专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2013139637A Continuous thin film vapor deposition apparatus 有权
标题翻译：连续薄膜蒸气沉积装置
公开(公告)号：JP2013139637A
公开(公告)日：2013-07-18
申请号：JP2012286188
申请日：2012-12-27
申请人： Snu Precision Co Ltd , エスエヌユープレシジョンカンパニーリミテッド
发明人： LEE HYOUNG BAE , JUNG KI TAEK , CHO WHANG SIN , YOON SUNG HOON
IPC分类号： C23C14/24 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a continuous thin film vapor deposition apparatus capable of vapor deposition in a thin-film form on a substrate by evaporating an organic material for a long time.SOLUTION: The continuous thin film vapor deposition apparatus includes a material storage part, a material preheat part, a material transport part, a material evaporation part, and a crucible transport part. In the material storage part, an organic material is stored. In the material preheat part, a crucible, in which the organic material is contained, is preheated to a temperature less than the vaporization point of the organic material. In the material transport part, a fixed quantity of the organic material is delivered from the material storage part, and the organic material is conveyed to the crucible arranged in the material preheat part. In the material evaporation part, the organic material contained in the crucible is evaporated by supplying the transported crucible with heat. In the crucible transport part, the crucible preheated in the material preheat part is carried in the material evaporation part or the crucible whose organic material is consumed is carried out of the material evaporation part.
摘要翻译：要解决的问题：提供能够通过长时间蒸发有机材料在基板上以薄膜形式气相沉积的连续薄膜蒸镀装置。解决方案：连续薄膜气相沉积装置包括材料储存部件，材料预热部件，材料输送部件，材料蒸发部件和坩埚输送部件。在材料储存部分中存储有机材料。在材料预热部分中，将含有有机材料的坩埚预热到低于有机材料的蒸发点的温度。在材料输送部中，从材料收纳部输送固定量的有机材料，将有机材料输送到布置在材料预热部上的坩埚。在材料蒸发部件中，通过向运送的坩埚供热来蒸发坩埚中所含的有机材料。在坩埚输送部中，在材料预热部中预热的坩埚被载置在材料蒸发部或由有机材料消耗的坩埚从材料蒸发部进行的情况下。

2. 发明专利

JP2013133545A Mask loading and substrate conveying chamber, and method for operating the same 有权
标题翻译：掩模装载和底板输送室及其操作方法
公开(公告)号：JP2013133545A
公开(公告)日：2013-07-08
申请号：JP2012243029
申请日：2012-11-02
申请人： Snu Precision Co Ltd , エスエヌユー精密股▲ふん▼有限公司
发明人： YOON SUNG HOON , CHO WHANG SIN , SONG KI CHUL , LEE JAE JIN
IPC分类号： C23C14/56 , C23C14/24 , G03F1/68 , H01L21/677
摘要： PROBLEM TO BE SOLVED: To provide a mask loading and substrate conveying chamber capable of enhancing the degree of space application of a process unit.SOLUTION: The mask loading and substrate conveying chamber 100 includes a first space part 110, a second space part 120, a mask loading unit 130, and a transfer unit. The first space part 110 has a door 111 for the access of a substrate or a mask M, and a second space part 120 is formed so as to be communicated with the first space part 110. The mask loading unit 130 loads a plurality of masks M, and the transfer unit transfers in the reciprocating manner the mask loading unit 130 so that the mask loading unit 130 may be selectively located in the first space part 110 or the second space part 120. The masks M are accessed through the door 111 when the mask loading unit 130 is located in the first space part, and the substrates are accessed through the door 111 when the mask loading unit 130 is located in the second space part 120.
摘要翻译：要解决的问题：提供能够提高处理单元的空间应用程度的掩模装载和基板输送室。解决方案：掩模装载和基板输送室100包括第一空间部分110，第二空间部分120，掩模加载单元130和传送单元。第一空间部分110具有用于访问基板或掩模M的门111，并且形成第二空间部分120以与第一空间部分110连通。掩模加载单元130装载多个掩模 M，并且传送单元以往复方式传送掩模加载单元130，使得掩模加载单元130可以选择性地位于第一空间部分110或第二空间部分120中。通过门111访问掩模M，当门掩模装载单元130位于第一空间部分中，并且当掩模装载单元130位于第二空间部分120中时，基板通过门111进入。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式