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1. 发明授权

US06887647B2 Negative-working resist composition for electron beams or x-rays 失效
标题翻译：用于电子束或X射线的负性抗蚀剂组合物
公开(公告)号：US06887647B2
公开(公告)日：2005-05-03
申请号：US10101178
申请日：2002-03-20
申请人： Shoichiro Yasunami , Koji Shirakawa , Yutaka Adegawa
发明人： Shoichiro Yasunami , Koji Shirakawa , Yutaka Adegawa
IPC分类号： C08F12/24 , C08F20/26 , C08F20/56 , C08F28/02 , C08K5/00 , C08K5/16 , C08L101/00 , G03F7/004 , G03F7/038 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0382 , Y10S430/115
摘要： A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating a sulfonic acid by the irradiation of electron beams or x-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent crosslinking with the resin (B) by the action of an acid, and (D) a compound generating a carboxylic acid having a specific structure by the irradiation of electron beams or x-rays.
摘要翻译：一种用于电子束或X射线的负性抗蚀剂组合物，其包含（A）通过照射电子束或X射线产生磺酸的化合物，（B）不溶于水并溶于碱性水溶液的树脂溶液，（C）通过酸作用与树脂（B）交联的交联剂，和（D）通过电子束或X射线的照射产生具有特定结构的羧酸的化合物。

2. 发明授权

US06773862B2 Negative resist composition 有权
标题翻译：负阻抗组成
公开(公告)号：US06773862B2
公开(公告)日：2004-08-10
申请号：US10274386
申请日：2002-10-21
申请人： Koji Shirakawa , Yutaka Adegawa , Shoichiro Yasunami
发明人： Koji Shirakawa , Yutaka Adegawa , Shoichiro Yasunami
IPC分类号： G03C173
CPC分类号： G03F7/0045 , G03F7/0382 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/115 , Y10S430/143 , Y10S430/167 , Y10S430/168
摘要： A negative resist composition comprising: (A) a compound being capable of generating an acid upon irradiation with an actinic ray or a radiation; (B) an alkali-soluble polymer; and (C) at least two crosslinking agents being capable of generating crosslinking with the polymer (B) by an action of an acid, wherein the crosslinking agent (C) comprises at least two compounds having a different skeleton from each other, which are selected from phenol derivatives having at least one of a hydroxymethyl group and an alkoxymethyl group on a benzene ring thereof, in which a sum of the hydroxymethyl group and the alkoxymethyl group is two or more, one of the at least two crosslinking agents comprises one or two benzene rings in the molecule thereof, and other one of the at least two crosslinking agents comprises from 3 to 5 benzene rings in the molecule thereof.
摘要翻译：一种负性抗蚀剂组合物，其包含：（A）能够在用光化射线或辐射照射时能够产生酸的化合物; （B）碱溶性聚合物; 和（C）至少两种能够通过酸的作用与聚合物（B）发生交联的交联剂，其中所述交联剂（C）包含至少两种具有彼此不同骨架的化合物，其被选择在苯环上具有羟甲基和烷氧基甲基中的至少一个的苯酚衍生物，其中羟甲基和烷氧基甲基的和为两个或多个，所述至少两种交联剂中的一种包含一个或两个其分子中的苯环，并且所述至少两种交联剂中的另一种在其分子中包含3至5个苯环。

3. 发明授权

US06746813B2 Negative resist composition 有权
标题翻译：负阻抗组成
公开(公告)号：US06746813B2
公开(公告)日：2004-06-08
申请号：US10396583
申请日：2003-03-26
申请人： Shoichiro Yasunami , Yutaka Adegawa , Koji Shirakawa
发明人： Shoichiro Yasunami , Yutaka Adegawa , Koji Shirakawa
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , Y10S430/106
摘要： A negative resist composition comprising (A-1) an alkali-soluble resin containing a repeating unit represented by formula (1) defined in the specification, (A-2) an alkali-soluble resin containing a repeating unit represented by formula (2) defined in the specification, (B) a crosslinking agent crosslinking with the alkali-soluble resin (A-1) or (A-2) by the action of an acid, (C) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (D) a nitrogen-containing basic compound.
摘要翻译：一种负型抗蚀剂组合物，其包含（A-1）含有本说明书中定义的式（1）表示的重复单元的碱溶性树脂（A-2）含有式（2）表示的重复单元的碱溶性树脂，（B）通过酸的作用与碱溶性树脂（A-1）或（A-2）交联的交联剂，（C）在光化反应下产生酸的化合物射线或辐射，和（D）含氮碱性化合物。

4. 发明授权

US06673512B1 Negative-working resist composition 有权
标题翻译：负性抗蚀剂组成
公开(公告)号：US06673512B1
公开(公告)日：2004-01-06
申请号：US09760806
申请日：2001-01-17
申请人： Kazuya Uenishi , Yutaka Adegawa , Koji Shirakawa
发明人： Kazuya Uenishi , Yutaka Adegawa , Koji Shirakawa
IPC分类号： G03F7003
CPC分类号： G03F7/0045 , G03F7/038 , Y10S430/168
摘要： A chemical amplification system negative-working resist composition for an electron beam and/or an X-ray, which is excellent in sensitivity and resolution and has a rectangular profile, comprising an alkali-soluble resin having structural units represented by the following general formula (a), a compound generating an acid by irradiation of the electron beam or the X-ray, and a crosslinking agent which initiates crosslinking by the acid:
摘要翻译：一种用于电子束和/或X射线的化学放大系统负性抗蚀剂组合物，其灵敏度和分辨率优异并且具有矩形轮廓，包括具有由以下通式表示的结构单元的碱溶性树脂（ a），通过照射电子束或X射线产生酸的化合物和引发酸的交联的交联剂：

5. 发明申请

US20060205879A1 Film-forming composition and insulating film and electronic device using the same 审中-公开
标题翻译：成膜组合物和绝缘膜及使用其的电子器件
公开(公告)号：US20060205879A1
公开(公告)日：2006-09-14
申请号：US11374162
申请日：2006-03-14
申请人： Yutaka Adegawa , Akira Asano
发明人： Yutaka Adegawa , Akira Asano
IPC分类号： C08L71/12
CPC分类号： C08J5/18 , C08J2365/00
摘要： A film-forming composition contains a compound having a cage structure, wherein the film-forming composition has a content of each metal of 300 ppb or less, and an insulating film and an electronic device using the same.
摘要翻译：成膜组合物含有具有笼结构的化合物，其中所述成膜组合物的每种金属的含量为300ppb以下，绝缘膜和使用其的电子器件。

6. 发明申请

US20050276964A1 Film-forming composition, insulating material-forming composition, insulating film and electronic device 失效
标题翻译：成膜组合物，绝缘材料形成组合物，绝缘膜和电子器件
公开(公告)号：US20050276964A1
公开(公告)日：2005-12-15
申请号：US11149385
申请日：2005-06-10
申请人： Katsuyuki Watanabe , Morio Yagihara , Kensuke Morita , Yutaka Adegawa , Akira Asano
发明人： Katsuyuki Watanabe , Morio Yagihara , Kensuke Morita , Yutaka Adegawa , Akira Asano
IPC分类号： C08G61/02 , C08J9/00 , C08L65/00 , B32B3/26
CPC分类号： C08J9/28 , C08G61/02 , C08J9/26 , C08J2201/046 , C08J2365/00 , C08L65/00 , H01B3/307 , H01B3/441 , Y10T428/249953 , Y10T428/31855
摘要： A film-forming composition comprising: a compound having a specific cage structure; a pore-forming agent; an adhesion promoter; and so on, an insulating film formed from the film-forming composition and an electronic device comprising the insulating film.
摘要翻译：一种成膜组合物，其包含：具有特定笼结构的化合物; 成孔剂; 粘合促进剂; 等等，由成膜组合物形成的绝缘膜和包括绝缘膜的电子器件。

7. 发明授权

US5795709A Particulate photographic polymer 失效
标题翻译：颗粒摄影聚合物
公开(公告)号：US5795709A
公开(公告)日：1998-08-18
申请号：US821075
申请日：1997-03-20
申请人： Yutaka Adegawa , Kentaro Shiratsuchi
发明人： Yutaka Adegawa , Kentaro Shiratsuchi
IPC分类号： G03C1/32 , C08F290/00 , C08F299/00 , G03C1/95
CPC分类号： G03C1/95 , G03C1/32 , G03C2001/7635 , G03C7/00 , Y10S430/151
摘要： There is disclosed a particulate photographic polymer, which at least comprises a repeating unit of the formula (I): ##STR1## wherein R is an alkyl group, a phenyl group, or a hydrogen atom; L is a divalent organic binding group; A is a repeating unit derived from at least one ethylenically unsaturated monomer, or a repeating unit derived by ring opening polymerization of a nitrogen-containing heterocyclic compound, with --(A).sub.m -- being soluble in water or a hydrophilic organic liquid; m is from 2 to 200; and Y is a monovalent binding group. The polymer is excellent in dispersion stability in coating solutions, prevents settling and agglomeratingis and the formation of mat pinholes, and can improve granularity of images.
摘要翻译：公开了至少包含式（I）的重复单元的微粒照相聚合物：其中R是烷基，苯基或氢原子的式（I） L是二价有机结合基团; A是衍生自至少一种烯属不饱和单体的重复单元，或由含氮杂环化合物的开环聚合衍生的重复单元， - （A）m-可溶于水或亲水性有机液体; m为2〜200; Y是一价结合基团。聚合物在涂布溶液中的分散稳定性优异，防止沉降和聚集，并形成垫针孔，并且可以提高图像的粒度。

8. 发明授权

US07268201B2 Insulating-film forming material and insulating film using the same 失效
标题翻译：绝缘膜形成材料和使用其的绝缘膜
公开(公告)号：US07268201B2
公开(公告)日：2007-09-11
申请号：US10806450
申请日：2004-03-23
申请人： Yutaka Adegawa
发明人： Yutaka Adegawa
IPC分类号： C08G77/04 , C08G77/20 , C07F7/00 , C07F7/21
CPC分类号： C09D183/04 , C08G77/04 , C08G77/50 , C09D183/14
摘要： A polymer having a repeating unit represented by formula (I) is used for an insulating-film forming material and an insulating film. wherein R1 to R7 each are a monovalent hydrocarbon group, etc.; one of X, Y and Z is a specific siloxane group and the remaining two each are —O— or divalent silyl-containing group that bonds to (I) on the side of the oxygen atom of the group.
摘要翻译：将具有式（I）所示的重复单元的聚合物用于绝缘膜形成材料和绝缘膜。其中R 1至R 7各自为一价烃基等; X，Y和Z中的一个是特定的硅氧烷基团，其余的两个是与基团的氧原子侧的（I）键合的-O-或二价含甲硅烷基的基团。

9. 发明授权

US07144970B2 Insulating-film forming material and insulating film using the same 有权
标题翻译：绝缘膜形成材料和使用其的绝缘膜
公开(公告)号：US07144970B2
公开(公告)日：2006-12-05
申请号：US10805204
申请日：2004-03-22
申请人： Yutaka Adegawa
发明人： Yutaka Adegawa
IPC分类号： C08G79/02
CPC分类号： C08J5/18 , C08G65/40 , C08J2371/00 , Y10T428/31504
摘要： An insulating-film forming material comprising a resin (A) that has a structure represented by formula (I): wherein Y1, Y2, Ar1 and Ar2 are the same or different; each of Y1, Y2, Ar1 and Ar2represents an aromatic ring-containing divalent organic group; at least one of Y1 and Y2 is a divalent aromatic polycyclic group having a specific structure; m and n each indicates a molar percentage of the repeating units; and m falls between 0 and 100 with (m+n)=100.
摘要翻译：一种绝缘膜形成材料，其包含具有由式（I）表示的结构的树脂（A）：其中Y 1，Y 2，Ar 1， / SUB＆gt;和Ar 2 2相同或不同; Y 1，Y 2，Ar 1和Ar 2中的每一个表示含芳环的二价有机基团 ; Y 1和Y 2 2中的至少一个是具有特定结构的二价芳族多环基团; m和n各自表示重复单元的摩尔百分数; （m + n）= 100时，m在0和100之间。

10. 发明授权

US06824948B1 Electron beam or X-ray negative-working resist composition 有权
标题翻译：电子束或X射线负极抗蚀剂组合物
公开(公告)号：US06824948B1
公开(公告)日：2004-11-30
申请号：US09759362
申请日：2001-01-16
申请人： Toshiaki Aoai , Yutaka Adegawa , Morio Yagihara
发明人： Toshiaki Aoai , Yutaka Adegawa , Morio Yagihara
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/038
摘要： A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating an acid and/or radical species by the irradiation of electron beams or X-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent causing crosslinking with the resin of component (B) by the action of an acid, and (D) a compound having at least one unsaturated bond capable of being polymerized by an acid and/or a radical, and a negative-working resist composition for electron beams or X-rays comprising (A) a compound generating an acid and/or radical species by the irradiation of electron beams or X-rays, (B′) a resin having at least one unsaturated bond polymerizable by an acid and/or an alkali, which is insoluble in water but soluble in an alkali aqueous solution, and (C) a crosslinking agent causing crosslinking with the resin (B′) by the action of an acid are disclosed.
摘要翻译：一种用于电子束或X射线的负性抗蚀剂组合物，包括（A）通过电子束或X射线的照射产生酸和/或自由基的化合物，（B）不溶于水和可溶的树脂在碱性水溶液中，（C）通过酸的作用与成分（B）的树脂交联的交联剂，（D）具有至少一个能够被酸和/ 或用于电子束或X射线的负性抗蚀剂组合物，其包含（A）通过照射电子束或X射线产生酸和/或自由基的化合物，（B'）具有至少一个不溶于水但可溶于碱性水溶液的酸和/或碱可聚合的不饱和键，和（C）通过酸的作用与树脂（B'）交联的交联剂被披露。

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