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1. 发明授权

US09285687B2 Inspection apparatus, lithographic apparatus, and device manufacturing method 有权
标题翻译：检验仪器，光刻设备及器件制造方法
公开(公告)号：US09285687B2
公开(公告)日：2016-03-15
申请号：US13608069
申请日：2012-09-10
申请人： Stanislav Y Smirnov , Lev Ryzhikov , Eric Brian Catey , Adel Joobeur , David Heald , Yevgeniy Konstantinovich Shmarev , Richard Jacobs
发明人： Stanislav Y Smirnov , Lev Ryzhikov , Eric Brian Catey , Adel Joobeur , David Heald , Yevgeniy Konstantinovich Shmarev , Richard Jacobs
IPC分类号： G03F7/20
CPC分类号： G03F7/70625 , G01N21/956 , G03F7/70633
摘要： An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A refractive objective directs the third beam to reflect from the wafer, and a second sensor detects a second image created by the reflected third beam. The first and second images can be used for CD measurements. The second beam can have a spectral range from about 200 nm to about 425 nm, and the third beam can have a spectral range from about 425 nm to about 850 nm. A third sensor may be provide that detects a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements.
摘要翻译：检查装置包括照明系统，其接收第一光束并产生来自第一光束的第二和第三光束;以及反射折射物镜，其引导第二光束从晶片反射。第一传感器检测由反射的第二光束产生的第一图像。折射物镜引导第三光束从晶片反射，第二传感器检测由反射的第三光束产生的第二图像。第一张和第二张图像可用于CD测量。第二光束可具有从约200nm至约425nm的光谱范围，并且第三光束可具有约425nm至约850nm的光谱范围。可以提供第三传感器，其检测由从晶片反射的第三光束产生的第三图像。第三个图像可用于OV测量。

2. 发明申请

US20130083306A1 Inspection Apparatus, Lithographic Apparatus, and Device Manufacturing Method 有权
标题翻译：检验装置，平版印刷装置和装置制造方法
公开(公告)号：US20130083306A1
公开(公告)日：2013-04-04
申请号：US13608069
申请日：2012-09-10
申请人： Stanislav Y. Smirnov , Lev Ryzhikov , Eric Brian Catey , Adel Joobeur , David Heald , Yevgeniy Konstantinovich Shmarev , Richard Jacobs
发明人： Stanislav Y. Smirnov , Lev Ryzhikov , Eric Brian Catey , Adel Joobeur , David Heald , Yevgeniy Konstantinovich Shmarev , Richard Jacobs
IPC分类号： G01B11/02 , G03B27/54 , G02B17/08
CPC分类号： G03F7/70625 , G01N21/956 , G03F7/70633
摘要： An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A refractive objective directs the third beam to reflect from the wafer, and a second sensor detects a second image created by the reflected third beam. The first and second images can be used for CD measurements. The second beam can have a spectral range from about 200 nm to about 425 nm, and the third beam can have a spectral range from about 425 nm to about 850 nm. A third sensor may be provide that detects a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements.
摘要翻译：检查装置包括照明系统，其接收第一光束并产生来自第一光束的第二和第三光束;以及反射折射物镜，其引导第二光束从晶片反射。第一传感器检测由反射的第二光束产生的第一图像。折射物镜引导第三光束从晶片反射，第二传感器检测由反射的第三光束产生的第二图像。第一张和第二张图像可用于CD测量。第二光束可具有从约200nm至约425nm的光谱范围，并且第三光束可具有约425nm至约850nm的光谱范围。可以提供第三传感器，其检测由从晶片反射的第三光束产生的第三图像。第三个图像可用于OV测量。

3. 发明授权

US08259398B2 High numerical aperture catadioptric objectives without obscuration and applications thereof 有权
标题翻译：高数值孔径反折射目标，无遮掩及其应用
公开(公告)号：US08259398B2
公开(公告)日：2012-09-04
申请号：US13267401
申请日：2011-10-06
申请人： Stanislav Y. Smirnov , Eric Brian Catey , Adel Joobeur
发明人： Stanislav Y. Smirnov , Eric Brian Catey , Adel Joobeur
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B27/283 , G03F7/70225 , G03F7/7025 , Y10S359/90
摘要： Disclosed are high numerical (NA) catadioptric objectives without a central obscuration, and applications thereof. Such objectives can operate through a wide spectral bandwidth of radiation, including deep ultraviolet (DUV) radiation. Importantly, refractive elements in the catadioptric objectives can be manufactured from a single type of material (such as, for example, CaF2 and/or fused silica). In addition, the elements of such catadioptric objectives are rotationally symmetric about an optical axis. The catadioptric objectives eliminate the central obscuration by (1) using a polarized beamsplitter (which passes radiation of a first polarization and reflects radiation of a second polarization), and/or (2) using one or more folding mirrors to direct off-axis radiation into the pupil of the catadioptric objective. An example catadioptric objective is shown in FIG. 2.
摘要翻译：公开了没有中心遮蔽的高数值（NA）反折射目标及其应用。这样的目标可以通过宽的光谱带宽进行工作，包括深紫外（DUV）辐射。重要的是，反射折射物镜中的折射元件可以由单一类型的材料（例如，CaF 2和/或熔融石英）制造。此外，这种反射折射物镜的元件关于光轴旋转对称。反折射目标通过（1）使用偏振分束器（其通过第一偏振的辐射并反射第二偏振的辐射）消除中心遮蔽，和/或（2）使用一个或多个折叠反射镜来引导离轴辐射进入反射折射目标的学生。图1中示出了示例反射折射物镜。 2。

4. 发明授权

US08064148B2 High numerical aperture catadioptric objectives without obscuration and applications thereof 有权
标题翻译：高数值孔径反折射目标，无遮掩及其应用
公开(公告)号：US08064148B2
公开(公告)日：2011-11-22
申请号：US12419565
申请日：2009-04-07
申请人： Stanislav Y. Smirnov , Eric Brian Catey , Adel Joobeur
发明人： Stanislav Y. Smirnov , Eric Brian Catey , Adel Joobeur
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B27/283 , G03F7/70225 , G03F7/7025 , Y10S359/90
摘要： Disclosed are high numerical (NA) catadioptric objectives without a central obscuration, and applications thereof. Such objectives can operate through a wide spectral bandwidth of radiation, including deep ultraviolet (DUV) radiation. Importantly, refractive elements in the catadioptric objectives can be manufactured from a single type of material (such as, for example, CaF2 and/or fused silica). In addition, the elements of such catadioptric objectives are rotationally symmetric about an optical axis. The catadioptric objectives eliminate the central obscuration by (1) using a polarized beamsplitter (which passes radiation of a first polarization and reflects radiation of a second polarization), and/or (2) using one or more folding mirrors to direct off-axis radiation into the pupil of the catadioptric objective. An example catadioptric objective is shown in FIG. 2.
摘要翻译：公开了没有中心遮蔽的高数值（NA）反折射目标及其应用。这样的目标可以通过宽的光谱带宽进行工作，包括深紫外（DUV）辐射。重要的是，反射折射物镜中的折射元件可以由单一类型的材料（例如，CaF 2和/或熔融石英）制造。此外，这种反射折射物镜的元件关于光轴旋转对称。反折射目标通过（1）使用偏振分束器（其通过第一偏振的辐射并反射第二偏振的辐射）消除中心遮蔽，和/或（2）使用一个或多个折叠反射镜来引导离轴辐射进入反射折射目标的学生。图1中示出了示例反射折射物镜。 2。

5. 发明申请

US20100149505A1 EUV Mask Inspection System 有权
标题翻译： EUV面罩检测系统
公开(公告)号：US20100149505A1
公开(公告)日：2010-06-17
申请号：US12605627
申请日：2009-10-26
申请人： Harry SEWELL , Eric Brian Catey , Adel Joobeur , Yevgeniy Konstantinovich Shmarev
发明人： Harry SEWELL , Eric Brian Catey , Adel Joobeur , Yevgeniy Konstantinovich Shmarev
IPC分类号： G03B27/54 , G01V8/00
CPC分类号： G03B27/54 , G01N2021/95676 , G03F7/70208 , G03F7/70275 , G03F7/7085 , G03F7/70991
摘要： Disclosed are apparatuses, methods, and lithographic systems for EUV mask inspection. An EUV mask inspection system can include an EUV illumination source, an optical system, and an image sensor. The EUV illumination source can be a standalone illumination system or integrated into the lithographic system, where the EUV illumination source can be configured to illuminate an EUV radiation beam onto a target portion of a mask. The optical system can be configured to receive at least a portion of a reflected EUV radiation beam from the target portion of the mask. Further, the image sensor can be configured to detect an aerial image corresponding to the portion of the reflected EUV radiation beam. The EUV mask inspection system can also include a data analysis device configured to analyze the aerial image for mask defects.
摘要翻译：公开了用于EUV掩模检查的装置，方法和光刻系统。 EUV掩模检查系统可以包括EUV照明源，光学系统和图像传感器。 EUV照明源可以是独立的照明系统或集成到光刻系统中，其中EUV照明源可被配置为将EUV辐射束照射到掩模的目标部分上。光学系统可以被配置为从掩模的目标部分接收反射的EUV辐射束的至少一部分。此外，图像传感器可以被配置为检测对应于反射的EUV辐射束的该部分的空间图像。 EUV掩模检查系统还可以包括被配置为分析掩模缺陷的空中图像的数据分析装置。

6. 发明授权

US09046754B2 EUV mask inspection system 有权
标题翻译： EUV面罩检测系统
公开(公告)号：US09046754B2
公开(公告)日：2015-06-02
申请号：US12605627
申请日：2009-10-26
申请人： Harry Sewell , Eric Brian Catey , Adel Joobeur , Yevgeniy Konstantinovich Shmarev
发明人： Harry Sewell , Eric Brian Catey , Adel Joobeur , Yevgeniy Konstantinovich Shmarev
IPC分类号： G03B27/52 , G03B27/54 , G03B27/62 , G03B27/32 , G03F7/20 , G03B13/26 , G01N21/956
CPC分类号： G03B27/54 , G01N2021/95676 , G03F7/70208 , G03F7/70275 , G03F7/7085 , G03F7/70991
摘要： Disclosed are apparatuses, methods, and lithographic systems for EUV mask inspection. An EUV mask inspection system can include an EUV illumination source, an optical system, and an image sensor. The EUV illumination source can be a standalone illumination system or integrated into the lithographic system, where the EUV illumination source can be configured to illuminate an EUV radiation beam onto a target portion of a mask. The optical system can be configured to receive at least a portion of a reflected EUV radiation beam from the target portion of the mask. Further, the image sensor can be configured to detect an aerial image corresponding to the portion of the reflected EUV radiation beam. The EUV mask inspection system can also include a data analysis device configured to analyze the aerial image for mask defects.
摘要翻译：公开了用于EUV掩模检查的装置，方法和光刻系统。 EUV掩模检查系统可以包括EUV照明源，光学系统和图像传感器。 EUV照明源可以是独立的照明系统或集成到光刻系统中，其中EUV照明源可被配置为将EUV辐射束照射到掩模的目标部分上。光学系统可以被配置为从掩模的目标部分接收反射的EUV辐射束的至少一部分。此外，图像传感器可以被配置为检测对应于反射的EUV辐射束的该部分的空间图像。 EUV掩模检查系统还可以包括被配置为分析掩模缺陷的空中图像的数据分析装置。

7. 发明授权

US09041903B2 Mask inspection with fourier filtering and image compare 有权
标题翻译：面罩检查与傅立叶滤镜和图像比较
公开(公告)号：US09041903B2
公开(公告)日：2015-05-26
申请号：US13256372
申请日：2010-03-18
申请人： Michael L. Nelson , Harry Sewell , Eric Brian Catey
发明人： Michael L. Nelson , Harry Sewell , Eric Brian Catey
IPC分类号： G03B27/52 , G03B27/68 , G03F1/84
CPC分类号： G03F1/84
摘要： A mask inspection system with Fourier filtering and image compare can include a first detector, a dynamic Fourier filter, a controller, and a second detector. The first detector can be located at a Fourier plane of the inspection system and can detect a first portion of patterned light produced by an area of a mask. The dynamic Fourier filter can be controlled by the controller based on the detected first portion of the patterned light. The second detector can detect a second portion of the patterned light produced by the section of the mask and transmitted through the dynamic Fourier filter. Further, the mask inspection system can include a data analysis device to compare the second portion of patterned light with another patterned light. Consequently, the mask inspection system is able to detect any possible defects on the area of the mask more accurately and with higher resolution.
摘要翻译：具有傅立叶滤波和图像比较的掩模检查系统可以包括第一检测器，动态傅立叶滤波器，控制器和第二检测器。第一检测器可以位于检查系统的傅立叶平面处，并且可以检测由掩模的区域产生的图案化光的第一部分。动态傅立叶滤波器可以由控制器基于检测到的图案化光的第一部分来控制。第二检测器可以检测由掩模的部分产生并通过动态傅立叶滤波器传输的图案化光的第二部分。此外，掩模检查系统可以包括数据分析装置，以将图案化的光的第二部分与另一图案化的光进行比较。因此，掩模检查系统能够更精确地并且以更高的分辨率检测掩模区域上的任何可能的缺陷。

8. 发明申请

US20120171600A1 Time Differential Reticle Inspection 有权
标题翻译：时间差分光栅检验
公开(公告)号：US20120171600A1
公开(公告)日：2012-07-05
申请号：US13378811
申请日：2010-07-16
申请人： Eric Brian Catey , Nora-Jean Harned , Yevgeniy Konstantinovich Shmarev , Robert Albert Tharaldsen , Richard David Jacobs
发明人： Eric Brian Catey , Nora-Jean Harned , Yevgeniy Konstantinovich Shmarev , Robert Albert Tharaldsen , Richard David Jacobs
IPC分类号： G03F7/20 , G01N21/00
CPC分类号： G03F1/84 , G03F7/7065
摘要： Disclosed are systems and methods for time differential reticle inspection. Contamination is detected by, for example, determining a difference between a first signature of at least a portion of a reticle and a second signature, produced subsequent to the first signature, of the portion of the reticle.
摘要翻译：公开了用于时差标线检查的系统和方法。通过例如确定掩模版的至少一部分的第一签名与第一签名之后产生的第二签名之间的差异来检测污染物。

9. 发明授权

US08623576B2 Time differential reticle inspection 有权
标题翻译：时差标线检查
公开(公告)号：US08623576B2
公开(公告)日：2014-01-07
申请号：US13378811
申请日：2010-07-16
申请人： Eric Brian Catey , Nora-Jean Harned , Yevgeniy Konstantinovich Shmarev , Robert Albert Tharaldsen , Richard David Jacobs
发明人： Eric Brian Catey , Nora-Jean Harned , Yevgeniy Konstantinovich Shmarev , Robert Albert Tharaldsen , Richard David Jacobs
IPC分类号： G03C5/00 , G06K9/00
CPC分类号： G03F1/84 , G03F7/7065
摘要： Disclosed are systems and methods for time differential reticle inspection. Contamination is detected by, for example, determining a difference between a first signature of at least a portion of a reticle and a second signature, produced subsequent to the first signature, of the portion of the reticle.
摘要翻译：公开了用于时差标线检查的系统和方法。通过例如确定掩模版的至少一部分的第一签名与第一签名之后产生的第二签名之间的差异来检测污染物。

10. 发明申请

US20120281197A1 Holographic Mask Inspection System with Spatial Filter 审中-公开
标题翻译：全息面罩检测系统与空间过滤器
公开(公告)号：US20120281197A1
公开(公告)日：2012-11-08
申请号：US13497178
申请日：2010-11-12
申请人： Robert Albert Tharaldsen , Arie Jeffrey Den Boef , Eric Brian Catey , Yevgeniy Konstantinovich Shmarev , Richard David Jacobs
发明人： Robert Albert Tharaldsen , Arie Jeffrey Den Boef , Eric Brian Catey , Yevgeniy Konstantinovich Shmarev , Richard David Jacobs
IPC分类号： G03H1/02 , G03B27/72
CPC分类号： G03H1/00 , G01N21/94 , G01N21/95607 , G01N21/95623 , G01N2021/95676 , G03F1/84 , G03H1/02 , G03H1/041 , G03H1/0443 , G03H1/08 , G03H2001/0204 , G03H2001/0452 , G03H2222/15 , G03H2222/43 , G03H2222/45 , G03H2223/12 , G03H2223/26 , G03H2223/53
摘要： Disclosed are apparatuses, methods, and lithographic systems for holographic mask inspection. A holographic mask inspection system (300, 600, 700) includes an illumination source (330), a spatial filter (350), and an image sensor (380). The illumination source being configured to illuminate a radiation beam (331) onto a target portion of a mask (310). The spatial filter (350) being arranged in a Fourier transform pupil plane of an optical system (390, 610, 710), where the spatial filter receives at least a portion of a reflected radiation beam (311) from the target portion of the mask. The optical system being arranged to combine (360, 660, 740) the portion of the reflected radiation beam (311) with a reference radiation beam (361, 331) to generate a combined radiation beam. Further, the image sensor (380) being configured to capture holographic image of the combined radiation beam. The image may contain one or more mask defects.
摘要翻译：公开了用于全息掩模检查的装置，方法和光刻系统。全息掩模检查系统（300,600,700）包括照明源（330），空间滤光器（350）和图像传感器（380）。照明源被配置为将辐射束（331）照射到掩模（310）的目标部分上。空间滤波器（350）被布置在光学系统（390,610,710）的傅立叶变换光瞳平面中，其中空间滤波器从掩模的目标部分接收反射的辐射束（311）的至少一部分。光学系统布置成将反射的辐射束（311）的该部分与参考辐射束（361,331）组合（360,660,740）以产生组合的辐射束。此外，图像传感器（380）被配置为捕获组合的辐射束的全息图像。图像可能包含一个或多个掩模缺陷。

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