专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120298865A1 SCANNING ELECTRON MICROSCOPE 有权
标题翻译：扫描电子显微镜
公开(公告)号：US20120298865A1
公开(公告)日：2012-11-29
申请号：US13522984
申请日：2011-01-21
申请人： Seiko Omori , Junichi Tanaka , Yoshinori Nakayama , Keiichiro Hitomi
发明人： Seiko Omori , Junichi Tanaka , Yoshinori Nakayama , Keiichiro Hitomi
IPC分类号： H01J37/26
CPC分类号： G03F7/70625 , H01J37/222 , H01J37/28 , H01J2237/1536 , H01J2237/226 , H01J2237/24571 , H01J2237/2809 , H01J2237/2817
摘要： Disclosed is a scanning electron microscope provided with a calculation device (403) for measuring the dimension of a pattern on a sample (413), characterized in that the amount of change of a pattern shape, caused by electron beam irradiation, is calculated and stored, and a pattern shape contour (614; 815; 1512) before the sample is irradiated with an electron beam is restored from a pattern shape contour (613; 814; 1511) in a scanning electron microscope image (612; 813; 1510) after the sample is irradiated with an electron beam using the calculated amount and, then, the pattern shape contour (614; 815; 1512) is displayed. Thus, the shrinking of a resist and/or the effect of electrostatic charge caused when a sample is irradiated with an electron beam are eliminated, so that the shape contour of a two-dimensional pattern before irradiating an electron beam can be restored with a high degree of accuracy, and the dimension of a pattern can be measured with a high degree of accuracy, using the restored image.
摘要翻译：公开了一种具有用于测量样品（413）上的图案的尺寸的计算装置（403）的扫描电子显微镜，其特征在于，计算并存储由电子束照射引起的图案形状的变化量在扫描电子显微镜图像（612; 813; 1510）中从扫描电子显微镜图像（612; 813; 1510）中的图案形状轮廓（613; 814; 1511）恢复在用电子束照射样品之前的图案形状轮廓（614; 815; 1512）使用计算量用电子束照射样品，然后显示图案形状轮廓（614; 815; 1512）。因此，消除了当用电子束照射样品时引起的抗蚀剂收缩和/或静电电荷的影响，从而能够以高的电压恢复照射电子束之前的二维图案的形状轮廓使用恢复的图像，可以高精度地测量图案的精度和尺寸。

2. 发明授权

US09110384B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US09110384B2
公开(公告)日：2015-08-18
申请号：US13522984
申请日：2011-01-21
申请人： Seiko Omori , Junichi Tanaka , Yoshinori Nakayama , Keiichiro Hitomi
发明人： Seiko Omori , Junichi Tanaka , Yoshinori Nakayama , Keiichiro Hitomi
IPC分类号： H01J37/28 , G03F7/26 , G03F7/20 , H01J37/22
CPC分类号： G03F7/70625 , H01J37/222 , H01J37/28 , H01J2237/1536 , H01J2237/226 , H01J2237/24571 , H01J2237/2809 , H01J2237/2817
摘要： Disclosed is a scanning electron microscope provided with a calculation device (403) for measuring the dimension of a pattern on a sample (413), characterized in that the amount of change of a pattern shape, caused by electron beam irradiation, is calculated and stored, and a pattern shape contour (614; 815; 1512) before the sample is irradiated with an electron beam is restored from a pattern shape contour (613; 814; 1511) in a scanning electron microscope image (612; 813; 1510) after the sample is irradiated with an electron beam using the calculated amount and, then, the pattern shape contour (614; 815; 1512) is displayed. Thus, the shrinking of a resist and/or the effect of electrostatic charge caused when a sample is irradiated with an electron beam are eliminated, so that the shape contour of a two-dimensional pattern before irradiating an electron beam can be restored with a high degree of accuracy, and the dimension of a pattern can be measured with a high degree of accuracy, using the restored image.
摘要翻译：公开了一种具有用于测量样品（413）上的图案的尺寸的计算装置（403）的扫描电子显微镜，其特征在于，计算并存储由电子束照射引起的图案形状的变化量在扫描电子显微镜图像（612; 813; 1510）中从扫描电子显微镜图像（612; 813; 1510）中的图案形状轮廓（613; 814; 1511）恢复在用电子束照射样品之前的图案形状轮廓（614; 815; 1512）使用计算量用电子束照射样品，然后显示图案形状轮廓（614; 815; 1512）。因此，消除了当用电子束照射样品时引起的抗蚀剂收缩和/或静电电荷的影响，从而能够以高的电压恢复照射电子束之前的二维图案的形状轮廓使用恢复的图像，可以高精度地测量图案的精度和尺寸。

3. 发明申请

US20120212602A1 PATTERN DIMENSION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM MICROSCOPE USED IN SAME 有权
标题翻译：图案尺寸测量方法和使用的充电颗粒光束显微镜
公开(公告)号：US20120212602A1
公开(公告)日：2012-08-23
申请号：US13504129
申请日：2010-09-30
申请人： Keiichiro Hitomi , Yoshinori Nakayama , Junichi Tanaka
发明人： Keiichiro Hitomi , Yoshinori Nakayama , Junichi Tanaka
IPC分类号： G06K9/48 , H04N7/18
CPC分类号： G01B15/00 , H01J37/28 , H01J2237/2814 , H01J2237/2817
摘要： In order to provide a pattern dimension measurement method with a small measured error and excellent reproducibility even though defocus occurs and a charged particle beam microscope used in the same, in a method for applying a charged particle beam to a specimen formed with a pattern to measure a pattern dimension from a signal intensity distribution of signal charged particles from the specimen, edge index positions (X1) and (X2) on the right and left of the maximum point of signal intensity corresponding to a pattern edge are calculated by a threshold method, and a pattern edge position (Xe) is found from a mean value between the positions. Thus, it is possible to reduce the influence of defocus on the pattern edge position (Xe).
摘要翻译：为了提供即使发生散焦而具有小的测量误差和优异的再现性的图案尺寸测量方法，并且在其中使用带电粒子束显微镜，在将带电粒子束施加到形成有待测量图案的样本的方法中通过阈值法计算来自样本的信号带电粒子的信号强度分布的图案尺寸，对应于图案边缘的最大信号强度点右侧和左侧的边缘索引位置（X1）和（X2）并且从位置之间的平均值找到图案边缘位置（Xe）。因此，可以减小散焦对图案边缘位置（Xe）的影响。

4. 发明授权

US09200896B2 Pattern dimension measurement method and charged particle beam microscope used in same 有权
标题翻译：图案尺寸测量方法和使用的带电粒子束显微镜
公开(公告)号：US09200896B2
公开(公告)日：2015-12-01
申请号：US13504129
申请日：2010-09-30
申请人： Keiichiro Hitomi , Yoshinori Nakayama , Junichi Tanaka
发明人： Keiichiro Hitomi , Yoshinori Nakayama , Junichi Tanaka
IPC分类号： H04N9/47 , H04N7/18 , G01B15/00 , H01J37/28
CPC分类号： G01B15/00 , H01J37/28 , H01J2237/2814 , H01J2237/2817
摘要： In order to provide a pattern dimension measurement method with a small measured error and excellent reproducibility even though defocus occurs and a charged particle beam microscope used in the same, in a method for applying a charged particle beam to a specimen formed with a pattern to measure a pattern dimension from a signal intensity distribution of signal charged particles from the specimen, edge index positions (X1) and (X2) on the right and left of the maximum point of signal intensity corresponding to a pattern edge are calculated by a threshold method, and a pattern edge position (Xe) is found from a mean value between the positions. Thus, it is possible to reduce the influence of defocus on the pattern edge position (Xe).
摘要翻译：为了提供即使发生散焦而具有小的测量误差和优异的再现性的图案尺寸测量方法，并且在其中使用带电粒子束显微镜，在将带电粒子束施加到形成有待测量图案的样本的方法中通过阈值法计算来自样本的信号带电粒子的信号强度分布的图案尺寸，对应于图案边缘的最大信号强度点右侧和左侧的边缘索引位置（X1）和（X2）并且从位置之间的平均值找到图案边缘位置（Xe）。因此，可以减小散焦对图案边缘位置（Xe）的影响。

5. 发明授权

US07750296B2 Scanning electron microscope and calibration of image distortion 有权
标题翻译：扫描电子显微镜和图像失真校准
公开(公告)号：US07750296B2
公开(公告)日：2010-07-06
申请号：US11866426
申请日：2007-10-03
申请人： Keiichiro Hitomi , Yasunari Sohda , Yoshinori Nakayama , Hajime Koyanagi
发明人： Keiichiro Hitomi , Yasunari Sohda , Yoshinori Nakayama , Hajime Koyanagi
IPC分类号： G01J4/00 , G01N23/00
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/2826
摘要： In method and apparatus for obtaining a scanning electron microscope image devoid of distortion by measuring a scanning distortion and calibrating the scanning distortion, there occurs a problem that an error takes place in dimension control owing to a scanning distortion of an electron beam. To cope with this problem, an image is obtained by scanning a predetermined region with the electron beam, a plurality of regions are selected from the image, the pattern pitch is measured in each of the regions and a scanning distortion amount is calculated from the result of measurement and then corrected.
摘要翻译：在通过测量扫描失真和校准扫描失真来获得没有失真的扫描电子显微镜图像的方法和装置中，存在由于电子束的扫描失真引起的尺寸控制中出现误差的问题。为了解决这个问题，通过用电子束扫描预定区域来获得图像，从图像中选择多个区域，在每个区域中测量图案间距，并根据结果计算扫描失真量的测量，然后校正。

6. 发明申请

US20110274341A1 CHARGED BEAM DEVICE 有权
标题翻译：充电光束装置
公开(公告)号：US20110274341A1
公开(公告)日：2011-11-10
申请号：US13142316
申请日：2010-01-13
申请人： Kaori Shirahata , Yoshinori Nakayama , Keiichiro Hitomi , Muneyuki Fukuda , Yasunari Sohda
发明人： Kaori Shirahata , Yoshinori Nakayama , Keiichiro Hitomi , Muneyuki Fukuda , Yasunari Sohda
IPC分类号： G06K9/00
CPC分类号： G01B15/00 , H01J37/153 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/216 , H01L22/12
摘要： In order to provide a charged beam device capable of obtaining a precise image of a sample surface pattern while improving the accuracy of automatic focus/astigmatism correction, there are provided an electron gun (1), a deflection control portion (8) which allows an electron beam to scan, a focus control portion (10) and an astigmatism correction portion (3) for the electron beam, an image processing portion (11), and a switching portion (9) which switches scan conditions when obtaining pattern information of the sample (1001) surface and scan conditions when performing the automatic focus/astigmatism correction, and a scan speed and scan procedures are switched between when obtaining the pattern information and when performing the automatic focus/astigmatism correction.
摘要翻译：为了提供能够获得样品表面图案的精确图像的带电束装置，同时提高自动聚焦/像散校正的精度，提供了一种电子枪（1），偏转控制部分（8），其允许电子束扫描，用于电子束的聚焦控制部分（10）和像散校正部分（3），图像处理部分（11）和切换部分（9），当获得图像信息进行自动聚焦/像散校正时的样品（1001）表面和扫描条件，并且在获得图案信息和执行自动聚焦/散光校正时切换扫描速度和扫描程序。

7. 发明申请

US20080203285A1 Charged particle beam measurement equipment, size correction and standard sample for correction 有权
标题翻译：带电粒子束测量设备，尺寸校正和标准样品进行校正
公开(公告)号：US20080203285A1
公开(公告)日：2008-08-28
申请号：US12010852
申请日：2008-01-30
申请人： Yasunari Sohda , Yoshinori Nakayama , Hajime Koyanagi , Keiichiro Hitomi
发明人： Yasunari Sohda , Yoshinori Nakayama , Hajime Koyanagi , Keiichiro Hitomi
IPC分类号： G01D18/00
CPC分类号： H01J37/28 , B82Y15/00 , H01J2237/2826
摘要： Correction of widths obtained by measurement of a sample with the use of a scanning electron microscope is executed with greater precision. Use is made of a standard sample 40 for correction comprising a plurality of correction mark members 42a, 42b, . . . , the respective correction mark members 42a, 42b, being lined up at specified intervals kept therebetween in a specified direction, and respective widths thereof, in the specified direction, differing from each other so as to be of respective sizes as pre-set. Measurement of the respective widths of the correction mark members 42a, 42b, . . . is made to obtain respective measurement widths while authorized widths of the respective widths of the correction mark members 42a, 42b, . . . are kept stored in an image processing unit of the scanning electron microscope to thereby find differences between the respective measurement widths, and authorized widths corresponding thereto, and the differences are stored as respective correction functions, which are used in correcting the measurement width of the sample.
摘要翻译：以更高的精度执行通过使用扫描电子显微镜测量样品获得的宽度的校正。使用由用于校正的标准样品40组成，包括多个校正标记构件42,4a，42b。。。，各个校正标记部件42,4a，42b以规定的间隔排列成规定的方向，并且在规定的方向上保持其各自的宽度彼此不同，从而具有预先设定的各自的尺寸。校正标记部件42,4a，42b，...的各自宽度的测量。。。被制成以获得相应的测量宽度，同时校正标记部件42,4a，42b的相应宽度的授权宽度。。。保存在扫描电子显微镜的图像处理单元中，从而发现各测量宽度与其对应的授权宽度之间的差异，并且将这些差值存储为用于校正样品的测量宽度的各种校正函数。

8. 发明申请

US20080121791A1 STANDARD REFERENCE COMPONENT FOR CALIBRATION, FABRICATION METHOD FOR THE SAME, AND SCANNING ELECTRON MICROSCOPE USING THE SAME 有权
标题翻译：用于校准的标准参考组件，相同的制造方法和使用其的扫描电子显微镜
公开(公告)号：US20080121791A1
公开(公告)日：2008-05-29
申请号：US11939596
申请日：2007-11-14
申请人： Yoshinori Nakayama , Yasunari Sohda , Keiichiro Hitomi , Hajime Koyanagi
发明人： Yoshinori Nakayama , Yasunari Sohda , Keiichiro Hitomi , Hajime Koyanagi
IPC分类号： H01J37/26 , G01D18/00
CPC分类号： H01J37/28 , H01J37/244 , H01J37/263 , H01J2237/24578 , H01J2237/2816 , H01J2237/2823 , H01J2237/2826 , H01J2237/30433 , H01J2237/3142 , H01J2237/31732
摘要： The present invention provides a standard reference component for calibration for performing magnification calibration used in the scanning electron microscope with high precision, and provides a scanning electron microscope technique using it. Provided is a standard reference component for calibration for calibrating a scanning electron microscope that measures a length of a pattern in an observation area from information on the intensity of secondary electrons or reflected electrons generated by scanning an incident electron beam in the observation area on a measuring sample, having: a first substrate on which a multiple-layer is laminated and a second substrate with a recess for holding the first substrate, wherein the first substrate is held in the recess of the second substrate so that a normal direction of the multiple-layer surface may be roughly perpendicular to a normal direction of the second substrate surface, and the multiple-layer has a multiple-layer structure of a film containing silicon and a film containing molybdenum.
摘要翻译：本发明提供了一种用于校准的标准参考部件，用于以高精度执行扫描电子显微镜中使用的放大校准，并提供使用它的扫描电子显微镜技术。提供了用于校准扫描电子显微镜的标准参考部件，该扫描电子显微镜从关于通过扫描观察区域中的入射电子束产生的二次电子或反射电子的强度的信息来测量观察区域中的图案的长度具有：层叠有多层的第一基板和具有用于保持所述第一基板的凹部的第二基板，其中，所述第一基板保持在所述第二基板的所述凹部中，层表面可以大致垂直于第二基板表面的法线方向，并且多层具有含硅的膜和含有钼的膜的多层结构。

9. 发明申请

US20080251868A1 Standard component for calibration and electron-beam system using the same 有权
标题翻译：用于校准的标准组件和使用其的电子束系统
公开(公告)号：US20080251868A1
公开(公告)日：2008-10-16
申请号：US12078516
申请日：2008-04-01
申请人： Yoshinori Nakayama , Yasunari Sohda , Keiichiro Hitomi
发明人： Yoshinori Nakayama , Yasunari Sohda , Keiichiro Hitomi
IPC分类号： H01L23/00 , H01L21/302 , H01L21/26 , G01N23/00
CPC分类号： G01N23/225 , H01J37/28 , H01J2237/20 , H01J2237/2826 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： The invention provides a standard component for calibration that enables a calibration position to be easily specified in order to calibrate accurately a scale factor in the electron-beam system, and provides an electron-beam system using it. High-accuracy metrology calibration capable of specifying a calibration position can be realized by forming a mark pattern or labeled material for identifying the calibration position in proximity of a superlattice pattern of the standard component for system calibration. The standard component for calibration is one that calibrates a scale factor of an electron-beam system based on a signal of secondary charged particles detected by irradiation of a primary electron beam emitted from the electron-beam system on a substrate having a cross section of a superlattice of a multi-layer structure in which different materials are deposited alternately. The substrate have linear patterns that are on the substrate surface parallel to the multi-layer and are arranged at a fixed interval in a direction crossing the cross section of the superlattice pattern, and is so configured that the cross sections of the linear patterns may exist on substantially the same plane of the superlattice cross section, so that the linear patterns enable a position of the superlattice pattern to be identified.
摘要翻译：本发明提供了一种用于校准的标准组件，其使得能够容易地指定校准位置，以便准确地校准电子束系统中的比例因子，并提供使用该电子束系统的电子束系统。可以通过形成用于识别用于系统校准的标准组件的超晶格图案附近的校准位置的标记图案或标记材料来实现能够指定校准位置的高精度度量学校准。用于校准的标准组件是基于通过照射从电子束系统发射的一次电子束检测的二次带电粒子的信号来校准电子束系统的比例因子的衬底上的横截面为其中不同材料交替沉积的多层结构的超晶格。衬底具有平行于多层的衬底表面上的线性图案，并且在与超晶格图案的横截面交叉的方向上以固定的间隔布置，并且被配置成可以存在线形图案的横截面在超晶格截面的基本上相同的平面上，使得线状图案能够识别超晶格图案的位置。

10. 发明授权

US08263929B2 Standard member for correction, scanning electron microscope using same, and scanning electron microscope correction method 有权
标题翻译：标准校正元件，扫描电子显微镜及其扫描电子显微镜校正方法
公开(公告)号：US08263929B2
公开(公告)日：2012-09-11
申请号：US13057235
申请日：2009-07-31
申请人： Yoshinori Nakayama , Yasunari Sohda , Keiichiro Hitomi
发明人： Yoshinori Nakayama , Yasunari Sohda , Keiichiro Hitomi
IPC分类号： G01J1/10
CPC分类号： H01J37/28 , B82Y15/00 , H01J2237/2826
摘要： Disclosed is a standard specimen, used with an electron microscope to correct the magnification with high precision. A standard member used for correction corrects a scanning electron microscope that measures a pattern within an observation region based on information about the secondary electrons generated by scanning incident electron lines on the observation region on a measurement specimen, or information about the reflected electron intensity. The standard member has a first pattern region that corrects the magnification and that comprises a concavo-convex pattern (line/space pattern) in the cross section of a multilayer film that has been laminated, and a second pattern region near the first pattern at almost the same height that does not contain a pattern with the same periodicity as the pattern pitch size of the first region and that is used for beam adjustment.
摘要翻译：公开了一种标准样品，与电子显微镜一起使用以高精度校正放大率。用于校正的标准构件基于通过扫描测量样本上的观察区域上的入射电子线扫描产生的二次电子信息或关于反射电子强度的信息来校正观察区域内的图案的扫描电子显微镜。标准构件具有第一图案区域，该第一图案区域校正放大率，并且在层压的多层膜的横截面中包括凹凸图案（线/空间图案），以及在第一图案附近的第二图案区域相同的高度不包含与第一区域的图案间距尺寸相同的周期性的图案，并且用于光束调节。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式