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    • 3. 发明授权
    • System for controlling an overlay, method for controlling overlay, and method for manufacturing a semiconductor device
    • 用于控制覆盖层的系统,用于控制覆盖层的方法以及用于制造半导体器件的方法
    • US07556899B2
    • 2009-07-07
    • US11389114
    • 2006-03-27
    • Makoto IkedaShoichi HarakawaTakuya Kono
    • Makoto IkedaShoichi HarakawaTakuya Kono
    • G03F9/00G06F19/00
    • G03F7/70633G03F7/70525
    • A system for controlling an overlay includes a processing data receiving module receiving a processing data string describing a name of an exposure process for a target layer and an original control set value of overlays between the target layer and underlying layers below the target layer; an inspection data receiving module receiving inspection data strings describing names of inspection processes and inspection values determined by the inspection processes inspecting respective overlays between the target layer and the underlying layers; a data combining module combining the processing data string and each of the inspection data strings using a combining condition table so as to create a correction data table; and a control set value calculation module calculating a corrected control set value based on the inspection values of the correction data table.
    • 用于控制覆盖的系统包括处理数据接收模块,其接收描述目标层的曝光处理的名称的处理数据串和目标层之下的目标层和下层之间的覆盖层的原始控制集值; 检查数据接收模块,接收描述由检查过程确定的检查过程名称和检查值的检查数据串,检查目标层和下层之间的各个覆盖层; 数据组合模块,其使用组合条件表来组合处理数据串和每个检查数据串,以便创建校正数据表; 以及控制设定值计算模块,基于校正数据表的检查值来计算校正后的控制设定值。
    • 5. 发明申请
    • Exposure apparatus correction system, exposure apparatus correcting method, and manufacturing method of semiconductor device
    • US20070020537A1
    • 2007-01-25
    • US11486033
    • 2006-07-14
    • Shoichi HarakawaMakoto IkedaTakuya Kono
    • Shoichi HarakawaMakoto IkedaTakuya Kono
    • G03F7/00
    • G03F7/70458
    • An exposure apparatus correction system comprising: a displacement calculator which calculates matching displacements between a first inspection pattern and a second inspection pattern, the first inspection pattern being transferred by an external first exposure apparatus, the second inspection pattern being positioned with respect to the first inspection pattern and transferred by a second exposure apparatus; an approximator which applies design coordinate systems and values of the calculated matching displacements to approximate expressions in which the matching displacements and a relationship between coordinate systems including the second inspection pattern is approximated by using a plurality of parameters, thereby allocating estimators to the plurality of respective parameters, the plurality of parameters having a mutually complementary relationship; a rounder which rounds estimators of the allocated estimators which are out of an effective range restricted by the second exposure apparatus to fall within the effective range; a back-calculator which defines the rounded estimators as new estimators and applies the new estimators and the design coordinate systems to the approximate expressions to calculate back calculation deviances which are expected to occur between the first inspection pattern and the second inspection pattern when the rounded values are used; a residual calculator which subtracts the calculation deviances from the matching displacements to obtain residuals; a corrected value calculator which utilizes the mutually complementary relationship between the plurality of parameters to calculate corrected values as values which reduce the residuals based on other parameters than the parameters whose estimators have been rounded in the plurality of parameters with respect to the other parameters; an adder which sequentially adds the new estimators and the corrected values and outputs results as a sum total of the estimators; an estimator memory which stores the sum total of the estimators; and a controller which allows the rounder, the back-calculator, the residual calculator, the corrected value calculator and the adder to cyclically perform repeated operations, and corrects the second exposure apparatus based on the sum total of the estimators stored in the estimator memory.
    • 8. 发明申请
    • IMAGE PICKUP APPARATUS
    • 图像拾取装置
    • US20130038757A1
    • 2013-02-14
    • US13551368
    • 2012-07-17
    • Kazuhiro HanedaMakoto IkedaYoshinao Shimada
    • Kazuhiro HanedaMakoto IkedaYoshinao Shimada
    • H04N5/76
    • H04N5/23212H04N5/3454
    • The invention provides an image pickup apparatus including: an image pickup device including a memory portion for analog storage and a pixel portion; a first read-out control and processing portions that, in a first frame-period, read out a first-image-signal from a first-pixel-region of the pixel portion, and in a second frame-period longer than the first frame-period, read out a second-image-signal from a second-pixel-region of the pixel portion including the first-pixel-region, and store the read-out signals in the memory portion; a second read-out control and processing portions that read out from a memory portion an AF image signal related to the first-image-signal and a display image signal related to the second-image-signal; a focal point detecting portion that carries out contrast focal point detection based on the AF image signal; and an image display portion that displays an image based on the display image signal.
    • 本发明提供了一种图像拾取装置,包括:图像拾取装置,包括用于模拟存储的存储部分和像素部分; 第一读出控制和处理部分,其在第一帧周期中从像素部分的第一像素区域读出第一图像信号,并且在比第一帧长的第二帧周期中 从包含第一像素区域的像素部分的第二像素区域读出第二图像信号,并将读出的信号存储在存储器部分中; 第二读出控制和处理部分,从存储器部分读出与第一图像信号相关的AF图像信号和与第二图像信号有关的显示图像信号; 焦点检测部,其基于所述AF图像信号进行对比度焦点检测; 以及基于显示图像信号显示图像的图像显示部。