专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2015119564A1 CONTROLLING PRESSURE IN CAVITIES ON SUBSTRATES 审中-公开
标题翻译：控制基板上的压力
公开(公告)号：WO2015119564A1
公开(公告)日：2015-08-13
申请号：PCT/SE2015/050130
申请日：2015-02-06
申请人： SILEX MICROSYSTEMS AB
发明人： WESTIN, Håkan , WICKERT, Peter
IPC分类号： B81C1/00 , B81B1/00
CPC分类号： B81C1/00293
摘要： The invention relates to a new method of providing different and controlled atmospheres inside cavities on one and the same chip of a MEMS device. With the new method one can refrain from providing separate getter materials, and thereby the manufacturing is simplified. The method comprises providing a first substrate (20) and a second substrate (28) and making at least one depression (22', 22'') in at least one of the substrates(20). A structural component (26) is provided in or on a surface of at least one of the substrates, said structure containing entrapped, absorbed or adsorbed ions, molecules or atoms of a gas. The substrates are bonded together such that a cavity forms and becomes hermetically sealed. The obtained structure is subjected to conditions so as to release the implanted, absorbed or adsorbed gas atoms, ions or molecules from the substrate to provide said controlled atmosphere inside the cavity.
摘要翻译：本发明涉及一种在MEMS器件的同一个芯片上的空腔内提供不同和受控气氛的新方法。采用这种新方法，可以避免提供单独的吸气剂材料，从而简化制造。该方法包括提供第一衬底（20）和第二衬底（28），并且在至少一个衬底（20）中形成至少一个凹陷（22'，22“）。在至少一个基板的表面中或其表面上设置结构部件（26），所述结构包含被截留的，吸收的或吸附的离子，气体的分子或原子。基板粘合在一起，使得空腔形成并变得密封。所获得的结构经受条件以从衬底中释放注入的，吸收的或吸附的气体原子，离子或分子，以在空腔内提供所述受控气氛。

2. 发明公开

EP3102534A1 CONTROLLING PRESSURE IN CAVITIES ON SUBSTRATES 审中-公开
标题翻译：压力控制龋洞对基质
公开(公告)号：EP3102534A1
公开(公告)日：2016-12-14
申请号：EP15745967.8
申请日：2015-02-06
申请人： Silex Microsystems AB
发明人： WESTIN, Håkan , WICKERT, Peter
IPC分类号： B81C1/00 , B81B1/00
CPC分类号： B81C1/00293
摘要： The invention relates to a new method of providing different and controlled atmospheres inside cavities on one and the same chip of a MEMS device. With the new method one can refrain from providing separate getter materials, and thereby the manufacturing is simplified. The method comprises providing a first substrate (20) and a second substrate (28) and making at least one depression (22', 22'') in at least one of the substrates(20). A structural component (26) is provided in or on a surface of at least one of the substrates, said structure containing entrapped, absorbed or adsorbed ions, molecules or atoms of a gas. The substrates are bonded together such that a cavity forms and becomes hermetically sealed. The obtained structure is subjected to conditions so as to release the implanted, absorbed or adsorbed gas atoms, ions or molecules from the substrate to provide said controlled atmosphere inside the cavity.

3. 发明公开

EP3401273A1 METHOD OF MAKING A MULTI-CAVITY MEMS DEVICE WITH DIFFERENT PRESSURES IN THE CAVITIES 审中-公开
公开(公告)号：EP3401273A1
公开(公告)日：2018-11-14
申请号：EP17208918.7
申请日：2017-12-20
申请人： Silex Microsystems AB
发明人： WESTIN, Håkan , WICKERT, Peter , EBEFORS, Thorbjörn
IPC分类号： B81B7/00 , B81B7/02 , B81C1/00
CPC分类号： B81B7/02 , B81C1/00285 , B81C2203/0118 , B81C2203/036
摘要： The present invention relates to a method of making a MEMS device (40) requiring more than one cavity (20', 20"), each cavity having different atmospheres in terms of pressure and/or composition, and a MEMS device having cavities (20', 20") with different atmospheres. The different atmospheres are obtained by combined use of gettering structures (26) and implanted gaseous species (28), which upon thermal activation removes unwanted species (gettering) from cavities (20', 20") and provides controlled atmosphere by release of implanted gas in the cavities (20', 20").

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式