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1. 发明申请

US20070227663A1 SUBSTRATE PROCESSING APPARATUS AND SIDE WALL COMPONENT 审中-公开
标题翻译：基板加工装置和侧壁组件
公开(公告)号：US20070227663A1
公开(公告)日：2007-10-04
申请号：US11691863
申请日：2007-03-27
申请人： Shosuke Endoh , Tsuyoshi Moriya , Akitaka Shimizu
发明人： Shosuke Endoh , Tsuyoshi Moriya , Akitaka Shimizu
IPC分类号： C23F1/00
CPC分类号： H01J37/32477
摘要： a substrate processing apparatus that enables abnormal electrical discharges and metal contamination to be prevented from occurring. A processing chamber is configured to house and carry out predetermined plasma processing on a substrate. A lower electrode is disposed on a bottom portion of the processing chamber and has the substrate mounted thereon. An upper electrode is disposed in a ceiling portion of the processing chamber. A side wall component covering a side wall of the processing chamber faces onto a processing space between the upper electrode and the lower electrode. The side wall component has at least one electrode layer to which a DC voltage is applied. An insulating portion made of an insulating material is present at least between the electrode layer and the processing space and covers the electrode layer. The insulating portion is formed by thermally spraying the insulating material.
摘要翻译：能够防止发生异常放电和金属污染的基板处理装置。处理室配置成容纳并执行衬底上的预定等离子体处理。下电极设置在处理室的底部，并且其上安装有基板。上电极设置在处理室的顶部。覆盖处理室的侧壁的侧壁部件面向上电极和下电极之间的处理空间。侧壁部件具有至少一个施加了直流电压的电极层。至少在电极层和处理空间之间存在由绝缘材料制成的绝缘部分并且覆盖电极层。绝缘部分通过热喷涂绝缘材料形成。

2. 发明授权

US08727708B2 Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component 有权
标题翻译：反射装置，连通管，排气泵，排气系统，清洁系统的方法，用于实施该方法的存储介质存储程序，基板处理装置和颗粒捕获部件
公开(公告)号：US08727708B2
公开(公告)日：2014-05-20
申请号：US13047370
申请日：2011-03-14
申请人： Tsuyoshi Moriya , Takahiro Murakami , Yoshiyuki Kobayashi , Tetsuji Sato , Eiichi Sugawara , Shosuke Endoh , Masaki Fujimori
发明人： Tsuyoshi Moriya , Takahiro Murakami , Yoshiyuki Kobayashi , Tetsuji Sato , Eiichi Sugawara , Shosuke Endoh , Masaki Fujimori
IPC分类号： F04D29/70 , F04D19/04
CPC分类号： F04D19/042 , F04D29/701 , F05D2260/607 , Y10T137/794
摘要： A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
摘要翻译：能够防止颗粒渗入处理室的反射装置。反射装置设置在连通管中。连通管允许基板处理装置和排气泵的处理室彼此连通。排气泵具有至少一个旋转叶片。反射装置包括至少一个反射表面。至少一个反射表面被定向到排气泵。

3. 发明授权

US07927066B2 Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component 有权
标题翻译：反射装置，连通管，排气泵，排气系统，清洁系统的方法，用于实施该方法的存储介质存储程序，基板处理装置和颗粒捕获部件
公开(公告)号：US07927066B2
公开(公告)日：2011-04-19
申请号：US11365682
申请日：2006-03-02
申请人： Tsuyoshi Moriya , Takahiro Murakami , Yoshiyuki Kobayashi , Tetsuji Sato , Eiichi Sugawara , Shosuke Endoh , Masaki Fujimori
发明人： Tsuyoshi Moriya , Takahiro Murakami , Yoshiyuki Kobayashi , Tetsuji Sato , Eiichi Sugawara , Shosuke Endoh , Masaki Fujimori
IPC分类号： F01D1/36 , F01D5/12 , F01D25/00 , F03B5/00 , F03B3/12 , F03B11/00 , F03D11/00
CPC分类号： F04D19/042 , F04D29/701 , F05D2260/607 , Y10T137/794
摘要： A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
摘要翻译：能够防止颗粒渗入处理室的反射装置。反射装置设置在连通管中。连通管允许基板处理装置和排气泵的处理室彼此连通。排气泵具有至少一个旋转叶片。反射装置包括至少一个反射表面。至少一个反射表面被定向到排气泵。

4. 发明申请

US20060257243A1 Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component 有权
标题翻译：反射装置，连通管，排气泵，排气系统，清洁系统的方法，用于实施该方法的存储介质存储程序，基板处理装置和颗粒捕获部件
公开(公告)号：US20060257243A1
公开(公告)日：2006-11-16
申请号：US11365682
申请日：2006-03-02
申请人： Tsuyoshi Moriya , Takahiro Murakami , Yoshiyuki Kobayashi , Tetsuji Sato , Eiichi Sugawara , Shosuke Endoh , Masaki Fujimori
发明人： Tsuyoshi Moriya , Takahiro Murakami , Yoshiyuki Kobayashi , Tetsuji Sato , Eiichi Sugawara , Shosuke Endoh , Masaki Fujimori
IPC分类号： F01D1/36
CPC分类号： F04D19/042 , F04D29/701 , F05D2260/607 , Y10T137/794
摘要： A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
摘要翻译：能够防止颗粒渗入处理室的反射装置。反射装置设置在连通管中。连通管允许基板处理装置和排气泵的处理室彼此连通。排气泵具有至少一个旋转叶片。反射装置包括至少一个反射表面。至少一个反射表面被定向到排气泵。

5. 发明授权

US08236109B2 Component cleaning method and storage medium 失效
标题翻译：组件清洗方法和存储介质
公开(公告)号：US08236109B2
公开(公告)日：2012-08-07
申请号：US12639586
申请日：2009-12-16
申请人： Tsuyoshi Moriya , Akitaka Shimizu
发明人： Tsuyoshi Moriya , Akitaka Shimizu
IPC分类号： B08B6/00
CPC分类号： H01L21/02057 , H01J37/32862 , Y10S438/905 , Y10S438/906
摘要： A method for cleaning a component in a substrate processing apparatus including a processing chamber, foreign materials being attached to the component, at least a part of the component being exposed inside the processing chamber, and the substrate processing apparatus being adapted to load and unload a foreign material adsorbing member into and from the processing chamber. The method includes loading the foreign material adsorbing member into the processing chamber; generating a plasma nearer the component than the foreign material adsorbing member; extinguishing the plasma; and unloading the foreign material adsorbing member from the processing chamber, wherein the generation and the extinguishment of the plasma are repeated alternately and the foreign material adsorbing member has a positive potential at least during the extinguishment of the plasma.
摘要翻译：一种清洗基板处理装置中的部件的方法，所述基板处理装置包括处理室，异物附着在所述部件上，所述部件的至少一部分暴露在所述处理室内部，所述基板处理装置适于加载和卸载异物吸附构件进出处理室。该方法包括将异物吸附构件装载到处理室中; 产生比异物吸附部件更靠近部件的等离子体; 熄灭等离子体; 并且从所述处理室卸载所述异物吸附构件，其中所述等离子体的产生和熄灭交替地重复，并且所述异物吸附构件至少在所述等离子体熄灭期间具有正电位。

6. 发明申请

US20060207971A1 Atmospheric transfer chamber, processed object transfer method, program for performing the transfer method, and storage medium storing the program 审中-公开
标题翻译：大气传送室，处理对象传送方法，执行传送方法的程序以及存储程序的存储介质
公开(公告)号：US20060207971A1
公开(公告)日：2006-09-21
申请号：US11376163
申请日：2006-03-16
申请人： Tsuyoshi Moriya , Takaaki Hirooka , Akitaka Shimizu , Satoshi Tanaka
发明人： Tsuyoshi Moriya , Takaaki Hirooka , Akitaka Shimizu , Satoshi Tanaka
IPC分类号： C23F1/00 , H01L21/306 , B44C1/22
CPC分类号： C23F1/12 , H01L21/02071 , H01L21/67017 , H01L21/67109 , H01L21/67775
摘要： An atmospheric transfer chamber, connected to an object processing chamber for processing a target object by using a plasma of a halogen-based gas, for transferring the target object therein, the atmospheric transfer chamber includes a dehumidifying unit for dehumidifying air in the atmospheric transfer chamber. The dehumidifying unit includes a desiccant filter, a cooling unit for cooling the air introduced into the atmospheric transfer chamber, and an air conditioner. The atmospheric transfer chamber is connected to a reaction product removal chamber for removing reaction products of a halogen-based gas attached to the target object, wherein halogen in reaction products attached to the target object is reduced.
摘要翻译：大气传送室，通过使用卤素系气体的等离子体连接到对象处理室，用于将目标物体转印到其中，大气传送室包括用于对大气传送室中的空气进行除湿的除湿单元。除湿单元包括干燥剂过滤器，用于冷却引入大气传送室的空气的冷却单元和空调。大气转移室连接到反应产物去除室，用于除去附着到目标物体上的卤素系气体的反应产物，其中附着在目标物体上的反应产物中的卤素被还原。

7. 发明授权

US09022225B2 Filtration filter and production method therefor 有权
标题翻译：过滤过滤器及其生产方法
公开(公告)号：US09022225B2
公开(公告)日：2015-05-05
申请号：US14006177
申请日：2012-03-13
申请人： Tsuyoshi Moriya , Asao Yamashita
发明人： Tsuyoshi Moriya , Asao Yamashita
IPC分类号： B01D25/00 , B01D29/62 , B01D29/46 , B01D63/08 , B01D39/16 , B01D39/20 , B01D61/02 , B01D61/04 , B01D69/10 , B01D29/00 , B01D61/24 , B01D65/02
CPC分类号： B01D29/62 , A61M2205/7563 , B01D29/46 , B01D39/16 , B01D39/1692 , B01D39/2003 , B01D39/2027 , B01D39/2055 , B01D39/2068 , B01D61/025 , B01D61/04 , B01D61/243 , B01D63/084 , B01D65/02 , B01D69/10 , B01D2311/04 , B01D2311/06 , B01D2313/02 , B01D2313/14 , B01D2321/04 , Y10T29/49826 , B01D2311/2642 , B01D2311/2626 , B01D2311/12 , B01D2311/2692
摘要： Provided is a filtration filer with which a stable opening size during filtration is obtained, and which can be easily regenerated when clogged and used repeatedly. The filtration filter (10) comprises: a substrate stack wherein substrates (11) that have a through hole that penetrates from front to back are stacked; stoppers (15) that define the spacing between the substrates (11); and pillars (16) with a larger thermal expansion coefficient than the stoppers (15). The spacing between the substrates (11) at normal temperature is defined at least by the stoppers (15), and the spacing when heated is defined by the thermally expanded pillars (16). The gaps between the substrates (11) form the filtration surface that traps contaminants contained in the liquid that is being treated A.
摘要翻译：提供了一种过滤器，其在过滤期间具有稳定的开口尺寸，并且可以在被堵塞并重复使用时容易地再生。过滤器（10）包括：基板叠层，其中具有从前到后穿透的通孔的基板（11）被堆叠; 限定基板（11）之间的间隔的止动件（15）; 和具有比止动件（15）更大的热膨胀系数的柱（16）。在正常温度下，基板（11）之间的间隔至少由止挡件（15）限定，加热时的间隔由热膨胀的支柱（16）限定。基板（11）之间的间隙形成了捕获正在处理的液体中的污染物的过滤表面。

8. 发明授权

US08854625B2 Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring 有权
标题翻译：包括颗粒监测单元，颗粒监测方法和程序的真空装置以及用于颗粒监测的窗口部件
公开(公告)号：US08854625B2
公开(公告)日：2014-10-07
申请号：US12985099
申请日：2011-01-05
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama
IPC分类号： G01N21/00 , C23C14/00 , H01J37/32 , B08B9/08 , G01N15/02 , G01N15/06
CPC分类号： H01J37/32935 , B08B9/08 , G01N15/0272 , G01N15/06 , G01N2015/0693 , Y10T428/30 , Y10T428/315 , Y10T428/8305
摘要： A particle monitoring apparatus includes a housing disposed on a gas exhaust line, a laser beam source for emitting a laser beam to particles in the gas exhaust line, a window member disposed at the housing for monitoring the particles in the gas exhaust line. The window member has a transparent base which is formed of a transparent resin or glass containing silicon and has a gas contact surface which faces a gas within the gas exhaust line, and a surface treatment layer formed on the gas contact surface of the transparent base, wherein the surface treatment layer contains one material selected from the group consisting of yttrium and calcium fluoride.
摘要翻译：粒子监测装置包括：设置在排气管上的壳体，用于向气体排出管线中的颗粒发射激光束的激光束源;设置在壳体处的用于监测排气管线中的颗粒的窗口部件。窗构件具有由透明树脂或含硅的玻璃形成的透明基底，并且具有与气体排出管线内的气体相对的气体接触面，以及形成在透明基底的气体接触面上的表面处理层，其中所述表面处理层含有选自钇和氟化钙的一种材料。

9. 发明授权

US08498911B2 Particle generation factor determining system, charging method and storage medium 有权
标题翻译：粒子生成因子决定系统，计费方法和存储介质
公开(公告)号：US08498911B2
公开(公告)日：2013-07-30
申请号：US12820692
申请日：2010-06-22
申请人： Tsuyoshi Moriya
发明人： Tsuyoshi Moriya
IPC分类号： G06Q40/00
CPC分类号： G06Q30/06 , G06Q30/0283 , G06Q30/04 , H01L22/12
摘要： Provided is a charging method capable of offering a user an incentive to use a particle generation factor determining system. In the particle generation factor determining system including a user interface device 11 through which a user inputs a particle map and a server 13, the server 13 calculates accuracy of each of multiple particle generation factors based on the particle map; the user interface device 11 displays the calculated accuracy or a title of generation-factor-relevant information 27 on each particle generation factor corresponding to this accuracy; the server 13 provides the generation-factor-relevant information 27 to the user interface device 11; a charged fee for providing particle generation-factor-relevant information 27 is determined based on accuracy of a particle generation factor corresponding to the provided generation-factor-relevant information 27.
摘要翻译：提供了一种能够向用户提供使用粒子生成因子确定系统的激励的计费方法。在包括用户通过其输入粒子映射的用户界面装置11和服务器13的粒子生成因子确定系统中，服务器13基于粒子图计算多个粒子生成因子中的每一个的精度; 用户界面装置11对与该精度对应的每个粒子生成因子显示计算出的生成因子相关信息27的精度或标题; 服务器13向用户接口设备11提供生成因子相关信息27; 基于与所提供的生成因子相关信息27相对应的粒子生成因子的精度，确定用于提供粒子生成因子相关信息27的收费。

10. 发明授权

US08243265B2 Method and apparatus for detecting foreign materials and storage medium 有权
标题翻译：检测异物和储存介质的方法和装置
公开(公告)号：US08243265B2
公开(公告)日：2012-08-14
申请号：US12617235
申请日：2009-11-12
申请人： Tsuyoshi Moriya , Hiroshi Nagaike , Hideaki Yakushiji
发明人： Tsuyoshi Moriya , Hiroshi Nagaike , Hideaki Yakushiji
IPC分类号： G01N21/00
CPC分类号： H01L21/67288 , G01N21/91 , G01N21/94 , G01N21/9501
摘要： A foreign material detecting method for detecting a foreign material attached to a substrate surface includes a spraying step of spraying an organic solvent or an oil-phase material containing a halogen element to the substrate surface, a condensing step of emphasizing the foreign material by condensing the sprayed organic solvent or oil-phase material around the foreign material attached to the substrate surface by controlling a temperature of the substrate surface, and a surface inspecting step of detecting the foreign material emphasized by the condensation of the organic solvent or the oil-phase material by a surface inspecting device.
摘要翻译：用于检测附着在基板表面上的异物的异物检测方法包括：向基板表面喷射含有卤素元素的有机溶剂或油相材料的喷射步骤，通过冷凝来强调异物的冷凝步骤通过控制基板表面的温度，附着于基板表面的异物附近的喷涂有机溶剂或油相材料，以及检测由有机溶剂或油相材料的冷凝强调的异物的表面检查步骤通过表面检查装置。

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