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    • 9. 发明授权
    • Semiconductor laser
    • 半导体激光器
    • US4456998A
    • 1984-06-26
    • US266610
    • 1981-05-22
    • Fujio TanakaYasuyuki OkamuraYukitoshi KushiroChuichi OtaShigeyuki Akiba
    • Fujio TanakaYasuyuki OkamuraYukitoshi KushiroChuichi OtaShigeyuki Akiba
    • H01S5/223H01S3/19
    • H01S5/2231
    • A semiconductor laser, which comprises a substrate of InP, an active layer, and two clad layers holding therebetween the active layer, and which is constructed so that the refractive index of the active layer may be larger than the refractive indexes of the two clad layers. In one of the two clad layers, the refractive index of a region adjacent to a radiation region in the active layer is larger than the refractive index of a region adjacent to a non-radiation region in the active layer. The refractive index of the other clad layer is equal to the refractive index of that region of said on clad layer adjoining the radiation region or the non-radiation region. The thickness and width of the radiation region of the active layer are selected so that the semiconductor laser may oscillate in the fundamental transverse mode. A buffer layer may be further provided between the active layer and one of the two clad layers.
    • 一种半导体激光器,其包括InP的衬底,有源层和保持在其间的有源层的两个覆盖层,并且被构造成使得有源层的折射率可以大于两个覆盖层的折射率 。 在两个包覆层中的一个中,与有源层中的辐射区相邻的区域的折射率大于与有源层中的非辐射区域相邻的区域的折射率。 另一个包覆层的折射率等于与辐射区域或非辐射区域相邻的所述上包层的区域的折射率。 选择有源层的辐射区域的厚度和宽度,使得半导体激光器可以在基本横向模式下振荡。 可以在活性层和两个包覆层中的一个之间进一步设置缓冲层。
    • 10. 发明授权
    • Optical modulation device
    • 光调制装置
    • US4913506A
    • 1990-04-03
    • US311218
    • 1989-02-16
    • Masatoshi SuzukiShigeyuki AkibaHideaki TanakaKatsuyuki Utaka
    • Masatoshi SuzukiShigeyuki AkibaHideaki TanakaKatsuyuki Utaka
    • G02F1/015G02F1/017G02F1/025G02B6/10
    • B82Y20/00G02F1/01708G02F1/025G02F2001/0157G02F2202/101G02F2202/102
    • An optical modulation device is disclosed in which a difference between the photon energy of incident light and the band-gap energy of the modulation waveguide layer is set to a value greater than 50 meV to thereby suppress the degradation of the modulation voltage and the modulation band width which is caused by an increase in the intensity of incident light and in that the optical modulation device is formed in a predetermined length to thereby decrease the modulation voltage. The energy gap of the optical waveguide layer of the optical modulation device is varied continuously or discontinuously in the direction of its thickness to provide a constant absorption coefficient thickwise of the optical waveguide layer so that the electric field intensity distribution in the optical waveguide layer is compensated for, by which overlap of the light distribution and the absorption coefficient is increased so as to decrease the modulation voltage and broaden the modulation band by the reduction of the length of the device. The composition, thickness and stripe width of the optical waveguide layer are changed so that its absorption coefficient increases from the light receiving end face of the optical waveguide layer toward its light emitting end face, thereby making the number of carriers absorbed per unit length substantially constant in the direction of travel of light.
    • 公开了一种光调制装置,其中将入射光的光子能量与调制波导层的带隙能量之间的差设定为大于50meV的值,从而抑制调制电压和调制带的劣化 由入射光强度的增加引起的宽度,并且光调制装置形成为预定长度,从而降低调制电压。 光调制装置的光波导层的能隙在其厚度方向上连续或不连续地变化,以提供光波导层厚度的恒定吸收系数,使得光波导层中的电场强度分布得到补偿 由此,增加了光分布和吸收系数的重叠,从而降低了调制电压,并且通过减小器件的长度来扩大调制频带。 改变光波导层的组成,厚度和条纹宽度,使得其吸收系数从光波导层的光接收端面向其发光端面增加,从而使每单位长度吸收的载流子基本恒定 在光的行进方向。