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1. 发明申请

US20050163939A1 Method for coating the quartz burner of an hid lamp 失效
标题翻译：用于涂覆隐藏灯的石英燃烧器的方法
公开(公告)号：US20050163939A1
公开(公告)日：2005-07-28
申请号：US10502408
申请日：2003-01-28
申请人： Wolfgang Moehl , Lars Bewig , Thomas Kuepper , Wolfram Maring , Christoph Moelle
发明人： Wolfgang Moehl , Lars Bewig , Thomas Kuepper , Wolfram Maring , Christoph Moelle
IPC分类号： C03C17/34 , C23C16/30 , H01J61/35 , H05H1/24
CPC分类号： C03C17/3417 , H01J61/35
摘要： In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOy and SiOx by means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.
摘要翻译：为了提高HID灯的能量平衡，石英燃烧器，优选其内部，通过交替地施加至少由氧化钛和氧化硅制成的非晶薄层，涂覆有一般的化学计量的TiO 通过等离子体脉冲化学气相沉积（PICVD）方法在高功率密度和100°至400°C范围内提高的衬底温度下，使用范围从1nm /秒到100nm / sec的小增长率，以便形成厚度小于1200nm的干涉层系统和0.1至1％范围内的最小化UV有源缺陷点率。

2. 发明授权

US07306830B2 Method for coating the quartz burner of an HID lamp 失效
标题翻译：用于涂覆HID灯的石英燃烧器的方法
公开(公告)号：US07306830B2
公开(公告)日：2007-12-11
申请号：US10502408
申请日：2003-01-28
申请人： Wolfgang Moehl , Lars Bewig , Thomas Kuepper , Wolfram Maring , Christopher Moelle
发明人： Wolfgang Moehl , Lars Bewig , Thomas Kuepper , Wolfram Maring , Christopher Moelle
IPC分类号： H05H1/24 , H01J61/40
CPC分类号： C03C17/3417 , H01J61/35
摘要： In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOy and SiOx by means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.
摘要翻译：为了提高HID灯的能量平衡，石英燃烧器，优选其内部，通过交替地施加至少由氧化钛和氧化硅制成的非晶薄层，涂覆有一般的化学计量的TiO 通过等离子体脉冲化学气相沉积（PICVD）方法在高功率密度和100°至400°C范围内提高的衬底温度下，使用范围从1nm /秒到100nm / sec的小增长率，以便形成厚度小于1200nm的干涉层系统和0.1至1％范围内的最小化UV有源缺陷点率。

3. 发明授权

US06379004B1 Ophthalmic lens and process for its production 失效
标题翻译：眼科镜片及其制作工艺
公开(公告)号：US06379004B1
公开(公告)日：2002-04-30
申请号：US09599731
申请日：2000-06-23
申请人： Marten Walther , Michael Spallek , Manfred Borens , Wolfgang Moehl , Markus Kuhr
发明人： Marten Walther , Michael Spallek , Manfred Borens , Wolfgang Moehl , Markus Kuhr
IPC分类号： G02C702
CPC分类号： G02B1/14 , G02B1/041 , G02B1/10 , G02B1/105 , C08L65/00 , C08L45/00
摘要： This invention relates to optical, preferably ophthalmic lenses with a body made of plastic, in particular for spectacle glasses, and the plastic incorporates cycloolefinic polymers and the plastic body is coated with a transparent coating resistant to corrosion. Another object of this invention is a process for the production of these lenses. The lenses according to the invention are especially resistant to greases, sweat and/or solvents.
摘要翻译：本发明涉及光学，优选眼科镜片，其具有由塑料制成的主体，特别是用于眼镜眼镜，并且塑料包含环烯聚合物，并且塑料体涂覆有耐腐蚀性的透明涂层。本发明的另一个目的是制造这些透镜的方法。根据本发明的镜片特别耐油脂，汗液和/或溶剂。

4. 发明申请

US20130213467A1 PRODUCTION OF MICROHOLES 审中-公开
标题翻译：生产微孔
公开(公告)号：US20130213467A1
公开(公告)日：2013-08-22
申请号：US13807407
申请日：2011-07-04
申请人： Kurt Nattermann , Ulrich Peuchert , Wolfgang Moehl
发明人： Kurt Nattermann , Ulrich Peuchert , Wolfgang Moehl
IPC分类号： H01L31/18 , H01L21/3065 , H01L31/0248 , B26F1/28
CPC分类号： H01L31/18 , B26F1/28 , C03C23/00 , H01L21/3065 , H01L21/486 , H01L31/022425 , H01L31/0248 , H01L31/068 , Y02E10/547 , Y10T428/24273
摘要： A method and apparatus for producing a multiplicity of holes in thin sheet-like workpieces of dielectric material or semiconductors is provided. The perforation points are marked by HF coupling points and caused to soften using HF energy in order to obtain dielectric breakdowns. The breakdowns are then widened into holes.
摘要翻译：提供一种用于在介电材料或半导体的薄片状工件中产生多个孔的方法和装置。穿孔点由HF耦合点标记，并使用HF能量软化以获得电介质击穿。然后将故障扩大到孔中。

5. 发明申请

US20130206724A1 GENERATION OF HOLES USING MULTIPLE ELECTRODES 有权
标题翻译：使用多个电极产生孔
公开(公告)号：US20130206724A1
公开(公告)日：2013-08-15
申请号：US13807402
申请日：2011-07-04
申请人： Kurt Nattermann , Ulrich Peuchert , Wolfgang Moehl , Stephan Behle , Dirk Weidmann , Sabine Lehnicke
发明人： Kurt Nattermann , Ulrich Peuchert , Wolfgang Moehl , Stephan Behle , Dirk Weidmann , Sabine Lehnicke
IPC分类号： B44C1/22
CPC分类号： B44C1/227 , B26F1/28 , B81C1/00087 , C03C23/00
摘要： An apparatus for producing holes in dielectric workpieces in the form of thin sheets and substrates, in particular of glass or glass-like materials and semiconductors is provided. The apparatus includes individual high-voltage electrodes that are symmetrically arranged on an electrode holder around the hole to be produced in the workpiece. The apparatus also includes individual counter electrodes that are arranged on a counter electrode holder. The electrodes and counter electrodes can be connected in a permutating manner to a high-voltage source for the discharge of high-voltage flashovers.
摘要翻译：提供了一种用于在薄片和基片，特别是玻璃或玻璃状材料和半导体形式的介电工件中制造孔的装置。该设备包括对称地布置在围绕要在工件中产生的孔的电极保持器上的单独的高压电极。该装置还包括布置在对电极保持器上的各个对置电极。电极和对置电极可以以排列方式连接到高电压源，用于放电高压闪络。

6. 发明申请

US20100244732A1 DISPLAY DEVICE, IN PARTICULAR TRANSPARENT MULTIMEDIA FACADE 审中-公开
标题翻译：显示设备，特别是透明多媒体设备
公开(公告)号：US20100244732A1
公开(公告)日：2010-09-30
申请号：US12648779
申请日：2009-12-29
申请人： Peter Kracht , Bernd Albrecht , Daniel Grimm , Angelika Ullmann , Marten Walther , Ernst-Friedrich Duesing , Horst Schillert , Matthias Anton , Andreas Nickut , Christoph Lothar Doeppner , Wolfgang Moehl , Rolf A. O. Schneider , Christian Henn
发明人： Peter Kracht , Bernd Albrecht , Daniel Grimm , Angelika Ullmann , Marten Walther , Ernst-Friedrich Duesing , Horst Schillert , Matthias Anton , Andreas Nickut , Christoph Lothar Doeppner , Wolfgang Moehl , Rolf A. O. Schneider , Christian Henn
IPC分类号： H05B37/02 , F21S4/00 , F21V9/00
CPC分类号： H05K3/24 , B32B17/10045 , B32B17/10055 , B32B17/10174 , F21K9/00 , G09F9/33 , G09F19/22 , G09F19/226 , H01L33/62 , H01L2924/0002 , H05K1/0306 , H05K1/09 , H05K2201/0108 , H05K2201/0326 , H05K2201/0391 , H05K2201/10106 , H01L2924/00
摘要： A large-area display device, in particular multimedia façade, comprises at least one transparent element, in which the transparent element comprises at least one transparent substrate on which one or more lighting elements is/are arranged.
摘要翻译：大面积显示装置，特别是多媒体外观，包括至少一个透明元件，其中透明元件包括至少一个透明基板，一个或多个照明元件布置在该透明基板上。

7. 发明申请

US20130209731A1 METHOD AND DEVICES FOR CREATING A MULTIPLICITY OF HOLES IN WORKPIECES 审中-公开
标题翻译：用于创造工件中多孔的方法和装置
公开(公告)号：US20130209731A1
公开(公告)日：2013-08-15
申请号：US13807391
申请日：2011-07-04
申请人： Kurt Nattermann , Ulrich Peuchert , Wolfgang Moehl , Stephan Behle
发明人： Kurt Nattermann , Ulrich Peuchert , Wolfgang Moehl , Stephan Behle
IPC分类号： C03B33/09
CPC分类号： C03B33/093 , B23K26/0093 , B23K26/0604 , B23K26/0622 , B23K26/0853 , B23K26/382 , B23K26/40 , B23K2103/42 , B23K2103/50 , B26D7/10 , B26F1/28 , Y10T428/24273
摘要： Methods and apparatuses for producing a multiplicity of holes in thin workpieces made of glass or glass-like materials and semiconductors are provided. The method includes directing multiple laser beams onto predetermined perforation points of the workpiece in a wavelength range between 1600 and 200 nm and with a radiation intensity that causes local non-thermal destruction of the workpiece material along respective filamentary channels. Subsequently, the filamentary channels are widened to the desired diameter of the holes.
摘要翻译：提供了由玻璃或玻璃状材料和半导体制成的薄工件中产生多个孔的方法和装置。该方法包括将多个激光束引导到在1600和200nm之间的波长范围内的工件的预定穿孔点上，并且具有导致工件材料沿着相应丝状通道局部非热破坏的辐射强度。随后，将丝状通道加宽到所需孔的直径。

8. 发明申请

US20050155556A1 Method and device for coating substrates 审中-公开
标题翻译：涂覆基材的方法和装置
公开(公告)号：US20050155556A1
公开(公告)日：2005-07-21
申请号：US11028364
申请日：2005-01-03
申请人： Burkhard Danielzik , Markus Kuhr , Wolfgang Moehl
发明人： Burkhard Danielzik , Markus Kuhr , Wolfgang Moehl
IPC分类号： G02B1/10 , C23C16/511 , H01J37/32 , C23C16/00 , H05H1/24
CPC分类号： H01J37/32192 , C23C16/511
摘要： The device for simultaneous multi-sided coating of a substrate, especially a lens, by microwave plasma chemical vapor deposition has a reaction chamber with microwave windows and microwave guides with microwave launch sites for guiding microwaves into the reaction chamber through the windows; dielectric tuning elements at the microwave launch sites to influence the microwave field distribution and at least one substrate holder arranged so that surfaces to be coated are oriented perpendicularly to plasma propagation directions. The respective shapes of the dielectric tuning elements are adapted to corresponding shapes of the surfaces, so that inhomogeneities in plasma distributions in the plasmas formed in the reaction chamber are corrected and coatings formed on the surfaces have a uniform thickness. Coated surfaces on opposite sides of a lens have a uniformity of ±1%.
摘要翻译：用于通过微波等离子体化学气相沉积同时多面涂覆基板，特别是透镜的装置具有带有微波窗口和微波导管的反应室，微波引导装置具有用于通过窗口将微波引导到反应室中的微波发射场; 在微波发射场所的介电调谐元件，以影响微波场分布;以及至少一个衬底保持器，其布置成使被涂覆的表面垂直于等离子体传播方向取向。介质调谐元件的各个形状适合于表面的相应形状，从而校正反应室中形成的等离子体中的等离子体分布的不均匀性，并且在表面上形成的涂层具有均匀的厚度。透镜两侧的涂层表面的均匀度为±1％。

9. 发明授权

US09018565B2 Generation of holes using multiple electrodes 有权
标题翻译：使用多个电极产生孔
公开(公告)号：US09018565B2
公开(公告)日：2015-04-28
申请号：US13807402
申请日：2011-07-04
申请人： Kurt Nattermann , Ulrich Peuchert , Wolfgang Moehl , Stephan Behle , Dirk Weidmann , Sabine Lehnicke
发明人： Kurt Nattermann , Ulrich Peuchert , Wolfgang Moehl , Stephan Behle , Dirk Weidmann , Sabine Lehnicke
IPC分类号： B26F1/28 , B44C1/22 , B81C1/00 , C03C23/00
CPC分类号： B44C1/227 , B26F1/28 , B81C1/00087 , C03C23/00
摘要： An apparatus for producing holes in dielectric workpieces in the form of thin sheets and substrates, in particular of glass or glass-like materials and semiconductors is provided. The apparatus includes individual high-voltage electrodes that are symmetrically arranged on an electrode holder around the hole to be produced in the workpiece. The apparatus also includes individual counter electrodes that are arranged on a counter electrode holder. The electrodes and counter electrodes can be connected in a permutating manner to a high-voltage source for the discharge of high-voltage flashovers.
摘要翻译：提供了一种用于在薄片和基片，特别是玻璃或玻璃状材料和半导体形式的介电工件中制造孔的装置。该设备包括对称地布置在围绕要在工件中产生的孔的电极保持器上的单独的高压电极。该装置还包括布置在对电极保持器上的各个对置电极。电极和对置电极可以以排列方式连接到高电压源，用于放电高压闪络。

10. 发明授权

US06916512B2 Method and device for coating substrates 失效
标题翻译：涂覆基材的方法和装置
公开(公告)号：US06916512B2
公开(公告)日：2005-07-12
申请号：US10203770
申请日：2001-03-01
申请人： Burkhard Danielzik , Markus Kuhr , Wolfgang Moehl
发明人： Burkhard Danielzik , Markus Kuhr , Wolfgang Moehl
IPC分类号： G02B1/10 , C23C16/511 , H01J37/32 , H05H1/46 , C23C16/00
CPC分类号： H01J37/32192 , C23C16/511
摘要： The method for coating plural surfaces on multiple sides of a substrate, especially a lens, includes launching microwave outputs into a microwave reactor at respective microwave launch sites; selecting respective microwave outputs to be greater than or equal to thresholds at which corresponding plasmas having a reduced permeability to microwave radiation arise in the microwave reactor; setting distances between the plural surfaces and microwave launch sites greater than microwave penetrations depths in the plasmas; placing respective dielectric tuning elements in microwave fields formed from the microwave outputs at the launch sites; and adapting the shapes of the dielectric tuning elements to the plural surfaces to be coated, so that plasma inhomogeneities are corrected and coatings with a uniformity of ±1% are formed on the plural surfaces.
摘要翻译：用于在基板，特别是透镜的多个面上涂覆多个表面的方法包括在各个微波发射场处将微波输出发射到微波反应器中; 选择相应的微波输出大于或等于在微波反应器中产生具有降低的微波辐射渗透性的相应等离子体的阈值; 设置多个表面和微波发射位置之间的距离大于微波穿透等离子体的深度; 将各个介电调谐元件放置在由发射位置的微波输出形成的微波场中; 并且使介质调谐元件的形状适应于待涂覆的多个表面，从而校正等离子体不均匀性，并且在多个表面上形成均匀度为±1％的涂层。

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