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    • 2. 发明申请
    • DISPLAY DEVICE
    • 显示设备
    • US20080259549A1
    • 2008-10-23
    • US12141608
    • 2008-06-18
    • Shiro SUMITAHiroshi Sano
    • Shiro SUMITAHiroshi Sano
    • G06F1/16
    • H05B33/04H01L27/3276H01L51/5259
    • A display device includes an array substrate including a top-emission-type display element which is provided in a rectangular display area, and a driving circuit which is disposed outside of the display area and drives the display element, and a sealing substrate which is disposed to be opposed to the display element of the array substrate and includes a recess portion which is opposed to the display element and is larger than the display area, wherein the sealing substrate further includes, in the recess portion on the outside of the display area, a moisture-absorbing material which is disposed along three or less sides of four sides of the display area, and the moisture-absorbing material and the driving circuit are disposed in a manner to overlap at least partly.
    • 显示装置包括阵列基板,其包括设置在矩形显示区域中的顶部发射型显示元件和设置在显示区域外部并驱动显示元件的驱动电路,以及设置在该发光型显示元件上的密封基板 与阵列基板的显示元件相对,并且包括与显示元件相对的并且大于显示区域的凹部,其中,密封基板还包括在显示区域的外侧的凹部中, 沿着显示区域的四边的三个或更少侧设置的吸湿材料,并且吸湿材料和驱动电路以至少部分重叠的方式设置。
    • 4. 发明授权
    • Particle supply apparatus, imaging apparatus, and particle accommodating unit transporting method
    • 粒子供给装置,成像装置和粒子容纳部输送方法
    • US08000636B2
    • 2011-08-16
    • US12018611
    • 2008-01-23
    • Hiroshi Sano
    • Hiroshi Sano
    • G03G15/08G03G15/00
    • G03G15/0879G03G15/0855G03G15/0865G03G2215/0875
    • A particle supply apparatus for supplying particles to a supply destination is disclosed that includes a particle supply apparatus main frame, a particle accommodating unit that accommodates the particles, a gas spouting unit that is arranged at a bottom portion of the particle accommodating unit and is configured to spout gas toward the particles, and a conveying mechanism that applies suction to the particles accommodated in the particle accommodating unit and conveys the particles toward the supply destination. The particle accommodating unit is installed in the particle supply apparatus main frame and is arranged to rest on a face at the bottom portion side during operation, and the particle accommodating unit is detached from the particle supply apparatus main frame and is arranged to rest on a face other than the face at the bottom portion side during transportation.
    • 公开了一种用于向供应目的地供应颗粒的颗粒供应装置,其包括颗粒供应装置主框架,容纳颗粒的颗粒容纳单元,布置在颗粒容纳单元的底部的气体喷射单元, 将气体喷射到颗粒,以及输送机构,其向容纳在颗粒容纳单元中的颗粒施加吸力,并将颗粒输送到供给目的地。 颗粒容纳单元安装在颗粒供应装置主框架中,并且被布置成在操作期间搁置在底部侧的表面上,并且颗粒容纳单元从颗粒供应装置主框架脱离并且被布置成搁置在 在运输过程中在底部侧的面以外的面。
    • 7. 发明申请
    • Multiplate clutch outer part
    • 多板离合器外部零件
    • US20070284212A1
    • 2007-12-13
    • US11448988
    • 2006-06-08
    • Hiroshi SanoTakahiro Ito
    • Hiroshi SanoTakahiro Ito
    • F16D13/60
    • F16D13/683F16D2250/00Y10T74/1987
    • A multiplate clutch outer part is formed by pressing a steel plate. The multiplate clutch outer part includes: an end wall portion; and a cylindrical portion having its one end formed continuously with the outer peripheral end of the end wall portion, and opened at the other end. A bottom face of each of outer grooves is formed to be an inclined face which is getting far away from an axis of the cylindrical portion toward the open end of the cylindrical portion. Arc faces formed at inner corners of each of the outer grooves has an increasing radius of curvature toward the open end of the cylindrical portion. Thus, there is provided a multiplate clutch outer part for which press working capable of minimizing ironing resistance can be performed to reduce defective forming rate.
    • 通过压制钢板形成多个离合器外部部件。 多片离合器外部部分包括:端壁部分; 以及圆筒部,其一端与端壁部的外周端连续形成,另一端开口。 每个外槽的底面形成为远离圆柱形部分的轴线朝向圆柱形部分的开口端的倾斜面。 形成在每个外槽的内角处的弧面朝向圆柱形部分的开口端具有增加的曲率半径。 因此,提供了一种多片离合器外部部件,可以进行能够最小化熨烫性的冲压加工,以减少不良成形速度。