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    • 2. 发明申请
    • Vapor Phase Methods for Forming Electrodes in Phase Change Memory Devices
    • 在相变存储器件中形成电极的气相方法
    • US20090275198A1
    • 2009-11-05
    • US12113586
    • 2008-05-01
    • Smuruthi KamepalliTyler Lowrey
    • Smuruthi KamepalliTyler Lowrey
    • H01L21/44
    • H01L45/1233H01L45/06H01L45/126H01L45/16
    • A method for forming electrode materials uniformly and conformally within openings having small dimensions, including sublithographic dimensions, or high aspect ratios. The method includes the steps of providing an insulator layer having an opening formed therein, and forming a conformal conductive or semiresistive material over and within the opening. The method is a CVD or ALD process for forming metal nitride, metal aluminum nitride, and metal silicon nitride electrode compositions. The methods utilize metal precursors containing one or more ligands selected from alkyl, allyl, alkene, alkyne, acyl, amide, amine, immine, imide, azide, hydrazine, silyl, alkylsilyl, silylamine, chelating, hydride, cyclic, carbocyclic, cyclopentadienyl, phosphine, carbonyl, or halide. Suitable precursors include monometallic precursors having the general formula MRn, where M is a metal, R designates a ligand as indicated above and n is an integer corresponding to the number of ligands bonded to the central metal atom. M may be Ti, Ta, W, Nb, Mo, Pt, Cr, Co, Ni, or other transition metal.
    • 在具有小尺寸,例如亚光刻尺寸或高纵横比的开口内均匀且保形地形成电极材料的方法。 该方法包括以下步骤:提供其中形成有开口的绝缘体层,并且在开口内部和内部形成共形导电或半材料材料。 该方法是用于形成金属氮化物,金属氮化铝和金属氮化硅电极组合物的CVD或ALD工艺。 该方法使用含有一种或多种选自烷基,烯丙基,炔,炔,酰基,酰胺,胺,胺,酰亚胺,叠氮化物,肼,甲硅烷基,烷基甲硅烷基,甲硅烷基胺,螯合氢化物,环状,碳环,环戊二烯基, 膦,羰基或卤化物。 合适的前体包括具有通式MRn的单金属前体,其中M是金属,R表示如上所述的配体,n是对应于与中心金属原子键合的配体数的整数。 M可以是Ti,Ta,W,Nb,Mo,Pt,Cr,Co,Ni或其它过渡金属。
    • 9. 发明授权
    • Multi-terminal chalcogenide logic circuits
    • 多端硫族化物逻辑电路
    • US07969769B2
    • 2011-06-28
    • US11724485
    • 2007-03-15
    • Tyler Lowrey
    • Tyler Lowrey
    • G11C11/00
    • H03K19/1733
    • Logic circuits are disclosed that include one or more three-terminal chalcogenide devices. The three-terminal chalcogenide devices are electrically interconnected and configured to perform one or more logic operations, including AND, OR, NOT, NAND, NOR, XOR, and XNOR. Embodiments include series and parallel configurations of three-terminal chalcogenide devices. The chalcogenide devices include a chalcogenide switching material as the working medium along with three electrical terminals in electrical communication therewith.In one embodiment, the circuits include one or more input terminals, one or more output terminals, and a clock terminal. The input terminals receive one or more input signals and deliver them to the circuit for processing according to a logic operation. Upon conclusion of processing, the output of the circuit is provided to the output terminal. The clock terminal delivers a clock signal to facilitate operation of the three-terminal devices included in the instant circuits. In one embodiment, the clock signal includes an ON cycle and an OFF cycle, where the circuit performs a logic operation during the ON cycle and any three-terminal devices that are switched to the conductive state during the ON cycle are returned to their resistive state during the OFF cycle.
    • 公开了包括一个或多个三末端硫族化物装置的逻辑电路。 三端硫属化物器件电互连并被配置为执行一个或多个逻辑操作,包括AND,OR,NOT,NAND,NOR,XOR和XNOR。 实施方案包括三末端硫族化物装置的串联和并联配置。 硫族化物装置包括作为工作介质的硫族化物转换材料以及与其电连通的三个电端子。 在一个实施例中,电路包括一个或多个输入端子,一个或多个输出端子和时钟端子。 输入端子接收一个或多个输入信号,并根据逻辑运算将它们传送到电路进行处理。 在处理结束时,将电路的输出提供给输出端。 时钟终端提供时钟信号,以便于即时电路中包括的三端设备的操作。 在一个实施例中,时钟信号包括ON周期和OFF周期,其中电路在ON周期期间执行逻辑运算,并且在ON周期期间切换到导通状态的任何三端器件返回到其电阻状态 在OFF循环期间。
    • 10. 发明授权
    • Memory device and method of making same
    • 存储器件及其制作方法
    • US07902536B2
    • 2011-03-08
    • US11495927
    • 2006-07-28
    • Wolodymyr CzubatyjTyler LowreySergey Kostylev
    • Wolodymyr CzubatyjTyler LowreySergey Kostylev
    • H01L29/02H01L47/00
    • G11C11/5678G11C11/56G11C13/0004H01L45/06H01L45/122H01L45/143H01L45/144H01L45/148
    • A radial memory device includes a phase-change material, a first electrode in electrical communication with the phase-change material, the first electrode having a substantially planar first area of electrical communication with the phase-change material. The radial memory device also includes a second electrode in electrical communication with the phase-change material, the second electrode having a second area of electrical communication with the phase-change material, the second area being laterally spacedly disposed from the first area and substantially circumscribing the first area.Further, a method of making a memory device is disclosed. The steps include depositing a first electrode, depositing a first insulator, configuring the first insulator to define a first opening. The first opening provides for a generally planar first contact of the first electrode. The method further including the steps of depositing a phase-change material, depositing a second insulator, configuring the second insulator, depositing a second electrode having a second contact laterally displaced from said first contact, and configuring said second electrode.
    • 径向存储器件包括相变材料,与相变材料电连通的第一电极,第一电极具有与相变材料电连通的基本平坦的第一区域。 所述径向存储装置还包括与所述相变材料电连通的第二电极,所述第二电极具有与所述相变材料电连通的第二区域,所述第二区域与所述第一区域横向间隔设置并且基本上限定 第一个区域。 此外,公开了一种制造存储器件的方法。 这些步骤包括沉积第一电极,沉积第一绝缘体,构成第一绝缘体以限定第一开口。 第一开口提供第一电极的大致平面的第一接触。 该方法还包括以下步骤:沉积相变材料,沉积第二绝缘体,构成第二绝缘体,沉积具有从所述第一触点横向移位的第二触点的第二电极,以及配置所述第二电极。