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    • 3. 发明申请
    • METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE
    • 测量目标形状的光学表面偏差的方法
    • US20100177320A1
    • 2010-07-15
    • US12684600
    • 2010-01-08
    • Ralf ArnoldStefan SchulteBernd Doerband
    • Ralf ArnoldStefan SchulteBernd Doerband
    • G01B11/02G02B13/18
    • G01B9/021G01B9/02039G01B11/2441G01M11/025G01M11/0271Y10T29/49771
    • A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.
    • 对准至少两个波形整形元件的方法,测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。 对准至少两个波形整形元件的方法,其中每个波形整形元件具有衍射测量结构,用于将入射光的一部分波前适应到目标形状的相应部分,包括:提供第一波 具有衍射对准结构的成形元件,将波形整形元件相对于彼此布置,使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过,并且对准第一波形整形 元件和第二波形成形元件相对于彼此,通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。
    • 7. 发明授权
    • Method of calibrating an interferometer optics and method of processing an optical element having an aspherical surface
    • 校准干涉仪光学元件的方法和处理具有非球面表面的光学元件的方法
    • US07123365B1
    • 2006-10-17
    • US10792755
    • 2004-03-05
    • Stefan Schulte
    • Stefan Schulte
    • G01B9/02
    • G01M11/0271G01B9/02038G01B9/02057G01B9/02072G01M11/025
    • A method of processing an optical element comprises providing an interferometer optics; arranging a calibrating substrate in a beam of measuring light emitted by the interferometer optics; superimposing measuring light having traversed the first and second surfaces of the calibrating substrate with reference light, and taking a first interferometric measurement of the superimposed measuring light and reference light; arranging the aspherical surface of the optical element in the beam of measuring light emitted by the interferometer optics, while the calibrating substrate is not arranged in the beam of measuring light; superimposing measuring light having interacted with the aspherical surface and the reference light, and taking a second interferometric measurement of the superimposed measuring light and reference light; determining deviations of the aspherical surface from a target shape thereof in dependence of the first and second measurements; and machining the aspherical surface of the optical element.
    • 一种处理光学元件的方法包括提供干涉仪光学元件; 将校准基板布置在由所述干涉仪光学器件发射的测量光束中; 叠加用参考光穿过校准基板的第一表面和第二表面的测量光,并对叠加的测量光和参考光进行第一干涉测量; 将光学元件的非球面布置在由干涉仪光学器件发射的测量光束中,同时校准基板未布置在测量光束中; 叠加与非球面和参考光相互作用的测量光,并对叠加的测量光和参考光进行第二干涉测量; 根据第一和第二测量确定非球面与其目标形状的偏差; 并加工光学元件的非球面。