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1. 发明授权

US08804110B2 Fault inspection device and fault inspection method 有权
标题翻译：故障检查装置及故障检查方法
公开(公告)号：US08804110B2
公开(公告)日：2014-08-12
申请号：US13703414
申请日：2011-05-20
申请人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda , Yukihiro Shibata
发明人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda , Yukihiro Shibata
IPC分类号： G01N21/00 , G01N21/95 , G01N21/94 , G01N21/956
CPC分类号： G01N21/94 , G01N21/47 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/4711 , G01N2021/8867 , G01N2021/8874 , G01N2201/0806 , G01N2201/10
摘要： Proposed is a defect inspection method whereby: illuminating light having a substantially uniform illumination intensity distribution in one direction of a sample surface irradiated on the sample surface; multiple scattered light components, which are output in multiple independent directions, are detected among the scattered light from the sample surface and multiple corresponding scattered light detection signals are obtained; at least one of the multiple scattered light detection signals is processed and the presence of defects is determined; at least one of the multiple scattered light detection signals that correspond to each of the points determined by the processing as a defect is processed and the dimensions of the defect are determined; and the position and dimensions of the defect on the sample surface, at each of the points determined as a defect, are displayed.
摘要翻译：提出了一种缺陷检查方法，其中：照射在样品表面上的样品表面的一个方向具有基本上均匀的照明强度分布的光; 在来自样品表面的散射光中检测多个独立方向输出的多个散射光分量，并获得多个相应的散射光检测信号; 处理多个散射光检测信号中的至少一个并确定缺陷的存在; 处理与通过处理确定的每个点对应的多个散射光检测信号中的至少一个作为缺陷，并确定缺陷的尺寸; 并且显示在被确定为缺陷的每个点处的样品表面上的缺陷的位置和尺寸。

2. 发明授权

US08599369B2 Defect inspection device and inspection method 有权
标题翻译：缺陷检查装置及检验方法
公开(公告)号：US08599369B2
公开(公告)日：2013-12-03
申请号：US13378418
申请日：2010-06-09
申请人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda
发明人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda
IPC分类号： G01N21/47 , G01N21/55
CPC分类号： G01N21/9501 , G01N2021/8861 , G01N2021/8874
摘要： A defect inspection method wherein illumination light having a substantially uniform illumination intensity distribution in a certain direction on the surface of a specimen is radiated onto the surface of the specimen; wherein multiple components of those scattered light beams from the surface of the specimen which are emitted mutually different directions are detected, thereby obtaining corresponding multiple scattered light beam detection signals; wherein the multiple scattered light beam detection signals is subjected to processing, thereby determining the presence of defects; wherein the corresponding multiple scattered light detecting signals is processed with respect to all of the spots determined to be defective by the processing, thereby determining the sizes of defects; and wherein the defect locations on the specimen and the defect sizes are displayed with respect to all of the spots determined to be defective by the processing.
摘要翻译：一种缺陷检查方法，其中将在试样表面上沿某一方向具有基本均匀的照明强度分布的照明光辐射到样品的表面上; 其中检测出来自样本表面的这些散射光束相互不同方向发射的多个分量，从而获得相应的多个散射光束检测信号; 其中对所述多个散射光束检测信号进行处理，由此确定缺陷的存在; 其中相应的多个散射光检测信号相对于通过处理确定为有缺陷的所有点进行处理，从而确定缺陷的尺寸; 并且其中相对于通过处理确定为有缺陷的所有点显示样本上的缺陷位置和缺陷尺寸。

3. 发明申请

US20130141715A1 FAULT INSPECTION DEVICE AND FAULT INSPECTION METHOD 有权
标题翻译：故障检测设备和故障检测方法
公开(公告)号：US20130141715A1
公开(公告)日：2013-06-06
申请号：US13703414
申请日：2011-05-20
申请人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda , Yukihiro Shibata
发明人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda , Yukihiro Shibata
IPC分类号： G01N21/88
CPC分类号： G01N21/94 , G01N21/47 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/4711 , G01N2021/8867 , G01N2021/8874 , G01N2201/0806 , G01N2201/10
摘要： Proposed is a defect inspection method whereby: illuminating light having a substantially uniform illumination intensity distribution in one direction of a sample surface irradiated on the sample surface; multiple scattered light components, which are output in multiple independent directions, are detected among the scattered light from the sample surface and multiple corresponding scattered light detection signals are obtained; at least one of the multiple scattered light detection signals is processed and the presence of defects is determined; at least one of the multiple scattered light detection signals that correspond to each of the points determined by the processing as a defect is processed and the dimensions of the defect are determined; and the position and dimensions of the defect on the sample surface, at each of the points determined as a defect, are displayed.
摘要翻译：提出了一种缺陷检查方法，其中：照射在样品表面上的样品表面的一个方向具有基本上均匀的照明强度分布的光; 在来自样品表面的散射光中检测多个独立方向输出的多个散射光分量，并获得多个相应的散射光检测信号; 处理多个散射光检测信号中的至少一个并确定缺陷的存在; 处理与通过处理确定的每个点对应的多个散射光检测信号中的至少一个作为缺陷，并确定缺陷的尺寸; 并且显示在被确定为缺陷的每个点处的样品表面上的缺陷的位置和尺寸。

4. 发明申请

US20120133928A1 DEFECT INSPECTION DEVICE AND INSPECTION METHOD 有权
标题翻译：缺陷检查装置和检查方法
公开(公告)号：US20120133928A1
公开(公告)日：2012-05-31
申请号：US13378418
申请日：2010-06-09
申请人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda
发明人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda
IPC分类号： G01N21/47 , G01N21/55
CPC分类号： G01N21/9501 , G01N2021/8861 , G01N2021/8874
摘要： A defect inspection method wherein illumination light having a substantially uniform illumination intensity distribution in a certain direction on the surface of a specimen is radiated onto the surface of the specimen; wherein multiple components of those scattered light beams from the surface of the specimen which are emitted mutually different directions are detected, thereby obtaining corresponding multiple scattered light beam detection signals; wherein the multiple scattered light beam detection signals is subjected to processing, thereby determining the presence of defects; wherein the corresponding multiple scattered light detecting signals is processed with respect to all of the spots determined to be defective by the processing, thereby determining the sizes of defects; and wherein the defect locations on the specimen and the defect sizes are displayed with respect to all of the spots determined to be defective by the processing.
摘要翻译：一种缺陷检查方法，其中将在试样表面上沿某一方向具有基本均匀的照明强度分布的照明光辐射到样品的表面上; 其中检测出来自样本表面的这些散射光束相互不同方向发射的多个分量，从而获得相应的多个散射光束检测信号; 其中对所述多个散射光束检测信号进行处理，由此确定缺陷的存在; 其中相应的多个散射光检测信号相对于通过处理确定为有缺陷的所有点进行处理，从而确定缺陷的尺寸; 并且其中相对于通过处理确定为有缺陷的所有点显示样本上的缺陷位置和缺陷尺寸。

5. 发明授权

US09041921B2 Defect inspection device and defect inspection method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US09041921B2
公开(公告)日：2015-05-26
申请号：US13519138
申请日：2011-01-17
申请人： Toshiyuki Nakao , Shigenobu Maruyama , Yuta Urano , Toshifumi Honda
发明人： Toshiyuki Nakao , Shigenobu Maruyama , Yuta Urano , Toshifumi Honda
IPC分类号： G01N21/00 , G01N21/95 , G01N21/47
CPC分类号： G01N21/9501 , G01N21/47
摘要： A defect inspection device has: an illumination optical system which irradiates a predetermined region of an inspection target with illumination light; a detection optical system which has a detector provided with a plurality of pixels by which scattered light from the predetermined region of the inspection target due to illumination light from the illumination optical system can be detected; and a signal processing portion which is provided with a correction portion which corrects pixel displacement caused by change in a direction perpendicular to a surface of the inspection target with respect to a detection signal based on the scattered light detected by the detector of the detection optical system, and a defect determination portion which determines a defect on the surface of the inspection target based on the detection signal corrected by the correction portion.
摘要翻译：缺陷检查装置具有：利用照明光照射检查对象物的规定区域的照明光学系统; 检测光学系统，其具有检测器，该检测器设置有多个像素，通过该检测器能够检测来自照明光学系统的照明光来自检查对象物的预定区域的散射光; 以及信号处理部，其具有校正部，该校正部基于由检测光学系统的检测器检测到的散射光，相对于检测信号校正与垂直于检查对象的表面的方向的变化引起的像素位移以及缺陷确定部分，其基于由校正部分校正的检测信号来确定检查对象的表面上的缺陷。

6. 发明申请

US20130003052A1 DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20130003052A1
公开(公告)日：2013-01-03
申请号：US13519138
申请日：2011-01-17
申请人： Toshiyuki Nakao , Shigenobu Maruyama , Yuta Urano , Toshifumi Honda
发明人： Toshiyuki Nakao , Shigenobu Maruyama , Yuta Urano , Toshifumi Honda
IPC分类号： G01N21/956
CPC分类号： G01N21/9501 , G01N21/47
摘要： A defect inspection device has: an illumination optical system which irradiates a predetermined region of an inspection target with illumination light; a detection optical system which has a detector provided with a plurality of pixels by which scattered light from the predetermined region of the inspection target due to illumination light from the illumination optical system can be detected; and a signal processing portion which is provided with a correction portion which corrects pixel displacement caused by change in a direction perpendicular to a surface of the inspection target with respect to a detection signal based on the scattered light detected by the detector of the detection optical system, and a defect determination portion which determines a defect on the surface of the inspection target based on the detection signal corrected by the correction portion.
摘要翻译：缺陷检查装置具有：利用照明光照射检查对象物的规定区域的照明光学系统; 检测光学系统，其具有检测器，该检测器设置有多个像素，通过该检测器能够检测来自照明光学系统的照明光来自检查对象物的预定区域的散射光; 以及信号处理部，其具有校正部，该校正部基于由检测光学系统的检测器检测到的散射光，相对于检测信号校正与垂直于检查对象的表面的方向的变化引起的像素位移以及缺陷确定部分，其基于由校正部分校正的检测信号来确定检查对象的表面上的缺陷。

7. 发明申请

US20120194807A1 FLAW INSPECTING METHOD AND DEVICE THEREFOR 有权
标题翻译： FLAW检查方法及其设备
公开(公告)号：US20120194807A1
公开(公告)日：2012-08-02
申请号：US13387120
申请日：2010-07-28
申请人： Shigenobu Maruyama , Toshifumi Honda , Toshiyuki Nakao , Yuta Urano
发明人： Shigenobu Maruyama , Toshifumi Honda , Toshiyuki Nakao , Yuta Urano
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/47
摘要： In order to maximize the effect of signal addition during inspection of foreign substances in wafers, a device structure including line sensors arranged in plural directions is effective. Low-angle detection optical systems that detect light beams in plural azimuth directions, the light beams being scattered in low angle directions among those scattered from a linear area on a sample illuminated by illuminating means, each include a combination of a first imaging lens group (330) and a diffraction grating (340) and a combination of a second imaging lens group (333) and an image detector (350) having a plurality of light receiving surfaces. A signal processing unit processes signals from the image detectors of the low-angle detection optical systems by adding the signals from the light receiving surfaces corresponding between the image detectors.
摘要翻译：为了最大限度地发挥在晶片中异物检查期间信号增加的效果，包括沿多个方向布置的线传感器的装置结构是有效的。检测在多个方位方向上的光束的低角度检测光学系统，所述光束在从照明装置照射的样品上的线性区域散射的那些中以低角度方向散射，各自包括第一成像透镜组（ 330）和衍射光栅（340）以及具有多个光接收表面的第二成像透镜组（333）和图像检测器（350）的组合。信号处理单元通过将来自相应于图像检测器之间的光接收表面的信号相加来处理来自低角度检测光学系统的图像检测器的信号。

8. 发明授权

US08514388B2 Flaw inspecting method and device therefor 有权
标题翻译：缺陷检查方法及其装置
公开(公告)号：US08514388B2
公开(公告)日：2013-08-20
申请号：US13387120
申请日：2010-07-28
申请人： Shigenobu Maruyama , Toshifumi Honda , Toshiyuki Nakao , Yuta Urano
发明人： Shigenobu Maruyama , Toshifumi Honda , Toshiyuki Nakao , Yuta Urano
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/47
摘要： In order to maximize the effect of signal addition during inspection of foreign substances in wafers, a device structure including line sensors arranged in plural directions is effective. Low-angle detection optical systems that detect light beams in plural azimuth directions, the light beams being scattered in low angle directions among those scattered from a linear area on a sample illuminated by illuminating means, each include a combination of a first imaging lens group (330) and a diffraction grating (340) and a combination of a second imaging lens group (333) and an image detector (350) having a plurality of light receiving surfaces. A signal processing unit processes signals from the image detectors of the low-angle detection optical systems by adding the signals from the light receiving surfaces corresponding between the image detectors.
摘要翻译：为了最大限度地发挥在晶片中异物检查期间信号增加的效果，包括沿多个方向布置的线传感器的装置结构是有效的。检测在多个方位方向上的光束的低角度检测光学系统，所述光束在从由照明装置照射的样品上的线性区域散射的那些中以低角度方向散射，各自包括第一成像透镜组（ 330）和衍射光栅（340）以及具有多个光接收表面的第二成像透镜组（333）和图像检测器（350）的组合。信号处理单元通过将来自相应于图像检测器之间的光接收表面的信号相加来处理来自低角度检测光学系统的图像检测器的信号。

9. 发明申请

US20130114078A1 DEFECT INSPECTION METHOD AND DEVICE THEREFOR 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US20130114078A1
公开(公告)日：2013-05-09
申请号：US13701030
申请日：2011-05-25
申请人： Toshifumi Honda , Yuta Urano , Yukihiro Shibata , Toshiyuki Nakao
发明人： Toshifumi Honda , Yuta Urano , Yukihiro Shibata , Toshiyuki Nakao
IPC分类号： G01N21/88
CPC分类号： G01N21/8806 , G01N21/9501 , G01N2021/8874
摘要： Disclosed is a defect inspection method which makes it possible to scan the entire surface of a sample and detect minute defects without causing thermal damage to the sample. A defect inspection method in which a pulse laser emitted from a light source is subjected to pulse division and irradiated on the surface of a sample which moves in one direction while the divided-pulse pulse laser is rotated, reflection light from the sample irradiated by the divided-pulse pulse laser is detected, the signal of the detected reflection light is processed to detect defects on the sample, and information regarding a detected defect is output to a display screen, wherein the barycentric position of the light intensity of the divided-pulse pulse laser is monitored and adjusted.
摘要翻译：公开了一种缺陷检查方法，其可以扫描样品的整个表面并检测微小缺陷而不会对样品造成热损伤。对从光源射出的脉冲激光进行脉冲分割并照射在分割脉冲激光器旋转时在一个方向上移动的样品的表面的缺陷检查方法中，检测出分割脉冲脉冲激光，检测出反射光的信号，以检测样本上的缺陷，将与检测到的缺陷有关的信息输出到显示画面，其中分割脉冲的光强度的重心位置脉冲激光被监测和调整。

10. 发明申请

US20130155400A1 METHOD AND DEVICE FOR INSPECTING FOR DEFECTS 有权
标题翻译：用于检查缺陷的方法和装置
公开(公告)号：US20130155400A1
公开(公告)日：2013-06-20
申请号：US13700520
申请日：2011-05-20
申请人： Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
发明人： Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
IPC分类号： G01N21/95
CPC分类号： G01N21/95 , G01N21/9501 , G01Q60/22 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspecting method is provided which comprises a pre-scan defect inspecting process including a pre-scan irradiating step for casting irradiation light onto the surface of a sample, a pre-scan detecting step for detecting the scattered lights, and a pre-scan defect information collecting step for obtaining information on preselected defects present on the sample surface on the basis of the scattered lights; a near-field defect inspecting process including a near-field irradiating step in which the distance between the sample surface and a near-field head is adjusted so that the sample surface is irradiated, a near-field detecting step for detecting near-field light response, and a near-field defect information collecting step for obtaining information on the preselected defects on the basis of the near-field light response; and a merging process for inspecting defects present on the sample surface by merging the pieces of information on the preselected defects.
摘要翻译：提供一种缺陷检查方法，其包括预扫描缺陷检查处理，其包括用于将照射光投射到样品表面上的预扫描照射步骤，用于检测散射光的预扫描检测步骤，以及预扫描缺陷信息收集步骤，用于基于散射光获得在样品表面上存在的预选缺陷的信息; 包括近场照射步骤的近场缺陷检查处理，其中调整样品表面和近场磁头之间的距离以照射样品表面;近场检测步骤，用于检测近场光响应和近场缺陷信息收集步骤，用于基于近场光响应获得关于预选缺陷的信息; 以及通过合并关于预选缺陷的信息来检查存在于样品表面上的缺陷的合并过程。

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