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1. 发明授权

US09285687B2 Inspection apparatus, lithographic apparatus, and device manufacturing method 有权
标题翻译：检验仪器，光刻设备及器件制造方法
公开(公告)号：US09285687B2
公开(公告)日：2016-03-15
申请号：US13608069
申请日：2012-09-10
申请人： Stanislav Y Smirnov , Lev Ryzhikov , Eric Brian Catey , Adel Joobeur , David Heald , Yevgeniy Konstantinovich Shmarev , Richard Jacobs
发明人： Stanislav Y Smirnov , Lev Ryzhikov , Eric Brian Catey , Adel Joobeur , David Heald , Yevgeniy Konstantinovich Shmarev , Richard Jacobs
IPC分类号： G03F7/20
CPC分类号： G03F7/70625 , G01N21/956 , G03F7/70633
摘要： An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A refractive objective directs the third beam to reflect from the wafer, and a second sensor detects a second image created by the reflected third beam. The first and second images can be used for CD measurements. The second beam can have a spectral range from about 200 nm to about 425 nm, and the third beam can have a spectral range from about 425 nm to about 850 nm. A third sensor may be provide that detects a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements.
摘要翻译：检查装置包括照明系统，其接收第一光束并产生来自第一光束的第二和第三光束;以及反射折射物镜，其引导第二光束从晶片反射。第一传感器检测由反射的第二光束产生的第一图像。折射物镜引导第三光束从晶片反射，第二传感器检测由反射的第三光束产生的第二图像。第一张和第二张图像可用于CD测量。第二光束可具有从约200nm至约425nm的光谱范围，并且第三光束可具有约425nm至约850nm的光谱范围。可以提供第三传感器，其检测由从晶片反射的第三光束产生的第三图像。第三个图像可用于OV测量。

2. 发明申请

US20130083306A1 Inspection Apparatus, Lithographic Apparatus, and Device Manufacturing Method 有权
标题翻译：检验装置，平版印刷装置和装置制造方法
公开(公告)号：US20130083306A1
公开(公告)日：2013-04-04
申请号：US13608069
申请日：2012-09-10
申请人： Stanislav Y. Smirnov , Lev Ryzhikov , Eric Brian Catey , Adel Joobeur , David Heald , Yevgeniy Konstantinovich Shmarev , Richard Jacobs
发明人： Stanislav Y. Smirnov , Lev Ryzhikov , Eric Brian Catey , Adel Joobeur , David Heald , Yevgeniy Konstantinovich Shmarev , Richard Jacobs
IPC分类号： G01B11/02 , G03B27/54 , G02B17/08
CPC分类号： G03F7/70625 , G01N21/956 , G03F7/70633
摘要： An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A refractive objective directs the third beam to reflect from the wafer, and a second sensor detects a second image created by the reflected third beam. The first and second images can be used for CD measurements. The second beam can have a spectral range from about 200 nm to about 425 nm, and the third beam can have a spectral range from about 425 nm to about 850 nm. A third sensor may be provide that detects a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements.
摘要翻译：检查装置包括照明系统，其接收第一光束并产生来自第一光束的第二和第三光束;以及反射折射物镜，其引导第二光束从晶片反射。第一传感器检测由反射的第二光束产生的第一图像。折射物镜引导第三光束从晶片反射，第二传感器检测由反射的第三光束产生的第二图像。第一张和第二张图像可用于CD测量。第二光束可具有从约200nm至约425nm的光谱范围，并且第三光束可具有约425nm至约850nm的光谱范围。可以提供第三传感器，其检测由从晶片反射的第三光束产生的第三图像。第三个图像可用于OV测量。

3. 发明授权

US09046754B2 EUV mask inspection system 有权
标题翻译： EUV面罩检测系统
公开(公告)号：US09046754B2
公开(公告)日：2015-06-02
申请号：US12605627
申请日：2009-10-26
申请人： Harry Sewell , Eric Brian Catey , Adel Joobeur , Yevgeniy Konstantinovich Shmarev
发明人： Harry Sewell , Eric Brian Catey , Adel Joobeur , Yevgeniy Konstantinovich Shmarev
IPC分类号： G03B27/52 , G03B27/54 , G03B27/62 , G03B27/32 , G03F7/20 , G03B13/26 , G01N21/956
CPC分类号： G03B27/54 , G01N2021/95676 , G03F7/70208 , G03F7/70275 , G03F7/7085 , G03F7/70991
摘要： Disclosed are apparatuses, methods, and lithographic systems for EUV mask inspection. An EUV mask inspection system can include an EUV illumination source, an optical system, and an image sensor. The EUV illumination source can be a standalone illumination system or integrated into the lithographic system, where the EUV illumination source can be configured to illuminate an EUV radiation beam onto a target portion of a mask. The optical system can be configured to receive at least a portion of a reflected EUV radiation beam from the target portion of the mask. Further, the image sensor can be configured to detect an aerial image corresponding to the portion of the reflected EUV radiation beam. The EUV mask inspection system can also include a data analysis device configured to analyze the aerial image for mask defects.
摘要翻译：公开了用于EUV掩模检查的装置，方法和光刻系统。 EUV掩模检查系统可以包括EUV照明源，光学系统和图像传感器。 EUV照明源可以是独立的照明系统或集成到光刻系统中，其中EUV照明源可被配置为将EUV辐射束照射到掩模的目标部分上。光学系统可以被配置为从掩模的目标部分接收反射的EUV辐射束的至少一部分。此外，图像传感器可以被配置为检测对应于反射的EUV辐射束的该部分的空间图像。 EUV掩模检查系统还可以包括被配置为分析掩模缺陷的空中图像的数据分析装置。

4. 发明申请

US20100149505A1 EUV Mask Inspection System 有权
标题翻译： EUV面罩检测系统
公开(公告)号：US20100149505A1
公开(公告)日：2010-06-17
申请号：US12605627
申请日：2009-10-26
申请人： Harry SEWELL , Eric Brian Catey , Adel Joobeur , Yevgeniy Konstantinovich Shmarev
发明人： Harry SEWELL , Eric Brian Catey , Adel Joobeur , Yevgeniy Konstantinovich Shmarev
IPC分类号： G03B27/54 , G01V8/00
CPC分类号： G03B27/54 , G01N2021/95676 , G03F7/70208 , G03F7/70275 , G03F7/7085 , G03F7/70991
摘要： Disclosed are apparatuses, methods, and lithographic systems for EUV mask inspection. An EUV mask inspection system can include an EUV illumination source, an optical system, and an image sensor. The EUV illumination source can be a standalone illumination system or integrated into the lithographic system, where the EUV illumination source can be configured to illuminate an EUV radiation beam onto a target portion of a mask. The optical system can be configured to receive at least a portion of a reflected EUV radiation beam from the target portion of the mask. Further, the image sensor can be configured to detect an aerial image corresponding to the portion of the reflected EUV radiation beam. The EUV mask inspection system can also include a data analysis device configured to analyze the aerial image for mask defects.
摘要翻译：公开了用于EUV掩模检查的装置，方法和光刻系统。 EUV掩模检查系统可以包括EUV照明源，光学系统和图像传感器。 EUV照明源可以是独立的照明系统或集成到光刻系统中，其中EUV照明源可被配置为将EUV辐射束照射到掩模的目标部分上。光学系统可以被配置为从掩模的目标部分接收反射的EUV辐射束的至少一部分。此外，图像传感器可以被配置为检测对应于反射的EUV辐射束的该部分的空间图像。 EUV掩模检查系统还可以包括被配置为分析掩模缺陷的空中图像的数据分析装置。

5. 发明申请

US20090091734A1 Illumination System 有权
标题翻译：照明系统
公开(公告)号：US20090091734A1
公开(公告)日：2009-04-09
申请号：US12328251
申请日：2008-12-04
申请人： Huibert VISSER , Jacob Fredrik Friso Klinkhamer , Lev Ryzhikov , Scott D. Coston , Adel Joobeur , Henri Johannes Petrus Vink , Yevgeniy Konstantinovich Shmarev
发明人： Huibert VISSER , Jacob Fredrik Friso Klinkhamer , Lev Ryzhikov , Scott D. Coston , Adel Joobeur , Henri Johannes Petrus Vink , Yevgeniy Konstantinovich Shmarev
IPC分类号： G03B27/54 , G02B27/10
CPC分类号： G03F7/70583 , G02B27/0905 , G03F7/70075
摘要： A coherence remover is provided. In an embodiment the coherence remover includes a first mirror and a second mirror coupled to the first mirror. The coherence remover is configured to receive an input beam. Each of the first and second mirrors is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.
摘要翻译：提供了一个相干去除器。在一个实施例中，相干去除器包括耦合到第一反射镜的第一反射镜和第二反射镜。相干去除器被配置为接收输入光束。第一和第二反射镜中的每一个被配置为反射输入光束的相应部分以产生相应的一个或多个中间光束。与输入光束相比，中间光束共同形成具有减小的相干性的输出光束。

6. 发明申请

US20080019008A1 Optical integrators for lithography systems and methods 有权
标题翻译：用于光刻系统和方法的光学积分器
公开(公告)号：US20080019008A1
公开(公告)日：2008-01-24
申请号：US11488174
申请日：2006-07-18
申请人： Lev Ryzhikov , Adel Joobeur , Yevgeniy Konstantinovich Shmarev
发明人： Lev Ryzhikov , Adel Joobeur , Yevgeniy Konstantinovich Shmarev
IPC分类号： G02B27/10
CPC分类号： G03F7/70075
摘要： An optical integrator having a first surface and a second surface that is used in a lithographic apparatus to modify light. The first surface is reflective, defines a volume, and is configured to be disposed in an optical illumination system along an optical axis, to surround the optical axis, and to reflect a light along a path incident upon the first surface. The second surface is disposed in the volume and has a first section of the second surface that is semi-reflective and is configured to reflect a first portion of a light along a path incident upon the first section of the second surface and to transmit a second portion of the light along the path incident upon the first section of the second surface. The second surface increases the number of reflections of the light to increase the uniformity of the intensity distribution of the light.
摘要翻译：具有第一表面和第二表面的光学积分器，其用于光刻设备中以修改光。第一表面是反射的，限定了一个体积，并被配置为沿光轴布置在光学照明系统中，以围绕光轴，并且沿着入射在第一表面上的路径反射光。第二表面设置在体积中并且具有半反射的第二表面的第一部分，并且被配置为沿着入射在第二表面的第一部分上的路径反射光的第一部分，并且透射第二表面沿着入射到第二表面的第一部分的路径的光的一部分。第二表面增加了光的反射数以增加光的强度分布的均匀性。

7. 发明申请

US20070127005A1 Illumination system 审中-公开
标题翻译：照明系统
公开(公告)号：US20070127005A1
公开(公告)日：2007-06-07
申请号：US11292275
申请日：2005-12-02
申请人： Huibert Visser , Jacob Klinkhamer , Lev Ryzhikov , Scott Coston , Adel Joobeur , Yevgeniy Konstantinovich Shmarev , HENRI JOHANNES VINK
发明人： Huibert Visser , Jacob Klinkhamer , Lev Ryzhikov , Scott Coston , Adel Joobeur , Yevgeniy Konstantinovich Shmarev , HENRI JOHANNES VINK
IPC分类号： G03B27/72
CPC分类号： G03F7/70583 , G02B27/0905 , G03F7/70075
摘要： A system and method are used to substantially homogenizing and removing at least some coherence from a beam of light.
摘要翻译：使用系统和方法基本均匀化并从光束中去除至少一些相干性。

8. 发明申请

US20100046092A1 Catadioptric Optical System for Scatterometry 有权
标题翻译：反射折射光学系统
公开(公告)号：US20100046092A1
公开(公告)日：2010-02-25
申请号：US12608654
申请日：2009-10-29
申请人： Yevgeniy Konstantinovich Shmarev , Stanislav Y. Smirnov , Irina I. Pozhinskaya
发明人： Yevgeniy Konstantinovich Shmarev , Stanislav Y. Smirnov , Irina I. Pozhinskaya
IPC分类号： G02B17/08
CPC分类号： G01N21/47 , G01N2021/4714 , G02B17/0808 , G02B17/0856 , G02B21/04 , G02B27/0025 , G03F7/70625 , G03F7/70633
摘要： A catadioptric system is provided comprising a correcting plate and an optical system. The correcting plate is configured to condition electromagnetic radiation to correct at least one aberration. The optical system is configured to reflect a first portion of the conditioned electromagnetic radiation, to refract a second portion of the conditioned electromagnetic radiation, and to focus the reflected first portion of the conditioned electromagnetic radiation onto a target portion of a substrate. The first portion of the electromagnetic radiation is not refracted by an optical element, allowing the catadioptric optical system to operate in a broad spectral range.
摘要翻译：提供了包括校正板和光学系统的反折射系统。校正板被配置为调节电磁辐射以校正至少一个像差。光学系统被配置为反射经调节的电磁辐射的第一部分，以折射经调节的电磁辐射的第二部分，并将经调节的电磁辐射的反射的第一部分聚焦到衬底的目标部分上。电磁辐射的第一部分不被光学元件折射，允许反射折射光学系统在宽光谱范围内操作。

9. 发明授权

US07633689B2 Catadioptric optical system for scatterometry 有权
标题翻译：反折射光学系统用于散射测量
公开(公告)号：US07633689B2
公开(公告)日：2009-12-15
申请号：US11779691
申请日：2007-07-18
申请人： Yevgeniy Konstantinovich Shmarev , Stanislav Y. Smirnov , Irina I. Pozhinskaya
发明人： Yevgeniy Konstantinovich Shmarev , Stanislav Y. Smirnov , Irina I. Pozhinskaya
IPC分类号： G02B17/00 , G02B21/00 , G02B23/00
CPC分类号： G01N21/47 , G01N2021/4714 , G02B17/0808 , G02B17/0856 , G02B21/04 , G02B27/0025 , G03F7/70625 , G03F7/70633
摘要： A catadioptric optical system having a high numerical aperture operates in a wide spectral range. The catadioptric optical system includes a correcting plate, a first reflective surface and a second reflective surface. The correcting plate conditions electromagnetic radiation to correct at least one aberration. The first reflective surface is positioned to reflect the electromagnetic radiation conditioned by the correcting plate. The second reflective surface is positioned to focus the electromagnetic radiation reflected by the first reflective surface onto a target portion of a substrate. The electromagnetic radiation reflected by the first reflective surface and focused by the second reflective surface is not refracted by a refractive element, thereby enabling the catadioptric optical system to operate in a broad spectral range.
摘要翻译：具有高数值孔径的反折射光学系统在宽光谱范围内工作。反折射光学系统包括校正板，第一反射表面和第二反射表面。校正板调节电磁辐射以校正至少一个像差。第一反射表面被定位成反射由校正板调节的电磁辐射。第二反射表面被定位成将由第一反射表面反射的电磁辐射聚焦到基底的目标部分上。由第一反射表面反射并由第二反射表面聚焦的电磁辐射不被折射元件折射，从而使反射折射光学系统能够在宽光谱范围内工作。

10. 发明申请

US20090021845A1 Catadioptric Optical System for Scatterometry 有权
标题翻译：反射折射光学系统
公开(公告)号：US20090021845A1
公开(公告)日：2009-01-22
申请号：US11779691
申请日：2007-07-18
申请人： Yevgeniy Konstantinovich Shmarev , Stanislav Y. Smirnov , Irina I. Pozhinskaya
发明人： Yevgeniy Konstantinovich Shmarev , Stanislav Y. Smirnov , Irina I. Pozhinskaya
IPC分类号： G02B17/08
CPC分类号： G01N21/47 , G01N2021/4714 , G02B17/0808 , G02B17/0856 , G02B21/04 , G02B27/0025 , G03F7/70625 , G03F7/70633
摘要： A catadioptric optical system having a high numerical aperture operates in a wide spectral range. The catadioptric optical system includes a correcting plate, a first reflective surface and a second reflective surface. The correcting plate conditions electromagnetic radiation to correct at least one aberration. The first reflective surface is positioned to reflect the electromagnetic radiation conditioned by the correcting plate. The second reflective surface is positioned to focus the electromagnetic radiation reflected by the first reflective surface onto a target portion of a substrate. The electromagnetic radiation reflected by the first reflective surface and focused by the second reflective surface is not refracted by a refractive element, thereby enabling the catadioptric optical system to operate in a broad spectral range.
摘要翻译：具有高数值孔径的反折射光学系统在宽光谱范围内工作。反折射光学系统包括校正板，第一反射表面和第二反射表面。校正板调节电磁辐射以校正至少一个像差。第一反射表面被定位成反射由校正板调节的电磁辐射。第二反射表面被定位成将由第一反射表面反射的电磁辐射聚焦到基底的目标部分上。由第一反射表面反射并由第二反射表面聚焦的电磁辐射不被折射元件折射，从而使反射折射光学系统能够在宽光谱范围内工作。

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