会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Clock distributing circuit
    • 时钟分配电路
    • US5732249A
    • 1998-03-24
    • US578432
    • 1995-12-26
    • Shinichi MasudaKazuya Ishihara
    • Shinichi MasudaKazuya Ishihara
    • G06F1/10H03K5/15H03K19/0175G06F1/04
    • G06F1/10
    • To improve the clock delay time and skew. A first resistance body (R1) and a second resistance body (R2) are provided at a terminal end node (N5) of a clock trunk line (1) composed of a doped polysilicon film or the like. Their elements (R1), (R2) are composed of the same film as the clock trunk line (1). Their resistance ratio is set so that the clamp level may be an inverted threshold of first and second local drivers (D2, D3), and the resistance values of both resistance bodies (R1, R2), and the value of interconnection resistance (R) of the clock trunk line (1) are set so that an amplitude of a clock signal at each of the nodes (N3, N4, N5) may be a potential corresponding to 1/2 of its peak-to-peak voltage at the same time. The amplitude of the clock signal from a start end node (N3) to a terminal end node (N5) decreases, and the delay time from an output of a clock driver (D1) to outputs of the local drivers (D2, D3) shaped in waveform is much shorter, and hence the clock skew of the outputs hardly occurs.
    • 提高时钟延迟时间和偏移。 在由掺杂多晶硅膜等构成的时钟主干线(1)的终端节点(N5)上设置有第一电阻体(R1)和第二电阻体(R2)。 它们的元件(R1),(R2)由与时钟主干线(1)相同的膜组成。 设置它们的电阻比,使得钳位电平可以是第一和第二局部驱动器(D2,D3)的反相阈值,并且两个电阻体(R1,R2)的电阻值和互连电阻值(R) 时钟中继线(1)的时钟信号的幅度被设置为使得每个节点(N3,N4,N5)处的时钟信号的幅度可以是对应于+ E的电位,其峰值的频率为1/2 + EE -peak电压同时。 从起始端节点(N3)到终端节点(N5)的时钟信号的幅度减小,并且从时钟驱动器(D1)的输出到本地驱动器(D2,D3)的输出的延迟时间成形 波形较短,因此几乎不发生输出的时钟偏移。
    • 3. 发明授权
    • Nonvolatile semiconductor memory device
    • 非易失性半导体存储器件
    • US08645795B2
    • 2014-02-04
    • US13462846
    • 2012-05-03
    • Kazuya IshiharaYoshiaki Tabuchi
    • Kazuya IshiharaYoshiaki Tabuchi
    • G11C29/00
    • G11C29/52G06F11/1048G11C13/0002G11C13/004G11C13/0061G11C13/0069G11C2029/0411
    • The present invention provides a nonvolatile semiconductor memory device that can optimize a timing of performing an error detection and correction process to shorten a processing time. Upon receiving a write request to a memory cell array including a variable resistive element where information is stored based on a resistance state of a variable resistor, an input/output buffer outputs write data to a write control unit and an ECC control unit. The write control unit performs a data write process of writing divided data, obtained by dividing the write data into a predetermined number of data, to the databanks. The ECC control unit generates a first error correction code by performing an error correction code generation process to the write data or the divided data, in parallel with the data write process. The write control unit performs a code write process of writing first test data into an ECC bank.
    • 本发明提供一种能够优化执行错误检测和校正处理的定时以缩短处理时间的非易失性半导体存储器件。 一旦输入/输出缓冲器向写入控制单元和ECC控制单元输出写入数据,就向存储单元阵列接收到写入请求,该存储单元阵列包括基于可变电阻器的电阻状态存储信息的可变电阻元件。 写入控制单元执行写入分割数据的数据写入处理,该分割数据是通过将写入数据划分成预定数量的数据而获得的。 ECC控制单元通过与数据写入处理并行地对写入数据或分割数据执行纠错码生成处理来生成第一纠错码。 写入控制单元执行将第一测试数据写入ECC组的代码写入处理。
    • 5. 发明授权
    • Variable resistance element
    • 可变电阻元件
    • US08115585B2
    • 2012-02-14
    • US11994646
    • 2006-07-05
    • Kazuya Ishihara
    • Kazuya Ishihara
    • H01C7/10
    • G11C13/0007G11C13/0069G11C2013/009G11C2213/31G11C2213/52H01L45/04H01L45/1233H01L45/146H01L45/147H01L45/1683
    • In a variable resistance element having a variable resistor between first and second electrodes and changing its electric resistance when a voltage pulse is applied between both electrodes, data holding characteristics can be improved by increasing a programming voltage and programming in a high current density. Therefore, a booster circuit for supplying a high voltage is needed when the variable resistance element is applied to a nonvolatile memory. When the smaller of the areas of the contact regions between the first electrode and variable resistor and between the second electrode and variable resistor is set to the electrode area of the variable resistance element, it is set within a specific range not larger than the predetermined electrode area. Thereby the programming current density can be increased without raising the programming voltage, and the variable resistance element having preferable data holding characteristics even at a high temperature can be provided.
    • 在具有第一和第二电极之间的可变电阻器的可变电阻元件中,并且当在两个电极之间施加电压脉冲时改变其电阻,可以通过增加编程电压并以高电流密度编程来提高数据保持特性。 因此,当可变电阻元件被施加到非易失性存储器时,需要用于提供高电压的升压电路。 当第一电极和可变电阻器之间以及第二电极和可变电阻器之间的接触区域中较小的区域被设置为可变电阻元件的电极区域时,其设定在不大于预定电极的特定范围内 区。 因此,可以提高编程电流密度而不提高编程电压,并且可以提供即使在高温也具有优选数据保持特性的可变电阻元件。
    • 9. 发明授权
    • Semiconductor memory device and method of fabricating the same
    • 半导体存储器件及其制造方法
    • US06919593B2
    • 2005-07-19
    • US10213374
    • 2002-08-07
    • Kazuya Ishihara
    • Kazuya Ishihara
    • H01L27/105H01L21/02H01L21/8246H01L27/115H01L27/108
    • H01L27/11502H01L27/11507H01L28/55
    • A ferroelectric capacitor having a ferroelectric film is formed on a conductive silicon substrate. The dielectric capacitor is covered with a first diffusion barrier film, and a second interlayer insulating film is formed on the first diffusion barrier film. A first metal wiring is formed on the second interlayer insulating film, and the first metal wiring is covered with a first buffer film. A second diffusion barrier film is formed on the first buffer film, and a third interlayer insulating film is formed on the second diffusion barrier film. A second metal wiring is formed on the third interlayer insulating film, and the second metal wiring is covered with a second buffer film. A third diffusion barrier film is formed on the second buffer film.
    • 在导电硅衬底上形成具有铁电体膜的铁电电容器。 介电电容器被第一扩散阻挡膜覆盖,在第一扩散阻挡膜上形成第二层间绝缘膜。 在第二层间绝缘膜上形成第一金属布线,第一金属布线被第一缓冲膜覆盖。 在第一缓冲膜上形成第二扩散阻挡膜,在第二扩散阻挡膜上形成第三层间绝缘膜。 在第三层间绝缘膜上形成第二金属布线,第二金属布线被第二缓冲膜覆盖。 在第二缓冲膜上形成第三扩散阻挡膜。