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    • 2. 发明授权
    • Semiconductor device
    • 半导体器件
    • US07115966B2
    • 2006-10-03
    • US10375125
    • 2003-02-28
    • Yasuhiro IdoKazushi KonoTakeshi Iwamoto
    • Yasuhiro IdoKazushi KonoTakeshi Iwamoto
    • H01L29/00H01L29/73
    • H01L23/5258H01L2924/0002H01L2924/00
    • On a semiconductor substrate a silicon oxide film is formed and provided with a recess. In the recess a reflector layer of copper is disposed as a blocking layer with a barrier metal posed therebetween. The reflector layer of copper is covered with a silicon oxide film and thereon a fuse region provided with a plurality of fuses is provided. The reflector layer of copper has a plane of reflection recessed downward to reflect a laser beam. The reflector layer of copper is arranged to overlap substantially the entirety of the fuse region, as seen in a plane. A laser beam radiated to blow the fuse can have a reduced effect on a vicinity of the fuse region. A semiconductor device reduced in size can be obtained.
    • 在半导体衬底上形成氧化硅膜并设置有凹部。 在凹部中,铜的反射器层被设置为阻挡层,其间具有阻挡金属。 铜的反射层被氧化硅膜覆盖,并且在其上提供设有多个保险丝的保险丝区域。 铜的反射层具有向下凹入的反射平面以反射激光束。 铜的反射器层布置成基本上与整个熔断器区域重叠,如在平面中所见。 照射熔断器的激光束可以对保险丝区域的附近产生减小的影响。 可以获得尺寸减小的半导体装置。
    • 3. 发明授权
    • Semiconductor device
    • 半导体器件
    • US06362514B1
    • 2002-03-26
    • US09352340
    • 1999-07-13
    • Yasuhiro IdoTakeshi IwamotoRui Toyota
    • Yasuhiro IdoTakeshi IwamotoRui Toyota
    • H01L2900
    • H01L23/5258H01L23/53228H01L2924/0002Y10S257/91H01L2924/00
    • There is described a semiconductor device having a copper fuse which prevents damage to a silicon substrate beneath the copper fuse, which would otherwise be caused by a laser beam radiated to blow the copper fuse. A light absorbing layer is formed on the copper fuse layer from material whose light absorption coefficient is greater than that of a copper wiring layer. Light absorbed by the light absorbing layer is transmitted, through heat conduction, to the copper wiring layer beneath the light absorbing layer and further to a barrier metal layer beneath the copper wiring layer. Even when the widely-used conventional laser beam of infrared wavelength is used, the copper fuse can be blown. Since a guard layer is formed below the fuse layer, there can be prevented damage to the silicon substrate, which would otherwise be caused by exposure to the laser beam of visible wavelength. Therefore, the copper fuse can be blown even by use of a laser beam of visible wavelength whose light absorption coefficient for copper is high.
    • 描述了具有铜熔丝的半导体器件,其防止对铜熔丝下方的硅衬底的损坏,否则这将由被辐射以吹制铜熔丝的激光束引起。 光吸收层由光吸收系数大于铜布线层的材料形成在铜熔丝层上。 由光吸收层吸收的光通过热传导传递到光吸收层下面的铜布线层,并且进一步传输到铜布线层下面的阻挡金属层。 即使使用广泛使用的红外波长的常规激光束,也可以熔断铜熔丝。 由于保护层形成在熔丝层的下面,所以可以防止对硅衬底的损坏,否则这将因暴露于可见波长的激光束而引起。 因此,即使通过使用铜的光吸收系数高的可见波长的激光束也能够熔断铜熔丝。
    • 5. 发明申请
    • Semiconductor device
    • 半导体器件
    • US20070102786A1
    • 2007-05-10
    • US11584513
    • 2006-10-23
    • Yasuhiro IdoTakeshi Iwamoto
    • Yasuhiro IdoTakeshi Iwamoto
    • H01L29/00
    • H01L23/5258H01L2924/0002H01L2924/00
    • A semiconductor device of the present invention comprises: a substrate; a plurality of wiring layers formed over the substrate; a fuse formed in an uppermost one of the plurality of wiring layers; a first insulating film made up of a single film and formed on the uppermost wiring layer such that the first insulating film is in contact with a surface of the fuse; and a second insulating film formed on the first insulating film; wherein the second insulating film has an opening therein formed above a fuse region of the uppermost wiring layer such that only the first insulating film exists above the fuse region, the fuse region including the fuse and being irradiated with a laser beam when the fuse is blown.
    • 本发明的半导体器件包括:衬底; 形成在所述基板上的多个布线层; 形成在所述多个布线层的最上面的保险丝; 由单个膜构成的第一绝缘膜,形成在所述最上布线层上,使得所述第一绝缘膜与所述保险丝的表面接触; 以及形成在所述第一绝缘膜上的第二绝缘膜; 其中所述第二绝缘膜在其最上布线层的熔丝区域的上方形成有开口,使得只有所述第一绝缘膜存在于所述熔丝区域的上方,所述熔丝区域包括所述熔丝并且当所述熔丝被熔断时被照射激光束 。
    • 6. 发明申请
    • Semiconductor device and manufacturing method thereof
    • 半导体装置及其制造方法
    • US20060076642A1
    • 2006-04-13
    • US11237772
    • 2005-09-29
    • Yasuhiro IdoTakeshi Iwamoto
    • Yasuhiro IdoTakeshi Iwamoto
    • H01L29/00
    • H01L23/53238H01L23/5258H01L2924/0002H01L2924/00
    • The present invention provides a semiconductor device comprising: a substrate; a first insulating film formed on a principal surface of the substrate; a second insulating film formed on the first insulating film; a plurality of fuses formed on the second insulating film; and a blocking layer disposed in the first and second insulating films, the blocking layer being formed of a material capable of reflecting laser light irradiated to blow the plurality of fuses. The blocking layer overlaps a region in which the plurality of fuses are formed when viewed from the principal surface of the substrate. The plurality of fuses may be each formed in two or more insulating film layers laminated to one another on the second insulating film.
    • 本发明提供一种半导体器件,包括:衬底; 形成在所述基板的主表面上的第一绝缘膜; 形成在所述第一绝缘膜上的第二绝缘膜; 形成在所述第二绝缘膜上的多个保险丝; 以及设置在所述第一和第二绝缘膜中的阻挡层,所述阻挡层由能够反射照射以吹动所述多个保险丝的激光的材料形成。 当从基板的主表面观察时,阻挡层与形成有多个熔丝的区域重叠。 多个保险丝可以分别形成在第二绝缘膜上彼此层压的两个或更多个绝缘膜层中。
    • 7. 发明授权
    • Semiconductor device
    • 半导体器件
    • US07728406B2
    • 2010-06-01
    • US11584513
    • 2006-10-23
    • Yasuhiro IdoTakeshi Iwamoto
    • Yasuhiro IdoTakeshi Iwamoto
    • H01L29/00
    • H01L23/5258H01L2924/0002H01L2924/00
    • A semiconductor device of the present invention comprises: a substrate; a plurality of wiring layers formed over the substrate; a fuse formed in an uppermost one of the plurality of wiring layers; a first insulating film made up of a single film and formed on the uppermost wiring layer such that the first insulating film is in contact with a surface of the fuse; and a second insulating film formed on the first insulating film; wherein the second insulating film has an opening therein formed above a fuse region of the uppermost wiring layer such that only the first insulating film exists above the fuse region, the fuse region including the fuse and being irradiated with a laser beam when the fuse is blown.
    • 本发明的半导体器件包括:衬底; 形成在所述基板上的多个布线层; 形成在所述多个布线层的最上面的保险丝; 由单个膜构成的第一绝缘膜,形成在所述最上布线层上,使得所述第一绝缘膜与所述保险丝的表面接触; 以及形成在所述第一绝缘膜上的第二绝缘膜; 其中所述第二绝缘膜在其最上布线层的熔丝区域的上方形成有开口,使得只有所述第一绝缘膜存在于所述熔丝区域的上方,所述熔丝区域包括所述熔丝并且当所述熔丝被熔断时被照射激光束 。