Christian Henn
发明人： Christoph Moelle , Lars Bewig , Frank Koppe , Thomas Kupper , Stefan Geisler , Stefan Bauer , Juergen Dzick , Lutz Klippe , Christian Henn
IPC分类号： B32B17/06 , B32B9/00 , B32B19/00 , F24B1/182
CPC分类号： G02B5/285 , C03C17/3417 , C03C2217/734 , C03C2218/156 , C03C2218/322 , C23C14/0078 , C23C14/022 , C23C14/34 , C23C14/56 , C23C28/042 , C23C28/42 , G02B1/105 , G02B1/14 , Y10T428/12576 , Y10T428/12611
摘要： A scratchproof, temperature-stable protective layer, in particular a scratch-resistant protective layer for cooking hobs is provided. In addition, processes and an apparatus for producing these protective layers are provided. The protective layer includes at least one hard-material layer having a functional layer interrupted by very thin interlayers so that the functional layer has a morphologically dense columnar structure that grows substantially perpendicular to the body surface. The production of layers of this type is achieved by a magnetron sputtering process and a corresponding arrangement, with the tendency of the columnar structures to widen out being reduced by targeted interruption of the growth of the functional layers.
摘要翻译：提供了耐刮擦，温度稳定的保护层，特别是用于烹饪炉盘的耐刮擦保护层。此外，提供了用于制造这些保护层的工艺和设备。保护层包括至少一个具有由非常薄的夹层中断的功能层的硬质材料层，使得功能层具有生长基本垂直于体表的形态致密的柱状结构。这种类型的层的生产通过磁控溅射工艺和相应的布置实现，其中柱状结构扩大的趋势通过功能层的生长的目标中断而减少。

10. 发明申请

US20050132959A1 Gas supply method in a CVD coating system for precursors with a low vapor pressure 有权
标题翻译：用于具有低蒸气压的前体的CVD涂覆系统中的气体供应方法
公开(公告)号：US20050132959A1
公开(公告)日：2005-06-23
申请号：US11014488
申请日：2004-12-16
申请人： Hartmut Bauch , Lars Bewig , Lutz Klippe , Thomas Kupper
发明人： Hartmut Bauch , Lars Bewig , Lutz Klippe , Thomas Kupper
IPC分类号： C23C16/448 , B01D3/42 , B05C11/00 , C23C16/00 , F25J3/00
CPC分类号： C23C16/448
摘要： A gas supply device for delivering precursors with a low vapor pressure to CVD coating systems. The gas supply device has a supply container for the precursor which is at a first temperature T1, an intermediate storage device for intermediately storing the vaporous precursor at a second temperature T2 and at a constant pressure p2, a first gas line between the supply container and the intermediate storage device and a second gas line for removing gas from the intermediate storage device. The gas supply device is developed in such a way that the first temperature T1 is higher than the second temperature T2. The lower temperature T2 of the intermediate storage device facilitates maintenance work on the same, while the precursor evaporates at a greater rate at the higher temperature T1 in the supply container. A first precursor vapor may be mixed with a gas and/or a second precursor vapor in the intermediate storage device. The partial pressure of the first precursor vapor is lower than that of the undiluted first precursor vapor at a constant overall pressure in the intermediate storage device, so that the temperature T2 of the intermediate storage device and the successive lines can be reduced.
摘要翻译：一种气体供应装置，用于将CVD蒸气压低的前体输送到CVD涂层系统。气体供给装置具有用于前体的供给容器，该供应容器处于第一温度T 1，中间储存装置用于在第二温度T 2和恒定压力p 2下将气态前体中间储存在第一温度T 1之间的第一气体管线供给容器和中间储存装置以及用于从中间储存装置除去气体的第二气体管线。气体供给装置以第一温度T 1高于第二温度T 2的方式展开。中间储存装置的较低温度T 2有助于维护工作，而前体在供应容器中的较高温度T 1下以更大的速率蒸发。第一前体蒸气可以与中间存储装置中的气体和/或第二前体蒸气混合。在中间储存装置中，在恒定的总体压力下，第一前体蒸气的分压低于未稀释的第一前体蒸汽的分压，从而可以减少中间储存装置的温度T 2和连续的管线。

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