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1. 发明授权

US5217536A Composite plating apparatus 失效
标题翻译：复合镀膜装置
公开(公告)号：US5217536A
公开(公告)日：1993-06-08
申请号：US710386
申请日：1991-06-05
申请人： Sowjun Matsumura , Tadashi Chiba , Takayuki Nakamura , Masahiro Saito
发明人： Sowjun Matsumura , Tadashi Chiba , Takayuki Nakamura , Masahiro Saito
IPC分类号： C23C18/16 , C25D15/02
CPC分类号： C23C18/1619 , C23C18/1662 , C25D15/02
摘要： A composite plating apparatus includes a plating tank for receiving therein a composite plating solution containing water-insoluble particles or fibers and a reservoir disposed adjacent the plating tank through an overflow weir, preferably in a common housing, the plating solution flowing into the reservoir in an overflow manner. A pump is disposed within the reservoir having a suction port for drawing the solution in the reservoir and a discharge port for pumping the solution. A conduit connected to the pump discharge port extends therefrom over the bottom of the plating tank through the overflow weir and includes a plurality of orifices. The plating solution is circulated by causing the solution to flow over the weir from the plating tank to the reservoir, pumping the solution to the conduit, and injecting the solution into the tank through the orifices to uniformly agitate the solution.

2. 发明授权

US5266181A Controlled composite deposition method 失效
标题翻译：控制复合沉积法
公开(公告)号：US5266181A
公开(公告)日：1993-11-30
申请号：US971555
申请日：1992-11-05
申请人： Sowjun Matsumura , Tadashi Chiba , Yoshiko Hotta , Itsuji Yoshikawa
发明人： Sowjun Matsumura , Tadashi Chiba , Yoshiko Hotta , Itsuji Yoshikawa
IPC分类号： C25D15/02 , C25D15/00
CPC分类号： C25D15/02
摘要： A composite deposit in which insoluble particles are co-deposited and dispersed in a metal matrix is formed on an article by dipping the article in a metal plating solution having insoluble particles dispersed therein and effecting an electroplating or chemical plating process. By adjusting the specific surface area of insoluble particles to be dispersed in the metal plating solution, the amount of insoluble particles co-deposited in the composite deposit can be controlled. Better results are obtained with insoluble particles having a specific surface area of 10 m.sup.2 /g or less.
摘要翻译：通过将制品浸入具有分散在其中的不溶性颗粒的金属电镀溶液中并进行电镀或化学镀处理，在制品上形成其中不溶性颗粒共沉淀并分散在金属基质中的复合沉积物。通过调整分散在金属电镀液中的不溶性粒子的比表面积，可以控制复合沉积物中共沉积的不溶性粒子的量。用比表面积为10m2 / g以下的不溶性粒子得到更好的结果。

3. 发明授权

US5103637A Rocket engine combustion chamber 失效
标题翻译：火箭发动机燃烧室
公开(公告)号：US5103637A
公开(公告)日：1992-04-14
申请号：US602640
申请日：1990-10-24
申请人： Takahiro Itoh , Morito Togawa , Masuo Okada , Sowjun Matsumura , Tadashi Chiba
发明人： Takahiro Itoh , Morito Togawa , Masuo Okada , Sowjun Matsumura , Tadashi Chiba
IPC分类号： F02K9/34 , F02K9/62
CPC分类号： F02K9/34 , F02K9/62 , Y10T428/12458 , Y10T428/12486
摘要： A rocket engine combustion chamber is defined by a generally cylindrical member comprising a metal matrix and heat insulating particles wherein the particles are distributed in the matrix such that the amount of particles gradually decreases in a radial direction from the inner surface to the outer surface of the member. Such a member is manufactured by controlled composite electroplating.
摘要翻译：火箭发动机燃烧室由包括金属基体和绝热颗粒的大致圆柱形构件限定，其中颗粒分布在基体中，使得颗粒的数量在径向方向上从内表面到外表面逐渐减小会员。这种构件通过受控复合电镀制造。

4. 发明授权

US5185216A Composite plating film for sliding member 失效
标题翻译：用于滑动构件的复合镀膜
公开(公告)号：US5185216A
公开(公告)日：1993-02-09
申请号：US574701
申请日：1990-08-29
申请人： Tadashi Tanaka , Masaaki Sakamoto , Motomu Wada , Hideo Ishikawa , Sowjun Matsumura , Tadashi Chiba , Kiyoshi Asakawa , Syoichi Oohora
发明人： Tadashi Tanaka , Masaaki Sakamoto , Motomu Wada , Hideo Ishikawa , Sowjun Matsumura , Tadashi Chiba , Kiyoshi Asakawa , Syoichi Oohora
IPC分类号： B32B15/01 , C22C11/06 , C22C29/00 , C22C29/06 , C22C29/16 , C22C32/00 , C25D15/02 , F16C33/12
CPC分类号： F16C33/12 , B32B15/01 , C25D7/10 , Y10S384/912 , Y10S384/913 , Y10S428/935 , Y10T428/12486 , Y10T428/12701
摘要： Disclosed is a composite plating film for sliding members, essentially containing at least one of the alloy elements selected from tin, indium, antimony, and copper; inorganic particles; and lead; the composition of the composite plating film being:a) at least one of the alloy elements selected from tin, indium, antimony, and copper . . . 2 to 30 weight % in total;b) inorganic particles . . . 0.3 to 25 volume %; andc) lead . . . the balance.
摘要翻译：公开了一种用于滑动构件的复合镀膜，其基本上包含选自锡，铟，锑和铜中的至少一种合金元素; 无机颗粒; 和铅所述复合镀膜的组成为：a）选自锡，铟，锑和铜中的至少一种合金元素。。。总计2〜30％ b）无机颗粒。。。 0.3〜25体积％; 和c）铅。。。余额。

5. 发明授权

US5232744A Electroless composite plating bath and method 失效
标题翻译：无电镀复合镀液及方法
公开(公告)号：US5232744A
公开(公告)日：1993-08-03
申请号：US658660
申请日：1991-02-21
申请人： Takayuki Nakamura , Tadashi Chiba
发明人： Takayuki Nakamura , Tadashi Chiba
IPC分类号： C23C18/36
CPC分类号： C23C18/36
摘要： A composite film consisting of particles of fibers dispersed in a metal matrix and formed by electroless deposition can be improved in appearance and particle or fiber content by adding a water-soluble amine or ammonium salt to the electroless plating bath. Preferably the bath contains a water-soluble nickel or cobalt salt, a hypophosphite reducing agent, a chelating agent for chelating the nickel or cobalt ion, a surface active agent, water-insoluble particles or fibers typically of polytetrafluoroethylene, and the water-soluble amine or ammonium salt.
摘要翻译：通过向无电镀浴中加入水溶性胺或铵盐，可以通过分散在金属基体中并通过无电沉积形成的由纤维颗粒组成的复合膜来改善外观和颗粒或纤维含量。优选地，浴含有水溶性镍或钴盐，次磷酸还原剂，螯合镍或钴离子的螯合剂，表面活性剂，一般为聚四氟乙烯的水不溶性颗粒或纤维，以及水溶性胺或铵盐。

6. 发明申请

US20080007364A1 Voltage controlled oscillator 审中-公开
标题翻译：压控振荡器
公开(公告)号：US20080007364A1
公开(公告)日：2008-01-10
申请号：US11783481
申请日：2007-04-10
申请人： Tadashi Chiba
发明人： Tadashi Chiba
IPC分类号： H03B5/12
CPC分类号： H03B5/1228 , H03B5/1215 , H03B5/1253 , H03B5/1293 , H03B2200/0062
摘要： A voltage controlled oscillator (VCO) conducts current on two paths through parallel inductors and parallel cross-coupled metal-oxide-semiconductor transistors. A pair of varactors are connected in series on a third path extending from a node between one inductor and one transistor to a node between the other inductor and the other transistor. The oscillation frequency is controlled by a voltage applied to a node between the two varactors on the third path. Each varactor is structured as a metal-oxide-semiconductor transistor with interconnected source and drain electrodes, a gate electrode, a body region below the gate electrode, and a body terminal region extending beyond the gate electrode. An adjustment voltage applied to the body terminal region shifts the voltage-capacitance curve of the varactor and the voltage-frequency curve of the VCO without changing the shapes of these curves, providing a simple way to adjust the VCO to meet application requirements.
摘要翻译：压控振荡器（VCO）通过并联电感器和并联交叉耦合的金属氧化物半导体晶体管在两个路径上传导电流。一对变容二极管在从一个电感器和一个晶体管之间的节点延伸到另一个电感器和另一个晶体管之间的节点的第三路径上串联连接。振荡频率由施加到第三路径上的两个变容二极管之间的节点的电压控制。每个变容二极管被构造为具有互连的源极和漏极电极，栅极电极，栅极电极下方的主体区域以及延伸超过栅极电极的主体端子区域的金属氧化物半导体晶体管。施加到主体端子区域的调整电压使变容二极管的电压 - 电容曲线和VCO的电压 - 频率曲线偏移，而不改变这些曲线的形状，提供了一种调整VCO以满足应用要求的简单方法。

7. 发明授权

US5938299A Braking force distribution controlling apparatus 失效
标题翻译：制动力分配控制装置
公开(公告)号：US5938299A
公开(公告)日：1999-08-17
申请号：US922673
申请日：1997-09-03
申请人： Masahiro Hara , Tadashi Chiba
发明人： Masahiro Hara , Tadashi Chiba
IPC分类号： B60T8/26 , B60T8/1766 , B60T8/28 , B60T8/58 , B60T13/00
CPC分类号： B60T8/1766
摘要： In a braking force distribution controlling apparatus mounted on a car and arranged to perform such a control as to make a rear-wheel braking force smaller than a front-wheel braking force when predetermined initiation conditions are met, one of the initiation condition is to satisfy either one of such a first condition that a body deceleration is not less than a first predetermined deceleration K1 and that a rear-wheel slip value is a first predetermined value or more greater than a front-wheel slip value and such a second condition that the body deceleration is not less than a second predetermined deceleration K2 which is a value greater than the aforementioned first predetermined deceleration K1.
摘要翻译：在安装在轿厢上的制动力分配控制装置中，在满足规定的起动条件的情况下，配置为进行使后轮制动力小于前轮制动力的控制，起动条件之一为满足这样的第一条件中的任何一个，即身体减速度不小于第一预定减速度K1，并且后轮滑移值是比前轮滑移值大的第一预定值或更大的第二条件，车身减速度不小于比上述第一预定减速度K1大的值的第二预定减速度K2。

8. 发明授权

US5199553A Sliding contactor for electric equipment 失效
标题翻译：电气设备滑动接触器
公开(公告)号：US5199553A
公开(公告)日：1993-04-06
申请号：US772084
申请日：1991-10-08
申请人： Hisaji Shinohara , Naoshi Uchida , Kiyoshi Kandatsu , Soujun Matsumura , Tadashi Chiba , Shigeharu Miyazaki
发明人： Hisaji Shinohara , Naoshi Uchida , Kiyoshi Kandatsu , Soujun Matsumura , Tadashi Chiba , Shigeharu Miyazaki
IPC分类号： H01H1/023 , H01H1/0233 , H01H1/0237 , H01H1/027 , H01H1/58 , H01H11/04
CPC分类号： H01H1/023 , H01H1/0233 , H01H1/0237 , H01H1/027 , H01H1/5833 , H01H11/041 , H01H2001/5838 , Y10S428/929 , Y10S428/935 , Y10T29/49224 , Y10T428/12486 , Y10T428/12625
摘要： A movable electrical contactor having a surface thereof in slidable contact with a mating conductor, the surface being coated with a composite material in which particles of graphite (C) are dispersed in a matrix of silver (Ag). The coating film is formed by electric plating using a plating liquid of metal silver in the range of 2-100 g/l in concentration, potassium cyanide in the range of 2-250 g/l, potassium hydroxide in the range of 0.5-15 g/l, graphite powder in the range of 1-55 g/l, and a dispersant for dispersing graphite powder into plating liquid in the range of 10-2000 ppm.
摘要翻译：一种可移动的电接触器，其表面与配合导体滑动接触，该表面涂有复合材料，其中石墨（C）的颗粒分散在银（Ag）的基质中。涂膜通过使用金属银的电镀液浓度为2-100g / l，氰化钾为2-250g / l，氢氧化钾范围为0.5-15的电镀形成 g / l，1-55g / l范围内的石墨粉末，以及用于将石墨粉末分散在10-2000ppm范围内的电镀液中的分散剂。

9. 发明授权

US08044484B2 Ultraviolet detecting device and manufacturing method thereof, and ultraviolet quantity measuring apparatus 有权
标题翻译：紫外线检测装置及其制造方法以及紫外线量测定装置
公开(公告)号：US08044484B2
公开(公告)日：2011-10-25
申请号：US12915150
申请日：2010-10-29
申请人： Noriyuki Miura , Tadashi Chiba
发明人： Noriyuki Miura , Tadashi Chiba
IPC分类号： H01L29/78
CPC分类号： H01L31/02162 , H01L27/144 , H01L31/105
摘要： The present invention provides an ultraviolet detecting device which comprises a silicon semiconductor layer having a thickness ranging from greater than or equal to 3 nm to less than or equal to 36 nm, which is formed over an insulating layer, lateral PN-junction type first and second photodiodes formed in the silicon semiconductor layer, an interlayer insulating film formed over the silicon semiconductor layer, a first filter layer made of silicon nitride, which is formed over the interlayer insulating film provided over the first photodiode and causes light lying in a wavelength range of an UV-B wave or higher to pass therethrough, and a second filter layer made of silicon nitride, which is formed over the interlayer insulating film provided over the second photodiode and allows light lying in a wavelength range of an UV-A wave or higher to pass therethrough.
摘要翻译：本发明提供了一种紫外线检测装置，其包括厚度范围大于或等于3nm至小于或等于36nm的硅半导体层，其形成在绝缘层上，首先是横向PN结型，形成在硅半导体层中的第二光电二极管，形成在硅半导体层上的层间绝缘膜，由氮化硅制成的第一滤光层，形成在设置在第一光电二极管上的层间绝缘膜之上，并且产生波长范围的光的UV-B波以上通过，以及由氮化硅构成的第二过滤层，其形成在设置在第二光电二极管上的层间绝缘膜的上方，并允许位于UV-A波的波长范围内的光或较高通过。

10. 发明授权

US07507587B2 Automatic analysis and control system for electroless composite plating solution 有权
标题翻译：化学复合电镀液自动分析与控制系统
公开(公告)号：US07507587B2
公开(公告)日：2009-03-24
申请号：US11287285
申请日：2005-11-28
申请人： Tadashi Chiba , Koji Monden , Kazuki Yoshikawa , Shinji Tachibana
发明人： Tadashi Chiba , Koji Monden , Kazuki Yoshikawa , Shinji Tachibana
IPC分类号： G01N21/00 , G01N21/62
CPC分类号： C23C18/1683 , G01N21/31 , Y10T436/12
摘要： An automatic analysis and control system for electroless composite plating solution for automatically analyzing an electroless composite plating solution and performing such a control as to obtain an appropriate bath composition and/or use conditions, wherein, as a technique for measuring the concentration of a metallic component in the plating solution by absorptiometry, the system includes a mechanism for measuring transmissivity or absorbance at least two or more different wavelengths after the plating solution is automatically introduced into an analytical cell, and a mechanism for calculating the objective concentration from the measured values and displaying the calculation results.
摘要翻译：一种用于自动分析无电解复合电镀溶液并进行控制以获得适当的浴组合物和/或使用条件的无电解复合电镀溶液的自动分析和控制系统，其中，作为用于测量金属组分浓度的技术在通过吸光光度法测定的电镀溶液中，该系统包括用于在将电镀溶液自动引入分析单元之后测量至少两个或更多个不同波长的透射率或吸光度的机构，以及用于根据测量值计算目标浓度并显示计算结果。

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