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1. 发明授权

US08506186B2 Coating and developing apparatus, coating and developing method and non-transitory tangible medium 有权
标题翻译：涂层和显影装置，涂层和显影方法以及非瞬态有形介质
公开(公告)号：US08506186B2
公开(公告)日：2013-08-13
申请号：US13225985
申请日：2011-09-06
申请人： Shinichi Hayashi , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
发明人： Shinichi Hayashi , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
IPC分类号： G03D5/00
CPC分类号： G03F7/3021 , G03F7/162 , H01L21/67178 , H01L21/67742 , H01L21/67745
摘要： A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed.
摘要翻译：一种处理块，包括一组液体处理相关单元块，布置在该组单位块的载体块侧的第一加热处理相关块，以及布置在该单元块的界面块侧的第二加热处理相关块单位块组。液体处理单元块组包括用于形成防反射膜和抗蚀剂膜的预处理的双重单元块，用于形成上层膜的后处理和进行曝光之前的清洁操作的双倍单位块，以及用于发展。第一加热工艺相关块加热涂覆有抗蚀剂液体和已经显影的基底的基底。第二加热处理相关块加热已经暴露但尚未显影的基板，已经形成有抗反射膜的基板和已经形成有上层膜的基板。

2. 发明申请

US20120057862A1 COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD AND NON-TRANSITORY TANGIBLE MEDIUM 有权
标题翻译：涂料和开发设备，涂料和开发方法和非交联不稳定介质
公开(公告)号：US20120057862A1
公开(公告)日：2012-03-08
申请号：US13221072
申请日：2011-08-30
申请人： Shinichi HAYASHI , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
发明人： Shinichi HAYASHI , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
IPC分类号： G03D5/00
CPC分类号： H01L21/6715 , G03F7/162 , G03F7/3021 , H01L21/67178 , H01L21/6719 , H01L21/67745
摘要： A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit bock for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate.
摘要翻译：通过在接口块的侧面上的载体块，一组液体处理相关单元块和加热块的侧面上布置加热处理相关块来形成处理块，从载波块到接口块的一侧。一组液相处理相关单元块由以下组成：一组用于涂覆膜的单元块，其通过向上堆叠用于抗反射膜的单元块，用于抗蚀剂膜的单元块和用于上部的单元块层膜，按顺序; 以及用于显影的单元块相对于用于涂膜的单元块组在上下方向上彼此堆叠。每个液体处理相关单元块的液体处理模块布置在用于基板的传送路径的右侧和左侧。

3. 发明授权

US08480319B2 Coating and developing apparatus, coating and developing method and non-transitory tangible medium 有权
标题翻译：涂层和显影装置，涂层和显影方法以及非瞬态有形介质
公开(公告)号：US08480319B2
公开(公告)日：2013-07-09
申请号：US13221072
申请日：2011-08-30
申请人： Shinichi Hayashi , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
发明人： Shinichi Hayashi , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
IPC分类号： G03D5/00
CPC分类号： H01L21/6715 , G03F7/162 , G03F7/3021 , H01L21/67178 , H01L21/6719 , H01L21/67745
摘要： A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit block for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate.
摘要翻译：通过在接口块的侧面上的载体块，一组液体处理相关单元块和加热块的侧面上布置加热处理相关块来形成处理块，从侧面载波块到接口块的一侧。一组液相处理相关单元块由以下组成：一组用于涂覆膜的单元块，其通过向上堆叠用于抗反射膜的单元块，用于抗蚀剂膜的单元块和用于上部的单元块层膜，按顺序; 以及用于显影的单元块相对于用于涂膜的单元块组在上下方向上彼此堆叠。每个液体处理相关单元块的液体处理模块布置在用于基板的传送路径的右侧和左侧。

4. 发明申请

US20120063765A1 COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD AND NON-TRANSITORY TANGIBLE MEDIUM 有权
标题翻译：涂料和开发设备，涂料和开发方法和非交联不稳定介质
公开(公告)号：US20120063765A1
公开(公告)日：2012-03-15
申请号：US13225985
申请日：2011-09-06
申请人： Shinichi HAYASHI , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
发明人： Shinichi HAYASHI , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
IPC分类号： G03D5/00
CPC分类号： G03F7/3021 , G03F7/162 , H01L21/67178 , H01L21/67742 , H01L21/67745
摘要： A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed.
摘要翻译：一种处理块，包括一组液体处理相关单元块，布置在该组单位块的载体块侧的第一加热处理相关块，以及布置在该单元块的界面块侧的第二加热处理相关块单位块组。液体处理单元块组包括用于形成防反射膜和抗蚀剂膜的预处理的双重单元块，用于形成上层膜的后处理和进行曝光之前的清洁操作的双倍单位块，以及用于发展。第一加热工艺相关块加热涂覆有抗蚀剂液体和已经显影的基底的基底。第二加热处理相关块加热已经暴露但尚未显影的基板，已经形成有抗反射膜的基板和已经形成有上层膜的基板。

5. 发明授权

US09162247B2 Coating and development treatment system with airflow control including control unit and movable airflow control plate 有权
标题翻译：涂装开发处理系统，包括控制单元和可移动气流控制板
公开(公告)号：US09162247B2
公开(公告)日：2015-10-20
申请号：US13448526
申请日：2012-04-17
申请人： Kousuke Yoshihara , Koji Takayanagi , Shinichi Hatakeyama , Kohei Kawakami
发明人： Kousuke Yoshihara , Koji Takayanagi , Shinichi Hatakeyama , Kohei Kawakami
IPC分类号： B05C11/00 , B05C13/02 , B05C5/00 , B05C11/02 , B05D1/00 , H01L21/67 , G03F7/16 , B05D3/12 , H01L21/00 , H01L51/00
CPC分类号： H01L21/0337 , B05C11/023 , B05D1/005 , G03F7/162 , G06F19/00 , H01L21/0271 , H01L21/6715 , H01L51/0003 , H01L2224/03418
摘要： A coating treatment apparatus supplying a coating solution to a front surface of a rotated substrate and diffusing the supplied coating solution to an outer periphery side of the substrate to thereby apply the coating solution on the front surface of the substrate includes: a substrate holding part holding a substrate; a rotation part rotating the substrate held on the substrate holding part; a supply part supplying a coating solution to a front surface of the substrate held on the substrate holding part; and an airflow control plate provided at a predetermined position above the substrate held on the substrate holding part for locally changing an airflow above the substrate rotated by the rotation part at an arbitrary position.
摘要翻译：一种涂布处理装置，其将涂布溶液供给到旋转的基板的前表面，并将供给的涂布溶液扩散到基板的外周侧，从而将涂布液涂布在基板的前表面上，包括：保持基板底物; 旋转部，旋转保持在所述基板保持部上的所述基板; 供给部，其向保持在所述基板保持部的所述基板的前表面供给涂布液; 以及气流控制板，其设置在保持在所述基板保持部上的所述基板上方的预定位置，用于在任意位置局部地改变由所述旋转部旋转的所述基板上方的气流。

6. 发明授权

US08505479B2 Resist coating apparatus 有权
标题翻译：抗蚀涂层设备
公开(公告)号：US08505479B2
公开(公告)日：2013-08-13
申请号：US12877187
申请日：2010-09-08
申请人： Kousuke Yoshihara , Tomohiro Iseki
发明人： Kousuke Yoshihara , Tomohiro Iseki
IPC分类号： B05C11/00 , B05C11/02
CPC分类号： H01L21/6715 , G03F7/162
摘要： A resist coating apparatus supplies a resist solution to substantially the center of a target substrate to be processed while rotating the target substrate at a first rotational speed, then decelerates the rotation of the substrate to a second rotational speed lower than the first rotational speed, or until rotational halt, makes the deceleration smaller in the deceleration step as the rotational speed becomes closer to the second rotational speed or the rotational halt, and accelerates the rotation of the substrate to a third rotational speed higher than the second rotational speed to spin off a residue of the resist solution.
摘要翻译：抗蚀涂层装置在以第一转速旋转目标基板的同时将抗蚀剂溶液基本上提供到待加工的目标基板的中心，然后使基板的旋转减速到低于第一转速的第二转速，或直到旋转停止，随着转速变得更接近于第二转速或转动停止，减速步骤中的减速度变小，并且将基板的旋转加速到高于第二转速的第三转速，以使其脱离抗蚀剂溶液的残留物。

7. 发明授权

US08414972B2 Coating treatment method, coating treatment apparatus, and computer-readable storage medium 有权
标题翻译：涂布处理方法，涂布处理装置和计算机可读存储介质
公开(公告)号：US08414972B2
公开(公告)日：2013-04-09
申请号：US12530345
申请日：2008-02-28
申请人： Kousuke Yoshihara , Tomohiro Iseki , Koji Takayanagi
发明人： Kousuke Yoshihara , Tomohiro Iseki , Koji Takayanagi
IPC分类号： B05D3/12
CPC分类号： H01L21/02104 , B05D1/005 , G03F7/162 , H01L21/02282 , H01L21/6715
摘要： In a coating step, a substrate is rotated at a high speed, and in that state a resist solution is discharged from a first nozzle to a central portion of the substrate to apply the resist solution over the substrate. Subsequently, in a flattening step, the rotation of the substrate is decelerated and the substrate is rotated at a low speed to flatten the resist solution on the substrate. In this event, the discharge of the resist solution by the first nozzle in the coating step is performed until a middle of the flattening step, and when the discharge of the resist solution is finished in the flattening step, the first nozzle is moved to move a discharge position of the resist solution from the central portion of the substrate. According to the present invention, the resist solution can be applied uniformly within the substrate.
摘要翻译：在涂布步骤中，基板高速旋转，并且在该状态下，将抗蚀剂溶液从第一喷嘴排出到基板的中心部分，以将抗蚀剂溶液涂覆在基板上。随后，在平坦化步骤中，基板的旋转减速，并且基板以低速旋转以使基板上的抗蚀剂溶液平坦化。在这种情况下，在涂布步骤中，通过第一喷嘴对抗蚀剂溶液的排出进行到平坦化阶段的中间，并且当在平坦化步骤中完成抗蚀剂溶液的排出时，第一喷嘴移动抗蚀剂溶液从衬底的中心部分的放电位置。根据本发明，能够将抗蚀剂溶液均匀地涂布在基板内。

8. 发明申请

US20130068324A1 CHEMICAL SUPPLY SYSTEM, SUBSTRATE TREATMENT APPARATUS INCORPORATING THE SAME, AND COATING AND DEVELOPING SYSTEM INCORPORATING THE SAME APPARATUS 有权
公开(公告)号：US20130068324A1
公开(公告)日：2013-03-21
申请号：US13695844
申请日：2011-03-16
申请人： Toshinobu Furusho , Takahiro Ookubo , Kousuke Yoshihara , Yusuke Yamamoto , Steffen Hornig
发明人： Toshinobu Furusho , Takahiro Ookubo , Kousuke Yoshihara , Yusuke Yamamoto , Steffen Hornig
IPC分类号： F17D1/00
CPC分类号： B05D1/02 , B01D29/56 , B01D35/02 , B05C9/06 , B05C11/10 , F17D1/00 , H01L21/67017 , H01L21/6715 , H01L21/67173 , H01L21/67178 , Y10T137/794
摘要： A chemical supply system comprises: a first container and a second container for storing a chemical solution; a first pump, located on a first pipe connecting the first and second containers, for directing the solution stored in the first container to the second container; and a first filter, located in the first pipe, for filtering the solution flowing through the first pipe from the first container toward the second container. The system further includes: a second pipe for connecting the first container and the second container; and a second pump, located on the second pipe, for directing the solution stored in the second container to the first container.

9. 发明授权

US08333522B2 Developing apparatus, developing method and storage medium 有权
标题翻译：显影装置，显影方法和存储介质
公开(公告)号：US08333522B2
公开(公告)日：2012-12-18
申请号：US13025490
申请日：2011-02-11
申请人： Hiroshi Arima , Kousuke Yoshihara , Yuichi Yoshida , Yasushi Takiguchi , Taro Yamamoto
发明人： Hiroshi Arima , Kousuke Yoshihara , Yuichi Yoshida , Yasushi Takiguchi , Taro Yamamoto
IPC分类号： G03D5/00
CPC分类号： G03F7/3021
摘要： There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form a liquid film of the developing solution on a surface of a substrate loaded into the processing vessel; and a drying unit that dries the substrate in order to stop a developing process by the liquid film. A reaction between a resist and the developing solution can be stopped. Therefore, a developing process can be performed in parallel with a cleaning process performed by a cleaning module and high throughput is achieved.
摘要翻译：提供了能够实现高产量的显影装置。显影装置包括在其中形成处理气氛的气密密封处理容器; 气氛气体供给单元，其将含有显影液雾的气氛气体供给到处理容器中，以在装载到处理容器中的基板的表面上形成显影液的液膜; 以及干燥单元，其干燥基板以便通过液膜来停止显影处理。可以停止抗蚀剂与显影液的反应。因此，可以与由清洁模块执行的清洁处理并行执行显影处理，并且实现高生产率。

10. 发明授权

US08318247B2 Coating treatment method, coating treatment apparatus, and computer-readable storage medium 有权
标题翻译：涂布处理方法，涂布处理装置和计算机可读存储介质
公开(公告)号：US08318247B2
公开(公告)日：2012-11-27
申请号：US12205999
申请日：2008-09-08
申请人： Kousuke Yoshihara , Tomohiro Iseki , Koji Takayanagi
发明人： Kousuke Yoshihara , Tomohiro Iseki , Koji Takayanagi
IPC分类号： B05D3/12
CPC分类号： G03F7/162
摘要： The present invention includes: a first step of discharging a coating solution from a nozzle to a center portion of the substrate to apply the coating solution on a surface of the substrate while rotating the substrate; a second step of decelerating, after the first step, the rotation of the substrate and continuously rotating the substrate; and a third step of accelerating, after the second step, the rotation of the substrate to dry the coating solution on the substrate, wherein: the substrate is rotated at a fixed speed of a first speed immediately before the first step; and in the first step, the rotation of the substrate which is at the first speed before start of the first step is gradually accelerated after the start of the first step so as to make the speed continuously change, and the acceleration of the rotation of the substrate is gradually decreased so as to make the speed of the rotation of the substrate converge in a second speed higher than the first speed at end of the first step.
摘要翻译：本发明包括：第一步骤，将涂布液从喷嘴排出到基板的中心部分，以在旋转基板的同时将涂布溶液施加到基板的表面上; 在第一步骤之后使基板旋转并使基板连续旋转的第二步骤; 以及第三步骤，在所述第二步骤之后加速所述基板的旋转以使所述基板上的所述涂布溶液干燥，其中：所述基板在所述第一步骤之前以一速度的固定速度旋转; 并且在第一步骤中，在第一步骤开始之后以第一速度的基板的旋转在第一步骤开始之后逐渐加速，以使得速度连续变化，并且旋转的加速度基板逐渐减小，以使得基板的旋转速度在第一步骤结束时以比第一速度高的第二速度会聚。

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