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1. 发明授权

US08734915B2 Film-formation method and manufacturing method of light-emitting device 有权
标题翻译：发光装置的成膜方法和制造方法
公开(公告)号：US08734915B2
公开(公告)日：2014-05-27
申请号：US12391840
申请日：2009-02-24
申请人： Shunpei Yamazaki , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka , Satoshi Seo
发明人： Shunpei Yamazaki , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka , Satoshi Seo
IPC分类号： B05D3/06 , B05D5/12 , C23C14/32 , C23C14/28
CPC分类号： C23C14/28 , C23C14/048 , H01L27/3211 , H01L51/0013 , H01L51/56
摘要： A film-formation method whereby a minute pattern thin film can be formed on a deposition substrate, without provision of a mask between a material and the deposition substrate. Moreover, a light-emitting element is formed by such a film-formation method, and a high-definition light-emitting device can be manufactured. Through a film-formation substrate in which a reflective layer, a light-absorbing layer and a material layer are formed, the light-absorbing layer is irradiated with light, so that a material contained in the material layer is deposited on a deposition substrate which is disposed to face the film-formation substrate. Since the reflective layer is selectively formed, a film to be deposited on the deposition substrate can be selectively formed with a minute pattern reflecting the pattern of the reflective layer. A wet process can be employed for formation of the material layer.
摘要翻译：可以在沉积基板上形成微图案薄膜而不在材料和沉积基板之间设置掩模的成膜方法。此外，通过这样的成膜方法形成发光元件，并且可以制造高清晰度发光器件。通过形成反射层，光吸收层和材料层的成膜基板，对光吸收层照射光，使得包含在材料层中的材料沉积在沉积基板上配置成面对成膜基板。由于选择性地形成反射层，所以可以以反射层的图案的微小图案选择性地形成沉积在沉积基板上的膜。可以采用湿法来形成材料层。

2. 发明申请

US20090220706A1 Film-Formation Method and Manufacturing Method of Light-Emitting Device 有权
标题翻译：发光装置的成膜方法及制造方法
公开(公告)号：US20090220706A1
公开(公告)日：2009-09-03
申请号：US12391840
申请日：2009-02-24
申请人： Shunpei Yamazaki , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka , Satoshi Seo
发明人： Shunpei Yamazaki , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka , Satoshi Seo
IPC分类号： C23C14/28
CPC分类号： C23C14/28 , C23C14/048 , H01L27/3211 , H01L51/0013 , H01L51/56
摘要： A film-formation method whereby a minute pattern thin film can be formed on a deposition substrate, without provision of a mask between a material and the deposition substrate. Moreover, a light-emitting element is formed by such a film-formation method, and a high-definition light-emitting device can be manufactured. Through a film-formation substrate in which a reflective layer, a light-absorbing layer and a material layer are formed, the light-absorbing layer is irradiated with light, so that a material contained in the material layer is deposited on a deposition substrate which is disposed to face the film-formation substrate. Since the reflective layer is selectively formed, a film to be deposited on the deposition substrate can be selectively formed with a minute pattern reflecting the pattern of the reflective layer. A wet process can be employed for formation of the material layer.
摘要翻译：可以在沉积基板上形成微图案薄膜而不在材料和沉积基板之间设置掩模的成膜方法。此外，通过这样的成膜方法形成发光元件，并且可以制造高清晰度发光器件。通过形成反射层，光吸收层和材料层的成膜基板，对光吸收层照射光，使得包含在材料层中的材料沉积在沉积基板上配置成面对成膜基板。由于选择性地形成反射层，所以可以以反射层的图案的微小图案选择性地形成沉积在沉积基板上的膜。可以采用湿法来形成材料层。

3. 发明申请

US20090221107A1 Deposition Method and Manufacturing Method of Light-Emitting Device 有权
标题翻译：发光装置的沉积方法和制造方法
公开(公告)号：US20090221107A1
公开(公告)日：2009-09-03
申请号：US12391785
申请日：2009-02-24
申请人： Shunpei Yamazaki , Koichiro Tanaka , Takahiro Ibe , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Takahiro Ibe , Satoshi Seo
IPC分类号： H01L21/30 , H01L33/00
CPC分类号： H01L51/0013 , C23C14/048 , H01L51/56
摘要： Part of a material layer is deposited on a deposition target surface of a second substrate by steps of providing a first substrate having a light absorption layer and a material layer in contact with the light absorption layer over one of surfaces; making a surface of the first substrate over which the material layer is formed and a deposition target surface of a second substrate face to each other; depositing part of the material layer on the deposition target surface of the second substrate in such a manner that irradiation with laser light of which repetition rate is greater than or equal to 10 MHz and pulse width is greater than or equal to 100 fs and less than or equal to 10 ns is performed from the other surface side of the first substrate to selectively heat part of the material layer overlapping with the light absorption layer.
摘要翻译：材料层的一部分通过以下步骤沉积在第二衬底的沉积靶表面上：通过提供具有光吸收层的第一衬底和与光吸收层接触的材料层在一个表面上的步骤; 制作形成材料层的第一基板的表面和第二基板的沉积目标表面彼此面对; 在第二基板的沉积靶表面上沉积材料层的一部分，使得以重复率大于或等于10MHz的激光照射并且脉冲宽度大于或等于100fs并小于或者等于10ns从第一基板的另一表面侧进行选择性地加热与光吸收层重叠的材料层的一部分。

4. 发明授权

US08581234B2 Deposition method and manufacturing method of light-emitting device 有权
标题翻译：发光装置的沉积方法和制造方法
公开(公告)号：US08581234B2
公开(公告)日：2013-11-12
申请号：US12391785
申请日：2009-02-24
申请人： Shunpei Yamazaki , Koichiro Tanaka , Takahiro Ibe , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Takahiro Ibe , Satoshi Seo
IPC分类号： H01L33/02
CPC分类号： H01L51/0013 , C23C14/048 , H01L51/56
摘要： Part of a material layer is deposited on a deposition target surface of a second substrate by steps of providing a first substrate having a light absorption layer and a material layer in contact with the light absorption layer over one of surfaces; making a surface of the first substrate over which the material layer is formed and a deposition target surface of a second substrate face to each other; depositing part of the material layer on the deposition target surface of the second substrate in such a manner that irradiation with laser light of which repetition rate is greater than or equal to 10 MHz and pulse width is greater than or equal to 100 fs and less than or equal to 10 ns is performed from the other surface side of the first substrate to selectively heat part of the material layer overlapping with the light absorption layer.
摘要翻译：材料层的一部分通过以下步骤沉积在第二衬底的沉积靶表面上：通过提供具有光吸收层的第一衬底和与光吸收层接触的材料层在一个表面上的步骤; 制作形成材料层的第一基板的表面和第二基板的沉积目标表面彼此面对; 在第二基板的沉积靶表面上沉积材料层的一部分，使得以重复率大于或等于10MHz的激光照射并且脉冲宽度大于或等于100fs并小于或者等于10ns从第一基板的另一表面侧进行选择性地加热与光吸收层重叠的材料层的一部分。

5. 发明授权

US08080811B2 Method for manufacturing evaporation donor substrate and light-emitting device 有权
标题翻译：制造蒸发供体基板和发光装置的方法
公开(公告)号：US08080811B2
公开(公告)日：2011-12-20
申请号：US12341424
申请日：2008-12-22
申请人： Kohei Yokoyama , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka
发明人： Kohei Yokoyama , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka
IPC分类号： H01J1/62
CPC分类号： H01L51/0013 , C23C14/048 , H01L27/3244
摘要： An evaporation donor substrate which enables only a desired evaporation material to be evaporated at the time of deposition by an evaporation method, and capable of reduction in manufacturing cost by increase in use efficiency of the evaporation material and deposition with high uniformity. An evaporation donor substrate capable of controlling laser light so that a desired position of an evaporation donor substrate is irradiated with the laser light in accordance with the wavelength of the emitted laser light at the time of evaporation. Specifically, an evaporation donor substrate in which a region which reflects laser light and a region which absorbs laser light at the time of irradiation with laser light having a wavelength of greater than or equal to 400 nm and less than or equal to 600 nm at the time of evaporation are formed.
摘要翻译：一种蒸发供体基板，其通过蒸发法沉积时只能使期望的蒸发材料蒸发，并且能够通过提高蒸发材料的使用效率和高均匀性的沉积而降低制造成本。一种能够控制激光的蒸发施主基板，使得根据在蒸发时发射的激光的波长，用激光照射蒸发供体基板的期望位置。具体而言，在该激光的反射时，激光的反射区域和在波长为400nm以上且小于等于600nm的激光照射时的区域的蒸发供体基板形成蒸发时间。

6. 发明授权

US08435811B2 Method for manufacturing evaporation donor substrate and light-emitting device 有权
标题翻译：制造蒸发供体基板和发光装置的方法
公开(公告)号：US08435811B2
公开(公告)日：2013-05-07
申请号：US13329624
申请日：2011-12-19
申请人： Kohei Yokoyama , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka
发明人： Kohei Yokoyama , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka
IPC分类号： H01L21/00 , H01L21/469
CPC分类号： H01L51/0013 , C23C14/048 , H01L27/3244
摘要： An evaporation donor substrate which enables only a desired evaporation material to be evaporated at the time of deposition by an evaporation method, and capable of reduction in manufacturing cost by increase in use efficiency of the evaporation material and deposition with high uniformity. An evaporation donor substrate capable of controlling laser light so that a desired position of an evaporation donor substrate is irradiated with the laser light in accordance with the wavelength of the emitted laser light at the time of evaporation. Specifically, an evaporation donor substrate in which a region which reflects laser light and a region which absorbs laser light at the time of irradiation with laser light having a wavelength of greater than or equal to 400 nm and less than or equal to 600 nm at the time of evaporation are formed.
摘要翻译：一种蒸发供体基板，其通过蒸发法沉积时只能使期望的蒸发材料蒸发，并且能够通过提高蒸发材料的使用效率和高均匀性的沉积而降低制造成本。一种能够控制激光的蒸发施主基板，使得根据在蒸发时发射的激光的波长，用激光照射蒸发供体基板的期望位置。具体而言，在该激光的反射时，激光的反射区域和在波长为400nm以上且小于等于600nm的激光照射时的区域的蒸发供体基板形成蒸发时间。

7. 发明申请

US20090166563A1 Method for Manufacturing Evaporation Donor Substrate and Light-Emitting Device 有权
标题翻译：制造蒸发供体基板和发光装置的方法
公开(公告)号：US20090166563A1
公开(公告)日：2009-07-02
申请号：US12341424
申请日：2008-12-22
申请人： Kohei Yokoyama , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka
发明人： Kohei Yokoyama , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka
IPC分类号： A61N5/067 , H01J1/62
CPC分类号： H01L51/0013 , C23C14/048 , H01L27/3244
摘要： An evaporation donor substrate which enables only a desired evaporation material to be evaporated at the time of deposition by an evaporation method, and capable of reduction in manufacturing cost by increase in use efficiency of the evaporation material and deposition with high uniformity. An evaporation donor substrate capable of controlling laser light so that a desired position of an evaporation donor substrate is irradiated with the laser light in accordance with the wavelength of the emitted laser light at the time of evaporation. Specifically, an evaporation donor substrate in which a region which reflects laser light and a region which absorbs laser light at the time of irradiation with laser light having a wavelength of greater than or equal to 400 nm and less than or equal to 600 nm at the time of evaporation are formed.
摘要翻译：一种蒸发供体基板，其通过蒸发法沉积时只能使期望的蒸发材料蒸发，并且能够通过提高蒸发材料的使用效率和高均匀性的沉积而降低制造成本。一种能够控制激光的蒸发施主基板，使得根据在蒸发时发射的激光的波长，用激光照射蒸发供体基板的期望位置。具体而言，在该激光的反射时，激光的反射区域和在波长为400nm以上且小于等于600nm的激光照射时的区域的蒸发供体基板形成蒸发时间。

8. 发明授权

US08232038B2 Manufacturing apparatus and manufacturing method of light-emitting device 有权
标题翻译：发光装置的制造装置及其制造方法
公开(公告)号：US08232038B2
公开(公告)日：2012-07-31
申请号：US12123902
申请日：2008-05-20
申请人： Yoshiharu Hirakata , Hisao Ikeda , Takahiro Ibe , Shunpei Yamazaki
发明人： Yoshiharu Hirakata , Hisao Ikeda , Takahiro Ibe , Shunpei Yamazaki
IPC分类号： H01L21/00
CPC分类号： H01L51/0013 , B23K26/042 , B23K26/0661 , B23K26/0732 , C23C14/048 , H01L27/3218 , H01L51/56
摘要： Demands such as higher definition, higher opening aperture, and higher reliability on a full-color flat panel display have been increased. Such demands are big objects in advancing higher definition (increase in the number of pixels) of a light-emitting device and miniaturization of each display pixel pitch with reduction in size of the light-emitting device. An organic compound-containing layer is selectively deposited using a laser beam which passes through openings of a mask. An irradiated substrate provided with a light absorption layer and a material layer containing an organic compound and a deposition substrate provided with first electrodes are placed so as to face each other. The light absorption layer is heated by a laser beam which has passed through the openings of the mask, and the organic compound at a position overlapping with the heated region is vaporized, and accordingly the organic compound is selectively deposited over the deposition substrate.
摘要翻译：已经提高了在全色平板显示器上的诸如更高清晰度，更高开口孔径和更高可靠性的要求。这种要求是通过减少发光装置的尺寸来提高发光装置的高清晰度（增加像素数）和每个显示像素间距的小型化的大目标。使用穿过掩模的开口的激光束选择性地沉积含有机化合物的层。设置有光吸收层的照射基板和含有有机化合物的材料层和设置有第一电极的沉积基板被放置成彼此面对。光吸收层被通过掩模开口的激光束加热，与加热区域重叠的位置上的有机化合物被蒸发，因此有机化合物选择性地沉积在沉积基板上。

9. 发明申请

US20080260938A1 Film Formation Apparatus, Film Formation Method, Manufacturing Apparatus, and Method for Manufacturing Light-Emitting Device 有权
标题翻译：成膜装置，成膜方法，制造装置以及制造发光装置的方法
公开(公告)号：US20080260938A1
公开(公告)日：2008-10-23
申请号：US11949217
申请日：2007-12-03
申请人： Hisao Ikeda , Tomoya Aoyama , Takahiro Ibe , Yoshiharu Hirakata , Shunpei Yamazaki
发明人： Hisao Ikeda , Tomoya Aoyama , Takahiro Ibe , Yoshiharu Hirakata , Shunpei Yamazaki
IPC分类号： B05D5/06 , B05C11/00 , B05C13/02
CPC分类号： B05C11/00 , C23C14/042 , C23C14/12 , C23C14/26 , C23C14/28 , C23C14/568 , H01L51/0081 , H01L51/56
摘要： An object is to improve use efficiency of an evaporation material, to reduce manufacturing cost of a light-emitting device, and to reduce manufacturing time needed for a light-emitting device including a layer containing an organic compound. The pressure of a film formation chamber is reduced, a plate is rapidly heated by heat conduction or heat radiation by using a heat source, a material layer on a plate is vaporized in a short time to be evaporated to a substrate on which the material layer is to be formed (formation substrate), and then the material layer is formed on the formation substrate. The area of the plate that is heated rapidly is set to have the same size as the formation substrate and film formation on the formation substrate is completed by one application of heat.
摘要翻译：本发明的目的在于提高蒸发材料的使用效率，降低发光元件的制造成本，减少含有有机化合物的层的发光元件所需的制造时间。成膜室的压力减小，通过使用热源的热传导或热辐射快速加热板，在短时间内蒸发板上的材料层以蒸发到其上的材料层（形成衬底），然后在形成衬底上形成材料层。将快速加热的板的面积设定为与形成基板相同的尺寸，并且通过一次加热完成在形成基板上的成膜。

10. 发明授权

US08313603B2 Film formation apparatus, film formation method, manufacturing apparatus, and method for manufacturing light-emitting device 有权
标题翻译：成膜装置，成膜方法，制造装置以及发光装置的制造方法
公开(公告)号：US08313603B2
公开(公告)日：2012-11-20
申请号：US11949217
申请日：2007-12-03
申请人： Hisao Ikeda , Tomoya Aoyama , Takahiro Ibe , Yoshiharu Hirakata , Shunpei Yamazaki
发明人： Hisao Ikeda , Tomoya Aoyama , Takahiro Ibe , Yoshiharu Hirakata , Shunpei Yamazaki
IPC分类号： C23C14/04 , C23C14/08
CPC分类号： B05C11/00 , C23C14/042 , C23C14/12 , C23C14/26 , C23C14/28 , C23C14/568 , H01L51/0081 , H01L51/56
摘要： An object is to improve use efficiency of an evaporation material, to reduce manufacturing cost of a light-emitting device, and to reduce manufacturing time needed for a light-emitting device including a layer containing an organic compound. The pressure of a film formation chamber is reduced, a plate is rapidly heated by heat conduction or heat radiation by using a heat source, a material layer on a plate is vaporized in a short time to be evaporated to a substrate on which the material layer is to be formed (formation substrate), and then the material layer is formed on the formation substrate. The area of the plate that is heated rapidly is set to have the same size as the formation substrate and film formation on the formation substrate is completed by one application of heat.
摘要翻译：本发明的目的在于提高蒸发材料的使用效率，降低发光元件的制造成本，减少含有有机化合物的层的发光元件所需的制造时间。成膜室的压力减小，通过使用热源的热传导或热辐射快速加热板，在短时间内蒸发板上的材料层以蒸发到其上的材料层（形成衬底），然后在形成衬底上形成材料层。将快速加热的板的面积设定为与形成基板相同的尺寸，并且通过一次加热完成在形成基板上的成膜。

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