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1. 发明授权

US06340325B1 Polishing pad grooving method and apparatus 失效
标题翻译：抛光槽切槽方法及装置
公开(公告)号：US06340325B1
公开(公告)日：2002-01-22
申请号：US09605869
申请日：2000-06-29
申请人： Shyng-Tsong Chen , Alex Siu Keung Chung , Kenneth M. Davis , Oscar Kai Chi Hsu , Kenneth P. Rodbell
发明人： Shyng-Tsong Chen , Alex Siu Keung Chung , Kenneth M. Davis , Oscar Kai Chi Hsu , Kenneth P. Rodbell
IPC分类号： B24B100
CPC分类号： B24B37/26 , Y10T409/303808 , Y10T409/306608 , Y10T409/308624
摘要： Grooves are formed in a COD pad by positioning the pad on a supporting surface with a working surface of the pad in spaced relation opposite to a router bit and at least one projecting stop member adjacent to the router bit, an outer end portion of the bit projecting beyond the stop. When the bit is rotated, relative axial movement between the bit and the pad causes the outer end portion of the bit to cut an initial recess in the pad. Relative lateral movement between the rotating bit and the pad then forms a groove which extends laterally away from the recess and has a depth substantially the same as that of the recess. The depths of the initial recess and the groove are limited by applying a vacuum to the working surface of the pad to keep it in contact with the stop member(s). Different lateral movements between the bit and the pad are used to form a variety of groove patterns, the depths of which are precisely controlled by the stop member(s).
摘要翻译：通过将焊盘定位在支撑表面上，通过将焊盘的工作表面与路由器钻头相对隔开的关系形成凹槽并形成至少一个与路由器钻头相邻的突出挡块，钻头的外端部分突出超出停止。当钻头旋转时，钻头和钻头之间的相对轴向运动使钻头的外端部分切割焊盘中的初始凹陷。旋转钻头和垫之间的相对横向运动形成一个横向延伸离开凹槽并具有与凹槽基本相同的深度的凹槽。通过将真空施加到垫的工作表面以使其与止动构件接触来限制初始凹部和凹槽的深度。钻头和垫之间的不同横向运动用于形成各种凹槽图案，其深度由止动件精确地控制。

2. 发明授权

US06383066B1 Multilayered polishing pad, method for fabricating, and use thereof 失效
标题翻译：多层抛光垫，其制造方法及其应用
公开(公告)号：US06383066B1
公开(公告)日：2002-05-07
申请号：US09599514
申请日：2000-06-23
申请人： Shyng-Tsong Chen , Alex Siu Keung Chung , Oscar Kai Chi Hsu , Kenneth P. Rodbell , Jean Vangsness
发明人： Shyng-Tsong Chen , Alex Siu Keung Chung , Oscar Kai Chi Hsu , Kenneth P. Rodbell , Jean Vangsness
IPC分类号： B24D1100
CPC分类号： B24B37/22 , B24B37/24 , B24D3/28
摘要： A multilayered polishing pad especially suitable for chemical-mechanical polishing or planarizing metal, semiconductor or optical surfaces is provided. The invention allows the mechanical and polishing properties of the several layers to be independently varied.
摘要翻译：提供了特别适用于化学机械抛光或平面化金属，半导体或光学表面的多层抛光垫。本发明允许独立地改变若干层的机械和抛光性能。

3. 发明授权

US06712681B1 Polishing pads with polymer filled fibrous web, and methods for fabricating and using same 有权
公开(公告)号：US06712681B1
公开(公告)日：2004-03-30
申请号：US09715184
申请日：2000-11-20
申请人： Shyng-Tsong Chen , Kenneth P. Rodbell , Oscar Kai Chi Hsu , Jean Vangsness , David S. Gilbride , Scott Clayton Billings , Kenneth Davis
发明人： Shyng-Tsong Chen , Kenneth P. Rodbell , Oscar Kai Chi Hsu , Jean Vangsness , David S. Gilbride , Scott Clayton Billings , Kenneth Davis
IPC分类号： B24D1100
CPC分类号： B24B37/26 , B24D3/28 , B24D11/008 , B24D18/00
摘要： A polishing pad having a body comprising fibers embedded in a matrix polymer formed by a reaction of polymer precursors. The fibers define interstices, and the precursors fill these interstices substantially completely before completion of the reaction. The pad may include a thin layer of free fibers at its polishing surface. A segment of at least a portion of the free fibers are embedded in the adjacent body of the polymer and fibers. The fibers may be separate, or in the form of a woven or non-woven web.

4. 发明授权

US06989117B2 Polishing pads with polymer filled fibrous web, and methods for fabricating and using same 失效
标题翻译：具有聚合物填充的纤维网的抛光垫，以及其制造和使用方法
公开(公告)号：US06989117B2
公开(公告)日：2006-01-24
申请号：US10782922
申请日：2004-02-23
申请人： Shyng-Tsong Chen , Kenneth P. Rodbell , Oscar Kai Chi Hsu , Jean Vangsness , David S. Gilbride , Scott Clayton Billings , Kenneth Davis
发明人： Shyng-Tsong Chen , Kenneth P. Rodbell , Oscar Kai Chi Hsu , Jean Vangsness , David S. Gilbride , Scott Clayton Billings , Kenneth Davis
IPC分类号： B29C39/42
CPC分类号： B24B37/26 , B24D3/28 , B24D11/008 , B24D18/00
摘要： A method of making a polishing pad having a body comprising fibers embedded in a matrix polymer formed by a reaction of polymer precursors. The fibers define interstices, and the precursors fill these interstices substantially completely before completion of the reaction. The method comprising placing the fibers and the precursors in a cavity of a mold for shaping the polishing pad; applying a differential pressure across a mold cavity, where the differential pressure and the amount of precursors are sufficient to cause the precursors to fill the interstices substantially completely before completion of the reaction; and applying sufficient heat to the mold to at least partially cure the polishing pad by causing the precursors to react.
摘要翻译：一种制造抛光垫的方法，该抛光垫具有包含嵌入在通过聚合物前体的反应形成的基体聚合物中的纤维的主体。纤维定义空隙，并且前体在反应完成之前基本上完全填充这些间隙。该方法包括将纤维和前体放置在用于成形抛光垫的模具的空腔中; 在模具腔内施加压差，其中压差和前体的量足以使得前体在反应完成之前基本上完全填充空隙; 并且通过使前体反应来向模具施加足够的热量以至少部分地固化抛光垫。

5. 发明授权

US06685548B2 Grooved polishing pads and methods of use 有权
标题翻译：凹槽抛光垫和使用方法
公开(公告)号：US06685548B2
公开(公告)日：2004-02-03
申请号：US10424840
申请日：2003-04-29
申请人： Shyng-Tsong Chen , Kenneth M. Davis , Kenneth P. Rodbell
发明人： Shyng-Tsong Chen , Kenneth M. Davis , Kenneth P. Rodbell
IPC分类号： B24B722
CPC分类号： B24B37/26 , B24D18/00
摘要： Grooves are formed in a CMP pad by positioning the pad on a supporting surface with a working surface of the pad in spaced relation opposite to a router bit and at least one projecting stop member adjacent to the router bit, an outer end portion of the bit projecting beyond the stop. When the bit is rotated, relative axial movement between the bit and the pad causes the outer end portion of the bit to cut an initial recess in the pad. Relative lateral movement between the rotating bit and the pad then forms a groove which extends laterally away from the recess and has a depth substantially the same as that of the recess. The depths of the initial recess and the groove are limited by applying a vacuum to the working surface of the pad to keep it in contact with the stop member(s). Different lateral movements between the bit and the pad are used to form a variety of groove patterns, the depths of which are precisely controlled by the stop member(s). The grooves may be formed in the polishing surface and/or the rear opposite surface of the pad and passages may be provided for interconnecting the rear grooves with the polishing surface or the front grooves.
摘要翻译：通过将衬垫定位在支撑表面上，使衬垫的工作表面与路由器刀片相对的间隔开的关系形成凹槽，并且至少一个与路由器刀头相邻的突出止动件，钻头的外端部分突出超出停止。当钻头旋转时，钻头和钻头之间的相对轴向运动使钻头的外端部分切割焊盘中的初始凹陷。旋转钻头和垫之间的相对横向运动形成一个横向延伸离开凹槽并具有与凹槽基本相同的深度的凹槽。通过将真空施加到垫的工作表面以使其与止动构件接触来限制初始凹部和凹槽的深度。钻头和垫之间的不同横向运动用于形成各种凹槽图案，其深度由止动件精确地控制。凹槽可以形成在抛光表面中和/或垫的后相对表面，并且可以设置通道用于将后槽与抛光表面或前槽相互连接。

6. 发明授权

US06656019B1 Grooved polishing pads and methods of use 有权
标题翻译：凹槽抛光垫和使用方法
公开(公告)号：US06656019B1
公开(公告)日：2003-12-02
申请号：US09668142
申请日：2000-09-25
申请人： Shyng-Tsong Chen , Kenneth M. Davis , Kenneth P. Rodbell
发明人： Shyng-Tsong Chen , Kenneth M. Davis , Kenneth P. Rodbell
IPC分类号： B24B100
CPC分类号： B24B37/26 , B24D18/00
摘要： Grooves are formed in a CMP pad by positioning the pad on a supporting surface with a working surface of the pad in spaced relation opposite to a router bit and at least one projecting stop member adjacent to the router bit, an outer end portion of the bit projecting beyond the stop. When the bit is rotated, relative axial movement between the bit and the pad causes the outer end portion of the bit to cut an initial recess in the pad. Relative lateral movement between the rotating bit and the pad then forms a groove which extends laterally away from the recess and has a depth substantially the same as that of the recess. Different lateral movements between the bit and the pad are used to form a variety of groove patterns, the depths of which are precisely controlled by the stop member(s). The grooves may be formed in the polishing surface and/or the rear opposite surface of the pad and passages may be provided for interconnecting the rear grooves with the polishing surface or the front grooves. Grooves in the polishing surface may be provided with outlets through which a polishing slurry may flow while the polishing surface is in contact with a workpiece surface.
摘要翻译：通过将衬垫定位在支撑表面上，使衬垫的工作表面与路由器刀片相对的间隔开的关系形成凹槽，并且至少一个与路由器刀头相邻的突出止动件，钻头的外端部分突出超出停止。当钻头旋转时，钻头和钻头之间的相对轴向运动使钻头的外端部分切割焊盘中的初始凹陷。旋转钻头和垫之间的相对横向运动形成一个横向延伸离开凹槽并具有与凹槽基本相同的深度的凹槽。钻头和垫之间的不同横向运动用于形成各种凹槽图案，其深度由止动件精确地控制。凹槽可以形成在抛光表面中和/或垫的后相对表面，并且可以设置通道用于将后槽与抛光表面或前槽相互连接。抛光表面中的凹槽可以设置有抛光浆料可以在抛光表面与工件表面接触的同时流过的出口。

7. 发明授权

US08999764B2 Ionizing radiation blocking in IC chip to reduce soft errors 有权
标题翻译： IC芯片中的电离辐射阻断减少软错误
公开(公告)号：US08999764B2
公开(公告)日：2015-04-07
申请号：US11836819
申请日：2007-08-10
申请人： Mukta G. Farooq , Ian D. Melville , Kevin S. Petrarca , Kenneth P. Rodbell
发明人： Mukta G. Farooq , Ian D. Melville , Kevin S. Petrarca , Kenneth P. Rodbell
IPC分类号： H01L21/00 , H01L23/532 , H01L23/556
CPC分类号： H01L23/5329 , H01L23/556 , H01L2924/0002 , Y10S438/958 , Y10S438/967 , H01L2924/00
摘要： Methods of blocking ionizing radiation to reduce soft errors and resulting IC chips are disclosed. One embodiment includes forming a front end of line (FEOL) for an integrated circuit (IC) chip; and forming at least one back end of line (BEOL) dielectric layer including ionizing radiation blocking material therein. Another embodiment includes forming a front end of line (FEOL) for an integrated circuit (IC) chip; and forming an ionizing radiation blocking layer positioned in a back end of line (BEOL) of the IC chip. The ionizing radiation blocking material or layer absorbs ionizing radiation and reduces soft errors within the IC chip.
摘要翻译：公开了阻止电离辐射以减少软错误的方法和产生的IC芯片。一个实施例包括形成用于集成电路（IC）芯片的线路前端（FEOL）; 以及在其中形成包括其中的电离辐射阻挡材料的至少一个后端线（BEOL）电介质层。另一实施例包括形成用于集成电路（IC）芯片的线路前端（FEOL）; 以及形成位于IC芯片的后端（BEOL）的电离辐射阻挡层。电离辐射阻挡材料或层吸收电离辐射并减少IC芯片内的软误差。

8. 发明授权

US08785217B2 Tunable radiation source 有权
标题翻译：可调辐射源
公开(公告)号：US08785217B2
公开(公告)日：2014-07-22
申请号：US13230798
申请日：2011-09-12
申请人： Michael A. Gaynes , Michael S. Gordon , Nancy C. LaBianca , Kenneth P. Rodbell
发明人： Michael A. Gaynes , Michael S. Gordon , Nancy C. LaBianca , Kenneth P. Rodbell
IPC分类号： G01R31/26 , H01L21/66
CPC分类号： H01L23/556 , G01R31/2881 , G06F17/5036 , H01L2224/16225 , H01L2224/32225 , H01L2224/73204 , H01L2924/00
摘要： An energy distribution of soft error-inducing radiation likely to be encountered by an electronic circuit during operation is determined. A tuned radiation source having a source energy distribution similar to the determined energy distribution is prepared. The electronic circuit is tested using the tuned radiation source.
摘要翻译：确定在操作期间可能由电子电路遇到的软误差诱发辐射的能量分布。制备具有与所确定的能量分布相似的源能分布的调谐辐射源。使用调谐的辐射源测试电子电路。

9. 发明授权

US08293643B2 Method and structure of forming silicide and diffusion barrier layer with direct deposited film on silicon 有权
标题翻译：在硅上直接沉积薄膜形成硅化物和扩散阻挡层的方法和结构
公开(公告)号：US08293643B2
公开(公告)日：2012-10-23
申请号：US12819634
申请日：2010-06-21
申请人： Cyril Cabral, Jr. , John M. Cotte , Kathryn C. Fisher , Laura L. Kosbar , Christian Lavoie , Zhu Liu , Kenneth P. Rodbell , Xiaoyan Shao
发明人： Cyril Cabral, Jr. , John M. Cotte , Kathryn C. Fisher , Laura L. Kosbar , Christian Lavoie , Zhu Liu , Kenneth P. Rodbell , Xiaoyan Shao
IPC分类号： H01L21/477
CPC分类号： H01L21/28518 , H01L21/76841 , H01L23/53238 , H01L31/022408 , H01L31/022425 , H01L2924/0002 , Y02E10/50 , H01L2924/00
摘要： A semiconductor device or a photovoltaic cell having a contact structure, which includes a silicon (Si) substrate; a metal alloy layer deposited on the silicon substrate; a metal silicide layer and a diffusion layer formed simultaneously from thermal annealing the metal alloy layer; and a metal layer deposited on the metal silicide and barrier layers.
摘要翻译：具有接触结构的半导体器件或光电池，其包括硅（Si）衬底; 沉积在硅衬底上的金属合金层; 金属硅化物层和由金属合金层热退火同时形成的扩散层; 以及沉积在金属硅化物和阻挡层上的金属层。

10. 发明授权

US07877716B2 Computer program products for determining stopping powers of design structures with respect to a traveling particle 有权
标题翻译：用于确定相对于旅行颗粒的设计结构的停止力的计算机程序产品
公开(公告)号：US07877716B2
公开(公告)日：2011-01-25
申请号：US12111529
申请日：2008-04-29
申请人： Giovanni Fiorenza , Conal E. Murray , Kenneth P. Rodbell , Henry Tang
发明人： Giovanni Fiorenza , Conal E. Murray , Kenneth P. Rodbell , Henry Tang
IPC分类号： G06F17/50 , G06F19/00 , G06G7/62
CPC分类号： G06F17/5009 , G06F2217/16
摘要： A computer program product, comprising a computer readable storage device having a computer readable program code stored therein, said program code including an algorithm adapted to be executed by a computer to implement a method. First, design information of a design structure is provided including a back-end-of-line layer of an integrated circuit which includes N interconnect layers, wherein N is a positive integer. Next, each interconnect layer is divided into multiple pixels. Next, a first path of a traveling particle in a first interconnect layer of the N interconnect layers is determined. Next, M path pixels of the multiple pixels of the first interconnect layer on the first path of the traveling particle are identified, wherein M is a positive integer. Next, a first loss energy lost by the traveling particle due to its completely passing through a first pixel of the M path pixels is determined.
摘要翻译：一种计算机程序产品，包括具有存储在其中的计算机可读程序代码的计算机可读存储设备，所述程序代码包括适于由计算机执行以实现方法的算法。首先，提供一种设计结构的设计信息，其包括包括N个互连层的集成电路的后端行层，其中N是正整数。接下来，每个互连层被分成多个像素。接下来，确定N个互连层的第一互连层中的行进粒子的第一路径。接下来，识别行进粒子的第一路径上的第一互连层的多个像素的M个路径像素，其中M是正整数。接下来，确定由于行进粒子完全通过M路径像素的第一像素而损失的第一损失能量。

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