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    • 1. 发明授权
    • Method of producing single crystal of KTiOPO.sub.4
    • 生产KTiOPO4单晶的方法
    • US5370076A
    • 1994-12-06
    • US056530
    • 1993-05-05
    • Tsutomu OkamotoKoji WatanabeTatsuo FukuiYasushi MinoyaKoichi TatsukiShigeo Kubota
    • Tsutomu OkamotoKoji WatanabeTatsuo FukuiYasushi MinoyaKoichi TatsukiShigeo Kubota
    • C30B15/00C30B9/00C30B29/22C30B29/32G02F1/35G02F1/355C30B9/12
    • C30B9/00C30B29/14
    • A method of growing a single crystal of KTiOPO.sub.4 which is a nonlinear optical material is disclosed. Growth of the single crystal of KTiOPO.sub.4 is carried out by melting a KTiOPO.sub.4 material with a flux to produce a melt, then contacting a seed crystal to the melt, and by slowly cooling at a saturation temperature or below. At this time, molar fractions of K.sub.2 O, P.sub.2 O.sub.5 and TiO.sub.2 contained in the melt fall within a region surrounded by six point in a K.sub.2 O-P.sub.2 O.sub.5 -TiO.sub.2 ternary phase diagram of A (K.sub.2 O:0.4150, P.sub.2 O.sub.5 :0.3906, TiO.sub.2 : 0.1944), B (K.sub.2 O:0.3750, P.sub.2 O.sub.5 : 0.3565, TiO.sub.2 : 0.2685), C (K.sub.2 O: 0.3750, P.sub.2 O.sub.5 : 0.3438, TiO.sub.2 : 0.2813), D (K.sub.2 O: 0.3850, P.sub.2 O.sub.5 : 0.3260, TiO.sub.2 : 0.2890), E (K.sub.2 O: 0.4000, P.sub.2 O.sub.5 : 0.3344, TiO.sub.2 : 0.2656), and F (K.sub.2 O: 0.4158, P.sub.2 O.sub.5 : 0.3744, TiO.sub.2 : 0.2098). In addition, K.sub.15 P.sub.13 O.sub.40 or the same composition produced by melting is used as the flux, and the proportion of a KTiOPO.sub.4 element in a composition of the melt is prescribed to 83.5 to 90.0 mol %. The seed crystal is set so that a C axis is in a direction perpendicular to a melt surface. Then, the seed crystal contacted to the melt is rotated and slowly cooled. Thus, a single crystal of KTiOPO.sub.4 of single domain at the end of growth can be produced.
    • 公开了一种生长作为非线性光学材料的KTiOPO4单晶的方法。 通过用助熔剂熔化KTiOPO 4材料以产生熔体,然后使晶种接触熔体,并通过在饱和温度或更低温度下缓慢冷却来进行KTiOPO4单晶的生长。 此时,K2O,P2O5和TiO 2的摩尔分数在A(K2O:0.4150,P2O5:0.3906,TiO 2:0.1944),K 2 O 3的K 2 O 5 - (K2O:0.3750,P2O5:0.3565,TiO2:0.2685),C(K2O:0.3750,P2O5:0.3438,TiO2:0.2813),D(K2O:0.3850,P2O5:0.3260,TiO2:0.2890),E(K2O: P 2 O 5:0.3344,TiO 2:0.2656)和F(K 2 O:0.4158,P 2 O 5:0.3744,TiO 2:0.2098)。 此外,将K15P13O40或通过熔融制造的相同组成用作助熔剂,并且将熔体组成中的KTiOPO 4元素的比例规定为83.5〜90.0mol%。 晶种被设定为使得C轴在垂直于熔体表面的方向上。 然后,将与熔体接触的晶种旋转并缓慢冷却。 因此,可以生产在生长结束时单畴KTiOPO4的单晶。
    • 4. 发明授权
    • Measuring apparatus
    • 测量装置
    • US07060913B2
    • 2006-06-13
    • US10790228
    • 2004-03-02
    • Kaname NishiueTsutomu Okamoto
    • Kaname NishiueTsutomu Okamoto
    • G01G19/00G01G11/00
    • G01G11/04
    • A measuring apparatus includes a measuring conveyor measuring a weight of an article during transportation, a feed conveyor, a discharge conveyor, and a central conveyor extending in a transporting direction through the measuring conveyor. In a first transfer area where the article is transferred from the feed conveyor to the measuring conveyor and in a second transfer area where the article is transferred from the measuring conveyor to the discharge conveyor, level portions of a transporting surface of the central conveyor are located at the same level as that of the measuring conveyor. In a measuring area where the measuring conveyor is located, the lower portion of the transporting surface of the central conveyor is shifted downward from that of the measuring conveyor. The measuring apparatus can stably transport the article, suppress vibrations during transfer to and from a measuring conveyor, and improve the measuring accuracy.
    • 测量装置包括测量输送机中测量物品重量的计量输送机,进料输送机,排料输送机和沿输送方向延伸穿过测量输送机的中心输送机。 在物品从进料输送机传送到测量输送机的第一传送区域中,以及物品从测量传送器传送到排出传送器的第二传送区域中,中心输送机的输送表面的高度部分位于 与测量输送机的水平相同。 在测量输送机所在的测量区域,中央输送机的输送表面的下部从测量输送机的下部向下移动。 测量装置可以稳定地输送物品,抑制在传送到测量输送机的过程中的振动,并提高测量精度。
    • 9. 发明授权
    • Method of producing a dielectric of two-layer construction
    • 二层结构电介质的制作方法
    • US4235663A
    • 1980-11-25
    • US856269
    • 1977-12-01
    • Tsutomu OkamotoHidemasa Tamura
    • Tsutomu OkamotoHidemasa Tamura
    • H05B33/22C30B19/00C30B19/02G02F1/00G02F1/03G02F1/05G09F9/30H01B3/00H01B3/12H03H3/00H05B33/12C30B19/04
    • G02F1/0018C30B19/00C30B19/02C30B29/22
    • A thin (less than 500.mu.m) epitaxial dielectric layer having low photoconductivity is grown on a monocrystalline wafer composed of Bi.sub.12 GeO.sub.20 by a liquid-phase epitaxial growth technique. The composition of the liquid melt from which the dielectric layer is grown is composed of a pseudo-three-component system defined by the formula:(Bi.sub.2 O.sub.3).multidot.(GeO.sub.2).multidot.(Y+xGa.sub.2 O.sub.3)wherein Y is a component selected from the group consisting of CaO, MgO, BaO, SrO and mixtures thereof and x is a numeral ranging from 0.05 to 5.0. The pseudo-three-component system is so-selected that in a ternary diagram of the three individual components, the mol ratio of Bi.sub.2 O.sub.3 :GeO.sub.2 (Y+xGa.sub.2 O.sub.3) is surrounded by a range connecting points A, B and C on such ternary diagram wherein point A is 0.760:0.002:0.238; point B is 0.994:0.002:0.004; and point C is 0.760:0.236:0.004.
    • 通过液相外延生长技术在由Bi12GeO20组成的单晶晶片上生长具有低光电导率的薄(小于500μm)的外延电介质层。 电介质层生长的液体熔体的组成由以下公式所定义的假三组分系统组成:(Bi 2 O 3)x(GeO 2)x(Y + x Ga 2 O 3),其中Y是选自 由CaO,MgO,BaO,SrO及其混合物组成,x为0.05至5.0的数字。 假三组分系统被选择为在三个单独组分的三元图中,Bi 3 O 3 :GeO 2(Y + xGa 2 O 3)的摩尔比被这样的三元图连接点A,B和C的范围包围 其中点A为0.760:0.002:0.238; B点为0.994:0.002:0.004; 点C为0.760:0.236:0.004。