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1. 发明申请

US20120222816A1 SURFACE WAVE PLASMA GENERATING ANTENNA AND SURFACE WAVE PLASMA PROCESSING APPARATUS 有权
标题翻译：表面波等离子体生成天线和表面波等离子体处理装置
公开(公告)号：US20120222816A1
公开(公告)日：2012-09-06
申请号：US13410957
申请日：2012-03-02
申请人： Taro IKEDA , Shigeru Kasai , Yuki Osada
发明人： Taro IKEDA , Shigeru Kasai , Yuki Osada
IPC分类号： H01L21/3065 , H01J1/02
CPC分类号： H01J37/3222 , C23C16/274
摘要： A surface wave plasma generating antenna serves to generate a surface wave plasma in a chamber by radiating into the chamber a microwave transmitted from a microwave output section through a coaxial waveguide including an outer conductor and an inner conductor. The surface wave plasma generating antenna is formed in a planar shape and has a plurality of slots arranged in a circumferential direction, and each joint portion between two adjacent slots in the circumferential direction is overlapped with at least one of the slots in a diametrical direction.
摘要翻译：表面波等离子体产生天线用于通过将包括外部导体和内部导体的同轴波导从微波输出部分发射的微波辐射到室中，从而在室内产生表面波等离子体。表面波等离子体发生天线形成为平面形状，并且具有沿圆周方向排列的多个狭槽，并且沿圆周方向的两个相邻狭槽之间的每个接合部分沿直径方向与至少一个狭槽重叠。

2. 发明授权

US07445690B2 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US07445690B2
公开(公告)日：2008-11-04
申请号：US11088811
申请日：2005-03-25
申请人： Shigeru Kasai , Yuki Osada , Takashi Ogino
发明人： Shigeru Kasai , Yuki Osada , Takashi Ogino
IPC分类号： C23C16/00 , H01L21/306
CPC分类号： H05B6/705
摘要： A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for introducing plasma generating microwaves into the chamber. The microwave introducing unit includes a microwave oscillator for outputting a plurality if microwaves having specified outputs, and an antenna section having a plurality of antennas to which the microwaves outputted from the microwave oscillator are respectively transmitted.
摘要翻译：等离子体处理装置包括用于容纳待处理基板的室，用于将处理气体供应到室中的气体供给单元和用于将等离子体产生微波引入室的微波引入单元。微波引入单元包括微波振荡器，用于输出具有指定输出的多个微波，以及具有分别从微波振荡器输出微波的多个天线的天线部分。

3. 发明申请

US20050034815A1 Plasma processor 失效
标题翻译：等离子处理器
公开(公告)号：US20050034815A1
公开(公告)日：2005-02-17
申请号：US10498672
申请日：2002-11-25
申请人： Shigeru Kasai , Nobuhiko Yamamoto , Hikaru Adachi , Yuki Osada
发明人： Shigeru Kasai , Nobuhiko Yamamoto , Hikaru Adachi , Yuki Osada
IPC分类号： H05H1/46 , C23C16/511 , H01J37/32 , H01L21/205 , H01P5/103 , C23F1/00
CPC分类号： H01J37/32256 , H01J37/32192 , H01J37/32568 , H01P5/103
摘要： A plasma processor with a microwave generating source mounted integrally on a shield lid by miniaturizing a matching circuit. The plasma processor is characterized by comprising a evacuatable processing vessel (42), a workpiece mount base (44) provided in the processing vessel, a microwave transmitting plate (70) provided in the opening section of the top of the processing vessel, a plane antenna member (74) for supplying a microwave into the processing vessel via the microwave transmitting plate, a shield lid (78) so grounded as to cover the top of the plane antenna member, a waveguide (82) for guiding the microwave from a microwave generating source to the plane antenna member, a member elevating mechanism (85) for relatively varying the vertical distance between the plane antenna member and the shield lid, a tuning rod (104) so provided insertably into the waveguide tube, a tuning rod drive mechanism (102) so moving the tuning rod as to adjust its insert amount, and a matching control section (114) for matching adjustment by controlling the elevation amount of the antenna member and the insert amount of the tuning rod.
摘要翻译：具有微波发生源的等离子体处理器通过使匹配电路小型化而整体地安装在屏蔽盖上。等离子体处理器的特征在于包括可排出的处理容器（42），设置在处理容器中的工件安装基座（44），设置在处理容器顶部的开口部分中的微波传输板（70）天线构件（74），用于经由微波传输板将微波提供到处理容器中;屏蔽盖（78），其被接地以覆盖平面天线构件的顶部;波导（82），用于引导微波从微波产生源到平面天线构件的构件升降机构，用于相对地改变平面天线构件和屏蔽盖之间的垂直距离的构件升降机构（85），可插入到波导管中的调谐杆（104），调谐杆驱动机构（102），以便调整调节杆的插入量;以及匹配控制部（114），用于通过控制天线部件的仰角量和插入量来匹配调整 e调音杆。

4. 发明授权

US08308898B2 Tuner and microwave plasma source 有权
标题翻译：调谐器和微波等离子体源
公开(公告)号：US08308898B2
公开(公告)日：2012-11-13
申请号：US13246417
申请日：2011-09-27
申请人： Shigeru Kasai , Taro Ikeda , Yuki Osada
发明人： Shigeru Kasai , Taro Ikeda , Yuki Osada
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H01J7/24 , H05B31/26 , H03H7/38
CPC分类号： H05B6/80 , H01J37/32192 , H01J37/32256 , H05B6/705 , H05H1/46 , H05H2001/463
摘要： A tuner for matching impedance includes: a body having a tubular outer conductor and a tubular inner conductor coaxially provided in the outer conductor, the body forming a part of the microwave transmission path; an annular dielectric slug provided between the outer conductor and the inner conductor, the slug being movable along a longitudinal direction of the inner conductor; and a drive mechanism for moving the slug and including a drive part for applying a driving force; a drive transmission part for transmitting the driving force to the slug; a drive guide part for guiding movement of the slug; and a holding part for holding the slug at the drive transmission part, and wherein the drive transmission part, the drive guide part and the holding part are accommodated in the inner conductor.
摘要翻译：用于匹配阻抗的调谐器包括：主体，其具有管状外导体和同轴地设置在外导体中的管状内导体，主体形成微波传输路径的一部分; 设置在所述外部导体和所述内部导体之间的环状介电块，所述块可沿着所述内部导体的纵向方向移动; 以及驱动机构，用于移动所述塞子并且包括用于施加驱动力的驱动部件; 驱动传递部，用于将驱动力传递到所述塞子; 驱动引导部，用于引导所述塞子的运动; 以及用于将所述块塞保持在所述驱动传递部分的保持部分，并且其中所述驱动传递部分，所述驱动引导部分和所述保持部分被容纳在所述内部导体中。

5. 发明申请

US20080309239A1 MAGNETRON CONTROL METHOD, MAGNETRON SERVICE LIFE JUDGMENT METHOD, MICROWAVE GENERATION DEVICE, MAGNETRON SERVICE LIFE JUDGMENT DEVICE, PROCESSING DEVICE, COMPUTER PROGRAM, AND STORAGE MEDIUM 失效
标题翻译： MAGNETRON控制方法，MAGNETRON服务寿命判断方法，微波发生装置，MAGNETRON服务生命判断装置，处理装置，计算机程序和存储介质
公开(公告)号：US20080309239A1
公开(公告)日：2008-12-18
申请号：US12044625
申请日：2008-03-07
申请人： Shigeru Kasai , Yuki Osada
发明人： Shigeru Kasai , Yuki Osada
IPC分类号： H01J25/50
CPC分类号： H05B6/666 , H01J37/32192 , H01J37/32201 , H05B6/806 , H05B2206/043
摘要： A microwave generation device includes: a magnetron having a cathode containing a filament and an anode containing a hollow resonator arranged to oppose to each other; a filament current measuring unit; and an application voltage measuring unit for measuring voltage applied to the filament. Based on the current and the voltage obtained by the current measuring unit and the voltage measuring unit, a resistance value calculation unit obtains a resistance value of the filament. A temperature calculation unit calculates the filament temperature from the resistance value and the resistance-temperature dependent characteristic. A filament power source is controlled by a power control unit so that the filament temperature is within a predetermined temperature range.
摘要翻译：微波发生装置包括：具有包含灯丝的阴极的磁控管和包含彼此相对的中空谐振器的阳极; 灯丝电流测量单元; 以及用于测量施加到灯丝上的电压的施加电压测量单元。基于由电流测量单元和电压测量单元获得的电流和电压，电阻值计算单元获得灯丝的电阻值。温度计算单元根据电阻值和电阻温度依赖特性来计算灯丝温度。灯丝电源由功率控制单元控制，使得灯丝温度在预定的温度范围内。

6. 发明授权

US07226524B2 Plasma processing apparatus 失效
标题翻译：等离子体处理装置
公开(公告)号：US07226524B2
公开(公告)日：2007-06-05
申请号：US10498672
申请日：2002-11-25
申请人： Shigeru Kasai , Nobuhiko Yamamoto , Hikaru Adachi , Yuki Osada
发明人： Shigeru Kasai , Nobuhiko Yamamoto , Hikaru Adachi , Yuki Osada
IPC分类号： C23C16/00 , H01L21/306 , C23F1/00
CPC分类号： H01J37/32256 , H01J37/32192 , H01J37/32568 , H01P5/103
摘要： A plasma processing apparatus includes an evacuatable processing vessel; a workpiece mount base for mounting thereon an object to be processed; a microwave transmitting plate provided in an opening of a ceiling of the processing vessel; a planar antenna member for supplying a microwave into the processing vessel via the microwave transmitting plate; a shield lid grounded to cover a top of the planar antenna member; a waveguide for guiding the microwave to the planar antenna member; a member elevating mechanism for relatively varying a vertical distance between the planar antenna member and the shield lid; a tuning rod insertable into the waveguide; a tuning rod driving mechanism for moving the tuning rod to adjust an insert amount thereof; and a matching control section for controlling an elevation amount of the planar antenna member and the insert amount of the tuning rod to obtain a matching adjustment.
摘要翻译：等离子体处理装置包括可抽空处理容器; 用于在其上安装待处理物体的工件安装基座; 设置在处理容器的天花板的开口中的微波传输板; 平面天线构件，用于经由微波发射板向处理容器提供微波; 屏蔽盖，其接地以覆盖所述平面天线构件的顶部; 用于将微波引导到平面天线构件的波导; 用于相对改变平面天线构件和屏蔽盖之间的垂直距离的构件升降机构; 调谐杆可插入到波导中; 调节杆驱动机构，用于移动调音杆以调节其插入量; 以及匹配控制部分，用于控制平面天线部件的仰角量和调节杆的插入量以获得匹配调整。

7. 发明授权

US07176634B2 Coaxial type impedance matching device and impedance detecting method for plasma generation 有权
标题翻译：同轴型阻抗匹配装置及等离子体发生阻抗检测方法
公开(公告)号：US07176634B2
公开(公告)日：2007-02-13
申请号：US10951049
申请日：2004-09-27
申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
IPC分类号： H01J7/24 , H03H7/38
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32183 , H01P5/026 , H01P5/04
摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
摘要翻译：等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号产生等离子体的功率到处理室。

8. 发明申请

US20050160987A1 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US20050160987A1
公开(公告)日：2005-07-28
申请号：US11088811
申请日：2005-03-25
申请人： Shigeru Kasai , Yuki Osada , Takashi Ogino
发明人： Shigeru Kasai , Yuki Osada , Takashi Ogino
IPC分类号： C23C16/00 , C23F1/00
CPC分类号： H05B6/705
摘要： A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for introducing plasma generating microwaves into the chamber. The microwave introducing unit includes a microwave oscillator for outputting a plurality of microwaves having specified outputs, and an antenna section having a plurality of antennas to which the microwaves outputted from the microwave oscillator are respectively transmitted.
摘要翻译：等离子体处理装置包括用于容纳待处理基板的室，用于将处理气体供应到室中的气体供给单元和用于将等离子体产生微波引入室的微波引入单元。微波引入单元包括微波振荡器，用于输出具有特定输出的多个微波，以及具有分别从微波振荡器输出微波的多个天线的天线部分。

9. 发明申请

US20050057164A1 Coaxial type impedance matching device and impedance detecting method for plasma generation 有权
标题翻译：同轴型阻抗匹配装置及等离子体发生阻抗检测方法
公开(公告)号：US20050057164A1
公开(公告)日：2005-03-17
申请号：US10951049
申请日：2004-09-27
申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
IPC分类号： H01J37/32 , H01J7/24 , H05B31/26
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32183 , H01P5/026 , H01P5/04
摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
摘要翻译：等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号产生等离子体的功率到处理室。

10. 发明申请

US20060144519A1 Coaxial type impedance matching device and impedance detecting method for plasma generation 有权
标题翻译：同轴型阻抗匹配装置及等离子体发生阻抗检测方法
公开(公告)号：US20060144519A1
公开(公告)日：2006-07-06
申请号：US11370780
申请日：2006-03-08
申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
IPC分类号： C23F1/00
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32183 , H01P5/026 , H01P5/04
摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
摘要翻译：等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号产生等离子体的功率到处理室。

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