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1. 发明授权

US06240111B1 Laser beam generating apparatus and method 有权
标题翻译：激光束发生装置及方法
公开(公告)号：US06240111B1
公开(公告)日：2001-05-29
申请号：US09289244
申请日：1999-04-09
申请人： Shigeo Kubota , Nobuhiko Umezu , Tatsuo Fukui , Hisashi Masuda , Koichi Tatsuki
发明人： Shigeo Kubota , Nobuhiko Umezu , Tatsuo Fukui , Hisashi Masuda , Koichi Tatsuki
IPC分类号： H01S310
CPC分类号： G02F1/37
摘要： A laser beam generating apparatus comprising a first laser beam source oscillating in a near infrared-ray region of, for example, an Nd:YAG laser to generate a laser beam, a second higher harmonic wave generator for generating, from the laser beam emitted from the first laser beam source, a second higher harmonic wave having a half wavelength of the laser beam emitted from the first laser beam source, a splitter for splitting the second higher harmonic wave, a second laser beam source which is supplied with a part of the second higher harmonic wave thus split is input to a Ti:Sapphire laser to be excited and oscillated, thereby generating a laser beam of substantially 700 nm in wavelength, a fourth higher harmonic wave generator for generating a fourth higher harmonic wave from the remaining part of the second higher harmonic wave thus split, a sum frequency mixing composed of a BBO crystal device to which the laser beam of substantially 700 nm in wavelength and the fourth higher harmonic wave are input, and a controller for controlling the temperature of the BBO crystal device to substantially 100K or less, thereby generating a laser beam of substantially 193 nm in wavelength as an output of the sum frequency mixing.
摘要翻译：一种激光束产生装置，包括：在例如Nd：YAG激光器的近红外线区域中振荡的第一激光束源，以产生激光束;第二高次谐波发生器，用于从从第一激光束源，具有从第一激光束源发射的激光束的半波长的第二高次谐波，用于分离第二高次谐波的分离器，被提供有第一激光束的一部分的第二激光束源将这样分割的第二高次谐波输入到激发和振荡的Ti：蓝宝石激光器中，从而产生大致为700nm的波长的激光束;第四高次谐波发生器，用于从剩余部分产生第四高次谐波这样分裂的第二高次谐波，由BBO晶体器件组成的和频混频，其中波长大致为700nm的激光束和第四较高谐波尼康波输入，以及用于将BBO晶体装置的温度控制在基本上为100K以下的控制器，由此产生大致193nm的波长的激光束作为和频混合的输出。

2. 发明授权

US5370076A Method of producing single crystal of KTiOPO.sub.4 失效
标题翻译：生产KTiOPO4单晶的方法
公开(公告)号：US5370076A
公开(公告)日：1994-12-06
申请号：US056530
申请日：1993-05-05
申请人： Tsutomu Okamoto , Koji Watanabe , Tatsuo Fukui , Yasushi Minoya , Koichi Tatsuki , Shigeo Kubota
发明人： Tsutomu Okamoto , Koji Watanabe , Tatsuo Fukui , Yasushi Minoya , Koichi Tatsuki , Shigeo Kubota
IPC分类号： C30B15/00 , C30B9/00 , C30B29/22 , C30B29/32 , G02F1/35 , G02F1/355 , C30B9/12
CPC分类号： C30B9/00 , C30B29/14
摘要： A method of growing a single crystal of KTiOPO.sub.4 which is a nonlinear optical material is disclosed. Growth of the single crystal of KTiOPO.sub.4 is carried out by melting a KTiOPO.sub.4 material with a flux to produce a melt, then contacting a seed crystal to the melt, and by slowly cooling at a saturation temperature or below. At this time, molar fractions of K.sub.2 O, P.sub.2 O.sub.5 and TiO.sub.2 contained in the melt fall within a region surrounded by six point in a K.sub.2 O-P.sub.2 O.sub.5 -TiO.sub.2 ternary phase diagram of A (K.sub.2 O:0.4150, P.sub.2 O.sub.5 :0.3906, TiO.sub.2 : 0.1944), B (K.sub.2 O:0.3750, P.sub.2 O.sub.5 : 0.3565, TiO.sub.2 : 0.2685), C (K.sub.2 O: 0.3750, P.sub.2 O.sub.5 : 0.3438, TiO.sub.2 : 0.2813), D (K.sub.2 O: 0.3850, P.sub.2 O.sub.5 : 0.3260, TiO.sub.2 : 0.2890), E (K.sub.2 O: 0.4000, P.sub.2 O.sub.5 : 0.3344, TiO.sub.2 : 0.2656), and F (K.sub.2 O: 0.4158, P.sub.2 O.sub.5 : 0.3744, TiO.sub.2 : 0.2098). In addition, K.sub.15 P.sub.13 O.sub.40 or the same composition produced by melting is used as the flux, and the proportion of a KTiOPO.sub.4 element in a composition of the melt is prescribed to 83.5 to 90.0 mol %. The seed crystal is set so that a C axis is in a direction perpendicular to a melt surface. Then, the seed crystal contacted to the melt is rotated and slowly cooled. Thus, a single crystal of KTiOPO.sub.4 of single domain at the end of growth can be produced.
摘要翻译：公开了一种生长作为非线性光学材料的KTiOPO4单晶的方法。通过用助熔剂熔化KTiOPO 4材料以产生熔体，然后使晶种接触熔体，并通过在饱和温度或更低温度下缓慢冷却来进行KTiOPO4单晶的生长。此时，K2O，P2O5和TiO 2的摩尔分数在A（K2O：0.4150，P2O5：0.3906，TiO 2：0.1944），K 2 O 3的K 2 O 5 - （K2O：0.3750，P2O5：0.3565，TiO2：0.2685），C（K2O：0.3750，P2O5：0.3438，TiO2：0.2813），D（K2O：0.3850，P2O5：0.3260，TiO2：0.2890），E（K2O： P 2 O 5：0.3344，TiO 2：0.2656）和F（K 2 O：0.4158，P 2 O 5：0.3744，TiO 2：0.2098）。此外，将K15P13O40或通过熔融制造的相同组成用作助熔剂，并且将熔体组成中的KTiOPO 4元素的比例规定为83.5〜90.0mol％。晶种被设定为使得C轴在垂直于熔体表面的方向上。然后，将与熔体接触的晶种旋转并缓慢冷却。因此，可以生产在生长结束时单畴KTiOPO4的单晶。

3. 发明授权

US6146251A Polishing method, method of manufacturing an optical device, and a liquid suspension used for polishing 有权
标题翻译：抛光方法，制造光学装置的方法和用于抛光的液体悬浮液
公开(公告)号：US6146251A
公开(公告)日：2000-11-14
申请号：US238897
申请日：1999-01-28
申请人： Tatsuo Fukui , Koichi Tatsuki
发明人： Tatsuo Fukui , Koichi Tatsuki
IPC分类号： B24B37/00 , C09G1/02 , C09K3/14 , B24B1/00
CPC分类号： C09G1/02
摘要： By polishing an optical device such as .beta.-BBO crystals using a liquid suspension comprising a fine powder of silicon oxide and a liquid lubricant of saturated hydrocarbon, satisfactory mirror face polishing can be applied to the optical device, without deteriorating the surface property while reducing occurrence of fine optical defects.
摘要翻译：通过使用包含氧化硅细粉末和饱和烃的液体润滑剂的液体悬浮液研磨诸如β-BOO晶体的光学装置，可以对光学器件施加令人满意的镜面抛光，而不会降低表面性能，同时减少发生的光学缺陷。

4. 发明授权

US07580121B2 Focal point detection apparatus 有权
标题翻译：焦点检测装置
公开(公告)号：US07580121B2
公开(公告)日：2009-08-25
申请号：US11661399
申请日：2005-10-17
申请人： Tatsuo Fukui
发明人： Tatsuo Fukui
IPC分类号： G01J1/00
CPC分类号： G02B21/247 , G02B27/0043 , G03F7/70641
摘要： A focal point detection apparatus enlarges a pull-in range of an auto-focus operation easily. The apparatus includes: illumination part illuminating an object plane via first visual field stop; first image-forming part forming an intermediate image of the first visual field stop on second visual field stop based on light from object plane, and transmitting intermediate image without blocking it with second visual field stop when object plane within a specified range contains a focused focal plane, and blocking a portion of intermediate image using second visual field stop when object plane is outside specified range, with remaining portion transmitted; second image-forming part dividing into two the final image of first visual field stop based on light from first image-forming part; and generating part detecting a gap between the divided final images and generating a focusing signal responsive to a locational relationship of object plane to focused focal plane.
摘要翻译：焦点检测装置容易地放大自动对焦操作的拉入范围。该装置包括：经由第一视野停止照明物面的照明部; 第一图像形成部分，基于来自物平面的光在第二视场停止部上形成第一视野停止的中间图像，并且当指定范围内的物面包含聚焦焦点时，传送中间图像而不阻挡第二视场停止并且当物平面在指定范围之外时，使用第二视场停止来阻挡中间图像的一部分，剩余部分被传送; 第二图像形成部分，基于来自第一图像形成部分的光分为第一视场停止的最终图像; 以及产生部分，其检测分割的最终图像之间的间隙，并响应于物平面与聚焦焦平面的位置关系产生聚焦信号。

5. 发明授权

US07456967B2 Mark position detection apparatus 有权
标题翻译：标记位置检测装置
公开(公告)号：US07456967B2
公开(公告)日：2008-11-25
申请号：US11516542
申请日：2006-09-07
申请人： Tatsuo Fukui , Takeshi Endo
发明人： Tatsuo Fukui , Takeshi Endo
IPC分类号： G01B11/00
CPC分类号： G03F9/7088
摘要： A mark position detection apparatus has an illumination optical system for illuminating a measurement mark with illumination light and an imaging optical system for converging light reflected from the measurement mark to form an image of the measurement mark on an image pickup apparatus. The mark position detection apparatus measures a positional displacement of the measurement mark by processing an image signal obtained by the image pickup apparatus. The mark position detection apparatus has an optical element provided in the illumination optical system for compensating a difference in asymmetry of the image signal that depends on the wavelength of the illumination light.
摘要翻译：标记位置检测装置具有照明用照明光的照明光学系统和用于会聚从测量标记反射的光的成像光学系统，以在摄像装置上形成测量标记的图像。标记位置检测装置通过处理由图像拾取装置获得的图像信号来测量测量标记的位置偏移。标记位置检测装置具有设置在照明光学系统中的光学元件，用于补偿取决于照明光的波长的图像信号的不对称性差异。

6. 发明授权

US06885450B2 Apparatus for detecting optical positional deviation 有权
标题翻译：用于检测光学位置偏差的装置
公开(公告)号：US06885450B2
公开(公告)日：2005-04-26
申请号：US09897904
申请日：2001-07-05
申请人： Tatsuo Fukui
发明人： Tatsuo Fukui
IPC分类号： H01L21/027 , G03F7/20 , G01B11/00
CPC分类号： G03F7/70633
摘要： An optical positional deviation detecting apparatus comprises an irradiation optical system for irradiating a measurement mark configured by forming a second mark (e.g., a resist mark) on a first mark (e.g., a base mark) with a beam of irradiation, an image forming optical system for forming an image of the measurement mark by converging reflected beam from the measurement mark, an imaging device for photographing the image of the measurement mark, which has been formed by the image forming optical system, an image processing device for measuring the positional deviation in alignment of the second mark with respect to the first mark by processing an image signal obtained by the imaging device, and an image field area adjustment mechanism for adjusting an image field area for the imaging device to photograph the image of the measurement mark.
摘要翻译：光学位置偏差检测装置包括：照射光学系统，用于照射通过用照射束在第一标记（例如，基准标记）上形成第二标记（例如，抗蚀剂标记）而构成的测量标记，成像光学用于通过会聚来自测量标记的反射光束来形成测量标记的图像的系统，用于拍摄由图像形成光学系统形成的测量标记的图像的成像装置，用于测量位置偏差的图像处理装置通过处理由成像装置获得的图像信号相对于第一标记的第二标记的对准，以及用于调整成像装置的图像场区域以拍摄测量标记的图像的图像场区域调整机构。

7. 发明申请

US20100283983A1 Illumination apparatus for efficiently gathering illumination light 有权
标题翻译：用于有效地收集照明光的照明装置
公开(公告)号：US20100283983A1
公开(公告)日：2010-11-11
申请号：US12805213
申请日：2010-07-19
申请人： Tatsuo Fukui , Masaki Kato
发明人： Tatsuo Fukui , Masaki Kato
IPC分类号： G03B27/54 , F21V3/00 , F21V5/04 , F21V13/04 , F21V8/00
CPC分类号： G03F7/70208 , G03F7/7005
摘要： An illumination apparatus includes a light guide fiber receiving illumination light, which is generated by first to third light sources, with first to third entrances and emitting at least part of the illumination light received by each entrance from a common exit. A second illumination relay optical system optically relays the illumination light from the second light source to form a first light beam having a first angle of incidence and sends the first light beam to the second entrance. First and third illumination relay optical systems optically relay the illumination light from the first and third light sources to form a second light beam having a second angle of incidence differing from the first angle of incidence and send the second light beam to the first and third entrances.
摘要翻译：照明装置包括：光导纤维，其由第一至第三光源产生，具有第一至第三入射并且从公共出口发射由每个入口接收的照明光的至少一部分的照明光。第二照明继电器光学系统光学地中继来自第二光源的照明光，以形成具有第一入射角的第一光束并将第一光束发送到第二入口。第一和第三照明继电器光学系统光学地中继来自第一和第三光源的照明光，以形成具有与第一入射角不同的第二入射角的第二光束，并将第二光束发送到第一入口和第三入口。

8. 发明授权

US07528954B2 Method of adjusting optical imaging system, positional deviation detecting mark, method of detecting positional deviation, method of detecting position, position detecting device and mark identifying device 有权
标题翻译：调整光学成像系统的方法，位置偏差检测标记，位置偏差检测方法，位置检测方法，位置检测装置和标记识别装置
公开(公告)号：US07528954B2
公开(公告)日：2009-05-05
申请号：US11604354
申请日：2006-11-27
申请人： Tatsuo Fukui
发明人： Tatsuo Fukui
IPC分类号： G01B11/00 , G01B9/00 , G01B11/14 , G01R31/26 , H01L21/66
CPC分类号： G03F9/7049 , G03F9/7069 , G03F9/7076 , G03F9/7088
摘要： A method of adjusting optical imaging system is provided to finely adjust arrangement of optical elements with sensitivity. Illumination light with a predetermined wavelength band is irradiated to an adjustment mark including first marks disposed at a first pitch and second marks disposed at a second pitch different from the first pitch. An image is captured according to light, of diffracted light emitted from the adjustment mark, passing through an aperture stop and reaching an image surface of the optical imaging system. A positional deviation between the first and second marks is calculated with symmetric/asymmetric property of luminance information. Based on respective positional deviations calculated while the wavelength band of illumination light is changed, arrangement of optical elements between a pupil plane and an aperture stop surface of the optical imaging system is finely adjusted, to correct imaging positional deviation of a pupil image on the aperture stop surface.
摘要翻译：提供了一种调整光学成像系统的方法，以灵敏地精细地调整光学元件的布置。将具有预定波长带的照明光照射到包括以第一间距布置的第一标记和以与第一间距不同的第二间距布置的第二标记的调节标记。根据光从调节标记发射的衍射光，通过孔径光阑并到达光学成像系统的图像表面来捕获图像。利用亮度信息的对称/非对称性来计算第一和第二标记之间的位置偏差。基于在照明光的波长带改变时计算出的各自的位置偏差，微调光学成像系统的光瞳平面和孔径光阑表面之间的光学元件的布置，以校正孔径上的瞳孔图像的成像位置偏差停止表面。

9. 发明授权

US07197176B2 Mark position detecting apparatus and mark position detecting method 有权
标题翻译：标记位置检测装置和标记位置检测方法
公开(公告)号：US07197176B2
公开(公告)日：2007-03-27
申请号：US10461443
申请日：2003-06-16
申请人： Tatsuo Fukui , Tomoaki Yamada , Hirofumi Arima
发明人： Tatsuo Fukui , Tomoaki Yamada , Hirofumi Arima
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T7/73 , G06T2207/30148
摘要： A mark position detection apparatus includes: an illumination unit that illuminates a substrate having a mark formed thereupon; an image-capturing unit that captures an image of the substrate by using reflected light from the substrate and outputs image signals; a storage unit at which information related to fixed pattern noise contained in the image signals output by the image-capturing unit is stored in memory; and a control unit that calculates a position of the mark on the substrate based upon the information related to the fixed pattern noise stored in memory at the storage unit and the image signals output from the image-capturing unit.
摘要翻译：标记位置检测装置包括：照射具有在其上形成的标记的基板的照明单元; 图像捕获单元，其通过使用来自所述基板的反射光捕获所述基板的图像并输出图像信号; 存储单元，在该存储单元中存储与图像捕获单元输出的图像信号中包含的固定图案噪声有关的信息; 以及控制单元，其基于与存储在存储单元中的存储器中的固定模式噪声有关的信息和从图像捕获单元输出的图像信号来计算基板上的标记的位置。

10. 发明申请

US20130033712A1 DETECTION METHOD AND DETECTION APPARATUS 有权
标题翻译：检测方法和检测装置
公开(公告)号：US20130033712A1
公开(公告)日：2013-02-07
申请号：US13568897
申请日：2012-08-07
申请人： Yoshiaki Kito , Masanori Arai , Tatsuo Fukui
发明人： Yoshiaki Kito , Masanori Arai , Tatsuo Fukui
IPC分类号： G01B11/14
CPC分类号： G01B11/14 , G01B11/028 , H01L21/67092 , H01L21/681 , H01L22/12
摘要： A detection method of detecting a position of an uppermost substrate of a plurality of substrates stacked on each other includes applying illumination to a region covering a portion of an edge of the uppermost substrate and a portion of a lower substrate stacked with the uppermost substrate, identifying a position of the edge of the uppermost substrate based on a position of a step-like portion present in the region due to a step formed between the uppermost substrate and the lower substrate, and identifying a position of the uppermost substrate based on the position of the edge of the uppermost substrate.
摘要翻译：检测彼此堆叠的多个基板的最上面的基板的位置的检测方法包括对覆盖最上面的基板的边缘的一部分的区域和与最上面的基板堆叠的下部基板的一部分进行照明，识别基于在最上面的基板和下部基板之间形成的台阶，基于存在于该区域中的阶梯状部分的位置的最上面的基板的边缘的位置，以及基于最上面的基板的位置来识别最上面的基板的位置最上面的衬底的边缘。

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