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1. 发明授权

US5076026A Microscopic grinding method and microscopic grinding device 失效
标题翻译：微观研磨方法和微观研磨装置
公开(公告)号：US5076026A
公开(公告)日：1991-12-31
申请号：US621430
申请日：1990-12-04
申请人： Shinichi Mizuguchi , Syuji Ueda , Kouji Kato , Noritsugu Umehara
发明人： Shinichi Mizuguchi , Syuji Ueda , Kouji Kato , Noritsugu Umehara
IPC分类号： B24B31/112 , B23Q1/34 , B24B1/00 , B24B13/00 , B24B35/00 , B24B37/00 , G01Q20/04 , G01Q60/32
CPC分类号： B23Q1/34 , B24B1/005 , B24B13/00 , B24B35/005
摘要： A microscopic grinding device grinds a workpiece at ultrahigh precision with the use of magnetic grinding fluid actuated microscopically in three dimensional directions by Z- and XY-axis actuators. The magnetic grinding fluid is magnetically supported between a grinding member and the workpiece by the magnetic field. Because magnetic field is generated to form a magnetic circuit within the device itself where no workpiece is necessary to form the magnetic circuit, the device can be used with equal results even with workpieces made from non-magnetic material. The pressure applied to the workpiece by the grinding member via the magnetic grinding fluid is detected by a load cell for feeding back a signal indicative of the detected pressure to the controller. The controller controls the actuators to actuate the grinding member such that the pressure applied from the grinding member, via the magnetic fluid, to the workpiece is maintained within a predetermined range.

2. 发明授权

US5404680A Method for polishing slight area of surface of workpiece and tool therefor 失效
标题翻译：抛光工件表面的微小区域的方法及其工具
公开(公告)号：US5404680A
公开(公告)日：1995-04-11
申请号：US213812
申请日：1994-03-16
申请人： Shinichi Mizuguchi , Koji Kato , Noritsugu Umehara
发明人： Shinichi Mizuguchi , Koji Kato , Noritsugu Umehara
IPC分类号： B24B13/00 , B23Q1/34 , B24B1/00 , B24B1/04 , B24B35/00 , B24B37/00 , B24C1/00
CPC分类号： B23Q1/34 , B24B1/005 , B24B1/04 , B24B13/00 , B24B35/00
摘要： A method for polishing a slight region of the surface of a workpiece utilizes an actuator or actuators having piezoelectric elements. The actuators cause slight movement of a polishing portion disposed at the leading end of a polishing tool in an XY-direction parallel with the surface of the workpiece and/or a Z-direction perpendicular to the surface of the workpiece. A polishing material, including a magnetic fluid and nonmagnetic abrasive grains dispersed in the magnetic fluid, is held magnetically in a space between the polishing portion and the workpiece.
摘要翻译：用于抛光工件表面的轻微区域的方法利用具有压电元件的致动器或致动器。这些致动器使抛光部分的抛光部分在与工件表面平行的XY方向和/或垂直于工件表面的Z方向上的微小移动。包括分散在磁性流体中的磁性流体和非磁性磨粒的抛光材料被磁性地保持在抛光部分和工件之间的空间中。

3. 发明授权

US5185957A Micro-abrading method and micro-abrading tool 失效
标题翻译：微研磨法和微研磨工具
公开(公告)号：US5185957A
公开(公告)日：1993-02-16
申请号：US708867
申请日：1991-05-31
申请人： Shinichi Mizuguchi , Shuji Ueda , Koji Kato , Noritsugu Umehara
发明人： Shinichi Mizuguchi , Shuji Ueda , Koji Kato , Noritsugu Umehara
IPC分类号： B24B1/00 , B24B13/00 , B24B35/00
CPC分类号： B24B35/005 , B24B1/005 , B24B13/00
摘要： A micro-abrading method wherein an abrading section undergoes a micromotion in the XY-direction parallel with the surface of a workpiece according to the operation of an actuator comprising piezoelectric elements, and an abrading material is held between the abrading section positioned at the lower end of an abrading tool and the workpiece. The phase difference between the X-direction motion and the Y-direction motion is cyclically changed while the abrading section is undergoing the micromotion, and the surface of the workpiece is entirely and uniformly abraded even though a large area is abraded.
摘要翻译：一种微研磨方法，其中研磨部分根据包括压电元件的致动器的操作在XY方向上平行于工件的表面进行微动作，并且研磨材料保持在位于下端的研磨部分之间的研磨工具和工件。 X方向运动和Y方向运动之间的相位差在磨损部分进行微动作时循环变化，即使大面积被磨损，工件的表面也被完全均匀地磨损。

4. 发明授权

US5611864A Microwave plasma processing apparatus and processing method using the same 失效
标题翻译：微波等离子体处理装置及其加工方法
公开(公告)号：US5611864A
公开(公告)日：1997-03-18
申请号：US404971
申请日：1995-03-16
申请人： Tadashi Kimura , Yoshikazu Yoshida , Shinichi Mizuguchi , Yasunao Okazaki
发明人： Tadashi Kimura , Yoshikazu Yoshida , Shinichi Mizuguchi , Yasunao Okazaki
IPC分类号： C23C14/35 , C23C16/511 , H01J37/32 , C23C16/00
CPC分类号： H01J37/32229 , C23C14/357 , C23C16/511 , H01J37/32192
摘要： The plasma processing apparatus of the invention generates plasma from a reactive gas with microwave power so as to process a substrate. The plasma processing apparatus includes: a vacuum chamber having an evacuation means and reactive gas inlet ports; a means for holding the substrate to be processed which is disposed inside the vacuum chamber; a dielectric plate disposed at a position facing the substrate to be processed so as to form an integral part of the vacuum chamber; a metal conductor plate disposed on an outer plane of the dielectric plate not facing the vacuum chamber so as to face the substrate to be processed; and a means for supplying microwave power substantially inverse-radially from a circumferential side of the dielectric plate towards a center thereof. Under the above construction, the microwave is supplied substantially inverse-radially from the circumferential side of the dielectric plate towards the center thereof, thereby generating a surface wave on the dielectric plate facing the substrate. As a result, the microwave power is uniformly radiated along radial directions into the vacuum chamber and plasma is uniformly generated from a reactive gas over a large area, so that even a large substrate may be processed uniformly.
摘要翻译：本发明的等离子体处理装置由具有微波功率的反应气体产生等离子体，以处理基板。等离子体处理装置包括：具有排气装置和反应气体进口的真空室; 用于保持设置在真空室内的待处理基板的装置; 电介质板，其设置在与被处理基板相对的位置，以形成所述真空室的整体部分; 金属导体板，其设置在不面向真空室的电介质板的外表面上，以面对待加工的基板; 以及用于从电介质板的周向侧向其中心提供基本上反向径向的微波功率的装置。在上述结构中，微波从电介质板的周向侧向其中心大致反向径向供给，从而在面向衬底的电介质板上产生表面波。结果，微波功率沿着径向均匀地辐射到真空室中，并且等离子体在大面积上由反应性气体均匀地产生，使得甚至可以均匀地加工大的衬底。

5. 发明授权

US06466997B1 Method and apparatus for performing TX raw cell status report frequency and interrupt frequency mitigation in a network node 有权
标题翻译：用于在网络节点中执行TX原始小区状态报告频率和中断频率减轻的方法和装置
公开(公告)号：US06466997B1
公开(公告)日：2002-10-15
申请号：US09332836
申请日：1999-06-14
申请人： Theodore L. Ross , Douglas M. Washabaugh , Peter J. Roman , Wing Cheung , Koichi Tanaka , Shinichi Mizuguchi , Robert E. Thomas
发明人： Theodore L. Ross , Douglas M. Washabaugh , Peter J. Roman , Wing Cheung , Koichi Tanaka , Shinichi Mizuguchi , Robert E. Thomas
IPC分类号： G06F500
CPC分类号： G06F13/387 , H04L2012/5616 , H04L2012/5658
摘要： A method and system for requesting an interrupt from a host system to service an adapter connected to the host system and a data interface. Data packets, including one or more data cells, are transferred between the data interface and the host system. The host system includes a host memory that includes a plurality of memory slots to store data packets transferred between the data interface and the host system. It is determined when a transfer of data has resulted in an occurrence of an interrupt event. An interrupt event occurs when the transfer of data includes a transfer of a data cell between the data interface and the host system and the data cell is defined to be an end of a data packet. In response to the occurrence of an interrupt event, it is determined whether to generate an interrupt request to the host system. This step of determining includes determining whether a predetermined interval of time has elapsed since the host system last processed an interrupt request or determining whether a predetermined number of interrupt events have occurred since the host system last processed an interrupt request. If the predetermined interval of time has elapsed or the predetermined number of events has occurred, respectively, the interrupt request from the adapter to the host system is generated.
摘要翻译：一种用于从主机系统请求中断来服务连接到主机系统的适配器和数据接口的方法和系统。包括一个或多个数据单元的数据包在数据接口和主机系统之间传输。主机系统包括主机存储器，其包括多个存储器插槽以存储在数据接口和主机系统之间传送的数据包。确定何时传输数据导致发生中断事件。当数据传输包括在数据接口和主机系统之间的数据信元的传送并且数据信元被定义为数据包的结尾时，发生中断事件。响应于中断事件的发生，确定是否向主机系统生成中断请求。该确定步骤包括确定从主机系统最后一次处理中断请求以来是否已经过去了预定的时间间隔，或者确定从主机系统最后一次处理中断请求以来是否发生了预定数量的中断事件。如果预定的时间间隔已经过去或预定的事件数量分别发生，则从适配器向主机系统产生中断请求。

6. 发明授权

US5920418A Diffractive optical modulator and method for producing the same, infrared sensor including such a diffractive optical modulator and method for producing the same, and display device including such a diffractive optical modulator 失效
$Diffractive optical modulator and method for producing the same, infrared sensor including such a diffractive optical modulator and method for producing the same, and display device including such a diffractive optical modulator$
公开(公告)号：US5920418A
公开(公告)日：1999-07-06
申请号：US492894
申请日：1995-06-20
申请人： Teruhiro Shiono , Michihito Ueda , Tatsuo Ito , Kazuo Yokoyama , Shinichi Mizuguchi
发明人： Teruhiro Shiono , Michihito Ueda , Tatsuo Ito , Kazuo Yokoyama , Shinichi Mizuguchi
IPC分类号： G03B9/36 , G01J5/08 , G02B5/18 , G02B26/08 , G03B9/18 , H04N5/74 , G02F1/13
CPC分类号： G01J5/02 , G01J5/0205 , G01J5/0235 , G01J5/024 , G01J5/04 , G01J5/045 , G01J5/08 , G01J5/0803 , G01J5/0806 , G01J5/0831 , G01J5/084 , G01J5/0893 , G02B26/0808 , G02B5/1828 , G03B9/18 , H04N5/7416
摘要： The diffractive optical modulator of the invention includes: a plate having a portion functioning as a first electrode; a spacer layer formed on the plate; and a grating consisting of a plurality of beams having a portion functioning as a second electrode, both ends of the beams being supported on the spacer layer. In the diffractive optical modulator, by adjusting a voltage applied between the first electrode and the second electrode, a distance between the beams and the plate is varied, thereby controlling the diffraction efficiency. An insulating layer is further provided between the plate and the plurality of beams.

7. 发明授权

US5798806A Spatial light modulator and projector 失效
标题翻译：空间光调制器和投影机
公开(公告)号：US5798806A
公开(公告)日：1998-08-25
申请号：US843611
申请日：1997-04-10
申请人： Hiroshi Tsutsui , Kazunori Komori , Kazuhiro Nishiyama , Yasunori Kuratomi , Akio Takimoto , Koji Akiyama , Shinichi Mizuguchi
发明人： Hiroshi Tsutsui , Kazunori Komori , Kazuhiro Nishiyama , Yasunori Kuratomi , Akio Takimoto , Koji Akiyama , Shinichi Mizuguchi
IPC分类号： G02F1/1335 , G02F1/135 , G02F1/1333
CPC分类号： G02F1/133512 , G02F1/135 , G02F2001/1351 , G02F2001/1352 , G02F2203/02
摘要： A spatial light modulator (SLM) providing effects light blocking of even strong incident light without reducing the photoelectric conversion efficiency, and a projector using said SLM, are disclosed. Said projector uses an SLM comprising a readout side glass substrate comprising a readout side transparent electrode; a light modulation layer for modulating incident light according to an applied voltage; a reflective electrode comprising plural electrode elements for applying a voltage to the light modulation layer, and reflecting the light passed by the readout side glass substrate, the readout side transparent electrode, and light modulation layer; a light blocking layer having plural holes; a drive electrode comprising plural electrode elements electrically connected through the holes in the light blocking layer to a corresponding electrode element of the reflective electrode; and voltage applying means for applying a voltage corresponding to the brightness of each pixel in the input image to each electrode element of the drive electrode.
摘要翻译：公开了一种在不降低光电转换效率的情况下提供甚至强入射光的遮光效果的空间光调制器（SLM），以及使用所述SLM的投影仪。所述投影仪使用包括读出侧玻璃基板的SLM，该读出侧玻璃基板包括读出侧透明电极; 光调制层，用于根据施加的电压调制入射光; 反射电极，其包括用于向所述光调制层施加电压并且反射通过所述读出侧玻璃基板，所述读出侧透明电极和光调制层的光的多个电极元件; 具有多个孔的遮光层; 驱动电极，其包括通过所述遮光层中的孔电连接到所述反射电极的相应电极元件的多个电极元件; 以及电压施加装置，用于将对应于输入图像中的每个像素的亮度的电压施加到驱动电极的每个电极元件。

8. 发明授权

US4311110A Electrostatic photocopying apparatus with improved developer supply means 失效
标题翻译：具有改进的显影剂供应装置的静电复印装置
公开(公告)号：US4311110A
公开(公告)日：1982-01-19
申请号：US136071
申请日：1980-03-28
申请人： Kenichi Matsumura , Shinichi Mizuguchi , Tadayuki Onoda , Tsutomu Hamada , Hisato Noda
发明人： Kenichi Matsumura , Shinichi Mizuguchi , Tadayuki Onoda , Tsutomu Hamada , Hisato Noda
IPC分类号： G03G15/08
CPC分类号： G03G15/0801
摘要： An electrostatic photocopying apparatus has a charger adjacent to a photosensitive body, a retaining means for retaining and supplying image forming particles to the photosensitive body, a particle supply means for supplying the particles to the retaining means, and a single-layer producing means for applying to the image forming particles forces which are not sufficient to remove from the photosensitive body the image forming particles adhered directly to the photosensitive body, but are sufficient to remove the image forming particles attached in the second or higher layer thereover. The image forming particles can be evenly spread in one layer on the photosensitive body. Even if the photosensitive body is carried at high speed, the spreading operation can be carried out correspondingly. In addition, the starting and stopping of the spreading of the image forming particles can be easily performed and the amount of the image forming particles used can be reduced. In one embodiment, the retaining means is a multistylus electrode.
摘要翻译：静电复印装置具有与感光体相邻的充电器，用于将成像颗粒保持并提供给感光体的保持装置，用于将颗粒供给到保持装置的颗粒供给装置和单层生产m

9. 发明授权

US5999980A Apparatus and method for setting a congestion indicate bit in an backwards RM cell on an ATM network 失效
标题翻译：用于设置拥塞的装置和方法指示ATM网络上的后向RM小区中的比特
公开(公告)号：US5999980A
公开(公告)日：1999-12-07
申请号：US712717
申请日：1996-09-12
申请人： Koichi Tanaka , Peter J. Roman , Kohei Abe , Shinichi Mizuguchi
发明人： Koichi Tanaka , Peter J. Roman , Kohei Abe , Shinichi Mizuguchi
IPC分类号： H04L12/56 , H04Q11/04 , G06F13/00
CPC分类号： H04L12/5602 , H04Q11/0478 , H04L2012/5635
摘要： An apparatus and method for generating a congestion indication bit to be written to the CI field of a backwards RM ATM cell to be transmitted by a network interface utilizes a slot.sub.-- type congestion signal for indicating that the number of slots available for receiving cells is below a threshold limit, and a CI.sub.-- VC signal for indicating that the buffer space consumed by cells received on a particular VC has passed a threshold value. The CI bit in a backward RM cell for the VC when either the slot.sub.-- type congestion signal is set or the CI.sub.-- VC bit is set or the EFCI bit was set in the last data cell received by the network interface or the CI bit was set in the last forward RM cell transmitted by the network interface.
摘要翻译：用于生成要写入将由网络接口发送的后向RM ATM信元的CI字段的拥塞指示位的装置和方法利用时隙型拥塞信号，用于指示可用于接收小区的时隙数目在下面阈值限制和用于指示在特定VC上接收的小区消耗的缓冲器空间已经通过阈值的CI-VC信号。当设置时隙型拥塞信号或设置CI-VC位或者由网络接口或CI位接收到的最后一个数据单元中设置EFCI位时，VC的反向RM单元中的CI位位于设置在由网络接口发送的最后一个前向RM小区中。

10. 发明授权

US5227838A Exposure system 失效
标题翻译：曝光系统
公开(公告)号：US5227838A
公开(公告)日：1993-07-13
申请号：US641944
申请日：1991-01-16
申请人： Yoshito Nakanishi , Takeo Sato , Nobuaki Furuya , Takeo Miyata , Shinichi Mizuguchi
发明人： Yoshito Nakanishi , Takeo Sato , Nobuaki Furuya , Takeo Miyata , Shinichi Mizuguchi
IPC分类号： G03B27/32 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7049 , G03F7/708
摘要： An exposure system includes a pulse light source emitting light in response to a trigger signal and giving a predetermined exposure light quantity by a plurality of times of light emission. A reticle has an alignment mark and a light exposure pattern. A projection lens contractedly projects the pattern of the reticle. A wafer has an alignment mark to be located. The wafer is exposed to a projection of the pattern. A wafer stage is movable and carries the wafer. A laser interferometer measures a position of the wafer stage. An alignment device serves to detect a condition of an alignment of the wafer with respect to the reticle in an exposure position.

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